JP5083339B2 - 基板搬送装置及び基板搬送方法並びに記憶媒体 - Google Patents
基板搬送装置及び基板搬送方法並びに記憶媒体 Download PDFInfo
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- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
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- B25J9/1633—Programme controls characterised by the control loop compliant, force, torque control, e.g. combined with position control
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/16—Programme controls
- B25J9/1656—Programme controls characterised by programming, planning systems for manipulators
- B25J9/1664—Programme controls characterised by programming, planning systems for manipulators characterised by motion, path, trajectory planning
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
- H01L21/67265—Position monitoring, e.g. misposition detection or presence detection of substrates stored in a container, a magazine, a carrier, a boat or the like
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67288—Monitoring of warpage, curvature, damage, defects or the like
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- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/673—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere using specially adapted carriers or holders; Fixing the workpieces on such carriers or holders
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- H01—ELECTRIC ELEMENTS
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- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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Description
この保持枠の内縁から各々内側に突出すると共に、当該内縁に沿って互いに間隔を開けて設けられ、前記基板の裏面側周縁部を載置するための3個以上の保持部と、
これら保持部の各々に設けられ、保持部に上から荷重が加わったときの当該保持部の歪み量を検出する歪みセンサと、
前記保持枠を前進させ、前記基体を前記基板載置部に対して相対的に上昇させてから、その上に基板が載置される基板載置部上の基板を受け取ったときに、各々の歪みセンサの歪み量に基づいて、基板の姿勢が正常であるか否かを判断する判断手段と、
基板の姿勢が異常であると判断したときに、前記保持枠の後退を禁止する手段と、
前記保持部による基板載置部に対する基板の受け渡し動作をティーチングするときに、前記歪みセンサの歪み量の変化のタイミングで、前記駆動部の駆動量を管理する高さ方向の座標位置を読み取って、基板の受け渡しの高さ位置として記憶する制御部と、を備え、
前記判断手段は、基板の姿勢が正常であるときの各歪みセンサの歪み量に基づいて設定されたしきい値と、各歪みセンサの歪み量の検出値とを比較し、少なくとも1個の歪みセンサの歪み量がしきい値以下のときには、基板の姿勢が異常であると判断することを特徴とする。
前記保持枠を前進させ、前記基体を前記基板載置部に対して相対的に上昇させてから、前記基板載置部上の基板を受け取る工程と、
前記保持部の各々に設けられた歪みセンサにより、保持部に上から荷重が加わったときの当該保持部の歪み量を検出する工程と、
各々の歪みセンサの歪み量に基づいて、基板の姿勢が正常であるか否かを判断する工程と、
基板の姿勢が異常であると判断したときに、前記保持枠の後退を禁止する工程と、
前記保持部による基板載置部に対する基板の受け渡し動作をティーチングするときに、前記歪みセンサの歪み量の変化のタイミングで、前記駆動部の駆動量を管理する高さ方向の座標位置を読み取って、基板の受け渡しの高さ位置として記憶する工程と、を含み、
前記基板の姿勢を判断する工程は、基板の姿勢が正常であるときの各歪みセンサの歪み量に基づいて設定されたしきい値と、各歪みセンサの歪み量の検出値とを比較し、少なくとも1個の歪みセンサの歪み量がしきい値以下のときには、基板の姿勢が異常であると判断することを特徴とする。
C 受け渡し手段
A1〜A4 搬送アーム
D 受け渡しアーム
E シャトルアーム
F インターフェイスアーム
3A,3B フォーク
30A〜30D 保持爪
4A〜4D 歪みセンサ
5 制御部
52 検査プログラム
53 ティーチングプログラム
Claims (3)
- 駆動部により昇降、進退自在に構成され、基板の周囲を囲むように設けられた保持枠と、
この保持枠の内縁から各々内側に突出すると共に、当該内縁に沿って互いに間隔を開けて設けられ、前記基板の裏面側周縁部を載置するための3個以上の保持部と、
これら保持部の各々に設けられ、保持部に上から荷重が加わったときの当該保持部の歪み量を検出する歪みセンサと、
前記保持枠を前進させ、前記基体を前記基板載置部に対して相対的に上昇させてから、その上に基板が載置される基板載置部上の基板を受け取ったときに、各々の歪みセンサの歪み量に基づいて、基板の姿勢が正常であるか否かを判断する判断手段と、
基板の姿勢が異常であると判断したときに、前記保持枠の後退を禁止する手段と、
前記保持部による基板載置部に対する基板の受け渡し動作をティーチングするときに、前記歪みセンサの歪み量の変化のタイミングで、前記駆動部の駆動量を管理する高さ方向の座標位置を読み取って、基板の受け渡しの高さ位置として記憶する制御部と、を備え、
前記判断手段は、基板の姿勢が正常であるときの各歪みセンサの歪み量に基づいて設定されたしきい値と、各歪みセンサの歪み量の検出値とを比較し、少なくとも1個の歪みセンサの歪み量がしきい値以下のときには、基板の姿勢が異常であると判断することを特徴とする基板搬送装置。 - 駆動部により昇降、進退自在に構成され、基板の周囲を囲むように設けられた保持枠と、この保持枠の内縁から各々内側に突出すると共に、当該内縁に沿って互いに間隔を開けて設けられ、前記基板の裏面側周縁部を載置するための3個以上の保持部と、を備えた基板搬送装置を用いて、その上に基板が載置される基板載置部に対して基板の受け渡しを行う基板搬送方法において、
前記保持枠を前進させ、前記基体を前記基板載置部に対して相対的に上昇させてから、前記基板載置部上の基板を受け取る工程と、
前記保持部の各々に設けられた歪みセンサにより、保持部に上から荷重が加わったときの当該保持部の歪み量を検出する工程と、
各々の歪みセンサの歪み量に基づいて、基板の姿勢が正常であるか否かを判断する工程と、
基板の姿勢が異常であると判断したときに、前記保持枠の後退を禁止する工程と、
前記保持部による基板載置部に対する基板の受け渡し動作をティーチングするときに、前記歪みセンサの歪み量の変化のタイミングで、前記駆動部の駆動量を管理する高さ方向の座標位置を読み取って、基板の受け渡しの高さ位置として記憶する工程と、を含み、
前記基板の姿勢を判断する工程は、基板の姿勢が正常であるときの各歪みセンサの歪み量に基づいて設定されたしきい値と、各歪みセンサの歪み量の検出値とを比較し、少なくとも1個の歪みセンサの歪み量がしきい値以下のときには、基板の姿勢が異常であると判断することを特徴とする基板搬送方法。 - 駆動部により昇降、進退自在に構成され、基板の周囲を囲むように設けられた保持枠と、この保持枠の内縁から各々内側に突出すると共に、当該内縁に沿って互いに間隔を開けて設けられ、前記基板の裏面側周縁部を載置するための3個以上の保持部と、を備えた基板搬送装置を用いられるコンピュータプログラムを格納した記憶媒体であって、前記プログラムは、請求項2記載の基板搬送方法を実行するようにステップ群が組まれていることを特徴とする記憶媒体。
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JP2010023502A JP5083339B2 (ja) | 2010-02-04 | 2010-02-04 | 基板搬送装置及び基板搬送方法並びに記憶媒体 |
TW099142821A TW201133687A (en) | 2010-02-04 | 2010-12-08 | Substrate transfer apparatus, substrate transfer method and storage medium |
KR1020100125400A KR20110090753A (ko) | 2010-02-04 | 2010-12-09 | 기판 반송 장치 및 기판 반송 방법과 기억 매체 |
US13/014,143 US20110190927A1 (en) | 2010-02-04 | 2011-01-26 | Substrate carrying device, substrate carrying method and storage medium |
CN201110035364XA CN102163571A (zh) | 2010-02-04 | 2011-01-31 | 基板输送装置和基板输送方法 |
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JP4055200B2 (ja) * | 2002-03-15 | 2008-03-05 | 株式会社安川電機 | 基板搬送用フォーク |
KR101015778B1 (ko) * | 2003-06-03 | 2011-02-22 | 도쿄엘렉트론가부시키가이샤 | 기판 처리장치 및 기판 수수 위치의 조정 방법 |
JP4403841B2 (ja) * | 2004-03-19 | 2010-01-27 | 株式会社安川電機 | ウェハ有無検出装置およびこれを用いた搬送ロボット装置 |
JP4809594B2 (ja) * | 2004-08-02 | 2011-11-09 | 東京エレクトロン株式会社 | 検査装置 |
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JP4535499B2 (ja) * | 2005-04-19 | 2010-09-01 | 東京エレクトロン株式会社 | 加熱装置、塗布、現像装置及び加熱方法 |
US7766566B2 (en) * | 2005-08-03 | 2010-08-03 | Tokyo Electron Limited | Developing treatment apparatus and developing treatment method |
JP4684805B2 (ja) * | 2005-08-25 | 2011-05-18 | 東京エレクトロン株式会社 | プローブ装置及び被検査体とプローブとの接触圧の調整方法 |
US8057153B2 (en) * | 2006-09-05 | 2011-11-15 | Tokyo Electron Limited | Substrate transfer device, substrate processing apparatus and substrate transfer method |
JP5003315B2 (ja) * | 2007-07-03 | 2012-08-15 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理方法並びに記憶媒体 |
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2010
- 2010-02-04 JP JP2010023502A patent/JP5083339B2/ja active Active
- 2010-12-08 TW TW099142821A patent/TW201133687A/zh unknown
- 2010-12-09 KR KR1020100125400A patent/KR20110090753A/ko not_active Application Discontinuation
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2011
- 2011-01-26 US US13/014,143 patent/US20110190927A1/en not_active Abandoned
- 2011-01-31 CN CN201110035364XA patent/CN102163571A/zh active Pending
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CN102163571A (zh) | 2011-08-24 |
JP2011161521A (ja) | 2011-08-25 |
US20110190927A1 (en) | 2011-08-04 |
KR20110090753A (ko) | 2011-08-10 |
TW201133687A (en) | 2011-10-01 |
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