TWI391793B - 光阻顯影液、及使用該顯影液之基板的製造方法 - Google Patents
光阻顯影液、及使用該顯影液之基板的製造方法 Download PDFInfo
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- TWI391793B TWI391793B TW095120981A TW95120981A TWI391793B TW I391793 B TWI391793 B TW I391793B TW 095120981 A TW095120981 A TW 095120981A TW 95120981 A TW95120981 A TW 95120981A TW I391793 B TWI391793 B TW I391793B
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- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 12
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- 125000001183 hydrocarbyl group Chemical group 0.000 claims description 7
- 125000000623 heterocyclic group Chemical group 0.000 claims description 6
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- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
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- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 4
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- SGJFJBCUIDRPOJ-UHFFFAOYSA-N N-benzylsulfanyl-N-methylmethanamine Chemical compound CN(C)SCC1=CC=CC=C1 SGJFJBCUIDRPOJ-UHFFFAOYSA-N 0.000 description 3
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- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
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- 238000007598 dipping method Methods 0.000 description 2
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- 125000005842 heteroatom Chemical group 0.000 description 2
- 150000002391 heterocyclic compounds Chemical class 0.000 description 2
- 125000004051 hexyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 2
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- FFYRIXSGFSWFAQ-UHFFFAOYSA-N 1-dodecylpyridin-1-ium Chemical compound CCCCCCCCCCCC[N+]1=CC=CC=C1 FFYRIXSGFSWFAQ-UHFFFAOYSA-N 0.000 description 1
- FVRSWMRVYMPTBU-UHFFFAOYSA-M 1-hydroxypropyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CCC(O)[N+](C)(C)C FVRSWMRVYMPTBU-UHFFFAOYSA-M 0.000 description 1
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- ZEADHTIGGVKXDB-UHFFFAOYSA-N 1-undecylpyridin-1-ium Chemical compound CCCCCCCCCCC[N+]1=CC=CC=C1 ZEADHTIGGVKXDB-UHFFFAOYSA-N 0.000 description 1
- HCYSJBICYOIBLS-UHFFFAOYSA-N 2-(dodecylamino)ethanol Chemical compound CCCCCCCCCCCCNCCO HCYSJBICYOIBLS-UHFFFAOYSA-N 0.000 description 1
- ZFDNAYFXBJPPEB-UHFFFAOYSA-M 2-hydroxyethyl(tripropyl)azanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCO ZFDNAYFXBJPPEB-UHFFFAOYSA-M 0.000 description 1
- JMTFLSQHQSFNTE-UHFFFAOYSA-O 3-dodecyl-1h-imidazol-3-ium Chemical compound CCCCCCCCCCCCN1C=C[NH+]=C1 JMTFLSQHQSFNTE-UHFFFAOYSA-O 0.000 description 1
- KCWDRMKPLNYFEA-UHFFFAOYSA-O 3-nonyl-1h-imidazol-3-ium Chemical compound CCCCCCCCC[N+]=1C=CNC=1 KCWDRMKPLNYFEA-UHFFFAOYSA-O 0.000 description 1
- ZMPAPJBFYQSNFM-UHFFFAOYSA-O 3-sulfanyl-1H-imidazol-3-ium Chemical compound S[n+]1cc[nH]c1 ZMPAPJBFYQSNFM-UHFFFAOYSA-O 0.000 description 1
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- ZLAXBCXHIMRHRK-UHFFFAOYSA-N CCN(C)CCCCCCCC1=CC=CC=C1 Chemical compound CCN(C)CCCCCCCC1=CC=CC=C1 ZLAXBCXHIMRHRK-UHFFFAOYSA-N 0.000 description 1
- PPYFTVCFHKTRJV-UHFFFAOYSA-N CCN(C)CCCCCCCCC1=CC=CC=C1 Chemical compound CCN(C)CCCCCCCCC1=CC=CC=C1 PPYFTVCFHKTRJV-UHFFFAOYSA-N 0.000 description 1
- VTBMBQBWDKQRDD-UHFFFAOYSA-N CCN(C)CCCCCCCCCC1=CC=CC=C1 Chemical compound CCN(C)CCCCCCCCCC1=CC=CC=C1 VTBMBQBWDKQRDD-UHFFFAOYSA-N 0.000 description 1
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- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 description 1
- VBQDSLGFSUGBBE-UHFFFAOYSA-N benzyl(triethyl)azanium Chemical compound CC[N+](CC)(CC)CC1=CC=CC=C1 VBQDSLGFSUGBBE-UHFFFAOYSA-N 0.000 description 1
- QXTVBPWGOIXKBU-UHFFFAOYSA-N benzyl(trihexyl)azanium Chemical compound CCCCCC[N+](CCCCCC)(CCCCCC)CC1=CC=CC=C1 QXTVBPWGOIXKBU-UHFFFAOYSA-N 0.000 description 1
- YOUGRGFIHBUKRS-UHFFFAOYSA-N benzyl(trimethyl)azanium Chemical compound C[N+](C)(C)CC1=CC=CC=C1 YOUGRGFIHBUKRS-UHFFFAOYSA-N 0.000 description 1
- LYNSJPNXIVLOQG-UHFFFAOYSA-N benzyl-decyl-ethyl-methylazanium Chemical compound CCCCCCCCCC[N+](C)(CC)CC1=CC=CC=C1 LYNSJPNXIVLOQG-UHFFFAOYSA-N 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 150000001649 bromium compounds Chemical class 0.000 description 1
- 125000004106 butoxy group Chemical group [*]OC([H])([H])C([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- IUNCEDRRUNZACO-UHFFFAOYSA-N butyl(trimethyl)azanium Chemical compound CCCC[N+](C)(C)C IUNCEDRRUNZACO-UHFFFAOYSA-N 0.000 description 1
- 150000001721 carbon Chemical group 0.000 description 1
- 239000011203 carbon fibre reinforced carbon Substances 0.000 description 1
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
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- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- RBUJTRYJXATERJ-UHFFFAOYSA-N dibenzyl(diethyl)azanium Chemical compound C=1C=CC=CC=1C[N+](CC)(CC)CC1=CC=CC=C1 RBUJTRYJXATERJ-UHFFFAOYSA-N 0.000 description 1
- GZUDBGUQXSQUQJ-UHFFFAOYSA-N diethyl(dihexyl)azanium Chemical compound CCCCCC[N+](CC)(CC)CCCCCC GZUDBGUQXSQUQJ-UHFFFAOYSA-N 0.000 description 1
- VICYBMUVWHJEFT-UHFFFAOYSA-N dodecyltrimethylammonium ion Chemical compound CCCCCCCCCCCC[N+](C)(C)C VICYBMUVWHJEFT-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005323 electroforming Methods 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- KVFVBPYVNUCWJX-UHFFFAOYSA-M ethyl(trimethyl)azanium;hydroxide Chemical compound [OH-].CC[N+](C)(C)C KVFVBPYVNUCWJX-UHFFFAOYSA-M 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002438 flame photometric detection Methods 0.000 description 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- XTPRURKTXNFVQT-UHFFFAOYSA-N hexyl(trimethyl)azanium Chemical compound CCCCCC[N+](C)(C)C XTPRURKTXNFVQT-UHFFFAOYSA-N 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- XEMZLVDIUVCKGL-UHFFFAOYSA-N hydrogen peroxide;sulfuric acid Chemical compound OO.OS(O)(=O)=O XEMZLVDIUVCKGL-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 150000004694 iodide salts Chemical class 0.000 description 1
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- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 125000001421 myristyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- WPABBAJWZPZLPM-UHFFFAOYSA-N n,n-diethyl-2-phenylethanamine Chemical compound CCN(CC)CCC1=CC=CC=C1 WPABBAJWZPZLPM-UHFFFAOYSA-N 0.000 description 1
- LGXCUUMYSHZXRQ-UHFFFAOYSA-N n,n-diethyl-7-phenylheptan-1-amine Chemical compound CCN(CC)CCCCCCCC1=CC=CC=C1 LGXCUUMYSHZXRQ-UHFFFAOYSA-N 0.000 description 1
- VWUSLFCCWWZUQA-UHFFFAOYSA-N n,n-diethyl-8-phenyloctan-1-amine Chemical compound CCN(CC)CCCCCCCCC1=CC=CC=C1 VWUSLFCCWWZUQA-UHFFFAOYSA-N 0.000 description 1
- STMHPPZPUXEBNT-UHFFFAOYSA-N n,n-dimethyl-7-phenylheptan-1-amine Chemical compound CN(C)CCCCCCCC1=CC=CC=C1 STMHPPZPUXEBNT-UHFFFAOYSA-N 0.000 description 1
- JDLUMMNICRAOOQ-UHFFFAOYSA-N n,n-dimethyl-8-phenyloctan-1-amine Chemical compound CN(C)CCCCCCCCC1=CC=CC=C1 JDLUMMNICRAOOQ-UHFFFAOYSA-N 0.000 description 1
- OUMBFMLKPJUWDQ-UHFFFAOYSA-N n-benzylpropan-1-amine Chemical compound CCCNCC1=CC=CC=C1 OUMBFMLKPJUWDQ-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HTKPDYSCAPSXIR-UHFFFAOYSA-N octyltrimethylammonium ion Chemical compound CCCCCCCC[N+](C)(C)C HTKPDYSCAPSXIR-UHFFFAOYSA-N 0.000 description 1
- 125000001147 pentyl group Chemical group C(CCCC)* 0.000 description 1
- 125000002572 propoxy group Chemical group [*]OC([H])([H])C(C([H])([H])[H])([H])[H] 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003856 quaternary ammonium compounds Chemical class 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- DZLFLBLQUQXARW-UHFFFAOYSA-N tetrabutylammonium Chemical compound CCCC[N+](CCCC)(CCCC)CCCC DZLFLBLQUQXARW-UHFFFAOYSA-N 0.000 description 1
- 229940073455 tetraethylammonium hydroxide Drugs 0.000 description 1
- LRGJRHZIDJQFCL-UHFFFAOYSA-M tetraethylazanium;hydroxide Chemical compound [OH-].CC[N+](CC)(CC)CC LRGJRHZIDJQFCL-UHFFFAOYSA-M 0.000 description 1
- CHYBTAZWINMGHA-UHFFFAOYSA-N tetraoctylazanium Chemical compound CCCCCCCC[N+](CCCCCCCC)(CCCCCCCC)CCCCCCCC CHYBTAZWINMGHA-UHFFFAOYSA-N 0.000 description 1
- LPSKDVINWQNWFE-UHFFFAOYSA-M tetrapropylazanium;hydroxide Chemical compound [OH-].CCC[N+](CCC)(CCC)CCC LPSKDVINWQNWFE-UHFFFAOYSA-M 0.000 description 1
- 125000003396 thiol group Chemical group [H]S* 0.000 description 1
- GCRCSLNXFKCFHB-UHFFFAOYSA-N triethyl(hexyl)azanium Chemical compound CCCCCC[N+](CC)(CC)CC GCRCSLNXFKCFHB-UHFFFAOYSA-N 0.000 description 1
- UGYWRPIRLIZRGL-UHFFFAOYSA-N tris(2-acetyloxyethyl)-benzylazanium Chemical compound CC(=O)OCC[N+](CCOC(C)=O)(CCOC(C)=O)CC1=CC=CC=C1 UGYWRPIRLIZRGL-UHFFFAOYSA-N 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
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- 125000005023 xylyl group Chemical group 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005172952 | 2005-06-13 | ||
| JP2005189438 | 2005-06-29 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW200715072A TW200715072A (en) | 2007-04-16 |
| TWI391793B true TWI391793B (zh) | 2013-04-01 |
Family
ID=37532260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW095120981A TWI391793B (zh) | 2005-06-13 | 2006-06-13 | 光阻顯影液、及使用該顯影液之基板的製造方法 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8808976B2 (enExample) |
| JP (1) | JP4688874B2 (enExample) |
| KR (1) | KR100993516B1 (enExample) |
| CN (1) | CN101213493B (enExample) |
| SG (1) | SG138212A1 (enExample) |
| TW (1) | TWI391793B (enExample) |
| WO (1) | WO2006134902A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5053592B2 (ja) * | 2006-08-10 | 2012-10-17 | 関東化学株式会社 | ポジ型レジスト処理液組成物及び現像液 |
| CN101657761B (zh) * | 2007-05-16 | 2012-07-04 | 株式会社德山 | 光刻胶显影液 |
| JP4853537B2 (ja) * | 2009-03-13 | 2012-01-11 | 東京エレクトロン株式会社 | 現像装置、現像方法及び記憶媒体 |
| JP5099054B2 (ja) * | 2009-03-13 | 2012-12-12 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、塗布、現像装置、塗布、現像方法及び記憶媒体 |
| SG11201500235XA (en) * | 2012-07-16 | 2015-02-27 | Basf Se | Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices |
| KR102378341B1 (ko) * | 2015-06-11 | 2022-03-24 | 주식회사 이엔에프테크놀로지 | 포토레지스트 현상액 |
| US9612536B2 (en) * | 2015-08-31 | 2017-04-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Developer for lithography |
| US20250044686A1 (en) * | 2023-08-04 | 2025-02-06 | Samsung Sdi Co., Ltd. | Method of forming patterns |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5756267A (en) * | 1990-05-29 | 1998-05-26 | Fuji Photo Film Co., Ltd. | Developing solution for negative type photosensitive resin compositions |
| US6455234B1 (en) * | 1999-05-04 | 2002-09-24 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4628023A (en) * | 1981-04-10 | 1986-12-09 | Shipley Company Inc. | Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant |
| JP2589408B2 (ja) | 1990-11-30 | 1997-03-12 | 東京応化工業株式会社 | レジスト用現像液組成物 |
| JP3225599B2 (ja) | 1992-06-03 | 2001-11-05 | ジェイエスアール株式会社 | ネガ型フォトレジスト膜の現像方法 |
| JPH063549A (ja) | 1992-06-22 | 1994-01-14 | Sumitomo Electric Ind Ltd | 光導波路及び光ファイバの結合方法 |
| JPH07120935A (ja) | 1993-10-25 | 1995-05-12 | Japan Synthetic Rubber Co Ltd | 感放射線性組成物用アルカリ性現像液 |
| JP2002169299A (ja) * | 2000-09-21 | 2002-06-14 | Tokuyama Corp | フォトレジスト現像液 |
| JP2003167329A (ja) * | 2001-09-20 | 2003-06-13 | Mitsubishi Chemicals Corp | 平版印刷版の作製方法 |
| JP2003107742A (ja) * | 2001-09-27 | 2003-04-09 | Fuji Photo Film Co Ltd | 印刷版の製版方法及びそれに用いる現像液 |
| JP2003131396A (ja) * | 2001-10-25 | 2003-05-09 | Mitsubishi Chemicals Corp | 感光性画像形成材の画像形成方法 |
| JP2004133433A (ja) * | 2002-09-20 | 2004-04-30 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| JP2004354402A (ja) * | 2003-03-31 | 2004-12-16 | Fuji Photo Film Co Ltd | 感熱性平版印刷版用現像液及び平版印刷版の製版方法 |
| JP4440600B2 (ja) | 2003-10-31 | 2010-03-24 | Ａｚエレクトロニックマテリアルズ株式会社 | 厚膜および超厚膜対応化学増幅型感光性樹脂組成物 |
| JP2006154569A (ja) * | 2004-11-30 | 2006-06-15 | Tokyo Ohka Kogyo Co Ltd | レジストパターンおよび導体パターンの製造方法 |
| CN1828429A (zh) * | 2005-02-28 | 2006-09-06 | 明德国际仓储贸易(上海)有限公司 | 显影液组成物 |
-
2006
- 2006-06-13 SG SG2007018559A patent/SG138212A1/en unknown
- 2006-06-13 CN CN2006800212348A patent/CN101213493B/zh not_active Expired - Fee Related
- 2006-06-13 KR KR1020077028816A patent/KR100993516B1/ko not_active Expired - Fee Related
- 2006-06-13 WO PCT/JP2006/311814 patent/WO2006134902A1/ja not_active Ceased
- 2006-06-13 JP JP2007521294A patent/JP4688874B2/ja not_active Expired - Fee Related
- 2006-06-13 US US11/917,175 patent/US8808976B2/en not_active Expired - Fee Related
- 2006-06-13 TW TW095120981A patent/TWI391793B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5756267A (en) * | 1990-05-29 | 1998-05-26 | Fuji Photo Film Co., Ltd. | Developing solution for negative type photosensitive resin compositions |
| US6455234B1 (en) * | 1999-05-04 | 2002-09-24 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2006134902A1 (ja) | 2009-01-08 |
| KR20080016843A (ko) | 2008-02-22 |
| JP4688874B2 (ja) | 2011-05-25 |
| US8808976B2 (en) | 2014-08-19 |
| WO2006134902A1 (ja) | 2006-12-21 |
| TW200715072A (en) | 2007-04-16 |
| KR100993516B1 (ko) | 2010-11-10 |
| US20090130606A1 (en) | 2009-05-21 |
| SG138212A1 (enExample) | 2008-01-28 |
| CN101213493A (zh) | 2008-07-02 |
| CN101213493B (zh) | 2011-08-24 |
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