SG138212A1 - - Google Patents
Info
- Publication number
- SG138212A1 SG138212A1 SG2007018559A SG2007018559A SG138212A1 SG 138212 A1 SG138212 A1 SG 138212A1 SG 2007018559 A SG2007018559 A SG 2007018559A SG 2007018559 A SG2007018559 A SG 2007018559A SG 138212 A1 SG138212 A1 SG 138212A1
- Authority
- SG
- Singapore
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/322—Aqueous alkaline compositions
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005172952 | 2005-06-13 | ||
| JP2005189438 | 2005-06-29 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG138212A1 true SG138212A1 (enExample) | 2008-01-28 |
Family
ID=37532260
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2007018559A SG138212A1 (enExample) | 2005-06-13 | 2006-06-13 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US8808976B2 (enExample) |
| JP (1) | JP4688874B2 (enExample) |
| KR (1) | KR100993516B1 (enExample) |
| CN (1) | CN101213493B (enExample) |
| SG (1) | SG138212A1 (enExample) |
| TW (1) | TWI391793B (enExample) |
| WO (1) | WO2006134902A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5053592B2 (ja) * | 2006-08-10 | 2012-10-17 | 関東化学株式会社 | ポジ型レジスト処理液組成物及び現像液 |
| CN101657761B (zh) * | 2007-05-16 | 2012-07-04 | 株式会社德山 | 光刻胶显影液 |
| JP4853537B2 (ja) * | 2009-03-13 | 2012-01-11 | 東京エレクトロン株式会社 | 現像装置、現像方法及び記憶媒体 |
| JP5099054B2 (ja) * | 2009-03-13 | 2012-12-12 | 東京エレクトロン株式会社 | 基板処理装置、基板処理方法、塗布、現像装置、塗布、現像方法及び記憶媒体 |
| SG11201500235XA (en) * | 2012-07-16 | 2015-02-27 | Basf Se | Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices |
| KR102378341B1 (ko) * | 2015-06-11 | 2022-03-24 | 주식회사 이엔에프테크놀로지 | 포토레지스트 현상액 |
| US9612536B2 (en) * | 2015-08-31 | 2017-04-04 | Taiwan Semiconductor Manufacturing Company, Ltd. | Developer for lithography |
| US20250044686A1 (en) * | 2023-08-04 | 2025-02-06 | Samsung Sdi Co., Ltd. | Method of forming patterns |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4628023A (en) * | 1981-04-10 | 1986-12-09 | Shipley Company Inc. | Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant |
| JP2670711B2 (ja) * | 1990-05-29 | 1997-10-29 | 富士写真フイルム株式会社 | ネガ型感光性樹脂組成物用現像液 |
| JP2589408B2 (ja) | 1990-11-30 | 1997-03-12 | 東京応化工業株式会社 | レジスト用現像液組成物 |
| JP3225599B2 (ja) | 1992-06-03 | 2001-11-05 | ジェイエスアール株式会社 | ネガ型フォトレジスト膜の現像方法 |
| JPH063549A (ja) | 1992-06-22 | 1994-01-14 | Sumitomo Electric Ind Ltd | 光導波路及び光ファイバの結合方法 |
| JPH07120935A (ja) | 1993-10-25 | 1995-05-12 | Japan Synthetic Rubber Co Ltd | 感放射線性組成物用アルカリ性現像液 |
| US6455234B1 (en) | 1999-05-04 | 2002-09-24 | Air Products And Chemicals, Inc. | Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers |
| JP2002169299A (ja) * | 2000-09-21 | 2002-06-14 | Tokuyama Corp | フォトレジスト現像液 |
| JP2003167329A (ja) * | 2001-09-20 | 2003-06-13 | Mitsubishi Chemicals Corp | 平版印刷版の作製方法 |
| JP2003107742A (ja) * | 2001-09-27 | 2003-04-09 | Fuji Photo Film Co Ltd | 印刷版の製版方法及びそれに用いる現像液 |
| JP2003131396A (ja) * | 2001-10-25 | 2003-05-09 | Mitsubishi Chemicals Corp | 感光性画像形成材の画像形成方法 |
| JP2004133433A (ja) * | 2002-09-20 | 2004-04-30 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法 |
| JP2004354402A (ja) * | 2003-03-31 | 2004-12-16 | Fuji Photo Film Co Ltd | 感熱性平版印刷版用現像液及び平版印刷版の製版方法 |
| JP4440600B2 (ja) | 2003-10-31 | 2010-03-24 | Ａｚエレクトロニックマテリアルズ株式会社 | 厚膜および超厚膜対応化学増幅型感光性樹脂組成物 |
| JP2006154569A (ja) * | 2004-11-30 | 2006-06-15 | Tokyo Ohka Kogyo Co Ltd | レジストパターンおよび導体パターンの製造方法 |
| CN1828429A (zh) * | 2005-02-28 | 2006-09-06 | 明德国际仓储贸易(上海)有限公司 | 显影液组成物 |
-
2006
- 2006-06-13 SG SG2007018559A patent/SG138212A1/en unknown
- 2006-06-13 CN CN2006800212348A patent/CN101213493B/zh not_active Expired - Fee Related
- 2006-06-13 KR KR1020077028816A patent/KR100993516B1/ko not_active Expired - Fee Related
- 2006-06-13 WO PCT/JP2006/311814 patent/WO2006134902A1/ja not_active Ceased
- 2006-06-13 JP JP2007521294A patent/JP4688874B2/ja not_active Expired - Fee Related
- 2006-06-13 US US11/917,175 patent/US8808976B2/en not_active Expired - Fee Related
- 2006-06-13 TW TW095120981A patent/TWI391793B/zh active
Also Published As
| Publication number | Publication date |
|---|---|
| JPWO2006134902A1 (ja) | 2009-01-08 |
| TWI391793B (zh) | 2013-04-01 |
| KR20080016843A (ko) | 2008-02-22 |
| JP4688874B2 (ja) | 2011-05-25 |
| US8808976B2 (en) | 2014-08-19 |
| WO2006134902A1 (ja) | 2006-12-21 |
| TW200715072A (en) | 2007-04-16 |
| KR100993516B1 (ko) | 2010-11-10 |
| US20090130606A1 (en) | 2009-05-21 |
| CN101213493A (zh) | 2008-07-02 |
| CN101213493B (zh) | 2011-08-24 |