CN101213493B - 光致抗蚀剂显影液及使用该显影液的基板的制造方法 - Google Patents

光致抗蚀剂显影液及使用该显影液的基板的制造方法 Download PDF

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Publication number
CN101213493B
CN101213493B CN2006800212348A CN200680021234A CN101213493B CN 101213493 B CN101213493 B CN 101213493B CN 2006800212348 A CN2006800212348 A CN 2006800212348A CN 200680021234 A CN200680021234 A CN 200680021234A CN 101213493 B CN101213493 B CN 101213493B
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China
Prior art keywords
development
photoresist
formula
photoresist liquid
carbon number
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Expired - Fee Related
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CN2006800212348A
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Chinese (zh)
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CN101213493A (zh
Inventor
尾前俊吉
东野诚司
大谷俊明
名*康隆
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Tokuyama Corp
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Tokuyama Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CN2006800212348A 2005-06-13 2006-06-13 光致抗蚀剂显影液及使用该显影液的基板的制造方法 Expired - Fee Related CN101213493B (zh)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
JP2005172952 2005-06-13
JP172952/2005 2005-06-13
JP2005189438 2005-06-29
JP189438/2005 2005-06-29
PCT/JP2006/311814 WO2006134902A1 (ja) 2005-06-13 2006-06-13 フォトレジスト現像液、および該現像液を用いた基板の製造方法

Publications (2)

Publication Number Publication Date
CN101213493A CN101213493A (zh) 2008-07-02
CN101213493B true CN101213493B (zh) 2011-08-24

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CN2006800212348A Expired - Fee Related CN101213493B (zh) 2005-06-13 2006-06-13 光致抗蚀剂显影液及使用该显影液的基板的制造方法

Country Status (7)

Country Link
US (1) US8808976B2 (enExample)
JP (1) JP4688874B2 (enExample)
KR (1) KR100993516B1 (enExample)
CN (1) CN101213493B (enExample)
SG (1) SG138212A1 (enExample)
TW (1) TWI391793B (enExample)
WO (1) WO2006134902A1 (enExample)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5053592B2 (ja) * 2006-08-10 2012-10-17 関東化学株式会社 ポジ型レジスト処理液組成物及び現像液
CN101657761B (zh) * 2007-05-16 2012-07-04 株式会社德山 光刻胶显影液
JP4853537B2 (ja) * 2009-03-13 2012-01-11 東京エレクトロン株式会社 現像装置、現像方法及び記憶媒体
JP5099054B2 (ja) * 2009-03-13 2012-12-12 東京エレクトロン株式会社 基板処理装置、基板処理方法、塗布、現像装置、塗布、現像方法及び記憶媒体
SG11201500235XA (en) * 2012-07-16 2015-02-27 Basf Se Composition for manufacturing integrated circuit devices, optical devices, micromachines and mechanical precision devices
KR102378341B1 (ko) * 2015-06-11 2022-03-24 주식회사 이엔에프테크놀로지 포토레지스트 현상액
US9612536B2 (en) * 2015-08-31 2017-04-04 Taiwan Semiconductor Manufacturing Company, Ltd. Developer for lithography
US20250044686A1 (en) * 2023-08-04 2025-02-06 Samsung Sdi Co., Ltd. Method of forming patterns

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05333562A (ja) 1992-06-03 1993-12-17 Japan Synthetic Rubber Co Ltd ネガ型フォトレジスト膜の現像方法
JPH07120935A (ja) 1993-10-25 1995-05-12 Japan Synthetic Rubber Co Ltd 感放射線性組成物用アルカリ性現像液
CN1392973A (zh) * 2000-09-21 2003-01-22 德山株式会社 光致抗蚀剂显影液
JP2003107742A (ja) * 2001-09-27 2003-04-09 Fuji Photo Film Co Ltd 印刷版の製版方法及びそれに用いる現像液
JP2003131396A (ja) * 2001-10-25 2003-05-09 Mitsubishi Chemicals Corp 感光性画像形成材の画像形成方法
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2004133433A (ja) * 2002-09-20 2004-04-30 Fuji Photo Film Co Ltd 平版印刷版の製版方法
JP2004354402A (ja) * 2003-03-31 2004-12-16 Fuji Photo Film Co Ltd 感熱性平版印刷版用現像液及び平版印刷版の製版方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4628023A (en) * 1981-04-10 1986-12-09 Shipley Company Inc. Metal ion free photoresist developer composition with lower alkyl quaternary ammonium hydrozide as alkalai agent and a quaternary ammonium compound as surfactant
JP2670711B2 (ja) * 1990-05-29 1997-10-29 富士写真フイルム株式会社 ネガ型感光性樹脂組成物用現像液
JP2589408B2 (ja) 1990-11-30 1997-03-12 東京応化工業株式会社 レジスト用現像液組成物
JPH063549A (ja) 1992-06-22 1994-01-14 Sumitomo Electric Ind Ltd 光導波路及び光ファイバの結合方法
US6455234B1 (en) 1999-05-04 2002-09-24 Air Products And Chemicals, Inc. Acetylenic diol ethylene oxide/propylene oxide adducts and their use in photoresist developers
JP4440600B2 (ja) 2003-10-31 2010-03-24 Ａｚエレクトロニックマテリアルズ株式会社 厚膜および超厚膜対応化学増幅型感光性樹脂組成物
JP2006154569A (ja) * 2004-11-30 2006-06-15 Tokyo Ohka Kogyo Co Ltd レジストパターンおよび導体パターンの製造方法
CN1828429A (zh) * 2005-02-28 2006-09-06 明德国际仓储贸易(上海)有限公司 显影液组成物

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05333562A (ja) 1992-06-03 1993-12-17 Japan Synthetic Rubber Co Ltd ネガ型フォトレジスト膜の現像方法
JPH07120935A (ja) 1993-10-25 1995-05-12 Japan Synthetic Rubber Co Ltd 感放射線性組成物用アルカリ性現像液
CN1392973A (zh) * 2000-09-21 2003-01-22 德山株式会社 光致抗蚀剂显影液
JP2003167329A (ja) * 2001-09-20 2003-06-13 Mitsubishi Chemicals Corp 平版印刷版の作製方法
JP2003107742A (ja) * 2001-09-27 2003-04-09 Fuji Photo Film Co Ltd 印刷版の製版方法及びそれに用いる現像液
JP2003131396A (ja) * 2001-10-25 2003-05-09 Mitsubishi Chemicals Corp 感光性画像形成材の画像形成方法
JP2004133433A (ja) * 2002-09-20 2004-04-30 Fuji Photo Film Co Ltd 平版印刷版の製版方法
JP2004354402A (ja) * 2003-03-31 2004-12-16 Fuji Photo Film Co Ltd 感熱性平版印刷版用現像液及び平版印刷版の製版方法

Also Published As

Publication number Publication date
JPWO2006134902A1 (ja) 2009-01-08
TWI391793B (zh) 2013-04-01
KR20080016843A (ko) 2008-02-22
JP4688874B2 (ja) 2011-05-25
US8808976B2 (en) 2014-08-19
WO2006134902A1 (ja) 2006-12-21
TW200715072A (en) 2007-04-16
KR100993516B1 (ko) 2010-11-10
US20090130606A1 (en) 2009-05-21
SG138212A1 (enExample) 2008-01-28
CN101213493A (zh) 2008-07-02

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