TWI390662B - 基材轉送裝置，基材處理設備及基材轉送方法 - Google Patents

基材轉送裝置，基材處理設備及基材轉送方法 Download PDF

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Publication number
TWI390662B
TWI390662B TW096133134A TW96133134A TWI390662B TW I390662 B TWI390662 B TW I390662B TW 096133134 A TW096133134 A TW 096133134A TW 96133134 A TW96133134 A TW 96133134A TW I390662 B TWI390662 B TW I390662B
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TW
Taiwan
Prior art keywords
substrate
support pins
wafer
support
transfer device
Prior art date
Application number
TW096133134A
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English (en)
Chinese (zh)
Other versions
TW200822274A (en
Inventor
Tsutomu Hiroki
Original Assignee
Tokyo Electron Ltd
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Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200822274A publication Critical patent/TW200822274A/zh
Application granted granted Critical
Publication of TWI390662B publication Critical patent/TWI390662B/zh

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67742—Mechanical parts of transfer devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67751—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber vertical transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
    • H01L21/681—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment using optical controlling means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
TW096133134A 2006-09-05 2007-09-05 基材轉送裝置，基材處理設備及基材轉送方法 TWI390662B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006239983A JP4799325B2 (ja) 2006-09-05 2006-09-05 基板受け渡し装置，基板処理装置，基板受け渡し方法

Publications (2)

Publication Number Publication Date
TW200822274A TW200822274A (en) 2008-05-16
TWI390662B true TWI390662B (zh) 2013-03-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
TW096133134A TWI390662B (zh) 2006-09-05 2007-09-05 基材轉送裝置，基材處理設備及基材轉送方法

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Country Link
JP (1) JP4799325B2 (ja)
KR (1) KR100941688B1 (ja)
CN (1) CN101351878B (ja)
TW (1) TWI390662B (ja)
WO (1) WO2008029608A1 (ja)

Families Citing this family (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4564078B2 (ja) * 2008-04-28 2010-10-20 東京エレクトロン株式会社 基板処理装置
JP5537380B2 (ja) * 2009-11-16 2014-07-02 キヤノン株式会社 露光装置及びデバイス製造方法
JP5614326B2 (ja) * 2010-08-20 2014-10-29 東京エレクトロン株式会社 基板搬送装置、基板搬送方法及びその基板搬送方法を実行させるためのプログラムを記録した記録媒体
JP5996857B2 (ja) * 2011-09-30 2016-09-21 東京エレクトロン株式会社 駆動装置及び基板処理システム
JP2013161946A (ja) * 2012-02-06 2013-08-19 Tokyo Electron Ltd 基板処理装置及び基板処理方法
KR101319022B1 (ko) * 2012-03-13 2013-10-29 피에스케이 주식회사 리프트 핀 어셈블리 및 그것을 구비한 기판 처리 장치
ITMO20130088A1 (it) * 2013-04-05 2014-10-06 Kemet Electronics Italia S R L Sistema di movimentazione
CN103531509A (zh) * 2013-09-26 2014-01-22 苏州经贸职业技术学院 一种工作台上精确定位圆心的方法
JP6113624B2 (ja) * 2013-10-11 2017-04-12 株式会社荏原製作所 基板処理装置および基板処理方法
CN104979258B (zh) * 2014-04-14 2018-01-12 睿励科学仪器（上海）有限公司 一种晶圆对准系统和晶圆对准方法
CN105097627B (zh) * 2014-04-15 2018-09-18 北京北方华创微电子装备有限公司 晶片校准装置以及半导体加工设备
TWI619145B (zh) * 2015-04-30 2018-03-21 佳能股份有限公司 壓印裝置，基板運送裝置，壓印方法以及製造物件的方法
US9405287B1 (en) * 2015-07-22 2016-08-02 Applied Materials, Inc. Apparatus and method for optical calibration of wafer placement by a robot
CN107851594B (zh) * 2015-08-28 2021-06-22 株式会社国际电气 基板处理装置以及半导体装置的制造方法
JP6432742B2 (ja) * 2015-09-30 2018-12-05 信越半導体株式会社 エピタキシャル成長装置及びエピタキシャルウェーハの製造方法
CN105824200B (zh) * 2016-05-31 2017-08-29 京东方科技集团股份有限公司 一种基板支撑结构及曝光机
JP6797063B2 (ja) * 2017-04-14 2020-12-09 東京エレクトロン株式会社 ピン制御方法及び基板処理装置
JP6783185B2 (ja) * 2017-05-15 2020-11-11 東京エレクトロン株式会社 検査装置
WO2019003403A1 (ja) * 2017-06-30 2019-01-03 東芝三菱電機産業システム株式会社 基板位置決め装置及び基板位置決め方法
KR102164067B1 (ko) * 2017-09-29 2020-10-12 시바우라 메카트로닉스 가부시끼가이샤 기판 처리 장치 및 기판 처리 방법
TWI681492B (zh) * 2018-02-14 2020-01-01 萬潤科技股份有限公司 載台及使用載台之晶圓量測方法及裝置
TWI805795B (zh) * 2018-07-20 2023-06-21 美商應用材料股份有限公司 基板定位設備與方法
DE102018007307A1 (de) * 2018-09-17 2020-03-19 Vat Holding Ag Stifthubvorrichtung
JP7219879B2 (ja) * 2018-12-17 2023-02-09 株式会社東京精密 補助方法及び補助装置
CN109686684B (zh) * 2018-12-27 2020-08-28 西安奕斯伟硅片技术有限公司 一种硅晶圆的加工方法、控制装置及外延反应设备
JP7290988B2 (ja) * 2019-04-26 2023-06-14 キヤノントッキ株式会社 アライメント装置、成膜装置、アライメント方法、成膜方法および電子デバイスの製造方法
CN110246788B (zh) * 2019-06-28 2020-05-19 英特尔半导体(大连)有限公司 用于在晶圆沉积薄膜的设备
US20200411348A1 (en) * 2019-06-28 2020-12-31 Kawasaki Jukogyo Kabushiki Kaisha Substrate transfer apparatus
JP2021012944A (ja) * 2019-07-05 2021-02-04 東京エレクトロン株式会社 基板処理装置及び基板の受け渡し方法
CN110718497B (zh) * 2019-10-18 2022-10-14 武汉新芯集成电路制造有限公司 一种晶圆卡盘、键合设备、晶圆位置的调整方法及系统
KR102412374B1 (ko) * 2019-11-22 2022-06-23 정성욱 복수의 비전 카메라를 이용한 웨이퍼 검사 장치 및 복수의 비전 카메라를 이용한 웨이퍼 검사 방법
JP7426808B2 (ja) * 2019-11-27 2024-02-02 株式会社Ｓｃｒｅｅｎホールディングス 基板処理装置
JP7357549B2 (ja) 2020-01-07 2023-10-06 東京エレクトロン株式会社 基板の位置ずれ検出方法、基板位置の異常判定方法、基板搬送制御方法、及び基板の位置ずれ検出装置
KR102616914B1 (ko) * 2021-03-24 2023-12-21 세메스 주식회사 기판 처리 방법 및 장치
CN113725136A (zh) * 2021-08-30 2021-11-30 长江存储科技有限责任公司 晶圆的对准方法、系统、计算机可读存储介质及处理器
CN115206862B (zh) * 2022-09-16 2023-02-03 杭州中欣晶圆半导体股份有限公司 一种解决硅片交接过程中精度失控的控制装置及控制方法
CN116913832A (zh) * 2023-05-31 2023-10-20 江苏亚电科技有限公司 一种晶圆搬运装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2602415B2 (ja) * 1994-06-16 1997-04-23 山形日本電気株式会社 ウェーハ位置決め装置
JPH09181154A (ja) * 1995-12-25 1997-07-11 Dainippon Screen Mfg Co Ltd 基板熱処理装置
JP2002280287A (ja) * 2001-03-19 2002-09-27 Nikon Corp 位置検出方法、位置検出装置、露光方法、露光装置、及びデバイス製造方法
JP2003051535A (ja) 2001-08-07 2003-02-21 Canon Inc 基板保持装置、露光装置およびデバイス製造方法
JP4080401B2 (ja) * 2003-09-05 2008-04-23 大日本スクリーン製造株式会社 基板処理装置および基板処理方法
JP2006071395A (ja) * 2004-09-01 2006-03-16 Nikon Corp 較正方法及び位置合わせ方法

Also Published As

Publication number Publication date
CN101351878A (zh) 2009-01-21
KR100941688B1 (ko) 2010-02-12
JP2008066367A (ja) 2008-03-21
TW200822274A (en) 2008-05-16
WO2008029608A1 (fr) 2008-03-13
CN101351878B (zh) 2010-06-09
JP4799325B2 (ja) 2011-10-26
KR20080055792A (ko) 2008-06-19

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