JP7426808B2 - 基板処理装置 - Google Patents
基板処理装置 Download PDFInfo
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- JP7426808B2 JP7426808B2 JP2019214003A JP2019214003A JP7426808B2 JP 7426808 B2 JP7426808 B2 JP 7426808B2 JP 2019214003 A JP2019214003 A JP 2019214003A JP 2019214003 A JP2019214003 A JP 2019214003A JP 7426808 B2 JP7426808 B2 JP 7426808B2
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- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
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- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
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- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
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Description
<基板処理システムの概略構成>
図1は、基板処理システム100の構成の一例を概略的に示す図である。基板処理システム100は、薬液またはリンス液などの処理液によって半導体ウエハ等の略円形の基板Wを一枚ずつ処理する枚葉式の基板処理システムである。基板処理システム100は、インデクサブロック110と、インデクサブロック110に結合された処理ブロック120と、基板処理システム100に設けられた装置の動作およびバルブの開閉を制御する制御部130とを含んでいる。
図2は、処理ユニット121の一例である基板処理装置1の構成の一例を概略的に示す図であり、図3は、基板処理装置1の一部の構成を拡大して概略的に示す図である。基板処理装置1は吸着保持機構10と回転機構20とリフトピン30と上下移動機構40と水平移動機構50とセンサ60と処理部90とを含んでいる。
次に、基板処理装置1の動作の一例について述べる。図8は、基板処理装置1の動作の一例を示すフローチャートである。初期的には、ノズル91、リンス用ノズルおよびセンサ60はそれぞれの待機位置に位置し、リフトピン30およびガード96はそれぞれの下位置に位置する。
リフトピン30は平面視において次に説明する領域内に位置しているとよい。具体的には、基板Wの直径の4分の1を直径とする仮想内円と、基板Wの直径の4分の3を直径とする仮想外円とで挟まれる環状領域内に、複数のリフトピン30が位置しているとよい。
上述の例では、リフトピン30は吸着保持機構10(吸着部材11)よりも径方向外側に位置している。しかしながら、必ずしもこれに限らない。図11は、リフトピン30および吸着保持機構10の構成の他の一例を概略的に示す平面図である。吸着保持機構10の吸着部材11には、リフトピン30と対向する位置に貫通孔11bが形成されている。貫通孔11bは吸着部材11(より具体的には、板状部材12)を上下方向に貫通している。この貫通孔11bは、吸着部材11内に形成される吸着用の内部流路と干渉しないように形成される。貫通孔11bは平面視においてリフトピン30よりも大きく、リフトピン30が貫通孔11bを貫通した状態で、水平移動方向D1に沿って移動可能である。貫通孔11bの大きさは、リフトピン30の移動可能範囲を確保できるように設定される。
複数のリフトピン30の少なくともいずれか一つの上端には、吸着口が形成されていてもよい。図13は、リフトピン30の構成の一例を概略的に示す平面図である。図13の例では、3つのリフトピン30のいずれもが、吸着口30aを有している。各リフトピン30の上端面は基板Wの下面に平行であり、吸着口30aはリフトピン30の上端面に形成される。リフトピン30には、吸着口30aに繋がる内部流路が形成されており、当該内部流路は吸引管38を介して吸引機構39に接続されている。吸引管38は可撓性を有しており、リフトピン30の移動に応じて変形する。吸引機構39はポンプを含んでおり、吸引管38の内部の気体を吸引する。これにより、吸着口30aから気体が吸引される。吸引機構39は制御部130によって制御される。
基板Wの位置を調整した後に、基板Wの偏心状態を再度確認してもよい。図14は、基板処理装置1の動作の他の一例を示すフローチャートである。まず、未処理の基板Wが搬入されて吸着保持機構10によって吸着保持される(ステップS1)。次に、センサ60が基板Wの偏心状態を測定し(ステップS2)、制御部130が基板Wの位置調整処理の必要性を判断し(ステップS3)、必要に応じて、制御部130が基板Wの位置調整処理を実行する(ステップS4)。
第2の実施の形態にかかる基板処理装置1の構成は、センサ60の構成を除いて第1の実施の形態と同様である。第2の実施の形態では、センサ60に替えてセンサ60Aが設けられる。ただし、第2の実施の形態は必ずしも第1の実施の形態を前提とする必要はなく、センサ60Aは、適宜、他の基板処理装置に適応可能である。
10 吸着保持機構
20 回転機構
30,30A リフトピン
40,40A 上下移動機構
50,50A 水平移動機構
60 センサ
70 収納部材(モータ収納部材)
Claims (7)
- 基板を処理するための基板処理装置であって、
基板の裏面を吸着し前記基板を水平に保持する吸着保持機構と、
前記基板を保持した前記吸着保持機構を前記基板の中心を通る鉛直方向の回転軸を中心に回転させる回転機構と、
前記吸着保持機構によって保持された前記基板に向かって処理液を吐出するノズルと、
前記吸着保持機構によって保持された前記基板を囲む筒状の形状を有するガードと、
前記吸着保持機構によって保持された前記基板よりも下方において、当該基板と対向する位置に設けられた複数のリフトピンと、
前記複数のリフトピンの上端を、前記吸着保持機構の吸着面よりも上方である第1位置と、前記吸着保持機構の前記吸着面よりも下方である第2位置との間で上下方向に移動させる上下移動機構と、
前記複数のリフトピンを前記吸着保持機構に対して水平方向に移動させる水平移動機構と、
前記吸着保持機構に保持された前記基板の偏心状態を測定するセンサと、
移動機構収納部材と
を備え、
前記上下移動機構は、前記複数のリフトピンを前記第1位置に移動させることで前記吸着保持機構から前記基板を支持し、
前記水平移動機構は、前記基板を支持した状態において、前記センサにより測定された前記基板の偏心状態に基づいて前記複数のリフトピンを水平方向に移動させ、
前記回転機構は、前記吸着保持機構から下方に延在するシャフトに連結され、
前記上下移動機構および前記水平移動機構は、前記回転機構を収納する収納部材に連結されており、
前記上下移動機構および前記水平移動機構は、前記収納部材の上面部に設けられており、
前記移動機構収納部材は、
前記回転軸を囲み、前記収納部材の上面部に連結された内周壁と、
前記内周壁と間隔を開けて当該内周壁の外周面を囲む外周壁と、
前記上下移動機構および前記水平移動機構より上方に位置し、前記内周壁の上端周縁と前記外周壁の上端周縁に連結される移動機構上面部と、
を有し、
前記移動機構上面部には、前記複数のリフトピンにおける各リフトピンによって貫通される貫通孔が形成され、
前記上下移動機構および前記水平移動機構は、前記内周壁と前記外周壁との間に設けられ、
前記移動機構上面部と前記複数のリフトピンにおける各リフトピンとの間に、前記貫通孔を封止するシールが設けられる、基板処理装置。 - 請求項1に記載の基板処理装置であって、
前記複数のリフトピンは互いに連結されて一体で移動する、基板処理装置。 - 請求項1または請求項2に記載の基板処理装置であって、
前記複数のリフトピンは、前記回転軸を中心とした仮想円上に等間隔で並んで設けられる、基板処理装置。 - 請求項1から請求項3のいずれか一つに記載の基板処理装置であって、
前記複数のリフトピンは、平面視において、前記吸着保持機構によって保持された前記基板の半径の4分の1の半径を有する仮想内円と、当該基板の半径の4分の3の半径を有する仮想外円とで挟まれる環状領域内に位置する、基板処理装置。 - 請求項1から請求項4のいずれか一つに記載の基板処理装置であって、
前記複数のリフトピンは、平面視において、前記吸着保持機構よりも外側に位置する、基板処理装置。 - 請求項1から請求項4のいずれか一つに記載の基板処理装置であって、
前記吸着保持機構には、前記複数のリフトピンによって上下方向に貫通される貫通孔が形成されている、基板処理装置。 - 請求項1から請求項6のいずれか一つに記載の基板処理装置であって、
前記複数のリフトピンの少なくとも一つの上端には、前記基板を吸着する吸着口が形成されている、基板処理装置。
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