TWI339447B - Structures for reducing operating voltage in a semiconductor device - Google Patents

Structures for reducing operating voltage in a semiconductor device Download PDF

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Publication number
TWI339447B
TWI339447B TW095128650A TW95128650A TWI339447B TW I339447 B TWI339447 B TW I339447B TW 095128650 A TW095128650 A TW 095128650A TW 95128650 A TW95128650 A TW 95128650A TW I339447 B TWI339447 B TW I339447B
Authority
TW
Taiwan
Prior art keywords
type
layer
channel junction
material layer
junction layer
Prior art date
Application number
TW095128650A
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English (en)
Chinese (zh)
Other versions
TW200715616A (en
Inventor
Virginia M Robbins
Steven D Lester
Jeffrey N Miller
David P Bour
Original Assignee
Avago Tech Ecbu Ip Sg Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Avago Tech Ecbu Ip Sg Pte Ltd filed Critical Avago Tech Ecbu Ip Sg Pte Ltd
Publication of TW200715616A publication Critical patent/TW200715616A/zh
Application granted granted Critical
Publication of TWI339447B publication Critical patent/TWI339447B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/30—Structure or shape of the active region; Materials used for the active region
    • H01S5/305—Structure or shape of the active region; Materials used for the active region characterised by the doping materials used in the laser structure

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  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Led Devices (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Semiconductor Lasers (AREA)
  • Electrodes Of Semiconductors (AREA)
TW095128650A 2005-08-15 2006-08-04 Structures for reducing operating voltage in a semiconductor device TWI339447B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/203,917 US7473941B2 (en) 2005-08-15 2005-08-15 Structures for reducing operating voltage in a semiconductor device

Publications (2)

Publication Number Publication Date
TW200715616A TW200715616A (en) 2007-04-16
TWI339447B true TWI339447B (en) 2011-03-21

Family

ID=37398551

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095128650A TWI339447B (en) 2005-08-15 2006-08-04 Structures for reducing operating voltage in a semiconductor device

Country Status (7)

Country Link
US (1) US7473941B2 (enExample)
EP (1) EP1755173B1 (enExample)
JP (1) JP5143384B2 (enExample)
KR (1) KR101242933B1 (enExample)
CN (1) CN1917241B (enExample)
DE (1) DE602006004119D1 (enExample)
TW (1) TWI339447B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470826B (zh) * 2012-03-30 2015-01-21 Phostek Inc 發光二極體裝置

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WO2013074530A2 (en) 2011-11-15 2013-05-23 Solar Junction Corporation High efficiency multijunction solar cells
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TWI597862B (zh) * 2013-08-30 2017-09-01 晶元光電股份有限公司 具阻障層的光電半導體元件
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JP6462456B2 (ja) * 2015-03-31 2019-01-30 ルネサスエレクトロニクス株式会社 半導体装置および半導体装置の製造方法
US20170110613A1 (en) 2015-10-19 2017-04-20 Solar Junction Corporation High efficiency multijunction photovoltaic cells
JP6708442B2 (ja) * 2016-03-01 2020-06-10 学校法人 名城大学 窒化物半導体発光素子
TWI617048B (zh) * 2016-06-29 2018-03-01 光鋐科技股份有限公司 具有穿隧接合層的磊晶結構、p型半導體結構朝上的製程中間結構及其製造方法
US10930808B2 (en) 2017-07-06 2021-02-23 Array Photonics, Inc. Hybrid MOCVD/MBE epitaxial growth of high-efficiency lattice-matched multijunction solar cells
CN107482091B (zh) 2017-07-25 2019-10-22 天津三安光电有限公司 一种用于多结led的隧穿结、多结led及其制备方法
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JP7169613B2 (ja) * 2017-11-10 2022-11-11 学校法人 名城大学 窒化物半導体発光素子の製造方法
JP6964875B2 (ja) * 2017-11-10 2021-11-10 学校法人 名城大学 窒化物半導体発光素子の製造方法
US11211514B2 (en) 2019-03-11 2021-12-28 Array Photonics, Inc. Short wavelength infrared optoelectronic devices having graded or stepped dilute nitride active regions
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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI470826B (zh) * 2012-03-30 2015-01-21 Phostek Inc 發光二極體裝置

Also Published As

Publication number Publication date
EP1755173A3 (en) 2007-06-20
JP5143384B2 (ja) 2013-02-13
US20070034853A1 (en) 2007-02-15
TW200715616A (en) 2007-04-16
US7473941B2 (en) 2009-01-06
KR20070020347A (ko) 2007-02-21
CN1917241B (zh) 2010-10-06
JP2007053376A (ja) 2007-03-01
KR101242933B1 (ko) 2013-03-12
CN1917241A (zh) 2007-02-21
EP1755173B1 (en) 2008-12-10
EP1755173A2 (en) 2007-02-21
DE602006004119D1 (de) 2009-01-22

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