TWI320945B - - Google Patents

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Publication number
TWI320945B
TWI320945B TW092119056A TW92119056A TWI320945B TW I320945 B TWI320945 B TW I320945B TW 092119056 A TW092119056 A TW 092119056A TW 92119056 A TW92119056 A TW 92119056A TW I320945 B TWI320945 B TW I320945B
Authority
TW
Taiwan
Prior art keywords
impedance
setting unit
plasma
power
processing apparatus
Prior art date
Application number
TW092119056A
Other languages
English (en)
Chinese (zh)
Other versions
TW200402759A (en
Inventor
Yohei Yamazawa
Manabu Iwata
Chishio Koshimizu
Fumihiko Higuchi
Akitaka Shimizu
Asao Yamashita
Nobuhiro Iwama
Tsutomu Higashiura
Dong Sheng Zhang
Michiko Nakaya
Norikazu Murakami
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of TW200402759A publication Critical patent/TW200402759A/zh
Application granted granted Critical
Publication of TWI320945B publication Critical patent/TWI320945B/zh

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
TW092119056A 2002-07-12 2003-07-11 Plasma treatment apparatus TW200402759A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002204928 2002-07-12
US39673002P 2002-07-19 2002-07-19
JP2003060670A JP4370789B2 (ja) 2002-07-12 2003-03-06 プラズマ処理装置及び可変インピーダンス手段の校正方法

Publications (2)

Publication Number Publication Date
TW200402759A TW200402759A (en) 2004-02-16
TWI320945B true TWI320945B (enExample) 2010-02-21

Family

ID=31497586

Family Applications (1)

Application Number Title Priority Date Filing Date
TW092119056A TW200402759A (en) 2002-07-12 2003-07-11 Plasma treatment apparatus

Country Status (4)

Country Link
US (2) US7527016B2 (enExample)
JP (1) JP4370789B2 (enExample)
CN (1) CN100355038C (enExample)
TW (1) TW200402759A (enExample)

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Also Published As

Publication number Publication date
US20040035365A1 (en) 2004-02-26
JP2004096066A (ja) 2004-03-25
US20070236148A1 (en) 2007-10-11
US8251011B2 (en) 2012-08-28
CN1476057A (zh) 2004-02-18
CN100355038C (zh) 2007-12-12
TW200402759A (en) 2004-02-16
US7527016B2 (en) 2009-05-05
JP4370789B2 (ja) 2009-11-25

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