CN100595886C - 一种消除反应离子刻蚀自偏压的方法及系统 - Google Patents
一种消除反应离子刻蚀自偏压的方法及系统 Download PDFInfo
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- CN100595886C CN100595886C CN200810223342A CN200810223342A CN100595886C CN 100595886 C CN100595886 C CN 100595886C CN 200810223342 A CN200810223342 A CN 200810223342A CN 200810223342 A CN200810223342 A CN 200810223342A CN 100595886 C CN100595886 C CN 100595886C
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- reactive ion
- ion etching
- resonant tank
- automatic bias
- reative cell
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CN200810223342A CN100595886C (zh) | 2008-09-26 | 2008-09-26 | 一种消除反应离子刻蚀自偏压的方法及系统 |
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CN200810223342A CN100595886C (zh) | 2008-09-26 | 2008-09-26 | 一种消除反应离子刻蚀自偏压的方法及系统 |
Publications (2)
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CN101399184A CN101399184A (zh) | 2009-04-01 |
CN100595886C true CN100595886C (zh) | 2010-03-24 |
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CN200810223342A Expired - Fee Related CN100595886C (zh) | 2008-09-26 | 2008-09-26 | 一种消除反应离子刻蚀自偏压的方法及系统 |
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Families Citing this family (1)
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CN102573264A (zh) * | 2011-12-01 | 2012-07-11 | 西安交通大学 | 大气压下开放式单极射频低温等离子体发生装置 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5140223A (en) * | 1989-07-18 | 1992-08-18 | Leybold Aktiengesellschaft | Circuit for adjusting the impedance of a plasma section to a high-frequency generator |
CN1476057A (zh) * | 2002-07-12 | 2004-02-18 | ���������ƴ���ʽ���� | 等离子体处理装置和可变阻抗装置的校正方法 |
CN1705079A (zh) * | 2004-06-02 | 2005-12-07 | 东京毅力科创株式会社 | 等离子体处理装置和阻抗调整方法 |
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2008
- 2008-09-26 CN CN200810223342A patent/CN100595886C/zh not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5140223A (en) * | 1989-07-18 | 1992-08-18 | Leybold Aktiengesellschaft | Circuit for adjusting the impedance of a plasma section to a high-frequency generator |
CN1476057A (zh) * | 2002-07-12 | 2004-02-18 | ���������ƴ���ʽ���� | 等离子体处理装置和可变阻抗装置的校正方法 |
CN1705079A (zh) * | 2004-06-02 | 2005-12-07 | 东京毅力科创株式会社 | 等离子体处理装置和阻抗调整方法 |
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CN101399184A (zh) | 2009-04-01 |
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Owner name: SEMICONDUCTOR MANUFACTURING INTERNATIONAL (SHANGHA Free format text: FORMER OWNER: INST OF MICROELECTRONICS, C. A. S Effective date: 20130419 Owner name: INST OF MICROELECTRONICS, C. A. S Effective date: 20130419 |
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Free format text: CORRECT: ADDRESS; FROM: 100029 CHAOYANG, BEIJING TO: 201203 PUDONG NEW AREA, SHANGHAI |
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Effective date of registration: 20130419 Address after: 201203 Shanghai City, Pudong New Area Zhangjiang Road No. 18 Patentee after: Semiconductor Manufacturing International (Shanghai) Corporation Patentee after: Institute of Microelectronics, Chinese Academy of Sciences Address before: 100029 Beijing city Chaoyang District Beitucheng West Road No. 3 Institute of Microelectronics Patentee before: Institute of Microelectronics, Chinese Academy of Sciences |
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