TWI302562B - - Google Patents
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- Publication number
- TWI302562B TWI302562B TW091100737A TW91100737A TWI302562B TW I302562 B TWI302562 B TW I302562B TW 091100737 A TW091100737 A TW 091100737A TW 91100737 A TW91100737 A TW 91100737A TW I302562 B TWI302562 B TW I302562B
- Authority
- TW
- Taiwan
- Prior art keywords
- adhesive
- resin
- group
- coupling agent
- weight
- Prior art date
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- 239000000853 adhesive Substances 0.000 claims description 137
- 230000001070 adhesive effect Effects 0.000 claims description 128
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 claims description 110
- 229920005989 resin Polymers 0.000 claims description 75
- 239000011347 resin Substances 0.000 claims description 75
- 239000000758 substrate Substances 0.000 claims description 60
- 239000013522 chelant Substances 0.000 claims description 53
- 239000007822 coupling agent Substances 0.000 claims description 53
- 229910052751 metal Inorganic materials 0.000 claims description 52
- 239000002184 metal Substances 0.000 claims description 52
- 150000001875 compounds Chemical class 0.000 claims description 47
- 125000003545 alkoxy group Chemical group 0.000 claims description 37
- 125000001424 substituent group Chemical group 0.000 claims description 36
- 239000004065 semiconductor Substances 0.000 claims description 31
- 229920001187 thermosetting polymer Polymers 0.000 claims description 25
- -1 sand compound Chemical class 0.000 claims description 20
- 239000011521 glass Substances 0.000 claims description 17
- 239000002245 particle Substances 0.000 claims description 14
- 239000004593 Epoxy Substances 0.000 claims description 13
- 229920005992 thermoplastic resin Polymers 0.000 claims description 13
- 239000003822 epoxy resin Substances 0.000 claims description 12
- 229920000647 polyepoxide Polymers 0.000 claims description 12
- 238000010438 heat treatment Methods 0.000 claims description 11
- 229910052782 aluminium Inorganic materials 0.000 claims description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 8
- 239000003094 microcapsule Substances 0.000 claims description 8
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 6
- 229910052760 oxygen Inorganic materials 0.000 claims description 6
- 239000001301 oxygen Substances 0.000 claims description 6
- 239000000843 powder Substances 0.000 claims description 6
- 239000007788 liquid Substances 0.000 claims description 5
- 239000002250 absorbent Substances 0.000 claims description 4
- 230000002745 absorbent Effects 0.000 claims description 4
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 4
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 4
- 125000002723 alicyclic group Chemical group 0.000 claims description 3
- 239000004576 sand Substances 0.000 claims description 3
- 125000003277 amino group Chemical group 0.000 claims description 2
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims 2
- 239000010931 gold Substances 0.000 claims 2
- 229910052737 gold Inorganic materials 0.000 claims 2
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims 1
- 125000003700 epoxy group Chemical group 0.000 claims 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229920001169 thermoplastic Polymers 0.000 claims 1
- 239000004416 thermosoftening plastic Substances 0.000 claims 1
- 239000011247 coating layer Substances 0.000 description 30
- 235000012431 wafers Nutrition 0.000 description 30
- 238000006243 chemical reaction Methods 0.000 description 22
- 239000003795 chemical substances by application Substances 0.000 description 9
- 238000000034 method Methods 0.000 description 8
- 238000010538 cationic polymerization reaction Methods 0.000 description 7
- 229910010272 inorganic material Inorganic materials 0.000 description 7
- 239000011147 inorganic material Substances 0.000 description 7
- 125000002328 sterol group Chemical group 0.000 description 7
- 239000004848 polyfunctional curative Substances 0.000 description 6
- 239000002313 adhesive film Substances 0.000 description 5
- 239000011230 binding agent Substances 0.000 description 5
- 229910001338 liquidmetal Inorganic materials 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 229920000877 Melamine resin Polymers 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 229910000420 cerium oxide Inorganic materials 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 239000010410 layer Substances 0.000 description 2
- 239000003960 organic solvent Substances 0.000 description 2
- 150000002923 oximes Chemical class 0.000 description 2
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- MFAWEYJGIGIYFH-QNSVNVJESA-N C(C1CO1)OCCC[C@H](C(OC)(OC)OC)CCCCCCCC Chemical compound C(C1CO1)OCCC[C@H](C(OC)(OC)OC)CCCCCCCC MFAWEYJGIGIYFH-QNSVNVJESA-N 0.000 description 1
- ZGUZGGUAXJHURW-UHFFFAOYSA-N CC(CCCCC(C(OC)(OC)OC)(CCC)C=CC)CCC Chemical compound CC(CCCCC(C(OC)(OC)OC)(CCC)C=CC)CCC ZGUZGGUAXJHURW-UHFFFAOYSA-N 0.000 description 1
- 229910052684 Cerium Inorganic materials 0.000 description 1
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 229910008051 Si-OH Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910006358 Si—OH Inorganic materials 0.000 description 1
- 229930182558 Sterol Natural products 0.000 description 1
- 229920001807 Urea-formaldehyde Polymers 0.000 description 1
- 229910052769 Ytterbium Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- DHKHKXVYLBGOIT-UHFFFAOYSA-N acetaldehyde Diethyl Acetal Natural products CCOC(C)OCC DHKHKXVYLBGOIT-UHFFFAOYSA-N 0.000 description 1
- 125000002777 acetyl group Chemical class [H]C([H])([H])C(*)=O 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- 150000001336 alkenes Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 230000003712 anti-aging effect Effects 0.000 description 1
- 239000007767 bonding agent Substances 0.000 description 1
- DQXBYHZEEUGOBF-UHFFFAOYSA-N but-3-enoic acid;ethene Chemical compound C=C.OC(=O)CC=C DQXBYHZEEUGOBF-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000006612 decyloxy group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000005038 ethylene vinyl acetate Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 238000007719 peel strength test Methods 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 239000013034 phenoxy resin Substances 0.000 description 1
- 229920006287 phenoxy resin Polymers 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920005749 polyurethane resin Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000010526 radical polymerization reaction Methods 0.000 description 1
- 230000003014 reinforcing effect Effects 0.000 description 1
- 230000001568 sexual effect Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 150000003432 sterols Chemical class 0.000 description 1
- 235000003702 sterols Nutrition 0.000 description 1
- 230000003685 thermal hair damage Effects 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical group [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- NAWDYIZEMPQZHO-UHFFFAOYSA-N ytterbium Chemical compound [Yb] NAWDYIZEMPQZHO-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
- C09J11/02—Non-macromolecular additives
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/54—Silicon-containing compounds
- C08K5/541—Silicon-containing compounds containing oxygen
- C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J163/00—Adhesives based on epoxy resins; Adhesives based on derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J5/00—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers
- C09J5/06—Adhesive processes in general; Adhesive processes not provided for elsewhere, e.g. relating to primers involving heating of the applied adhesive
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/10—Adhesives in the form of films or foils without carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/50—Assembly of semiconductor devices using processes or apparatus not provided for in a single one of the subgroups H01L21/06 - H01L21/326, e.g. sealing of a cap to a base of a container
- H01L21/56—Encapsulations, e.g. encapsulation layers, coatings
- H01L21/563—Encapsulation of active face of flip-chip device, e.g. underfilling or underencapsulation of flip-chip, encapsulation preform on chip or mounting substrate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2666/00—Composition of polymers characterized by a further compound in the blend, being organic macromolecular compounds, natural resins, waxes or and bituminous materials, non-macromolecular organic substances, inorganic substances or characterized by their function in the composition
- C08L2666/28—Non-macromolecular organic substances
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2203/00—Applications of adhesives in processes or use of adhesives in the form of films or foils
- C09J2203/326—Applications of adhesives in processes or use of adhesives in the form of films or foils for bonding electronic components such as wafers, chips or semiconductors
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2400/00—Presence of inorganic and organic materials
- C09J2400/10—Presence of inorganic materials
- C09J2400/14—Glass
- C09J2400/143—Glass in the substrate
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2463/00—Presence of epoxy resin
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/2919—Material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29199—Material of the matrix
- H01L2224/2929—Material of the matrix with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29299—Base material
- H01L2224/293—Base material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29399—Coating material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
- H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
- H01L2224/29001—Core members of the layer connector
- H01L2224/29099—Material
- H01L2224/29198—Material with a principal constituent of the material being a combination of two or more materials in the form of a matrix with a filler, i.e. being a hybrid material, e.g. segmented structures, foams
- H01L2224/29298—Fillers
- H01L2224/29399—Coating material
- H01L2224/2949—Coating material with a principal constituent of the material being a polymer, e.g. polyester, phenolic based polymer, epoxy
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- H—ELECTRICITY
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Description
1302562 A7 ____B7___ 五、發明說明(/ ) [發明之詳細說明] [發明所屬之技術領域] 本發明係關於一種接著劑,特別是關於一種將半導體 晶片連接於基板上之接著劑。 [習知技術] 以往以來,爲了將半導體晶片連接到基板上乃使用含 有環氧樹脂般之熱固性樹脂的接著劑。 圖7之符號1〇1係顯示半導體晶片111藉由接著劑 112貼附到基板113所成之電氣裝置。半導體晶片111所 具有之凸塊狀之端子121係抵接於基板113上之配線圖案 的一部分所構成之端子122上。在此狀態下,半導體晶片 111內之內部電路乃透過端子121、122而與基板113上之 配線圖案做電氣連接。又接著劑112中之熱固性樹脂業已 硬化,透過此接著劑112使得半導體晶片111與基板113 做機械性連接。 爲了使環氧樹脂硬化,於接著劑112 —般係添加有微 膠囊型咪唑般之硬化劑。 惟,欲使採用上述般硬化劑的接著劑硬化,需要在 180°C以上之高溫下進行加熱,當受接著體之基板Π3的配 線圖案爲微細的情況下,配線圖案有時會受到熱損傷。又 ,雖降低加熱溫度可將受接著體之熱損傷做某種程度的防 止,惟在加熱處理上所需要之時間會變長。 作爲在低溫下具有優異硬化性的接著劑,近年來係開 發出含有丙烯酸酯般之自由基聚合性樹脂與自由基聚合起 3 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公藿) ,—^--------裝--------訂---------^9. (請先閱讀背面之注意事項再填寫本頁) 1302562 A7 B7 五、發明說明( (請先閱讀背面之注意事項再填寫本頁) 始劑所成的接著劑,惟此種接著劑相較於使用熱固性樹脂 的情況,在硬化狀態下之電氣特性與耐熱性不佳,結果所 得之電氣裝置101的可靠性下降了。 [發明所欲解決之課題] 本發明係爲了解決上述習知技術之不佳情況所得之創 作,其目的在於提供一種能在低溫、短時間的條件下產生 硬化,且在連接可靠性也優異之接著劑。 [用以解決課題之手段] 本發明之發明者等,並不採用一般所使用之硬化劑, 而是著眼於讓環氧樹脂行陽離子聚合之做法,經不斷硏究 的結果發現,若將結構中具有至少一個烷氧基之矽烷化合 物(矽烷偶合劑)以及金屬螯合物添加到接著劑中,利用金 屬螯合物與矽烷偶合劑進行反應時所產生之陽離子來讓環 氧樹脂進行聚合(陽離子聚合),則接著劑可在低溫、短時 間內硬化。 以添加有金屬螯合物與矽烷偶合劑之接著劑來讓環氧 樹脂硬化之反應係利用以下之反應式(1)〜(4)來說明。
X 一 S ί 一 OR + H2O ^ X 一S i - OH + R - 0H 反應式。
Al + OH-Si-X
A 卜 i - X 讎馨馨 —RH 反應式(2) 本紙張尺度適用中國國家標準(CNS)A4規格(210 χ 2绍/^爱) ,-r 1302562 A7 B7 五、發明說明(;) X- S 卜 0一一 Η +
AI-〇-Si-X + X-Si-OH 卜Ο-Si - X 反應式(3) CH~ CH, + -R-CH—CH2 n^cH—CH2 R 一 CH—Cfi +
OH r~ch-ch2 I 0H~ • ••反應式(4) 於上述反應式(1)中RO係表示烷氧基。具有至少一個 烷氧基之矽烷化合物係如反應式(1)所示般’ 一旦與接著劑 中之水進行反應,則該矽烷化合物之垸氧基會水解而成爲 矽醇基(Si — 0H)〇 一旦加熱接著劑,則矽醇基會與鋁螯合物般之金屬螯 合物反應,矽烷化合物會鍵結於鋁螯合物上(反應式(2))。 其次如反應式(3)所示般,藉由讓在平衡反應中殘留在 接著劑中之其他的矽醇基配位到已與矽醇基鍵結之鋁螯合 物上,則會產生布朗斯台德(Br0nsted)酸點,如反應式(4) 所示般,藉由活性化之質子使得位於環氧樹脂之末端的瓌 氧環開環,而與其他之環氧樹脂之環氧環進行聚合(陽離子 聚合)。 如此般,使用矽烷偶合劑、金屬螯合物、以活性化之 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱〉 (請先閱讀背面之注意事項再填寫本頁) —· ϋ n n n n n n^-OJ· n 1 ϋ n n n n I * 1302562 A7 _______Β7____ 五、發明說明(φ ) 質子所聚合之熱固性樹脂來製作接著劑的情況下,接著劑 係藉由讓熱固性樹脂行陽離子聚合而硬化。 上述反應由於係在較以往硬化劑硬化之溫度(180°C以 上)爲低之溫度下進行,所以藉由添加金屬螯合物與矽烷化 合物,接著劑可在低溫、短時間下硬化。 本發明係基於上述見地所創作者,本發明係一種接著 劑’其具有樹脂成分、金屬蜜合物、以及政院偶合劑,前 述樹脂成分係含有熱固性樹脂,前述矽烷偶合劑係以下述 通式(1)所表不之砂院化合物所構成: X2 X4 (上述通式中取代基χΐ〜X4當中之至少一取代基係烷氧 基)。 本發明係一種接著劑,其中,前述烷氧基係甲氧基。 本發明係一種接著劑,其中,前述烷氧基係乙氧基。 本發明係一種接著劑,其中,前述矽烷化合物之取代 基X1〜X4當中之至少一取代基係烷氧基以外的取代基,前 述烷氧基以外的取代基當中之至少一取代基係具有環氧環 〇 本發/月係一種接著劑,其中,前述矽烷化合物之取代 基X〜X虽中之至少一取代基係烷氧基以外的取代基,前 述院氧基以外的取代基當中之至少—取代基係具有乙腿 ___6 ^紙張尺度適用中國國家樣準(CNS)Ai^格(210 X 297公爱) --- (請先閱讀背面之注意事項再填寫本頁) I--------^------— 1302562 ••通式(1) A7 B7 五、發明說明(fe ) 本發明係一種接著劑,其中,前述金屬螯合物係以銘 螯合物爲主成分。 本發明係一種接著薄膜,係將接著劑{具有樹脂成分、 金屬螯合物、以及矽烷偶合劑,前述樹脂成分係含有熱固 性樹脂;前述矽烷偶合劑係以下述通式(1)所表示之矽烷化 合物所構成: X2 X 丨一S i — X3
I X4 (上述通式中取代基X1〜X4當中之至少一取代基係烷氧 基)}成形爲片狀所得者。 本發明係一種電氣裝置,其具有半導體晶片與基板, 在前述半導體晶片與前述基板之間係配置有接著劑{具有樹 脂成分、金屬螯合物、以及矽烷偶合劑,前述樹脂成分係 含有熱固性樹脂;前述矽烷偶合劑係以下述通式(1)所表示 之矽烷化合物所構成: X2 (請先閱讀背面之注意事項再填寫本頁) t Aim n -ϋ· 1讀- 裝--------訂---------· -Si — X3 通式(1 ) (上述通式中取代基X1〜X4當中之至少一取代基係烷氧 基)},前述接著劑係經由熱處理而硬化。 本發明係一種電氣裝置,其具有玻璃基板與基板,在 8 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐> - 1302562 A7 ______B7 五、發明說明(7 ) (請先閱讀背面之注意事項再填寫本頁) 前述玻璃基板與前述基板之間係配置有接著劑{具有樹脂成 分、金屬螯合物、以及矽烷偶合劑,前述樹脂成分係含有 熱固性樹脂;前述矽烷偶合劑係以下述通式(1)所表示之砂 烷化合物所構成: X2 X4 (上述通式中取代基X1〜X4當中之至少一取代基係烷氧 基)},前述接著劑係經由熱處理而硬化。 本發明係一種接著劑,其中,前述金屬螯合物係經過 微膠囊化。 本發明係一種接著劑,其中,前述金屬螯合物係粉體 或液體狀。 本發明係一種接著劑,其中,前述微膠囊係由吸收性 樹脂粒子所構成,並分散於前述接著劑中。 本發明係由上述方式所構成,本發明所使用之矽烷偶 合劑之取代基X1〜X4係具有至少一個之烷氧基。 熱固性樹脂係藉由矽烷偶合劑與金屬螯合物之反應所 產生之陽離子而聚合,可相較於以往以更低溫、更短時間 之加熱條件使得接著劑硬化。 又’本發明所使用之矽烷偶合劑之烷氧基並不侷限於 乙氧基或甲氧基般之讓氧鍵結於烷基上所成者,亦包含有 例如具有環結構者、烯烴、乙炔般之具有不飽和鍵結者等 9 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 1302562 A7 ________B7__ ' 一 " 一' --—— --- 五、發明說明(<?) 。惟’由水解之際之立體障礙的觀點來看,以於垸基鍵結 氧者、尤其是於甲基鍵結氧所成之甲氧基爲佳。 又,當2烷偶合劑之烷氧基以外的取代基具有環氧環 般之反應性高的官能基之情況’由於該官能基會參與熱固 性樹脂之聚合反應’所以硬化後之接著劑的強度會更爲提 商。 由於砂醇基不僅是對於金屬螯合物,即便對於無機材 料一般也具有吸附、鍵結之性質,所以將本發明之接著劑 使用在對於玻璃基板般之無機材料所構成之物的貼合之際 ,矽烷偶合劑之矽醇基會鍵結於無機材料之表面,砂醇基 以外之取代基則會與接著劑之樹脂成分鍵結。如此般,由 於透過矽烷偶合劑讓無機材料與樹脂成分鍵結,所以本發 明之接著劑與無機材料的親合性亦高。 於樹脂成分中所含之熱塑性樹脂,雖不參與樹脂成分 的硬化反應,惟藉由添加熱塑性樹脂具有提升接著劑之接 著性的效果。又,當使用高極性之物當作熱塑性樹脂時, 熱塑性樹脂不僅會參與樹脂成分的硬化反應,且可透過矽 烷偶合劑來與無機材料鍵結,所以在硬化性以及對於無機 材料之親合性變得更高。 又,只要將參與陽離子聚合反應之金屬螯合物加以微 膠囊化,當作所謂的潛在性硬化劑來使用時,可提升本發 明之接著劑的儲存性。 又,矽烷偶合劑雖受到硬化劑粒子表面所附著之水分 或空氣中之水分的影響而水解,惟爲了更迅速地進行處理 10 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) —----------^--------tr---------—. (請先閱讀背面之注意事項再填寫本頁) 1302562 Αί __B7__ 五、發明說明(?) ,只要對矽烷偶合劑中添加水而將事先矽醇化者用於接著 劑,或是對接著劑添加水來進行矽烷偶合劑之矽醇化即可 Ο [發明之實施形態] 說明本發明之實施形態。首先,將有機溶劑中溶解有 熱塑性樹脂所得之物與熱固性樹脂做混合,製作出以熱固 性樹脂與熱塑性樹脂爲主成分之樹脂成分。其次將此樹脂 成分與金屬螯合物、矽烷偶合劑做調配,製作出本發明之 接著劑。於此狀態下,接著劑係呈糊狀。 圖1(a)之符號25係表示剝離薄膜,於此剝離薄膜25 之表面若塗佈一定量之本發明的接著劑並乾燥之,則接著 劑中之有機溶劑會被去除,形成接著劑之塗佈層15,得到 由剝離薄膜25與接著劑塗佈層15所構成之接著薄膜20。 在此狀態下,接著劑塗佈層15並非糊狀而是固體,惟構成 接著劑塗佈層15之接著劑並未硬化。 圖1(b)之符號13係表示基板,基板13之一面係配置 有未予圖示之金屬配線。由該金屬配線之線寬部分構成連 接端子22,連接端子22係露出於基板13之表面。 圖1(b)係顯示在該基板13之配置有連接端子22之側 的表面密合上接著薄膜20之接著劑塗佈層15的狀態,在 此狀態下對全體做抵壓,讓接著薄膜20貼附於基板13上 。由於剝離薄膜25與接著劑塗佈層15之間的接著強度較 基板13與接著劑塗佈層15之間的接著強度來得小,若將 於基板13所貼附之接著薄膜20的剝離薄膜25翻開,則剝 11 本紙張尺度適用中國國家標準<CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) --------訂--------- 1302562 A7 ______B7__ 五、發明說明(γ ) 離薄膜25會自塗佈層15剝離,接著劑塗佈層15會殘留在 基板13表面(圖1(c))。 圖1(d)之符號11係顯示半導體晶片。於此半導體晶片 11,係配置有自半導體晶片11表面突出之凸塊狀的連接端 子21,連接端子21係與半導體晶片11之未予圖示的內部 電路相連接。 將表面配置有接著劑塗佈層15的基板13配置在未予 圖示之載置台上,讓半導體晶片11之連接端子21所位於 之側的面壓抵於基板13上之接著劑塗佈層15表面,一邊 自上方抵壓半導體晶片11 一邊進行加熱,則接著劑塗佈層 15會軟化,藉由受到抵壓之半導體晶片11使得已軟化之 接著劑塗佈層15被壓退,於是半導體晶片11之連接端子 21便抵接於基板13之連接端子22的表面(圖1(d))。 在此狀態下持續加熱既定時間,則接著劑塗佈層15會 在連接端子21、22彼此接觸的狀態下硬化,在半導體晶片 11與基板13之連接端子21、22彼此在電氣連接的狀態下 ,半導體晶片11會藉由已硬化之接著劑塗佈層15來固定 ‘ 於基板13上,得到本發明之電氣裝置5。 以上係說明利用剝離薄膜25與接著劑塗佈層15所構 成之接著薄膜20來連接基板13與半導體晶片11之情況, 惟本發明並不限定於此。例如,亦可將接著劑塗佈層15半 硬化至展現自支持性程度,將半硬化狀態之接著劑塗佈層 15本身當作接著薄膜來使用。 作爲將接著劑塗佈層15半硬化至展現自支持牲程度的 12 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) —;--------裝--------訂--------- (請先閱讀背面之注意事項再填寫本頁) 1302562 A7 广 一___B7 _一-- 五、發明說明((丨) (請先閱讀背面之注意事項再填寫本頁) 方法,有將接著劑塗佈層15加熱到不至完全硬化程度之方 法。又,亦可將於接著劑添加有固形樹脂所得之提昇黏度 之物成形爲薄膜狀來當作接著薄膜。 以上雖就接著劑成形爲薄膜狀的情況來說明,惟本發 明並不侷限於此。例如,本發明之接著劑亦可在糊狀的情 況下直接使用。 圖2(a)係顯示與圖1(b)所示之物爲相同的基板13。欲 對此基板13搭載半導體晶片11之時,首先對基板13之配 置有連接端子22之側的表面塗佈糊狀之接著劑,形成接著 劑之塗佈層12(圖2(b))。 其次,讓基板13之連接端子22與半導體晶片11之 連接端子21對向來做對位,讓半導體晶片11之配置有連 接端子21之側的面壓抵於基板13之接著劑塗佈層12表面 。由於此接著劑塗佈層12屬低黏度之物,所以其受到半導 體晶片Π之作用會被壓退,於是半導體晶片11之連接端 子21會抵接於基板13之連接端子22表面。 以與圖1(d)爲同樣的製程將基板13與半導體晶片11 加熱抵壓,則在基板13之連接端子22與半導體晶片11之 連接端子21呈密合之狀態下塗佈層12之接著劑會硬化, 而得到本發明之電氣裝置6。 以上雖說明讓半導體晶片11與基板13做連接之情況 ,惟本發明並不侷限於此,亦可使用於各種之電氣裝置之 連接方面,例如,可使用在TCP(Tape Carrier Package)般 之可ί合載半導體晶片之基板與LCD(Liquid Crystal Display) 13 ^紙張尺度適用中國國家標準(CNS)A4規格(210 x 297公釐^ ~ 1302562
五、發明說明(θ) 的連接方面。 圖3(a)之符號60係顯示於LCD所使用之玻璃基板’ 於此玻璃基板60的一面係形成有IT0電極65(Indium tin oxide) 〇 在ITO電極65之表面當中位於玻璃基板60邊部之部 分貼附與圖1(a)爲相同構造之接著薄膜之後’以與圖i(b) 爲同樣的製程將剝離薄膜加以剝離,即於IT0電極上殘留 由接著劑所構成之接著劑塗佈層15(圖3(b))。 其次,在讓配置有ΙΤΟ電極65之側的表面朝上的狀 態下,將玻璃基板60配置到未予圖示之載置台上。 圖3(c)之符號50係顯示TCP。在此係從TCP的原板 切出長方形形狀之物來當作TCP 50使用。TCP 50係由樹 脂薄膜所構成,其一面配置有複數條之金屬配線55 ’該金 屬配線55係沿著TCP 50之長方向來配置。金屬配線55 之長方向的端部係位於TCP 50之長方向的端部。 讓TCP 50之配置有金屬配線55之側的面朝下,將 TCP 50之金屬配線55的端部配置到玻璃基板60之配置有 接著劑塗佈層15的邊部之上方,使得金屬配線55之端部 與接著劑塗佈層15以對向的方式進行對位(圖3(c))。 其次,將TCP 50之金屬配線55的端部壓抵於接著劑 塗佈層15之表面。圖4係顯示該狀態之俯視圖。在此狀態 下,一邊抵壓與玻璃基板60相疊合之TCP 50的端部、一 邊將TCP 50與玻璃基板60加熱,則接著劑塗佈層15會 受熱軟化,軟化後之接著劑塗佈層15會受到抵壓TCP 50 14 本紙張尺度適用中國國家標準<CNS)A4規格<210 X 297公爱) (請先閱讀背面之注意事項再填寫本頁) —-----訂--------- 1302562 A7 _B7_ 五、發明說明(ί}) 端部的作用而被壓退,於是TCP 50之金屬配線55的端部 會抵接到玻璃基板60上之ITO電極65表面。 圖3(d)係顯示加熱結束後之狀態,由於接著劑塗佈層 15係在TCP 50之金屬配線55端部抵接於ITO電極65之 狀態下硬化,所以TCP 50與玻璃基板60不只是做機械性 的連接,TCP 50與玻璃基板60亦做電氣性連接。 下面表1係顯示在本發明之接著劑所能使用之矽烷偶 合劑的具體例。 (請先閱讀背面之注意事項再填寫本頁)
ϋ n ϋ n n tf an 一:eJI n n n I 線 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 1302562 B7 五、發明說明((上) *上述表1所表示之矽烷偶合劑分別爲信越化學工業(股份 有限)公司製造者 參照上述表1,作爲矽烷偶合劑所使用之矽烷化合物 ,其1分子中具有1〜3個乙氧基、甲氧基等之烷氧基。又 ’院氧基以外之取代基,係在結構中具有環氧環、乙稀基 、胺基、锍基等。此等之取代基不僅與樹脂等知有機化合 物的親合性高,有時尙可參與熱固性樹脂之硬化反應。 如r 一環氧丙氧基丙基或沒一(3,4一環氧環己基)乙基 般之末端配置有環氧環之取代基,其環氧環可參與環氧樹 脂之聚合反應。是以,若使用上述表1中5、6、7、14攔 中所顯示之化合物般之末端具有環氧環的矽烷偶合劑的情 況下,熱固後之接著劑的強度愈發提高。 以上雖說明了 1分子中具有1〜3個烷氧基之矽烷偶合 劑,惟本發明並不侷限於此,亦可使用例如全部的取代基 皆爲烷氧基所構成之矽烷化合物(矽酸鹽)來作爲矽烷偶合 劑。 又,亦可取代矽烷偶合劑而改用二氧化矽般之具有矽 醇基之物質。惟,相對於二氧化矽一般以粒子之狀態存在 ,矽烷偶合劑則呈現液體狀,所以矽烷偶合劑在接著劑中 之分散性佳且反應性高,是以較二氧化矽爲佳。 於本發明中,可使用锆螯合物、鈦螯合物、鋁螯合物 等各種之金屬螯合物,其中又以使用反應性高之鋁螯合物 爲佳。又,作爲金屬螯合物可使用粉體或液體之各種形態 之物。 尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) 訂---------線一 1302562 A7 _B7_ 五、發明說明((L) 本發明所能使用之熱固性樹脂,可使用環氧樹脂、尿 素樹脂、三聚氰胺樹脂、酚醛樹脂等之各種樹脂,若考量 到熱固後之接著劑強度等,則以使用環氧樹脂爲佳。 若於樹脂成分中配合熱塑性樹脂,由於可藉由熱塑性 樹脂之性質而提昇接著劑之凝集力,所以接著劑之接著力 可更爲提高。作爲此等熱塑性樹脂,可使用苯氧樹脂、聚 酯樹脂、聚氨酯樹脂、聚乙烯醇縮醛、乙撐乙烯乙酸酯、 聚丁二烯橡膠等之橡膠類之各種物質。 (實施例) 依據下述表2之「接著劑組成」的欄位中所示之配合 方式,將樹脂成分、金屬螯合物、矽烷偶合劑以及導電性 粒子加以混合而製作實施例1〜10、比較例1之接著劑,使 用該等接著劑來分別製作與圖1(a)之符號20所示之接著薄 膜呈相同構造之實施例1〜10、比較例1之接著薄膜。 (請先閱讀背面之注意事項再填寫本頁) ------—訂--------- _ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐〉 A7 1302562 _B7 五、發明說明(U ) [表2] 接著劑之組成與剝離強度試驗 實施例 比較例 1 2 3 4 5 6 7 8 9 10 1 接 著 劑 之 組 成 熱塑性 樹脂 YP50 50 50 50 50 50 50 50 50 50 50 熱固性 樹脂 愛皮 克特 828 50 25 20 賽洛 賽得 2021P 25 50 50 50 50 50 50 50 100 硬化劑 HX 3941 HP 30 金屬 螯合物 TAA 2 鋁螯 合劑 A(W) 2 2 2 2 2 2 2 2 2 矽烷 偶合劑 KBE -402 3 KBE *403 3 KBM -403 3 3 3 3 15 0.5 3 3 KBM -503 3 導電性粒子 5 5 5 5 5 5 5 5. 5 5 5 結 果 剝離強度 (N/cm) 4.5 8.3 11.1 15.3 17.1 13.5 12.1 19.0 14.4 2.2 1.3 評價 Δ Δ 〇 ◎ ◎ 〇 〇 ◎ 〇 X X _ 1Q 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) A7 1302562 五、發明說明(%0) 爲X,3N/cm〜ΙΟΝ/cm 者評定爲△,:lON/cm〜15N/cm 者評 定爲〇,超過15N/cm者評定爲◎。該等之測定結果與評 價結果係記載於上述表2之「結果」欄中。 由上述表2之「結果」欄可明顯地看出,使用添加有 金屬螯合物與矽烷偶合劑之實施例1〜10之接著劑的試驗片 ,相較於習知所採用之添加了硬化劑之比較例1之接著劑 ,可得到高剝離強度,本發明之接著劑即使在130°c、10 秒鐘此種低溫、短時間之熱壓接條件下,仍可確認出高接 著力。又,使用實施例10之接著劑的情況,雖發生接著劑 之硬化反應,爲經硬化後之接著劑由於硬而脆,所以試驗 片之剝離強度低。 在分別使用相同種類之金屬螯合物與矽烷偶合劑之實 施例1、2當中,使用脂環式環氧樹脂(賽洛賽得2021P)作 爲熱固性樹脂的實施例2可得到較高之剝離強度。由這些 結果可知,相較於在實施例1所使用之雙酚A型環氧樹脂( 艾皮克特828),在實施例2所使用之脂環式環氧樹脂(賽洛 賽得2021P)藉陽離子聚合的反應速度尤其快。 在分別使用相同樹脂成分與矽烷偶合劑之實施例5、7 當中’使用反應性高之鋁螯合物作爲金屬螯合物之實施例 5相較於使用鈦螯合物之實施例7可得到較高之剝離強度 之結果。 又’使用r 一環氧丙氧基丙基三甲氧基矽烷作爲偶合 劑之實施例5相較於使用7 —甲基丙醯基丙基三甲氧基矽 烷之實施例6可得到更高之剝離強度。據推測,相對於實 _____22___ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) -------1---------I I---訂·-------- (請先閱讀背面之注意事項再填寫本頁) A7 1302562 _____B7__ 五、發明說明(>| ) 施例6所使用之矽烷偶合劑其甲氧基以外的取代基爲具有 乙烯基之甲基丙醯基丙基,由於在實施例5所使用之矽烷 偶合劑其甲氧基外的取代基爲具有環氧環之環氧丙氧基, 而該環氧環會與熱固性樹脂發生聚合,所以剝離強度變高 〇 使用同樣具有環氧丙氧基丙基、但烷氧基之碳數或數 量相異之矽烷偶合劑的實施例3〜5中,使用烷氧基之數最 多且烷氧基之碳數少的偶合劑之實施例5的結果最佳,而 使用烷氧基之數量相較於另兩者爲少、且各烷氧基之碳數 最多之偶合劑的實施例3的結果最差。由於烷氧基之碳數 少者在水解製程之立體障礙少,又烷氧基之數量多者於陽 離子聚合反應可提供較多之矽醇基,所以得到了上述結果 〇 又,分別使用相同之樹脂成分、金屬螯合物、矽烷偶 合劑,僅在矽烷偶合劑之添加量方面做變化之實施例5、8 、9方面,矽烷偶合劑相對於金屬螯合物之添加量多的實 施例8相較於添加量較少之實施例5、9,可得到更高之剝 離強度。 又,做爲本發明之接著劑所使用之導電性粒子,可使 用金屬被膜樹脂或金屬粒子等。又,本發明之接著劑亦包 含不具導電性粒子者。於本發明之接著劑中亦可添加塡料 、著色劑、抗老化劑等之各種的添加劑。 以上雖就將粉體或液體狀之金屬螯合物直接添加到接 著劑之情況做說明,惟本發明並不侷限於此,例如亦可將 _______________ 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁) · -------- 1302562 A/ B7 五、發明說明(11) 金屬螯合物加以微膠囊化,再添加到接著劑中。 圖5之符號7係顯示接著劑,接著劑7係具有由樹脂 成分等所構成之接著劑成分32、以及分散於接著劑成分32 中之微膠囊30。此微膠囊30係具有由金屬螯合物所構成 之粒子31、以及以被覆粒子31之表面的方式所形成之樹 脂被膜35。 構成該樹脂被膜35之樹脂的玻璃移轉溫度由於較將硬 化劑加以硬化之際的加熱溫度爲低,所以接著劑7 —旦受 到加熱,則樹脂被膜35會熔解,金屬螯合物之粒子31會 與其他接著劑成分32相混而開始接著劑之硬化反應。 以上雖就將粉體之金屬螯合物加以微膠囊化的情況做 說明,惟本發明並不侷限於此,例如亦可將液體狀之金屬 螯合物予以微膠囊化後再使用於接著劑中。圖6之符號8 係顯示該接著劑之一例。於此接著劑8之接著劑成分42中 係分散有吸收性樹脂粒子所構成之微膠囊40,該微膠囊40 中係吸收著液體狀之金屬螯合物。一旦將此接著劑8加熱 ,則微膠囊40之吸收性樹脂會熔解使得金屬螯合物與其他 之接著劑成分相混,接著劑之硬化反應得以開始。 又,亦可採與圖6所示之微膠囊40爲同樣的製程,將 液體狀之矽烷偶合劑加以微膠囊化。 [發明之效果] 由於能以低溫、短時間來將接著劑硬化,所以對半導 體晶片或基板之施加熱應力小,可得到可靠性高之電氣裝 置。 94 ___________ 一 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) V-----------------------訂------ (請先閲讀背面之注意事項再填寫本頁) 1302562 A7 五、發明說明(j) [圖式之簡單說明] 圖1(a)〜(d)所示係本發明之接著劑之使用方法之一例 之圖。 圖2(a)〜(c)所示係本發明之接著劑之使用方法之另一 例之圖。 圖3(a)〜(d)所示係使用本發明之接著劑將LCD與TCP 做連接之製程之一例之圖。 圖4係用以說明將TCP與玻璃基板疊合之狀態的俯視 圖。 圖5係用以說明將粉體之金屬螯合物加以微膠囊化之 情況的接著劑之一例之圖。 圖6係用以說明將液體狀之金屬螯合物加以微膠囊化 之情況的接著劑之一例之圖。 圖7係用以說明習知之接著劑之圖。 [符號說明] 7 、 8 、 12 、 15 接著劑(接著劑塗佈層) 13 基板 11 半導體晶片 50 基板(TCP) 60 玻璃基板 _______—. _ 9S 本紙張尺度適用中國國家標準(CNS)A4規格<210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁)
• .ϋ n n n n n n 一 0’ I n n n n i 1 n I
Claims (1)
- 1302562 第91100737號專利申請案申請專利範圍修正本(2008·8) 六、申請專利範圍 1. 一種接著劑,其爲糊狀物,係具有樹脂成分、金屬 螯合物、以及矽烷偶合劑,前述樹脂成分係含有熱固性樹 脂; 前述矽烷偶合劑係以下述通式(1)所表示之砂院化合物 所構成: X2 I X1— Si — X3 · . ·通式(1 ) I X4 (上述通式中取代基X1〜X4當中之至少一取代基係烷氧 基,烷氧基以外之取代基係選自環氧環、乙烯基、胺基、 锍基、甲基); 前述金屬螯合物之含有量相對於前述樹脂成分100重 量份爲0.1重量份〜20重量份;前述矽烷偶合劑之含有量 相對於前述樹脂成分100重量份爲0.1重量份〜35重量份 , 前述金屬螯合物係經過微膠囊化,此微膠囊係由樹脂 粒子所構成,並分散於前述接著劑中。 2. 如申請專利範圍第1項之接著劑,其中,前述烷氧 基係甲氧基。 3. 如申請專利範圍第1項之接著劑,其中,前述烷氧 基係乙氧基。 4. 如申請專利範圍第1項之接著劑,其中,前述矽烷 化合物之取代基X1〜X4當中之至少一取代基係烷氧基以外 ......................•裝·..............訂……------…… (請先閲讀背面之注意事項再塡寫本頁) < 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 1302562 I D8 六、申請專利範圍 的取代基,前述烷氧基以外的取代基當中之至少一取代基 係具有環氧環。 (請先閲讀背面之注意事項再塡寫本頁) 5. 如申請專利範圍第1項之接著劑,其中,前述矽院 化合物之取代基X1〜X4當中之至少一取代基係烷氧基以外 的取代基,前述烷氧基以外的取代基當中之至少一取代基 係具有乙烯基。 6. 如申請專利範圍第4項之接著劑,其中,前述具有 環氧環之取代基係以下述化學式(2)所表示之7 —環氧丙氧 基丙基: CH2 - CHCH2 0C3H8 - · · ·化學式(2 ) 7.如申請專利範圍第5項之接著劑,其中,前述具有 乙烯基之取代基係以下述化學式(3)所表示之r 一甲基丙烯 醯氧丙基: ch3 CH2=C-C-0-C3H6- · · ·化學式(3) 8. 如申請專利範圍第1項之接著劑,其中,前述樹脂 成分具有熱塑性樹脂,且相對於前述熱固性樹脂1〇〇重量 份係添加前述熱塑性樹脂10重量份以上。 9. 如申請專利範圍第1項之接著劑,其中,前述樹脂 2 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 1302562 韶 C8 、 D8 • ' '----___ 六、申請專利範圍 成分具有熱塑性樹脂,且相對於前述熱固性樹脂1〇〇重息 份係添加前述熱塑性樹脂ίο重量份以上。 奧 1〇·如申請專利範圍第i項之接著劑’其中’前述熱 性樹脂係環氧樹脂。 11·如申請專利範圍第1〇項之接著劑,其中,前述产 氧樹脂係脂環式環氧樹脂。 u K I2·如申請專利範圍第i項之接著劑,其中,前述金 螯合物係以錦螯合物爲主成分。 • I1·如申請專利範圍第ί項之接著劑,其中,前述金 螯合物係以鋁螯合物爲主成分。 Η·—種接著薄膜,係將接著劑{爲糊狀物,具有樹俨 成分、金屬螯合物、以及砂院偶合劑,前述樹脂成分係二 有熱固性樹脂;前述矽烷偶合劑係以下述通式(1)所表示1 矽烷化合物所構成: / X2 χ! - γ-χ3 …通式⑴ X4 (上述通式中取代基X1〜X4當中之至少一取代基係烷氧 基)}成形爲片狀所得者; 前述金屬螯合物之含有量相對於前述樹脂成分100重 量份爲〇·1重量份〜20重量份;前述矽烷偶合劑之含有量 相對於前述樹脂成分100重量份爲0.1重量份〜35重量份 .ΙΊ.....Μ...................................訂................線· f請先閱讀背面之注意事項再塡寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 1 A8B8C8D8 1302562 六、申請專利範圍 前述金屬螯合物係經過微膠囊化,此微膠囊化之金屬 螯合物係分散於前述接著薄膜中。 一種電氣裝置,其具有半導體晶片與基板,在前述 半導體晶片與前述基板之間係配置有接著劑{具有樹脂成分 、金屬螯合物、以及矽烷偶合劑,前述樹脂成分係含有熱 固性樹脂;前述矽烷偶合劑係以下述通式(1)所表示之矽院 化合物所構成: X2 I X!-Si — X3 · ••通式⑴ i X1 (上述通式中取代基X1〜X1當中之至少一取代基係烷氧 基)},前述接著劑係經由熱處理而硬化。 16.—種電氣裝置,其具有玻璃基板與基板,在前述玻 璃基板與前述基板之間係配置有接著劑{具有樹脂成分、金 屬螯合物、以及矽烷偶合劑,前述樹脂成分係含有熱固性 樹脂;前述矽烷偶合劑係以下述通式(1)所表示之矽烷化合 物所構成: X2 x丨-:1·-χ3 …通式⑴ X1 (上述通式中取代基X1〜X1當中之至少一取代基係烷氧 基)},前述接著劑係經由熱處理而硬化。 (請先閲讀背面之注意事項再塡寫本頁) -έ 線 1 表祕Λ適用中國國家標準(CNS)A4規格(210 X 297公變) J302562 1 D8 ,六、申請專利範圍 17·如申請專利範圍第1項之接著劑,其中,前述金屬 螯合物係粉體或液體狀。 18·如申請專利範圍第1項之接著劑,其中,前述樹脂 粒子係吸收性樹脂粒子。 (請先閲讀背面之注意事項再塡寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
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TWI639670B (zh) * | 2011-07-29 | 2018-11-01 | 日商日立化成股份有限公司 | 接著劑組成物、使用其的膜狀接著劑及電路連接材料、電路構件的連接結構及其製造方法、電路連接材料的使用以及太陽電池模組 |
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KR100863473B1 (ko) | 2008-10-16 |
HK1049183A1 (en) | 2003-05-02 |
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HK1049183B (zh) | 2006-09-01 |
US6921782B2 (en) | 2005-07-26 |
CN1236003C (zh) | 2006-01-11 |
KR20020062854A (ko) | 2002-07-31 |
US20020151627A1 (en) | 2002-10-17 |
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