TWD225036S - 基板處理裝置用隔熱板 - Google Patents
基板處理裝置用隔熱板 Download PDFInfo
- Publication number
- TWD225036S TWD225036S TW110305062F TW110305062F TWD225036S TW D225036 S TWD225036 S TW D225036S TW 110305062 F TW110305062 F TW 110305062F TW 110305062 F TW110305062 F TW 110305062F TW D225036 S TWD225036 S TW D225036S
- Authority
- TW
- Taiwan
- Prior art keywords
- substrate processing
- heat shield
- processing equipment
- article
- processing device
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 3
- 235000012431 wafers Nutrition 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 1
Abstract
【物品用途】;本設計的物品是基板處理裝置用隔熱板，為一種應用在處理晶圓的基板處理裝置中，設置在晶舟下方，用以阻擋來自加熱器之輻射熱的隔熱板。;【設計說明】;(無)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2021-005833 | 2021-03-22 | ||
| JPD2021-5833F JP1700781S (zh) | 2021-03-22 | 2021-03-22 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TWD225036S true TWD225036S (zh) | 2023-05-01 |
Family
ID=78766347
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW110305062F TWD225036S (zh) | 2021-03-22 | 2021-09-17 | 基板處理裝置用隔熱板 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD981972S1 (zh) |
| JP (1) | JP1700781S (zh) |
| TW (1) | TWD225036S (zh) |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| AU2002355034A1 (en) * | 2002-11-26 | 2004-06-18 | Disco Corporation | Cassette for storing multiple sheets of semiconductor wafers |
| USD547147S1 (en) * | 2006-09-01 | 2007-07-24 | Huy Tran | Window tinting tool |
| USD615937S1 (en) * | 2009-03-06 | 2010-05-18 | Tokyo Electron Limited | Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers |
| USD655259S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD655257S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
| JP1624334S (zh) * | 2018-05-18 | 2019-02-12 | ||
| JP1624353S (zh) | 2018-07-19 | 2019-02-12 |
-
2021
- 2021-03-22 JP JPD2021-5833F patent/JP1700781S/ja active Active
- 2021-09-17 TW TW110305062F patent/TWD225036S/zh unknown
- 2021-09-21 US US29/808,582 patent/USD981972S1/en active Active
Also Published As
| Publication number | Publication date |
|---|---|
| USD981972S1 (en) | 2023-03-28 |
| JP1700781S (zh) | 2021-11-29 |
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