USD981972S1 - Adiabatic plate for substrate processing appratus - Google Patents
Adiabatic plate for substrate processing appratus Download PDFInfo
- Publication number
- USD981972S1 USD981972S1 US29/808,582 US202129808582F USD981972S US D981972 S1 USD981972 S1 US D981972S1 US 202129808582 F US202129808582 F US 202129808582F US D981972 S USD981972 S US D981972S
- Authority
- US
- United States
- Prior art keywords
- substrate processing
- adiabatic plate
- processing appratus
- appratus
- adiabatic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Images
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2021-005833D | 2021-03-22 | ||
JPD2021-5833F JP1700781S (zh) | 2021-03-22 | 2021-03-22 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD981972S1 true USD981972S1 (en) | 2023-03-28 |
Family
ID=78766347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/808,582 Active USD981972S1 (en) | 2021-03-22 | 2021-09-21 | Adiabatic plate for substrate processing appratus |
Country Status (3)
Country | Link |
---|---|
US (1) | USD981972S1 (zh) |
JP (1) | JP1700781S (zh) |
TW (1) | TWD225036S (zh) |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040256284A1 (en) * | 2002-11-26 | 2004-12-23 | Masatoshi Nanjo | Cassette for storing a plurality of semiconductor wafers |
USD547147S1 (en) * | 2006-09-01 | 2007-07-24 | Huy Tran | Window tinting tool |
USD615937S1 (en) * | 2009-03-06 | 2010-05-18 | Tokyo Electron Limited | Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers |
USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD655257S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD655259S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD916037S1 (en) * | 2018-05-18 | 2021-04-13 | Kokusai Electric Corporation | Cover of seal cap for reaction chamber for semiconductor |
USD924823S1 (en) | 2018-07-19 | 2021-07-13 | Kokusai Electric Corporation | Adiabatic plate for substrate processing apparatus |
-
2021
- 2021-03-22 JP JPD2021-5833F patent/JP1700781S/ja active Active
- 2021-09-17 TW TW110305062F patent/TWD225036S/zh unknown
- 2021-09-21 US US29/808,582 patent/USD981972S1/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20040256284A1 (en) * | 2002-11-26 | 2004-12-23 | Masatoshi Nanjo | Cassette for storing a plurality of semiconductor wafers |
USD547147S1 (en) * | 2006-09-01 | 2007-07-24 | Huy Tran | Window tinting tool |
USD615937S1 (en) * | 2009-03-06 | 2010-05-18 | Tokyo Electron Limited | Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers |
USD654884S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD654883S1 (en) * | 2010-10-21 | 2012-02-28 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD655257S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD655259S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Top plate for reactor for manufacturing semiconductor |
USD916037S1 (en) * | 2018-05-18 | 2021-04-13 | Kokusai Electric Corporation | Cover of seal cap for reaction chamber for semiconductor |
USD924823S1 (en) | 2018-07-19 | 2021-07-13 | Kokusai Electric Corporation | Adiabatic plate for substrate processing apparatus |
Also Published As
Publication number | Publication date |
---|---|
JP1700781S (zh) | 2021-11-29 |
TWD225036S (zh) | 2023-05-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |