TW593603B - Waveguide and composition - Google Patents

Waveguide and composition Download PDF

Info

Publication number
TW593603B
TW593603B TW091106117A TW91106117A TW593603B TW 593603 B TW593603 B TW 593603B TW 091106117 A TW091106117 A TW 091106117A TW 91106117 A TW91106117 A TW 91106117A TW 593603 B TW593603 B TW 593603B
Authority
TW
Taiwan
Prior art keywords
composition
hydroxyphenyl
oligomer
silsesquioxane
weight
Prior art date
Application number
TW091106117A
Other languages
English (en)
Chinese (zh)
Inventor
James G Shelnut
Matthew L Moynihan
Original Assignee
Shipley Co Llc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Llc filed Critical Shipley Co Llc
Application granted granted Critical
Publication of TW593603B publication Critical patent/TW593603B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
TW091106117A 2001-03-29 2002-03-28 Waveguide and composition TW593603B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom

Publications (1)

Publication Number Publication Date
TW593603B true TW593603B (en) 2004-06-21

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
TW091106117A TW593603B (en) 2001-03-29 2002-03-28 Waveguide and composition

Country Status (7)

Country Link
US (1) US6731857B2 (enExample)
EP (1) EP1251155B1 (enExample)
JP (1) JP4557487B2 (enExample)
KR (1) KR100831937B1 (enExample)
CN (1) CN1277886C (enExample)
DE (1) DE60208628T2 (enExample)
TW (1) TW593603B (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI398732B (zh) * 2004-04-14 2013-06-11 羅門哈斯電子材料有限公司 波導組成物及自其形成之波導
TWI420133B (zh) * 2006-07-21 2013-12-21 Tokyo Ohka Kogyo Co Ltd 高折射率構件及影像感測器

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
WO2003005616A2 (en) * 2001-07-06 2003-01-16 Viasystems Group, Inc. System and method for integrating optical layers in a pcb for inter-board communications
JP4557497B2 (ja) * 2002-03-03 2010-10-06 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
US6856745B2 (en) * 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
JP2004185000A (ja) * 2002-12-02 2004-07-02 Rohm & Haas Electronic Materials Llc 導波路を形成する方法及びそれから形成される導波路
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
EP1672426A4 (en) * 2003-10-07 2010-02-24 Hitachi Chemical Co Ltd RADIATION-CURABLE COMPOSITION, METHOD OF STORING THE SAME, METHOD OF FORMING HARDENED FILM, PATTERN FORMING METHOD, PATTERN USING METHOD, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
JP2005181958A (ja) * 2003-12-22 2005-07-07 Rohm & Haas Electronic Materials Llc レーザーアブレーションを用いる電子部品および光学部品の形成方法
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP1772482B1 (en) * 2004-04-14 2009-06-17 Rohm and Haas Electronic Materials, L.L.C. Waveguide compositions and waveguides formed therefrom
US20050272179A1 (en) * 2004-05-24 2005-12-08 Andrew Frauenglass Three-dimensional lithographic fabrication technique
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
TW200623993A (en) * 2004-08-19 2006-07-01 Rohm & Haas Elect Mat Methods of forming printed circuit boards
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
DE602005011394D1 (de) * 2004-12-22 2009-01-15 Rohm & Haas Elect Mat Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen
JP5243692B2 (ja) * 2004-12-22 2013-07-24 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法
EP1674905B1 (en) 2004-12-22 2008-10-15 Rohm and Haas Electronic Materials, L.L.C. Methods of forming optical devices having polymeric layers
EP1851591A4 (en) * 2005-02-15 2010-09-01 Rpo Pty Ltd PHOTOLITHOGRAPHIC PATTERNING OF POLYMERIC MATERIALS
EP1693484A3 (en) * 2005-02-15 2007-06-20 Rohm and Haas Electronic Materials, L.L.C. Plating Method
US7212723B2 (en) * 2005-02-19 2007-05-01 The Regents Of The University Of Colorado Monolithic waveguide arrays
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP2008166798A (ja) 2006-12-31 2008-07-17 Rohm & Haas Electronic Materials Llc 光学的機能を有するプリント回路板の形成方法
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
CN114867794B (zh) * 2019-12-31 2023-10-27 株式会社东进世美肯 包含倍半硅氧烷低聚物的湿式涂布用防水涂层组合物

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168246A (en) 1981-04-09 1982-10-16 Fujitsu Ltd Formation of negative pattern
JPS6025061B2 (ja) 1981-12-02 1985-06-15 日立化成工業株式会社 感光性シリコ−ン樹脂組成物
JPS63279245A (ja) 1987-05-12 1988-11-16 Fujitsu Ltd ネガ型レジスト組成物
JPH036503A (ja) * 1989-06-05 1991-01-14 Sumitomo Electric Ind Ltd 光伝送用ポリマークラッドファイバ
FR2656617A1 (fr) 1989-12-28 1991-07-05 Thomson Csf Procede de synthese de polysilsesquioxanes et applications des produits contenus.
EP0464614B1 (en) 1990-06-25 1999-09-29 Matsushita Electronics Corporation A composition having sensitivity to light or radiation
JPH04247406A (ja) * 1991-02-01 1992-09-03 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04271306A (ja) 1991-02-27 1992-09-28 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04366958A (ja) 1991-06-14 1992-12-18 Oki Electric Ind Co Ltd 放射線感応性樹脂組成物
US5296332A (en) 1991-11-22 1994-03-22 International Business Machines Corporation Crosslinkable aqueous developable photoresist compositions and method for use thereof
JP3273519B2 (ja) 1992-12-04 2002-04-08 日本電信電話株式会社 ポリシロキサン系光導波路の製造方法
JPH06256523A (ja) 1993-03-02 1994-09-13 Nippon Telegr & Teleph Corp <Ntt> 遷移金属元素を含むポリシロキサンおよびそれを用いた光導波路
JPH08176444A (ja) 1994-10-26 1996-07-09 Nippon Telegr & Teleph Corp <Ntt> 高分子光学材料及びこれを用いた光導波路
TW397936B (en) 1994-12-09 2000-07-11 Shinetsu Chemical Co Positive resist comosition based on a silicone polymer containing a photo acid generator
JP3094819B2 (ja) * 1994-12-09 2000-10-03 信越化学工業株式会社 ポジ型レジスト材料
JP3724004B2 (ja) 1995-03-28 2005-12-07 東レ株式会社 熱硬化性組成物、その製造方法およびカラーフィルタ
JP3204359B2 (ja) 1995-04-28 2001-09-04 日本電信電話株式会社 フレキシブル高分子光導波路
JPH08327842A (ja) 1995-05-29 1996-12-13 Nippon Telegr & Teleph Corp <Ntt> 光導波路
JP3324360B2 (ja) * 1995-09-25 2002-09-17 信越化学工業株式会社 ポリシロキサン化合物及びポジ型レジスト材料
US5972516A (en) 1996-02-29 1999-10-26 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide
JPH10148729A (ja) 1996-11-21 1998-06-02 Nippon Telegr & Teleph Corp <Ntt> 高分子光導波路コア部のリッジ・パターン形成方法
US5991493A (en) 1996-12-13 1999-11-23 Corning Incorporated Optically transmissive bonding material
US6144795A (en) 1996-12-13 2000-11-07 Corning Incorporated Hybrid organic-inorganic planar optical waveguide device
JP3571482B2 (ja) 1997-03-13 2004-09-29 日本電信電話株式会社 口径変換用高分子光導波路パターン形成方法
US6054253A (en) 1997-10-10 2000-04-25 Mcgill University-The Royal Institute For The Advancement Of Learning Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon
JPH11352348A (ja) * 1998-06-05 1999-12-24 Nippon Telegr & Teleph Corp <Ntt> 光導波路型偏光子
US6087064A (en) 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
JP3133039B2 (ja) 1998-10-05 2001-02-05 日本電信電話株式会社 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法
JP3709088B2 (ja) * 1998-12-24 2005-10-19 京セラ株式会社 光導波路
US6187505B1 (en) 1999-02-02 2001-02-13 International Business Machines Corporation Radiation sensitive silicon-containing resists
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI398732B (zh) * 2004-04-14 2013-06-11 羅門哈斯電子材料有限公司 波導組成物及自其形成之波導
TWI420133B (zh) * 2006-07-21 2013-12-21 Tokyo Ohka Kogyo Co Ltd 高折射率構件及影像感測器
US8760763B2 (en) 2006-07-21 2014-06-24 Tokyo Ohka Kogyo Co., Ltd. High refractive index material

Also Published As

Publication number Publication date
EP1251155A1 (en) 2002-10-23
DE60208628T2 (de) 2006-11-02
KR100831937B1 (ko) 2008-05-23
DE60208628D1 (de) 2006-04-06
EP1251155B1 (en) 2006-01-11
US6731857B2 (en) 2004-05-04
JP4557487B2 (ja) 2010-10-06
KR20020077168A (ko) 2002-10-11
CN1277886C (zh) 2006-10-04
JP2003048984A (ja) 2003-02-21
US20020172492A1 (en) 2002-11-21
CN1399439A (zh) 2003-02-26

Similar Documents

Publication Publication Date Title
TW593603B (en) Waveguide and composition
TW594416B (en) Photoimageable composition
TWI258637B (en) Multilayer photoresist systems that include a silicon-containing photoresist
TWI398732B (zh) 波導組成物及自其形成之波導
JP5975582B2 (ja) エポキシ官能性シロキサンオリゴマーを含有するエポキシ官能性の放射線硬化性組成物
JP2004184999A (ja) フォトイメージャブル導波路組成物及びそれから形成される導波路
TW200421019A (en) Multilayer photoresist systems
TWI598694B (zh) 用於形成光阻下層膜之化合物及組成物，以及使用該化合物及組成物形成光阻下層膜之方法
TWI332968B (en) Waveguide compositions and waveguides formed therefrom
TW200401804A (en) Processes for producing polysiloxanes and photoresist compositions comprising same
CA2424557A1 (en) Radiation sensitive dielectric constant changing composition and dielectric constant changing method
KR100789583B1 (ko) 감방사선성 굴절율 변화성 조성물 및 굴절율 변화법
JP4557497B2 (ja) シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
TWI801634B (zh) 光波導形成用感光性環氧樹脂組成物、光波導形成用感光性薄膜及使用其之光波導、光電傳輸用混合撓性印刷配線板
JP5459929B2 (ja) ケイ素含有ポリマーおよびそのポリマーから形成される光導波路
JP2005092177A (ja) 光学部品形成方法
KR20100102451A (ko) 반도체 소자의 미세 패턴 형성 방법
JP2018155802A (ja) ポジ型感光性レジストドライフィルムの製造方法及びポジ型感光性レジストドライフィルム
JPWO2008126499A1 (ja) ポリマー光導波路形成用材料、ポリマー光導波路、及びポリマー光導波路製造方法
CN105593727B (zh) 光波导用感光性树脂组合物和光波导芯层形成用光固化性薄膜、光波导及挠性印刷电路板
JP6442618B2 (ja) 光塩基発生剤を含有する光イメージ化可能な組成物
TWI252373B (en) Fluorinated Si-polymers and photoresists comprising same
KR20170012923A (ko) 감광성 수지 조성물, 그로부터 형성된 경화막, 및 경화막을 갖는 소자
JP3781940B2 (ja) ネガ型レジスト組成物及びレジストパターン形成方法
JP2005126497A (ja) 光導波路用感光性樹脂組成物および光導波路

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent