KR100831937B1 - 도파관 및 조성물 - Google Patents

도파관 및 조성물 Download PDF

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Publication number
KR100831937B1
KR100831937B1 KR1020020016937A KR20020016937A KR100831937B1 KR 100831937 B1 KR100831937 B1 KR 100831937B1 KR 1020020016937 A KR1020020016937 A KR 1020020016937A KR 20020016937 A KR20020016937 A KR 20020016937A KR 100831937 B1 KR100831937 B1 KR 100831937B1
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KR
South Korea
Prior art keywords
hydroxyphenyl
silsesquioxane
alkyl
formula
present
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
KR1020020016937A
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English (en)
Korean (ko)
Other versions
KR20020077168A (ko
Inventor
쉘넛제임스지.
모이니한매튜엘.
Original Assignee
롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨
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Application filed by 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨 filed Critical 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨
Publication of KR20020077168A publication Critical patent/KR20020077168A/ko
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Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
KR1020020016937A 2001-03-29 2002-03-28 도파관 및 조성물 Expired - Lifetime KR100831937B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
US09/821,527 2001-03-29

Publications (2)

Publication Number Publication Date
KR20020077168A KR20020077168A (ko) 2002-10-11
KR100831937B1 true KR100831937B1 (ko) 2008-05-23

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020020016937A Expired - Lifetime KR100831937B1 (ko) 2001-03-29 2002-03-28 도파관 및 조성물

Country Status (7)

Country Link
US (1) US6731857B2 (enExample)
EP (1) EP1251155B1 (enExample)
JP (1) JP4557487B2 (enExample)
KR (1) KR100831937B1 (enExample)
CN (1) CN1277886C (enExample)
DE (1) DE60208628T2 (enExample)
TW (1) TW593603B (enExample)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
WO2003005616A2 (en) * 2001-07-06 2003-01-16 Viasystems Group, Inc. System and method for integrating optical layers in a pcb for inter-board communications
JP4557497B2 (ja) * 2002-03-03 2010-10-06 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
US6856745B2 (en) * 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
JP2004185000A (ja) * 2002-12-02 2004-07-02 Rohm & Haas Electronic Materials Llc 導波路を形成する方法及びそれから形成される導波路
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
EP1672426A4 (en) * 2003-10-07 2010-02-24 Hitachi Chemical Co Ltd RADIATION-CURABLE COMPOSITION, METHOD OF STORING THE SAME, METHOD OF FORMING HARDENED FILM, PATTERN FORMING METHOD, PATTERN USING METHOD, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
JP2005181958A (ja) * 2003-12-22 2005-07-07 Rohm & Haas Electronic Materials Llc レーザーアブレーションを用いる電子部品および光学部品の形成方法
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
DE602005001341T2 (de) * 2004-04-14 2008-02-21 Rohm and Haas Electronic Materials, L.L.C., Marlborough Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
EP1772482B1 (en) * 2004-04-14 2009-06-17 Rohm and Haas Electronic Materials, L.L.C. Waveguide compositions and waveguides formed therefrom
US20050272179A1 (en) * 2004-05-24 2005-12-08 Andrew Frauenglass Three-dimensional lithographic fabrication technique
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
TW200623993A (en) * 2004-08-19 2006-07-01 Rohm & Haas Elect Mat Methods of forming printed circuit boards
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
DE602005011394D1 (de) * 2004-12-22 2009-01-15 Rohm & Haas Elect Mat Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen
JP5243692B2 (ja) * 2004-12-22 2013-07-24 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法
EP1674905B1 (en) 2004-12-22 2008-10-15 Rohm and Haas Electronic Materials, L.L.C. Methods of forming optical devices having polymeric layers
EP1851591A4 (en) * 2005-02-15 2010-09-01 Rpo Pty Ltd PHOTOLITHOGRAPHIC PATTERNING OF POLYMERIC MATERIALS
EP1693484A3 (en) * 2005-02-15 2007-06-20 Rohm and Haas Electronic Materials, L.L.C. Plating Method
US7212723B2 (en) * 2005-02-19 2007-05-01 The Regents Of The University Of Colorado Monolithic waveguide arrays
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP5586820B2 (ja) * 2006-07-21 2014-09-10 東京応化工業株式会社 高屈折率材料
JP2008166798A (ja) 2006-12-31 2008-07-17 Rohm & Haas Electronic Materials Llc 光学的機能を有するプリント回路板の形成方法
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
CN114867794B (zh) * 2019-12-31 2023-10-27 株式会社东进世美肯 包含倍半硅氧烷低聚物的湿式涂布用防水涂层组合物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06172533A (ja) * 1992-12-04 1994-06-21 Nippon Telegr & Teleph Corp <Ntt> 光導波路形成用高分子及びポリシロキサン系光導波路の製造方法
US5612170A (en) * 1994-12-09 1997-03-18 Shin-Etsu Chemical Co., Ltd. Positive resist composition
WO1998026315A1 (en) * 1996-12-13 1998-06-18 Corning Incorporated Hybrid organic-inorganic planar optical waveguide device
US6087064A (en) * 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
US6088492A (en) * 1996-02-29 2000-07-11 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168246A (en) 1981-04-09 1982-10-16 Fujitsu Ltd Formation of negative pattern
JPS6025061B2 (ja) 1981-12-02 1985-06-15 日立化成工業株式会社 感光性シリコ−ン樹脂組成物
JPS63279245A (ja) 1987-05-12 1988-11-16 Fujitsu Ltd ネガ型レジスト組成物
JPH036503A (ja) * 1989-06-05 1991-01-14 Sumitomo Electric Ind Ltd 光伝送用ポリマークラッドファイバ
FR2656617A1 (fr) 1989-12-28 1991-07-05 Thomson Csf Procede de synthese de polysilsesquioxanes et applications des produits contenus.
EP0464614B1 (en) 1990-06-25 1999-09-29 Matsushita Electronics Corporation A composition having sensitivity to light or radiation
JPH04247406A (ja) * 1991-02-01 1992-09-03 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04271306A (ja) 1991-02-27 1992-09-28 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04366958A (ja) 1991-06-14 1992-12-18 Oki Electric Ind Co Ltd 放射線感応性樹脂組成物
US5296332A (en) 1991-11-22 1994-03-22 International Business Machines Corporation Crosslinkable aqueous developable photoresist compositions and method for use thereof
JPH06256523A (ja) 1993-03-02 1994-09-13 Nippon Telegr & Teleph Corp <Ntt> 遷移金属元素を含むポリシロキサンおよびそれを用いた光導波路
JPH08176444A (ja) 1994-10-26 1996-07-09 Nippon Telegr & Teleph Corp <Ntt> 高分子光学材料及びこれを用いた光導波路
JP3094819B2 (ja) * 1994-12-09 2000-10-03 信越化学工業株式会社 ポジ型レジスト材料
JP3724004B2 (ja) 1995-03-28 2005-12-07 東レ株式会社 熱硬化性組成物、その製造方法およびカラーフィルタ
JP3204359B2 (ja) 1995-04-28 2001-09-04 日本電信電話株式会社 フレキシブル高分子光導波路
JPH08327842A (ja) 1995-05-29 1996-12-13 Nippon Telegr & Teleph Corp <Ntt> 光導波路
JP3324360B2 (ja) * 1995-09-25 2002-09-17 信越化学工業株式会社 ポリシロキサン化合物及びポジ型レジスト材料
JPH10148729A (ja) 1996-11-21 1998-06-02 Nippon Telegr & Teleph Corp <Ntt> 高分子光導波路コア部のリッジ・パターン形成方法
US6144795A (en) 1996-12-13 2000-11-07 Corning Incorporated Hybrid organic-inorganic planar optical waveguide device
JP3571482B2 (ja) 1997-03-13 2004-09-29 日本電信電話株式会社 口径変換用高分子光導波路パターン形成方法
US6054253A (en) 1997-10-10 2000-04-25 Mcgill University-The Royal Institute For The Advancement Of Learning Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon
JPH11352348A (ja) * 1998-06-05 1999-12-24 Nippon Telegr & Teleph Corp <Ntt> 光導波路型偏光子
JP3133039B2 (ja) 1998-10-05 2001-02-05 日本電信電話株式会社 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法
JP3709088B2 (ja) * 1998-12-24 2005-10-19 京セラ株式会社 光導波路
US6187505B1 (en) 1999-02-02 2001-02-13 International Business Machines Corporation Radiation sensitive silicon-containing resists
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06172533A (ja) * 1992-12-04 1994-06-21 Nippon Telegr & Teleph Corp <Ntt> 光導波路形成用高分子及びポリシロキサン系光導波路の製造方法
US5612170A (en) * 1994-12-09 1997-03-18 Shin-Etsu Chemical Co., Ltd. Positive resist composition
US6088492A (en) * 1996-02-29 2000-07-11 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide
WO1998026315A1 (en) * 1996-12-13 1998-06-18 Corning Incorporated Hybrid organic-inorganic planar optical waveguide device
US6087064A (en) * 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method

Also Published As

Publication number Publication date
EP1251155A1 (en) 2002-10-23
DE60208628T2 (de) 2006-11-02
DE60208628D1 (de) 2006-04-06
EP1251155B1 (en) 2006-01-11
US6731857B2 (en) 2004-05-04
TW593603B (en) 2004-06-21
JP4557487B2 (ja) 2010-10-06
KR20020077168A (ko) 2002-10-11
CN1277886C (zh) 2006-10-04
JP2003048984A (ja) 2003-02-21
US20020172492A1 (en) 2002-11-21
CN1399439A (zh) 2003-02-26

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