KR20020077168A - 도파관 및 조성물 - Google Patents
도파관 및 조성물 Download PDFInfo
- Publication number
- KR20020077168A KR20020077168A KR1020020016937A KR20020016937A KR20020077168A KR 20020077168 A KR20020077168 A KR 20020077168A KR 1020020016937 A KR1020020016937 A KR 1020020016937A KR 20020016937 A KR20020016937 A KR 20020016937A KR 20020077168 A KR20020077168 A KR 20020077168A
- Authority
- KR
- South Korea
- Prior art keywords
- hydroxyphenyl
- silsesquioxane
- alkyl
- group
- composition
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C13/00—Fibre or filament compositions
- C03C13/04—Fibre optics, e.g. core and clad fibre compositions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/04—Polysiloxanes
- C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Optical Integrated Circuits (AREA)
- Silicon Polymers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
가교결합제(%) | RI(0.633 ㎛) | RI(0.78 ㎛) | RI(1.55 ㎛) |
1.7 | 1.5907 | 1.5823 | 1.5710 |
3.7 | 1.5912 | 1.5829 | 1.5712 |
7.1 | 1.5934 | 1.5849 | 1.5724 |
13.3 | 1.5959 | 1.5872 | 1.5745 |
광활성 성분(%) | RI(0.633 ㎛) | RI(0.78 ㎛) | RI(1.55 ㎛) |
7.1 | 1.5934 | 1.5849 | 1.5724 |
13.3 | 1.5976 | 1.5889 | 1.5767 |
Claims (10)
- 중합 단위로서 화학식 (RSiO1.5)(여기서, R 은 하이드록시페닐 또는 하이드록시벤질로부터 선택된다)의 모노머를 포함하며, 화학조사선(actinic radiation)에 노광시 용해도가 변하는 실세스퀴옥산 올리고머; 및 광활성 성분을 함유하는 포토디파이너블(photodefinable) 조성물.
- 중합 단위로서 화학식 (RSiO1.5)(여기서, R 은 하이드록시페닐 또는 하이드록시벤질로부터 선택된다)의 모노머를 포함하며, 화학조사선에 노광시 용해도가 변하는 실세스퀴옥산 올리고머; 하나 이상의 유기 가교결합제; 및 광활성 성분을 함유하는 포토디파이너블 조성물.
- 제 1 항 또는 제 2 항에 있어서, 실세스퀴옥산 올리고머가 중합단위로서 화학식 (R2SiO1.5)(여기서, R2는 하이드록시페닐, 하이드록시페닐(C1-C5)알킬, 페닐, 할로페닐, (C1-C10)알킬페닐, (C1-C10)플루오로알킬페닐, (C1-C10)알킬 및 (C1-C10)플루오로알킬로 구성된 그룹중에서 선택되고, R 및 R2는 동일하지 않다)의 모노머를 추가로 함유하는 포토디파이너블 조성물.
- a) 기판상에, 중합 단위로서 화학식 (RSiO1.5)(여기서, R 은 하이드록시페닐 또는 하이드록시페닐(C1-C5)알킬로부터 선택된다)의 모노머를 포함하는 실세스퀴옥산 올리고머; 및 광활성 성분을 함유하는 포토디파이너블 조성물 층을 침적시키고; b) 상기 조성물을 화학조사선에 노광시켜 광도파관(optical waveguide)을 형성하는 단계를 포함함을 특징으로 하여 광도파관을 제조하는 방법.
- 제 4 항에 있어서, 실세스퀴옥산 올리고머가 중합단위로서 화학식 (R2SiO1.5)(여기서, R2는 하이드록시페닐, 하이드록시페닐(C1-C5)알킬, 페닐, 할로페닐, (C1-C10)알킬페닐, (C1-C10)플루오로알킬페닐, (C1-C10)알킬 및 (C1-C10)플루오로알킬로 구성된 그룹중에서 선택되고, R 및 R2는 동일하지 않다)의 모노머를 추가로 함유하는 방법.
- 제 4 항 또는 제 5 항에 있어서, 포토디파이너블 조성물이 하나 이상의 유기 가교결합제를 추가로 함유하는 방법.
- 코어(core)와 클래딩(cladding)을 포함하며, 코어와 클래딩 중 적어도 하나가 중합 단위로서 화학식 (RSiO1.5)(여기서, R 은 하이드록시페닐 또는 하이드록시페닐(C1-C5)알킬로부터 선택된다)의 모노머를 포함하는 실세스퀴옥산 폴리머를 함유하는 광도파관.
- 코어와 클래딩을 포함하며, 코어와 클래딩 중 적어도 하나가 중합 단위로서 화학식 (RSiO1.5)(여기서, R 은 하이드록시페닐 또는 하이드록시벤질로부터 선택된다)의 모노머를 포함하는 실세스퀴옥산 폴리머; 및 하나 이상의 유기 가교결합제를 함유하는 광도파관.
- 제 7 항 또는 제 8 항에 있어서, 실세스퀴옥산 폴리머가 중합단위로서 화학식 (R2SiO1.5)(여기서, R2는 하이드록시페닐, 하이드록시페닐(C1-C5)알킬, 페닐, 할로페닐, (C1-C10)알킬페닐, (C1-C10)플루오로알킬페닐, (C1-C10)알킬 및 (C1-C10)플루오로알킬로 구성된 그룹중에서 선택되고, R 및 R2는 동일하지 않다)의 모노머를 추가로 함유하는 광도파관.
- 제 7 항 내지 제 9 항중 어느 한 항에 따른 하나 이상의 광도파관을 포함하는 전자 디바이스.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/821,527 US6731857B2 (en) | 2001-03-29 | 2001-03-29 | Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom |
US09/821,527 | 2001-03-29 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20020077168A true KR20020077168A (ko) | 2002-10-11 |
KR100831937B1 KR100831937B1 (ko) | 2008-05-23 |
Family
ID=25233613
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020020016937A KR100831937B1 (ko) | 2001-03-29 | 2002-03-28 | 도파관 및 조성물 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6731857B2 (ko) |
EP (1) | EP1251155B1 (ko) |
JP (1) | JP4557487B2 (ko) |
KR (1) | KR100831937B1 (ko) |
CN (1) | CN1277886C (ko) |
DE (1) | DE60208628T2 (ko) |
TW (1) | TW593603B (ko) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8034545B2 (en) | 2003-10-07 | 2011-10-11 | Hitachi Chemical Co., Ltd. | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide |
KR101102798B1 (ko) * | 2006-07-21 | 2012-01-05 | 도오꾜오까고오교 가부시끼가이샤 | 고굴절률 재료 |
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US6731857B2 (en) * | 2001-03-29 | 2004-05-04 | Shipley Company, L.L.C. | Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom |
WO2003005616A2 (en) * | 2001-07-06 | 2003-01-16 | Viasystems Group, Inc. | System and method for integrating optical layers in a pcb for inter-board communications |
JP4557497B2 (ja) * | 2002-03-03 | 2010-10-06 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物 |
US6856745B2 (en) * | 2002-07-02 | 2005-02-15 | Lucent Technologies Inc. | Waveguide and applications therefor |
JP4014519B2 (ja) * | 2002-07-17 | 2007-11-28 | 日東電工株式会社 | ポリマー光導波路の製造方法 |
TWI249045B (en) * | 2002-12-02 | 2006-02-11 | Shipley Co Llc | Methods of forming waveguides and waveguides formed therefrom |
US6842577B2 (en) * | 2002-12-02 | 2005-01-11 | Shipley Company L.L.C. | Photoimageable waveguide composition and waveguide formed therefrom |
JP2005092177A (ja) * | 2003-09-12 | 2005-04-07 | Rohm & Haas Electronic Materials Llc | 光学部品形成方法 |
JP5102428B2 (ja) * | 2003-11-25 | 2012-12-19 | ローム・アンド・ハース・エレクトロニック・マテリアルズ,エル.エル.シー. | 導波路組成物およびこれから形成された導波路 |
US7072564B2 (en) * | 2003-11-25 | 2006-07-04 | Rohm And Haas Electronic Materials Llc | Waveguide compositions and waveguides formed therefrom |
JP2005181958A (ja) * | 2003-12-22 | 2005-07-07 | Rohm & Haas Electronic Materials Llc | レーザーアブレーションを用いる電子部品および光学部品の形成方法 |
US7906180B2 (en) * | 2004-02-27 | 2011-03-15 | Molecular Imprints, Inc. | Composition for an etching mask comprising a silicon-containing material |
EP1772482B1 (en) * | 2004-04-14 | 2009-06-17 | Rohm and Haas Electronic Materials, L.L.C. | Waveguide compositions and waveguides formed therefrom |
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DE602005011393D1 (de) * | 2004-12-22 | 2009-01-15 | Rohm & Haas Elect Mat | Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen |
JP2006184902A (ja) * | 2004-12-22 | 2006-07-13 | Rohm & Haas Electronic Materials Llc | 光学デバイスを形成する方法 |
EP1693484A3 (en) * | 2005-02-15 | 2007-06-20 | Rohm and Haas Electronic Materials, L.L.C. | Plating Method |
JP2008530317A (ja) * | 2005-02-15 | 2008-08-07 | アールピーオー プロプライエタリー リミテッド | ポリマー材料のフォトリソグラフィックパターニング |
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JP4762630B2 (ja) * | 2005-08-03 | 2011-08-31 | 東京応化工業株式会社 | レジスト組成物およびレジストパターン形成方法 |
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TWI343226B (en) | 2006-12-31 | 2011-06-01 | Rohm & Haas Elect Mat | Printed circuit boards having optical functionality and methods forming the same |
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-
2001
- 2001-03-29 US US09/821,527 patent/US6731857B2/en not_active Expired - Lifetime
-
2002
- 2002-03-27 DE DE60208628T patent/DE60208628T2/de not_active Expired - Lifetime
- 2002-03-27 EP EP02252203A patent/EP1251155B1/en not_active Expired - Lifetime
- 2002-03-28 KR KR1020020016937A patent/KR100831937B1/ko active IP Right Grant
- 2002-03-28 TW TW091106117A patent/TW593603B/zh not_active IP Right Cessation
- 2002-03-29 JP JP2002095177A patent/JP4557487B2/ja not_active Expired - Lifetime
- 2002-03-29 CN CNB021415196A patent/CN1277886C/zh not_active Expired - Lifetime
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8034545B2 (en) | 2003-10-07 | 2011-10-11 | Hitachi Chemical Co., Ltd. | Radiation curable composition, storing method thereof, forming method of cured film, patterning method, use of pattern, electronic components and optical waveguide |
KR101102798B1 (ko) * | 2006-07-21 | 2012-01-05 | 도오꾜오까고오교 가부시끼가이샤 | 고굴절률 재료 |
US8760763B2 (en) | 2006-07-21 | 2014-06-24 | Tokyo Ohka Kogyo Co., Ltd. | High refractive index material |
Also Published As
Publication number | Publication date |
---|---|
KR100831937B1 (ko) | 2008-05-23 |
EP1251155B1 (en) | 2006-01-11 |
US6731857B2 (en) | 2004-05-04 |
DE60208628T2 (de) | 2006-11-02 |
JP4557487B2 (ja) | 2010-10-06 |
EP1251155A1 (en) | 2002-10-23 |
DE60208628D1 (de) | 2006-04-06 |
US20020172492A1 (en) | 2002-11-21 |
JP2003048984A (ja) | 2003-02-21 |
CN1399439A (zh) | 2003-02-26 |
TW593603B (en) | 2004-06-21 |
CN1277886C (zh) | 2006-10-04 |
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