DE60208628D1 - Verfahren zur Herstellung optischer Lichtwellenleiter aus einer Silsesquioxanzusammensetzung - Google Patents

Verfahren zur Herstellung optischer Lichtwellenleiter aus einer Silsesquioxanzusammensetzung

Info

Publication number
DE60208628D1
DE60208628D1 DE60208628T DE60208628T DE60208628D1 DE 60208628 D1 DE60208628 D1 DE 60208628D1 DE 60208628 T DE60208628 T DE 60208628T DE 60208628 T DE60208628 T DE 60208628T DE 60208628 D1 DE60208628 D1 DE 60208628D1
Authority
DE
Germany
Prior art keywords
optical waveguides
producing optical
silsesquioxane composition
silsesquioxane
composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE60208628T
Other languages
English (en)
Other versions
DE60208628T2 (de
Inventor
James G Shelnut
Matthew L Moynihan
George G Barclay
Dana A Gronbeck
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Rohm and Haas Electronic Materials LLC
Original Assignee
Shipley Co Inc
Shipley Co LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc, Shipley Co LLC filed Critical Shipley Co Inc
Application granted granted Critical
Publication of DE60208628D1 publication Critical patent/DE60208628D1/de
Publication of DE60208628T2 publication Critical patent/DE60208628T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
DE60208628T 2001-03-29 2002-03-27 Verfahren zur Herstellung von Lichtwellenleitern unter Verwendung einer Silsesquioxanzusammensetzung Expired - Lifetime DE60208628T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US821527 2001-03-29
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom

Publications (2)

Publication Number Publication Date
DE60208628D1 true DE60208628D1 (de) 2006-04-06
DE60208628T2 DE60208628T2 (de) 2006-11-02

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
DE60208628T Expired - Lifetime DE60208628T2 (de) 2001-03-29 2002-03-27 Verfahren zur Herstellung von Lichtwellenleitern unter Verwendung einer Silsesquioxanzusammensetzung

Country Status (7)

Country Link
US (1) US6731857B2 (de)
EP (1) EP1251155B1 (de)
JP (1) JP4557487B2 (de)
KR (1) KR100831937B1 (de)
CN (1) CN1277886C (de)
DE (1) DE60208628T2 (de)
TW (1) TW593603B (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
WO2003005616A2 (en) * 2001-07-06 2003-01-16 Viasystems Group, Inc. System and method for integrating optical layers in a pcb for inter-board communications
JP4557497B2 (ja) * 2002-03-03 2010-10-06 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
US6856745B2 (en) * 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
EP1434068A3 (de) * 2002-12-02 2004-07-28 Shipley Company, L.L.C. Herstellungsmethoden von Lichtwellenleitern mit runden Querschnitten und Lichtwellenleitern die nach diesen Methoden hergestellt werden
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
KR100853054B1 (ko) * 2003-10-07 2008-08-19 히다치 가세고교 가부시끼가이샤 방사선 경화성 조성물, 그 보존방법, 경화막 형성방법,패턴 형성방법, 패턴 사용방법, 전자부품 및 광도파로
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
JP2005181958A (ja) * 2003-12-22 2005-07-07 Rohm & Haas Electronic Materials Llc レーザーアブレーションを用いる電子部品および光学部品の形成方法
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
EP1772482B1 (de) * 2004-04-14 2009-06-17 Rohm and Haas Electronic Materials, L.L.C. Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
EP1586603B1 (de) * 2004-04-14 2007-06-13 Rohm and Haas Electronic Materials LLC Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
US20050272179A1 (en) * 2004-05-24 2005-12-08 Andrew Frauenglass Three-dimensional lithographic fabrication technique
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
JP2006072352A (ja) * 2004-08-19 2006-03-16 Rohm & Haas Electronic Materials Llc プリント回路板を形成する方法
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
DE602005011394D1 (de) * 2004-12-22 2009-01-15 Rohm & Haas Elect Mat Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen
DE602005010378D1 (de) * 2004-12-22 2008-11-27 Rohm & Haas Elect Mat Verfahren zur Herstellung optischer Vorrichtungen mit Polymerschichten
EP1674903B1 (de) * 2004-12-22 2008-12-03 Rohm and Haas Electronic Materials, L.L.C. Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen
BRPI0607463A2 (pt) * 2005-02-15 2009-09-08 Rpo Pty Ltd padronização fotolitográfica de materiais poliméricos
EP1693484A3 (de) * 2005-02-15 2007-06-20 Rohm and Haas Electronic Materials, L.L.C. Plattierungsverfahren
US7212723B2 (en) * 2005-02-19 2007-05-01 The Regents Of The University Of Colorado Monolithic waveguide arrays
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP5586820B2 (ja) * 2006-07-21 2014-09-10 東京応化工業株式会社 高屈折率材料
EP1950587B1 (de) 2006-12-31 2017-11-08 Rohm and Haas Electronic Materials LLC Verfahren zur Herstellung von Leiterplatten mit eingebetteten optischen Wellenleitern
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
CN114867794B (zh) * 2019-12-31 2023-10-27 株式会社东进世美肯 包含倍半硅氧烷低聚物的湿式涂布用防水涂层组合物

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57168246A (en) 1981-04-09 1982-10-16 Fujitsu Ltd Formation of negative pattern
JPS6025061B2 (ja) 1981-12-02 1985-06-15 日立化成工業株式会社 感光性シリコ−ン樹脂組成物
JPS63279245A (ja) 1987-05-12 1988-11-16 Fujitsu Ltd ネガ型レジスト組成物
JPH036503A (ja) * 1989-06-05 1991-01-14 Sumitomo Electric Ind Ltd 光伝送用ポリマークラッドファイバ
FR2656617A1 (fr) 1989-12-28 1991-07-05 Thomson Csf Procede de synthese de polysilsesquioxanes et applications des produits contenus.
DE69131658T2 (de) 1990-06-25 2000-04-27 Matsushita Electronics Corp Licht- oder strahlungsempfindliche Zusammensetzung
JPH04247406A (ja) * 1991-02-01 1992-09-03 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04271306A (ja) 1991-02-27 1992-09-28 Sumitomo Electric Ind Ltd プラスチック光伝送体
JPH04366958A (ja) 1991-06-14 1992-12-18 Oki Electric Ind Co Ltd 放射線感応性樹脂組成物
US5296332A (en) 1991-11-22 1994-03-22 International Business Machines Corporation Crosslinkable aqueous developable photoresist compositions and method for use thereof
JP3273519B2 (ja) 1992-12-04 2002-04-08 日本電信電話株式会社 ポリシロキサン系光導波路の製造方法
JPH06256523A (ja) 1993-03-02 1994-09-13 Nippon Telegr & Teleph Corp <Ntt> 遷移金属元素を含むポリシロキサンおよびそれを用いた光導波路
JPH08176444A (ja) 1994-10-26 1996-07-09 Nippon Telegr & Teleph Corp <Ntt> 高分子光学材料及びこれを用いた光導波路
JP3094819B2 (ja) * 1994-12-09 2000-10-03 信越化学工業株式会社 ポジ型レジスト材料
TW397936B (en) 1994-12-09 2000-07-11 Shinetsu Chemical Co Positive resist comosition based on a silicone polymer containing a photo acid generator
JP3724004B2 (ja) 1995-03-28 2005-12-07 東レ株式会社 熱硬化性組成物、その製造方法およびカラーフィルタ
JP3204359B2 (ja) 1995-04-28 2001-09-04 日本電信電話株式会社 フレキシブル高分子光導波路
JPH08327842A (ja) 1995-05-29 1996-12-13 Nippon Telegr & Teleph Corp <Ntt> 光導波路
JP3324360B2 (ja) * 1995-09-25 2002-09-17 信越化学工業株式会社 ポリシロキサン化合物及びポジ型レジスト材料
US5972516A (en) 1996-02-29 1999-10-26 Kyocera Corporation Method for manufacturing optical waveguide using siloxane polymer, and optoelectronic hybrid substrate using the optical waveguide
JPH10148729A (ja) 1996-11-21 1998-06-02 Nippon Telegr & Teleph Corp <Ntt> 高分子光導波路コア部のリッジ・パターン形成方法
US5991493A (en) 1996-12-13 1999-11-23 Corning Incorporated Optically transmissive bonding material
US6144795A (en) 1996-12-13 2000-11-07 Corning Incorporated Hybrid organic-inorganic planar optical waveguide device
JP3571482B2 (ja) 1997-03-13 2004-09-29 日本電信電話株式会社 口径変換用高分子光導波路パターン形成方法
US6054253A (en) 1997-10-10 2000-04-25 Mcgill University-The Royal Institute For The Advancement Of Learning Solvent-assisted lithographic process using photosensitive sol-gel derived glass for depositing ridge waveguides on silicon
JPH11352348A (ja) * 1998-06-05 1999-12-24 Nippon Telegr & Teleph Corp <Ntt> 光導波路型偏光子
US6087064A (en) 1998-09-03 2000-07-11 International Business Machines Corporation Silsesquioxane polymers, method of synthesis, photoresist composition, and multilayer lithographic method
JP3133039B2 (ja) 1998-10-05 2001-02-05 日本電信電話株式会社 光導波路用感光性組成物およびその製造方法および高分子光導波路パターン形成方法
JP3709088B2 (ja) * 1998-12-24 2005-10-19 京セラ株式会社 光導波路
US6187505B1 (en) 1999-02-02 2001-02-13 International Business Machines Corporation Radiation sensitive silicon-containing resists
US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom

Also Published As

Publication number Publication date
KR100831937B1 (ko) 2008-05-23
EP1251155B1 (de) 2006-01-11
DE60208628T2 (de) 2006-11-02
US6731857B2 (en) 2004-05-04
JP4557487B2 (ja) 2010-10-06
US20020172492A1 (en) 2002-11-21
TW593603B (en) 2004-06-21
EP1251155A1 (de) 2002-10-23
KR20020077168A (ko) 2002-10-11
JP2003048984A (ja) 2003-02-21
CN1277886C (zh) 2006-10-04
CN1399439A (zh) 2003-02-26

Similar Documents

Publication Publication Date Title
DE60208628D1 (de) Verfahren zur Herstellung optischer Lichtwellenleiter aus einer Silsesquioxanzusammensetzung
DE60127012D1 (de) Verfahren zur Herstellung einer photonischen Kristallstruktur
DE60230369D1 (de) Verfahren zur Herstellung einer optischen Wellenleitervorrichtung
DE60201869D1 (de) Verfahren zur Herstellung einer Struktur
DE60222329D1 (de) Verfahren zur Herstellung eines Lichtwellenleiters
DE60217982D1 (de) Verfahren zur Herstellung einer optischen Faser
DE60100449D1 (de) Verfahren zur Herstellung einer Photo-Orientierungsschicht
DE60212183D1 (de) Verfahren zur herstellung eines verbundes
DE60113574D1 (de) Verfahren zur Herstellung einer Halbleitervorrichtung
DE60118126D1 (de) Verfahren zur Herstellung einer Spiegelstruktur
DE60218802D1 (de) Verfahren zur Herstellung einer Vorrichtung
DE60203426D1 (de) Verfahren zur Herstellung einer Anzeigevorrichtung
DE60125870D1 (de) Verfahren zur herstellung einer meta-vollaromatischen polyamidfaser
DE50109017D1 (de) Verfahren zur herstellung einer elektronischen baugruppe
DE60031761D1 (de) Verfahren zur herstellung einer harzzusammensetzung
ATA20032001A (de) Verfahren zur herstellung einer wasserkraftanlage
DE60239472D1 (de) Verfahren zur herstellung einer anzeigeeinrichtung
ATE337284T1 (de) Verfahren zur herstellung einer in hohem grade linearen alkoholzusammensetzung
DE50206834D1 (de) Verfahren zur herstellung einer rohrfeder
DE60008348D1 (de) Verfahren zur Herstellung einer leitfähigen Faser
DE60130531D1 (de) Verfahren zur Herstellung eines Lichtwellenleiters
DE69911606D1 (de) Verfahren zur herstellung einer zusatzbrillenlinse
DE60230646D1 (de) Verfahren zur herstellung einer borsäureesterverbindung
DE60134220D1 (de) Verfahren zur herstellung einer heteroübergang-bicmos-integrierter schaltung
DE60116839D1 (de) Verfahren zur Herstellung einer Spiegelstruktur

Legal Events

Date Code Title Description
8364 No opposition during term of opposition