JP4557487B2 - ウェーブガイドおよび組成物 - Google Patents

ウェーブガイドおよび組成物 Download PDF

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Publication number
JP4557487B2
JP4557487B2 JP2002095177A JP2002095177A JP4557487B2 JP 4557487 B2 JP4557487 B2 JP 4557487B2 JP 2002095177 A JP2002095177 A JP 2002095177A JP 2002095177 A JP2002095177 A JP 2002095177A JP 4557487 B2 JP4557487 B2 JP 4557487B2
Authority
JP
Japan
Prior art keywords
present
hydroxyphenyl
optical waveguide
formula
silsesquioxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2002095177A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003048984A (ja
JP2003048984A5 (enExample
Inventor
ジェームズ・ジー・シェルナット
マシュー・エル・モイナイハン
ジョージ・ジー・バークレー
ダナ・エー・グロンベック
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Electronic Materials International LLC
Original Assignee
Rohm and Haas Electronic Materials LLC
DuPont Electronic Materials International LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm and Haas Electronic Materials LLC, DuPont Electronic Materials International LLC filed Critical Rohm and Haas Electronic Materials LLC
Publication of JP2003048984A publication Critical patent/JP2003048984A/ja
Publication of JP2003048984A5 publication Critical patent/JP2003048984A5/ja
Application granted granted Critical
Publication of JP4557487B2 publication Critical patent/JP4557487B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/04—Fibre optics, e.g. core and clad fibre compositions
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/04—Polysiloxanes
    • C08L83/06—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/13—Integrated optical circuits characterised by the manufacturing method
    • G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Physics & Mathematics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Optical Integrated Circuits (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
JP2002095177A 2001-03-29 2002-03-29 ウェーブガイドおよび組成物 Expired - Lifetime JP4557487B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
US09/821527 2001-03-29

Publications (3)

Publication Number Publication Date
JP2003048984A JP2003048984A (ja) 2003-02-21
JP2003048984A5 JP2003048984A5 (enExample) 2005-09-15
JP4557487B2 true JP4557487B2 (ja) 2010-10-06

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002095177A Expired - Lifetime JP4557487B2 (ja) 2001-03-29 2002-03-29 ウェーブガイドおよび組成物

Country Status (7)

Country Link
US (1) US6731857B2 (enExample)
EP (1) EP1251155B1 (enExample)
JP (1) JP4557487B2 (enExample)
KR (1) KR100831937B1 (enExample)
CN (1) CN1277886C (enExample)
DE (1) DE60208628T2 (enExample)
TW (1) TW593603B (enExample)

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US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
WO2003005616A2 (en) * 2001-07-06 2003-01-16 Viasystems Group, Inc. System and method for integrating optical layers in a pcb for inter-board communications
JP4557497B2 (ja) * 2002-03-03 2010-10-06 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． シランモノマー及びポリマーを製造する方法及びそれを含むフォトレジスト組成物
US6856745B2 (en) * 2002-07-02 2005-02-15 Lucent Technologies Inc. Waveguide and applications therefor
JP4014519B2 (ja) * 2002-07-17 2007-11-28 日東電工株式会社 ポリマー光導波路の製造方法
US6842577B2 (en) * 2002-12-02 2005-01-11 Shipley Company L.L.C. Photoimageable waveguide composition and waveguide formed therefrom
JP2004185000A (ja) * 2002-12-02 2004-07-02 Rohm & Haas Electronic Materials Llc 導波路を形成する方法及びそれから形成される導波路
JP2005092177A (ja) * 2003-09-12 2005-04-07 Rohm & Haas Electronic Materials Llc 光学部品形成方法
EP1672426A4 (en) * 2003-10-07 2010-02-24 Hitachi Chemical Co Ltd RADIATION-CURABLE COMPOSITION, METHOD OF STORING THE SAME, METHOD OF FORMING HARDENED FILM, PATTERN FORMING METHOD, PATTERN USING METHOD, ELECTRONIC COMPONENT, AND OPTICAL WAVEGUIDE
US7072564B2 (en) * 2003-11-25 2006-07-04 Rohm And Haas Electronic Materials Llc Waveguide compositions and waveguides formed therefrom
JP5102428B2 (ja) * 2003-11-25 2012-12-19 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 導波路組成物およびこれから形成された導波路
JP2005181958A (ja) * 2003-12-22 2005-07-07 Rohm & Haas Electronic Materials Llc レーザーアブレーションを用いる電子部品および光学部品の形成方法
US7906180B2 (en) * 2004-02-27 2011-03-15 Molecular Imprints, Inc. Composition for an etching mask comprising a silicon-containing material
DE602005001341T2 (de) * 2004-04-14 2008-02-21 Rohm and Haas Electronic Materials, L.L.C., Marlborough Zusammensetzungen für Wellenleiter und daraus hergestellte Wellenleiter
EP1772482B1 (en) * 2004-04-14 2009-06-17 Rohm and Haas Electronic Materials, L.L.C. Waveguide compositions and waveguides formed therefrom
US20050272179A1 (en) * 2004-05-24 2005-12-08 Andrew Frauenglass Three-dimensional lithographic fabrication technique
TWI294258B (en) * 2004-08-03 2008-03-01 Rohm & Haas Elect Mat Methods of forming devices having optical functionality
TW200623993A (en) * 2004-08-19 2006-07-01 Rohm & Haas Elect Mat Methods of forming printed circuit boards
US20060081557A1 (en) 2004-10-18 2006-04-20 Molecular Imprints, Inc. Low-k dielectric functional imprinting materials
DE602005011394D1 (de) * 2004-12-22 2009-01-15 Rohm & Haas Elect Mat Optische Trockenfilme und Verfahren zur Herstellung optischer Vorrichtungen mit Trockenfilmen
JP5243692B2 (ja) * 2004-12-22 2013-07-24 ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． 光学乾燥フィルム及び乾燥フィルムを有する光学デバイス形成方法
EP1674905B1 (en) 2004-12-22 2008-10-15 Rohm and Haas Electronic Materials, L.L.C. Methods of forming optical devices having polymeric layers
EP1851591A4 (en) * 2005-02-15 2010-09-01 Rpo Pty Ltd PHOTOLITHOGRAPHIC PATTERNING OF POLYMERIC MATERIALS
EP1693484A3 (en) * 2005-02-15 2007-06-20 Rohm and Haas Electronic Materials, L.L.C. Plating Method
US7212723B2 (en) * 2005-02-19 2007-05-01 The Regents Of The University Of Colorado Monolithic waveguide arrays
US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP5586820B2 (ja) * 2006-07-21 2014-09-10 東京応化工業株式会社 高屈折率材料
JP2008166798A (ja) 2006-12-31 2008-07-17 Rohm & Haas Electronic Materials Llc 光学的機能を有するプリント回路板の形成方法
US8415010B2 (en) * 2008-10-20 2013-04-09 Molecular Imprints, Inc. Nano-imprint lithography stack with enhanced adhesion between silicon-containing and non-silicon containing layers
CN114867794B (zh) * 2019-12-31 2023-10-27 株式会社东进世美肯 包含倍半硅氧烷低聚物的湿式涂布用防水涂层组合物

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JPS63279245A (ja) 1987-05-12 1988-11-16 Fujitsu Ltd ネガ型レジスト組成物
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Also Published As

Publication number Publication date
EP1251155A1 (en) 2002-10-23
DE60208628T2 (de) 2006-11-02
KR100831937B1 (ko) 2008-05-23
DE60208628D1 (de) 2006-04-06
EP1251155B1 (en) 2006-01-11
US6731857B2 (en) 2004-05-04
TW593603B (en) 2004-06-21
KR20020077168A (ko) 2002-10-11
CN1277886C (zh) 2006-10-04
JP2003048984A (ja) 2003-02-21
US20020172492A1 (en) 2002-11-21
CN1399439A (zh) 2003-02-26

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