JP2003048984A5 - - Google Patents

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Publication number
JP2003048984A5
JP2003048984A5 JP2002095177A JP2002095177A JP2003048984A5 JP 2003048984 A5 JP2003048984 A5 JP 2003048984A5 JP 2002095177 A JP2002095177 A JP 2002095177A JP 2002095177 A JP2002095177 A JP 2002095177A JP 2003048984 A5 JP2003048984 A5 JP 2003048984A5
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JP
Japan
Prior art keywords
hydroxyphenyl
alkyl
formula
monomer
silsesquioxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002095177A
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English (en)
Japanese (ja)
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JP4557487B2 (ja
JP2003048984A (ja
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Publication date
Priority claimed from US09/821,527 external-priority patent/US6731857B2/en
Application filed filed Critical
Publication of JP2003048984A publication Critical patent/JP2003048984A/ja
Publication of JP2003048984A5 publication Critical patent/JP2003048984A5/ja
Application granted granted Critical
Publication of JP4557487B2 publication Critical patent/JP4557487B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002095177A 2001-03-29 2002-03-29 ウェーブガイドおよび組成物 Expired - Lifetime JP4557487B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
US09/821527 2001-03-29

Publications (3)

Publication Number Publication Date
JP2003048984A JP2003048984A (ja) 2003-02-21
JP2003048984A5 true JP2003048984A5 (enExample) 2005-09-15
JP4557487B2 JP4557487B2 (ja) 2010-10-06

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002095177A Expired - Lifetime JP4557487B2 (ja) 2001-03-29 2002-03-29 ウェーブガイドおよび組成物

Country Status (7)

Country Link
US (1) US6731857B2 (enExample)
EP (1) EP1251155B1 (enExample)
JP (1) JP4557487B2 (enExample)
KR (1) KR100831937B1 (enExample)
CN (1) CN1277886C (enExample)
DE (1) DE60208628T2 (enExample)
TW (1) TW593603B (enExample)

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US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP5586820B2 (ja) * 2006-07-21 2014-09-10 東京応化工業株式会社 高屈折率材料
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CN114867794B (zh) * 2019-12-31 2023-10-27 株式会社东进世美肯 包含倍半硅氧烷低聚物的湿式涂布用防水涂层组合物

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