TW523831B - Semiconductor device and a process for designing a mask - Google Patents

Semiconductor device and a process for designing a mask Download PDF

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Publication number
TW523831B
TW523831B TW089110149A TW89110149A TW523831B TW 523831 B TW523831 B TW 523831B TW 089110149 A TW089110149 A TW 089110149A TW 89110149 A TW89110149 A TW 89110149A TW 523831 B TW523831 B TW 523831B
Authority
TW
Taiwan
Prior art keywords
simulation
polished
active
polishing
semiconductor device
Prior art date
Application number
TW089110149A
Other languages
English (en)
Chinese (zh)
Inventor
Edward O Travis
Aykut Dengi
Sejal Chheda
Tat-Kwan Yu
Mark S Roberton
Original Assignee
Motorola Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Motorola Inc filed Critical Motorola Inc
Application granted granted Critical
Publication of TW523831B publication Critical patent/TW523831B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00—Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass
    • H10P95/06—Planarisation of inorganic insulating materials
    • H10P95/062—Planarisation of inorganic insulating materials involving a dielectric removal step
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00—Grinding, lapping or polishing of wafers, substrates or parts of devices
    • H10P52/40—Chemomechanical polishing [CMP]
    • H10P52/403—Chemomechanical polishing [CMP] of conductive or resistive materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/926—Dummy metallization

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Design And Manufacture Of Integrated Circuits (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Semiconductor Memories (AREA)
TW089110149A 1999-06-29 2000-05-25 Semiconductor device and a process for designing a mask TW523831B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/340,697 US6396158B1 (en) 1999-06-29 1999-06-29 Semiconductor device and a process for designing a mask

Publications (1)

Publication Number Publication Date
TW523831B true TW523831B (en) 2003-03-11

Family

ID=23334550

Family Applications (1)

Application Number Title Priority Date Filing Date
TW089110149A TW523831B (en) 1999-06-29 2000-05-25 Semiconductor device and a process for designing a mask

Country Status (7)

Country Link
US (2) US6396158B1 (https=)
EP (1) EP1196948A2 (https=)
JP (2) JP5249483B2 (https=)
KR (1) KR100722177B1 (https=)
CN (1) CN1274013C (https=)
TW (1) TW523831B (https=)
WO (1) WO2001001469A2 (https=)

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Also Published As

Publication number Publication date
KR20020012298A (ko) 2002-02-15
WO2001001469A3 (en) 2001-12-27
JP2011228750A (ja) 2011-11-10
KR100722177B1 (ko) 2007-05-29
CN1365516A (zh) 2002-08-21
EP1196948A2 (en) 2002-04-17
CN1274013C (zh) 2006-09-06
US6593226B2 (en) 2003-07-15
US6396158B1 (en) 2002-05-28
JP2003503847A (ja) 2003-01-28
US20020050655A1 (en) 2002-05-02
WO2001001469A2 (en) 2001-01-04
JP5249483B2 (ja) 2013-07-31

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