TW521554B - Master flexible wiring plate, photomask for the exposure in photolithography process, manufacturing method of multilayer flexible wiring plate - Google Patents
Master flexible wiring plate, photomask for the exposure in photolithography process, manufacturing method of multilayer flexible wiring plate Download PDFInfo
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- TW521554B TW521554B TW090131013A TW90131013A TW521554B TW 521554 B TW521554 B TW 521554B TW 090131013 A TW090131013 A TW 090131013A TW 90131013 A TW90131013 A TW 90131013A TW 521554 B TW521554 B TW 521554B
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- flexible wiring
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- wiring board
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/002—Etching of the substrate by chemical or physical means by liquid chemical etching
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/0393—Flexible materials
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0137—Materials
- H05K2201/0166—Polymeric layer used for special processing, e.g. resist for etching insulating material or photoresist used as a mask during plasma etching
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0364—Conductor shape
- H05K2201/0367—Metallic bump or raised conductor not used as solder bump
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0703—Plating
- H05K2203/0733—Method for plating stud vias, i.e. massive vias formed by plating the bottom of a hole without plating on the walls
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/15—Position of the PCB during processing
- H05K2203/1545—Continuous processing, i.e. involving rolls moving a band-like or solid carrier along a continuous production path
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/4007—Surface contacts, e.g. bumps
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/423—Plated through-holes or plated via connections characterised by electroplating method
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4614—Manufacturing multilayer circuits by laminating two or more circuit boards the electrical connections between the circuit boards being made during lamination
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4626—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials
- H05K3/4635—Manufacturing multilayer circuits by laminating two or more circuit boards characterised by the insulating layers or materials laminating flexible circuit boards using additional insulating adhesive materials between the boards
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/901—Printed circuit
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
- Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
- Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Production Of Multi-Layered Print Wiring Board (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Description
521554 A7 ___ B7 ____ 五、發明說明(I ) [發明之詳細說明] [發明所屬之技術領域] 本發明係關於一種由例如聚醯亞胺所構成之撓性配線 板之製造方法,尤其係關於一種做多層撓性配線板積層的 技術。 [習知技術] 以往以來,已知有在具有可撓性之絕緣薄膜上讓銅箔 等之導體做積層並形成電路之撓性配線板。 在此種撓性配線板中,近年來伴隨電子元件之小型化 ,連接電極之細微間距化與多層化乃不斷地發展著。 .以往,在製造此種多層撓性配線板之際,係對於各層 之基板進行定位後形成配線圖案,然後將基板彼此貼合而 做積層。 [發明所欲解決之課題] 惟,在上述習知技術當中,於製造過程中因爲熱收縮 等之原因造成每一層基板之尺寸變化不同,在這種情況下 要將基板彼此做積層來取得電氣連接有其困難,此爲問題 所在。 又以目前之技術來說,要對每一層之基板控制其尺寸 .變化是困難的。 又,於各層基板中在形成電路圖案之際有時會使用薄 膜狀之曝光用光罩,在此種情況下,有時有曝光用光罩本 身之收縮也造成影響之問題。 本發明係用以解決上述習知技術的課題所得者,其目 3 ^紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) --------------------訂---------線 (請先閲讀背面之注意事項再填寫本頁) 521554 A7 ________B7_______ 五、發明說明(·>/ ) 的在於提供一種多層撓性配線板之製造方法,可將各層t 基板做高精度的對位而可讓各層之基板輕易地積層° [用以解決課題之手段] 爲了達成上述目的,申請專利範圍第1項之發明係— 種撓性配線板用原板,其特徵在於,具有:具可撓性 狀基材;以及,複數之配線圖案,係於前述基材上朝既$ 方向配置,與多層撓性配線板之各層的基板圖案相對應° 申請專利範圍第2項之發明,係於申請專利範圍第1 項之撓性配線板用原板中,讓各配線圖案相對於基材之搬 運方向配置於正交之方向。 .申請專利範圍第3項之發明,係一種於光飩刻製程中 所使用之曝光用光罩,具有:片狀之光罩本體;以及,複 數之圖案孔,其在前述光罩本體係配置於既定方向,與多 層撓性配線板之各層基板相對應。 申請專利範圍第4項之發明,係於申請專利範圍第3 項之曝光用光罩中,讓各圖案孔相對於光罩本體之搬運方 向配置於正交之方向。 申請專利範圍第5項之發明,係於申請專利範圍第3 項之曝光用光罩中,讓前述各圖案孔與配線圖案相對應。 申請專利範圍第6項之發明,係於申請專利範圍第4 項之曝光用光罩中,讓前述各圖案孔與配線圖案相對應。 申請專利範圍第7項之發明,係一種多層撓性配線板 之製造方法,其特徵在於,具有下述之製程:在片狀之光 罩本體方面使用曝光用光罩(與多層撓性配線板之各層基板 4 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公爱)~ -- (請先閱讀背面之注意事項再填寫本頁) --訂---------線 521554 A7 ______ _B7 _____ 五、發明說明(巧) 相對應的複數圖案孔配置於既定方向),而對於朝既定方向 搬運之光罩本體進行曝光。 申請專利範圍第8項之發明,係於申請專利範圍第7 項之多層撓性配線板之製造方法中,讓各圖案孔相對於光 罩本體之搬運方向配置於正交之方向。 申請專利範圍第9項之發明,係於申請專利範圍第7 項之多層撓性配線板之製造方法中,讓前述各圖案孔與配 線圖案相對應。 申請專利範圍第10項之發明,係於申請專利範圍第8 項之多層撓性配線板之製造方法中,讓前述各圖案孔與配 線麗案相對應。 [發明之實施形態] 以下參照圖式詳細地說明有關本發明之撓性配線板之 實施形態。 圖1(a)係顯示本實施形態之撓性配線板用原板之槪略 構成俯視圖,圖1(b)係圖1(a)之A— A線截面圖。 如圖1(a)所示,本實施形態之撓性配線板用原板1係 往箭頭方向被搬運,由輥子(未予圖示)所捲繞,於長方形 薄膜狀之基材2上,與未予圖示之多層撓性配線板之各層( .在本實施形態爲6層)之基板對應之複數的同一配線圖案3 係相對於基材2之搬運方向P在正交方向(寬方向)配置著 〇 如圖1(b)所示般,在本實施形態中,於基材2之一側 面係形成有配線圖案3,再者,於該配線圖案3之島部3a 5 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) (請先閱讀背面之注意事項再填寫本頁)
521554 A7 ______JB7__ 五、發明說明(+ ) 以外的部分上則積層有覆蓋薄膜7。 (請先閱讀背面之注意事項再填寫本頁) 再者,於本實施形態中,在基材2之搬運(長邊)方向 ,與各層之基板相對應之複數的配線圖案3係隔著既定之 間隔設於既定位置。 又,在基材2之另一面側則形成有與配線圖案3之各 島部3a相連接之凸塊11。 圖2(a)〜(g)與圖3(a)〜(g)係顯示有關本發明之撓性配線 板之製造方法之一例之製程圖。 如圖2(a)所示,首先,在例如銅(Cu)箔4上塗佈既定 厚度之聚醯胺酸2a,以既定溫度來加熱,藉以得到圖2(b) 所示之聚醯亞胺所構成之基材2。 其次,如圖2(c)所示般,在銅箔4之表面張貼感光性 之光阻薄膜(例如旭化成公司製造乾式薄膜光阻 SPG152)5a,進一步如圖2(d)所示般,使用圖4(a)、⑻所 示之曝光用光罩6來進行曝光。 此處,圖4(a)係顯示於本發明所使用之曝光用光罩之 一例的俯視圖,圖4(b)係圖4(a)之B—B線截面圖。 如圖4(a)、(b)所示般,本實施形態之曝光用光罩6係 薄膜狀之負型光罩,其與多層撓性配線板之各層的配線圖 .案3相對應之圖案孔6a係沿著與基材2之搬運方向P呈正 交之方向配置。 又,在本實施形態中,此種一群的圖案孔6a係隔著既 定之間隔在基材2之搬運方向P配置著既定數量。 使用此種曝光用光罩6進行曝光對光阻薄膜5a形成隱 6 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 521554 A7 ___ B7 五、發明說明(< ) 像之後,使用既定之顯像液(例如碳酸鈉)進行顯像來形成 圖2(e)所示般之光阻圖案5。 接著,使用既定之蝕刻液(例如氯化銅)進行蝕刻,如 圖2(e)、(f)所不般,將銅箔4之露出部分40去除。 接著,使用既定之溶液(例如氫氧化鈉)進行剝離處理 ,藉此,如圖2(g)所示般,將光阻圖案5去除。藉此,在 基材2上形成既定之配線圖案3。 之後,如圖3(a)所示般,於基材2與配線圖案3上張 貼與上述光阻薄膜5爲相同材料所構成之覆蓋薄膜7。 接著,如圖3(b)所示般,使用一具有與配線圖案3之 島部3a相對應之遮光部8a的曝光用光罩8,對覆蓋薄膜7 進行既定之曝光與顯像,藉此,如圖3(c)所示般,讓配線 圖案3之島部3a露出。 再者’如圖3(d)所示.般,於基板2之裏面側張貼感光 性之光阻薄膜10 ’使用與述島部3a對應之具有負型圖 案之孔9a之薄膜狀的曝光用光罩9來進行曝光。 接著,使用既定之顯像液(例如碳酸鈉)進行顯像,而 如圖3(e)所示般,於光阻薄膜10形成孔1〇a。 再者,藉由使用既定之鹼性蝕刻液(例如TMAH(氫氧 ‘化四甲銨))進行蝕刻,如圖3(f)所示般,在基材2形成通孔 2a ° 之後,例如進行電鍍,而如圖3(g)所示般,在基材2 之各通孔2a內塡充焊料並形成連接用凸塊u。 依據上述之本貫施形態,由於與多層撓性配線板之各 7 本紙張尺度國國家標準(CNS)A4規格(21〇 x 2一97公釐) 1 -- (請先閱讀背面之注意事項再填寫本頁) 訂i丨;------% 521554 A7 ___Β7____ 五、發明說明((7 ) (請先閱讀背面之注意事項再填寫本頁) 層基板相對應之複數的配線圖案3係配置在同一基材2上 ,所以幾乎沒有各層基板之基材2厚度等的差異,可使得 製造過程中各層基板之尺寸變化率相等。 其結果,依據本實施形態,由於可高精度定位出各層 基板之連接電極,乃可輕易地積層各層基板。 又,在本實施形態中,由於各配線圖案3相對於基材 2之搬運方向Ρ係配置在其正交方向上,所以尤能抑制因 製造批次不同所致之基材2厚度等之差異。 再者,依據本實施形態,由於可藉由一曝光用光罩6 來形成各層基板之配線等圖案,所以可將多層撓性配線板 之製造裝置的構成簡潔化。 依據上述本實施形態,可高效率地製造出積層容易之 多層撓性配線板用之各層基板。' 又,本發明並不限於上述實施形態,可進行各種的變 更。 例如,在上述實施形態中,雖於基材上配置形成同一 之配線圖案,惟本發明並不侷限於此,亦可配置形成每層 均不同之配線圖案。 又,在上述實施形態,係舉出基板爲6層之多層撓性 .配線板爲例子來說明,惟本發明並不侷限於此,可適用於 至少2層之各種的多層撓性配線板上。 再者’本發明在將基板彼此完全重合之情況固然適用 ’另外做部分重合之情況也能適用。 [發明之效果] 8 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐) 521554 A7 _B7____ 五、發明說明(9 ) 如上所述,依據本發明,可高精度地將多層撓性配線 板之各層基板加以定位,可輕易地進行積層。 又,依據本發明,由於可藉由一曝光用光罩來形成各 層基板之配線等之圖案,所以可將多層撓性配線板之製造 裝置之構成簡潔化。 [圖式之簡單說明] 圖1(a)係顯示有關本發明之撓性配線板用原板之一實 施形態之槪略構成俯視圖,圖1(b)係圖1(a)之A— A線截 面圖。 圖2(a)〜(g)係顯示有關本發明之撓性配線板之製造方 法之一例之製程圖(之一)。 圖3(a)〜(g)係顯示有關本發明之撓性配線板之製造方 法之一例之製程圖(之二)。 圖4(a)係顯示本發明所使用之曝光用光罩之一例之俯 視圖,圖4(b)係圖4(a)之B—B線截面圖。 [符號說明] (請先閱讀背面之注意事項再填寫本頁) 訂---- 1 撓性配線板用原板 2 基材 2a 通孔 3 配線圖案 3a 島部 4 覆蓋薄膜 6 曝光用光罩 9 本紙張尺度!^中關家$準(CNS)A4規格(21Q χ 297公爱) 521554 A7 _ B7 五、發明說明(Υ ) 6a 圖案孔 9 曝光用光罩 9a 孔 11 凸塊 (請先閱讀背面之注意事項再填寫本頁) 10 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
Claims (1)
- 521554 C8 _ D8 /、、申清專利範圍 L一種撓性配線板用原板,其特徵在於,具有: 具可撓性之片狀基材;以及 複數之配線圖案,係於前述基材上朝既定方向配置, 與多層撓性配線板之各層的基板圖案相對應。 2·如申請專利範圍第1項之撓性配線板用原板,其中 ’各配線圖案相對於基材之搬運方向係配置於正交之方向 〇 3.—種於光蝕刻製程中所使用之曝光用光罩,具有: 片狀之光罩本體;以及, ,複數之圖案孔,其在前述光罩本體係配置於既定方向 ’與多層撓性配線板之各層基板相對應。 4·如申請專利範圍第3項之曝光用光罩,其中,各圖 案孔相對於光罩本體之搬運方向係配置於正交之方向。 5·如申請專利範圍第.3項之曝光用光罩,其中,前述 各圖案孔係與配線圖案相對應。 6·如申請專利範圍第4項之曝光用光罩,其中,前述 各圖案孔係與配線圖案相對應。 7. —種多層撓性配線板之製造方法,其特徵在於,具 有下述之製程:在片狀之光罩本體方面使用曝光用光罩(與 多層撓性配線板之各層基板相對應的複數圖案孔配置於既 定方向),而對於朝既定方向搬運之光罩本體進行曝光。 8. 如申請專利範圍第7項之多層撓性配線板之製造方 法’其中’各圖案孔相對於光罩本體之搬運方向係配置於 正交之方向。 1 適用中國國家標準(CNS) A4規格(210 X 297公釐)〜 - (請先閲讀背面之注意事項再塡寫本頁) 、-& I, 521554 韶 C8 D8 六、申請專利範圍 9. 如申請專利範圍第7項之多層撓性配線板之製造方 法,其中,前述各圖案孔係與配線圖案相對應。 10. 如申請專利範圍第8項之多層撓性配線板之製造方 法,其中,前述各圖案孔係與配線圖案相對應。 (請先閲讀背面之注意事項再填寫本頁) 本紙張尺度適用中國國家標準(CNS)A4規格(210 X 297公釐)
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-
2000
- 2000-12-21 JP JP2000388816A patent/JP2002190674A/ja active Pending
-
2001
- 2001-12-14 TW TW090131013A patent/TW521554B/zh not_active IP Right Cessation
- 2001-12-15 CN CNB011454695A patent/CN100469216C/zh not_active Expired - Lifetime
- 2001-12-20 US US10/028,624 patent/US7211735B2/en not_active Expired - Lifetime
- 2001-12-20 KR KR1020010081614A patent/KR20020050720A/ko not_active Application Discontinuation
-
2007
- 2007-03-26 US US11/728,406 patent/US20070163111A1/en not_active Abandoned
- 2007-03-26 US US11/728,382 patent/US20070169958A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR20020050720A (ko) | 2002-06-27 |
JP2002190674A (ja) | 2002-07-05 |
US20020079134A1 (en) | 2002-06-27 |
US7211735B2 (en) | 2007-05-01 |
US20070169958A1 (en) | 2007-07-26 |
CN1366445A (zh) | 2002-08-28 |
CN100469216C (zh) | 2009-03-11 |
US20070163111A1 (en) | 2007-07-19 |
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