TW224077B - - Google Patents

Info

Publication number
TW224077B
TW224077B TW080103864A TW80103864A TW224077B TW 224077 B TW224077 B TW 224077B TW 080103864 A TW080103864 A TW 080103864A TW 80103864 A TW80103864 A TW 80103864A TW 224077 B TW224077 B TW 224077B
Authority
TW
Taiwan
Application number
TW080103864A
Other languages
Chinese (zh)
Original Assignee
Corning Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=24270461&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=TW224077(B) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Corning Inc filed Critical Corning Inc
Application granted granted Critical
Publication of TW224077B publication Critical patent/TW224077B/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
    • C03B19/1415—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/02—Pure silica glass, e.g. pure fused quartz
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
    • C03B2201/10—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with boron
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C03B2201/28—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with phosphorus
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/31—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with germanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/32—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with aluminium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/34—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with rare earth metals, i.e. with Sc, Y or lanthanides, e.g. for laser-amplifiers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
    • C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/50—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with alkali metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
    • C03B2201/54—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with beryllium, magnesium or alkaline earth metals
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/04—Multi-nested ports
    • C03B2207/06—Concentric circular ports
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/50—Multiple burner arrangements
    • C03B2207/52—Linear array of like burners
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Glass Compositions (AREA)
  • Silicon Compounds (AREA)
TW080103864A 1990-08-16 1991-05-17 TW224077B (show.php)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/568,230 US5043002A (en) 1990-08-16 1990-08-16 Method of making fused silica by decomposing siloxanes

Publications (1)

Publication Number Publication Date
TW224077B true TW224077B (show.php) 1994-05-21

Family

ID=24270461

Family Applications (1)

Application Number Title Priority Date Filing Date
TW080103864A TW224077B (show.php) 1990-08-16 1991-05-17

Country Status (6)

Country Link
US (2) US5043002A (show.php)
EP (1) EP0471139B1 (show.php)
JP (1) JP2683727B2 (show.php)
CA (1) CA2037102C (show.php)
DE (1) DE69123659T2 (show.php)
TW (1) TW224077B (show.php)

Families Citing this family (139)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5152819A (en) * 1990-08-16 1992-10-06 Corning Incorporated Method of making fused silica
US5231059A (en) * 1990-09-21 1993-07-27 Allied-Signal Inc. Process for preparing black glass using cyclosiloxane precursors
WO1994017003A1 (en) * 1990-09-21 1994-08-04 Allied-Signal Inc. Ceramic fiber reinforced silicon carboxide composite with adjustable dielectric properties
DE69222953D1 (de) * 1991-04-12 1997-12-04 Allied Signal Inc Schwarze glaskeramik hergestellt durch schnelle pyrolyse in sauerstoffhaltigen atmosphären
US5266533A (en) * 1991-04-12 1993-11-30 Allied-Signal Inc. Black glass ceramic from rapid pyrolysis in oxygen-containing atmospheres
JP2588447B2 (ja) * 1991-06-29 1997-03-05 信越石英株式会社 エキシマレーザー用石英ガラス部材の製造方法
US5154744A (en) * 1991-08-26 1992-10-13 Corning Incorporated Method of making titania-doped fused silica
CA2084461A1 (en) * 1991-12-06 1993-06-07 Hiroo Kanamori Method for fabricating an optical waveguide
US5296012A (en) * 1992-12-28 1994-03-22 Corning Incorporated Method of making optical waveguide preforms
US5332702A (en) * 1993-04-16 1994-07-26 Corning Incorporated Low sodium zircon refractory and fused silica process
GB9312634D0 (en) * 1993-06-18 1993-08-04 Tsl Group Plc Improvements in vitreous silica manufacture
US5356451A (en) * 1993-12-20 1994-10-18 Corning Incorporated Method and apparatus for vaporization of liquid reactants
US5599371A (en) * 1994-12-30 1997-02-04 Corning Incorporated Method of using precision burners for oxidizing halide-free, silicon-containing compounds
US5558687A (en) * 1994-12-30 1996-09-24 Corning Incorporated Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds
US5632797A (en) * 1994-12-30 1997-05-27 Corning Incorporated Method of providing vaporized halide-free, silicon-containing compounds
US5616159A (en) * 1995-04-14 1997-04-01 Corning Incorporated Method of forming high purity fused silica having high resistance to optical damage
EP0747327B2 (en) * 1995-06-07 2003-08-27 Corning Incorporated Method of thermally treating and consolidating silica preforms for reducing laser-induced optical damage in silica
JPH0967138A (ja) * 1995-06-22 1997-03-11 Toshiba Corp 半導体製造用石英及びその製造装置並びに製造方法
US5703191A (en) * 1995-09-01 1997-12-30 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
DE69634667T2 (de) * 1995-09-12 2006-04-27 Corning Inc. Boule-oszillationsmuster für die herstellung von geschmolzenem quarzglas
EP0850199B1 (en) * 1995-09-12 2005-12-28 Corning Incorporated Method and Furnace for the Production of Silica Glass containing less striae
EP0850201B1 (en) * 1995-09-12 2003-07-16 Corning Incorporated Containment vessel for producing fused silica glass
US5838866A (en) 1995-11-03 1998-11-17 Corning Incorporated Optical fiber resistant to hydrogen-induced attenuation
CN1052464C (zh) * 1995-11-03 2000-05-17 康宁股份有限公司 抗氢致衰减的光纤
US5879649A (en) * 1995-12-19 1999-03-09 Corning Incorporated Method for purifying polyalkylsiloxanes and the resulting products
US6312656B1 (en) 1995-12-19 2001-11-06 Corning Incorporated Method for forming silica by combustion of liquid reactants using oxygen
JP4089922B2 (ja) 1995-12-19 2008-05-28 コーニング インコーポレイテッド 液状反応物の燃焼により溶融シリカを作成する方法および装置
EP0780345A1 (en) * 1995-12-22 1997-06-25 Corning Incorporated Optical element for UV transmission
US5910371A (en) 1996-01-04 1999-06-08 Francel; Josef Composite glass article and method of manufacture
JP2000505036A (ja) * 1996-02-21 2000-04-25 コーニング インコーポレイテッド 純粋な溶融シリカ、炉および方法
JP2000506117A (ja) * 1996-03-05 2000-05-23 コーニング インコーポレイテッド 光学ガラスの初期透過率を増大させる方法
FR2759465B1 (fr) * 1996-04-30 1999-04-30 Corning Inc Procede de formation d'un circuit optique
US6309991B1 (en) * 1996-08-29 2001-10-30 Corning Incorporated Silica with low compaction under high energy irradiation
RU2175647C2 (ru) * 1996-08-29 2001-11-10 Корнинг Инкорпорейтед Линза установки шагового мультиплицирования, изготовленная из кварцевого стекла
JP2001502312A (ja) * 1996-10-08 2001-02-20 コーニング インコーポレイテッド シロキサン原料のゲル化を阻害する方法およびゲル化の阻害された原料
EP0888398A4 (en) * 1996-12-16 1999-09-29 Corning Inc PROCESS AND FILLER FOR FORMING GERMANIUM-DOPED SILICA
KR20000057597A (ko) * 1996-12-16 2000-09-25 알프레드 엘. 미첼슨 광파 광회로 장치용 유기금속
US6174509B1 (en) * 1997-02-11 2001-01-16 Corning Incorporated Pure fused silica, furnace and method
KR20000076000A (ko) 1997-03-07 2000-12-26 알프레드 엘. 미첼슨 티타니아-도핑 용융 실리카의 제조 방법
BR9808604A (pt) * 1997-04-18 2000-05-23 Corning Inc Processo para purificação de siloxano
BR9810379A (pt) * 1997-07-08 2000-09-05 Corning Inc Estoque de alimentação de cloreto de germânio e siloxano para formação de vidro de sìlica e processo
US5979185A (en) * 1997-07-16 1999-11-09 Corning Incorporated Method and apparatus for forming silica by combustion of liquid reactants using a heater
JP2001510136A (ja) * 1997-07-21 2001-07-31 コーニング インコーポレイテッド 低流量の原料蒸気の生成方法および装置
DE69841741D1 (de) * 1997-09-24 2010-08-05 Corning Inc VERFAHREN ZUR HERSTELLUNG VON GESCHMOLZENES SiO2-TiO2 GLAS
JPH11116247A (ja) * 1997-10-09 1999-04-27 Nikon Corp 合成石英ガラス製造方法
US6094940A (en) * 1997-10-09 2000-08-01 Nikon Corporation Manufacturing method of synthetic silica glass
EP1094990A1 (en) * 1998-04-22 2001-05-02 Corning Incorporated Methods for making ultra-low expansion silica-titania glasses
US6546757B1 (en) 1998-07-28 2003-04-15 Brown University Research Foundation Liquid spray pyrolysis method for the fabrication of optical fiber preforms, with reactant mixing
EP0978487A3 (en) 1998-08-07 2001-02-21 Corning Incorporated Sealed, nozzle-mix burners for silica deposition
ZA994171B (en) * 1998-08-07 2000-03-28 Corning Inc Method and apparatus for forming soot for the manufacture of glass.
US6260385B1 (en) 1998-08-07 2001-07-17 Corning Incorporated Method and burner for forming silica-containing soot
US6672106B1 (en) 1998-08-07 2004-01-06 Corning Incorporated Method and apparatus for forming soot for the manufacture of glass
US6574991B1 (en) * 1998-08-13 2003-06-10 Corning Incorporated Pure fused silica, furnace and method
US5970751A (en) * 1998-09-22 1999-10-26 Corning Incorporated Fused SiO2 -TiO2 glass method
EP1140715A4 (en) * 1998-09-22 2005-10-05 Corning Inc BURNER FOR THE PRODUCTION OF BALLS OF MELTED SILICATED GLASS
US6207522B1 (en) 1998-11-23 2001-03-27 Microcoating Technologies Formation of thin film capacitors
US6336347B1 (en) 1998-12-28 2002-01-08 Pirelli Cavi E Sistemi S.P.A. Process for producing silica by decomposition of an organosilane
EP1016635B1 (en) * 1998-12-28 2005-09-07 Pirelli & C. S.p.A. Process for producing silica by decomposition of an organosilane
US6242136B1 (en) 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6319634B1 (en) * 1999-03-12 2001-11-20 Corning Incorporated Projection lithography photomasks and methods of making
US6682859B2 (en) * 1999-02-12 2004-01-27 Corning Incorporated Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass
US6783898B2 (en) 1999-02-12 2004-08-31 Corning Incorporated Projection lithography photomask blanks, preforms and method of making
US6782716B2 (en) * 1999-02-12 2004-08-31 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6265115B1 (en) 1999-03-15 2001-07-24 Corning Incorporated Projection lithography photomask blanks, preforms and methods of making
US6649268B1 (en) * 1999-03-10 2003-11-18 Nikon Corporation Optical member made of silica glass, method for manufacturing silica glass, and reduction projection exposure apparatus using the optical member
NO310142B1 (no) * 1999-03-29 2001-05-28 Elkem Materials Fremgangsmåte for fremstilling av amorft silica fra silisium og fra silisiumholdige materialer
US6140546A (en) * 1999-06-04 2000-10-31 Phillips Petroleum Company Hydrocarbon dehydrocyclization process
US6931097B1 (en) 1999-07-22 2005-08-16 Corning Incorporated Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements
KR100647968B1 (ko) 1999-07-22 2006-11-17 코닝 인코포레이티드 극 자외선 소프트 ｘ-선 투사 리소그라피 방법 및 마스크디바이스
WO2001017919A1 (en) * 1999-09-10 2001-03-15 Corning Incorporated Pure fused silica, furnace and method
US6410192B1 (en) * 1999-11-15 2002-06-25 Corning Incorporated Photolithography method, photolithography mask blanks, and method of making
US6176588B1 (en) 1999-12-14 2001-01-23 Corning Incorporated Low cost light weight mirror blank
US6314766B1 (en) * 2000-01-19 2001-11-13 Corning Incorporated Apparatus for minimizing air infiltration in the production of fused silica glass
US6418756B1 (en) 2000-01-28 2002-07-16 Corning Incorporated Method of making planar waveguides using low flow rates of feedstock vapors from a gas and liquid mixture
US6598425B1 (en) * 2000-03-08 2003-07-29 Corning Incorporated Method for collecting soot
US20020005051A1 (en) * 2000-04-28 2002-01-17 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6403508B1 (en) 2000-05-31 2002-06-11 Corning Incorporated Fused silica with constant induced absorption
US6988378B1 (en) 2000-07-27 2006-01-24 Corning Incorporated Light weight porous structure
US6387511B1 (en) * 2000-07-27 2002-05-14 Corning Incorporated Light weight porous structure
US6378337B1 (en) * 2000-09-15 2002-04-30 Corning Incorporated Method for producing bulk fused silica
EP1328482A1 (en) * 2000-09-28 2003-07-23 Corning Incorporated Optical glass silica soot particles and method of making same
US6776006B2 (en) 2000-10-13 2004-08-17 Corning Incorporated Method to avoid striae in EUV lithography mirrors
DE60105191D1 (de) * 2000-12-19 2004-09-30 Pirelli & C Spa Abscheidungsbrenner mit mehreren flammen und verfahren zur herstellung von vorformen für optische fasern
KR20030069193A (ko) * 2000-12-21 2003-08-25 코닝 인코포레이티드 용융 실리카 제조 로용 내화물질
DE10065028A1 (de) * 2000-12-23 2002-07-18 Degussa Mit Kalium dotierte pyrogene Oxide
US20050120752A1 (en) * 2001-04-11 2005-06-09 Brown John T. Substantially dry, silica-containing soot, fused silica and optical fiber soot preforms, apparatus, methods and burners for manufacturing same
US6606883B2 (en) * 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
US8047023B2 (en) * 2001-04-27 2011-11-01 Corning Incorporated Method for producing titania-doped fused silica glass
US20020174684A1 (en) * 2001-05-23 2002-11-28 Danielson Paul S. Fused silica furnace and method
JP4165879B2 (ja) * 2001-05-30 2008-10-15 ピレリ・アンド・チ・ソチエタ・ペル・アツィオーニ 気相成長法によりガラス光ファイバ予成型品を製造する方法及び装置
US20030039865A1 (en) * 2001-06-20 2003-02-27 Isonics Corporation Isotopically engineered optical materials
JP4154563B2 (ja) * 2001-07-23 2008-09-24 信越化学工業株式会社 シリカ含有複合酸化物球状微粒子及びその製造方法
JP2003040627A (ja) * 2001-07-30 2003-02-13 Mitsubishi Electric Corp 石英系ガラス用原料及び石英系ガラスの製造方法
JP2005503316A (ja) * 2001-09-27 2005-02-03 コーニング インコーポレイテッド 石英ガラス生産のための改善された方法及び炉
US6763683B2 (en) 2001-10-23 2004-07-20 Corning Incorporated Method for pure, fused oxide
US8037717B2 (en) * 2001-10-26 2011-10-18 Corning Incorporated Methods and apparatus for pulsed doping or drying a soot preform
US20030104209A1 (en) * 2001-11-30 2003-06-05 Bellman Robert A. Precursor and method of growing doped glass films
US6832493B2 (en) * 2002-02-27 2004-12-21 Corning Incorporated High purity glass bodies formed by zero shrinkage casting
US20030159466A1 (en) * 2002-02-27 2003-08-28 Bowden Bradley F. Dry pressing of spray dried soot to make EUV components
US6829908B2 (en) * 2002-02-27 2004-12-14 Corning Incorporated Fabrication of inclusion free homogeneous glasses
DE10211958A1 (de) * 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
FI115134B (fi) * 2002-06-28 2005-03-15 Liekki Oy Menetelmä seostetun lasimateriaalin valmistamiseksi
US7572423B2 (en) 2002-11-26 2009-08-11 Cabot Corporation Fumed metal oxide particles and process for producing the same
AU2003284494A1 (en) * 2002-11-29 2004-06-23 Shin-Etsu Quartz Products Co., Ltd. Method for producing synthetic quartz glass and synthetic quartz glass article
DE10302914B4 (de) * 2003-01-24 2005-12-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
US7329377B2 (en) * 2004-03-12 2008-02-12 Massachusetts Institute Of Technology Cyclic shrinkage of a templated 3D network material
JP2006119379A (ja) * 2004-10-21 2006-05-11 Sumitomo Electric Ind Ltd 光導波路デバイスの製造方法、および光導波路デバイス
DE102006022303B4 (de) 2006-05-11 2009-06-18 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas mit vorgegebenem Hydroxylgruppengehalt
DE102006034885A1 (de) 2006-07-25 2008-08-07 Daimlerchrysler Ag Wasserstoff- und Energiegewinnung durch thermische Umsetzung von Silanen
US20080050076A1 (en) * 2006-08-23 2008-02-28 Ming-Jun Li Low loss photonic waveguide having high index contrast glass layers
US7799711B2 (en) * 2007-08-31 2010-09-21 Corning Incorporated Photomachinable glass compositions having tunable photosensitivity
JP5003503B2 (ja) * 2008-01-17 2012-08-15 三菱電機株式会社 石英系ガラスの製造方法および光デバイスの製造方法
US8414970B2 (en) * 2008-02-15 2013-04-09 Guardian Industries Corp. Organosiloxane inclusive precursors having ring and/or cage-like structures for use in combustion deposition
US8038971B2 (en) 2008-09-05 2011-10-18 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
US8729158B2 (en) 2008-09-05 2014-05-20 Cabot Corporation Fumed silica of controlled aggregate size and processes for manufacturing the same
GB2478307A (en) 2010-03-02 2011-09-07 Heraeus Quartz Uk Ltd Manufacture of silica glass
US8840858B2 (en) 2011-07-06 2014-09-23 Corning Incorporated Apparatus for mixing vaporized precursor and gas and method therefor
CN102320732A (zh) * 2011-08-25 2012-01-18 长飞光纤光缆有限公司 一种制备光纤预制棒的方法
CN103842303B (zh) 2011-09-29 2018-07-03 住友电气工业株式会社 玻璃微粒沉积体以及玻璃预制件的制造方法
DE102011119374A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119373A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas
DE102011119341A1 (de) 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von synthetischem Quarzglas nach der Sootmethode
DE102011119339A1 (de) * 2011-11-25 2013-05-29 Heraeus Quarzglas Gmbh & Co. Kg Zerstäubungsverfahren zur Herstellung von synthetischem Quarzglas
DE102011121190A1 (de) * 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS-Verdampfungsverfahren
TWI532815B (zh) * 2012-01-20 2016-05-11 先鋒材料科技股份有限公司 導熱、絕緣、耐燃及耐高溫之黏著劑及其組合物
DE102013202256B3 (de) * 2013-02-12 2014-07-17 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Titan-dotiertem synthetischen Quarzglas und dessen Verwendung
JP6236866B2 (ja) * 2013-05-15 2017-11-29 住友電気工業株式会社 ガラス微粒子堆積体の製造方法およびガラス微粒子堆積体製造用バーナー
DE102013209673B3 (de) 2013-05-24 2014-05-22 Heraeus Quarzglas Gmbh & Co. Kg Verfahren und Verdampfer zur Herstellung von synthetischem Quarzglas
DE102013110177A1 (de) 2013-09-16 2015-03-19 Heraeus Quarzglas Gmbh & Co. Kg Verfahren zur Herstellung von Eisen-dotiertem Kieselglas
EP3002262B1 (de) * 2014-10-01 2018-06-27 Heraeus Quarzglas GmbH & Co. KG Verfahren zur Herstellung von synthetischem Quarzglas mittels einer polymerisierbaren Polyalkylsiloxanverbindung
US11124442B2 (en) 2016-07-18 2021-09-21 Prysmian S.P.A. Method for manufacturing silicon dioxide preforms employed in the production of optical fibers
CN106277750A (zh) * 2016-08-19 2017-01-04 中国建筑材料科学研究总院 石英玻璃的制备方法
EP3309126A1 (de) * 2016-10-11 2018-04-18 Evonik Degussa GmbH Verfahren zur herstellung von siliciumtetrachlorid durch carbochlorierung
KR102242799B1 (ko) 2017-01-09 2021-04-21 에보니크 오퍼레이션즈 게엠베하 분무 열분해에 의해 금속 산화물을 제조하는 방법
CN106915898B (zh) * 2017-04-11 2019-07-23 湖北菲利华石英玻璃股份有限公司 一种大规格二氧化硅疏松体的生产方法
EP3424883A1 (de) 2017-07-05 2019-01-09 Evonik Degussa GmbH Sprühverdampfung eines flüssigen rohstoffes zur herstellung von siliciumdioxid und metalloxiden
EP3495321A1 (de) 2017-12-07 2019-06-12 Evonik Degussa GmbH Herstellung von pulverförmigen, porösen kristallinen metallsilikaten mittels flammensprühpyrolyse
EP3659964A1 (en) 2018-11-28 2020-06-03 Hysilabs, SAS Catalysed process of production of hydrogen from silylated derivatives as hydrogen carrier compounds
JP7428632B2 (ja) 2020-12-14 2024-02-06 信越化学工業株式会社 多孔質ガラス母材の製造方法及び製造装置

Family Cites Families (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2272342A (en) 1934-08-27 1942-02-10 Corning Glass Works Method of making a transparent article of silica
US2269059A (en) 1938-05-14 1942-01-06 Corning Glass Works Method of preparing finely comminuted oxides
BE438752A (show.php) 1939-04-22
US3117838A (en) 1957-08-02 1964-01-14 Int Standard Electric Corp Manufacture of silica
US3086851A (en) 1957-10-10 1963-04-23 Degussa Burner for production of finely divided oxides
US3303115A (en) * 1962-05-31 1967-02-07 Corning Glass Works Methods for forming materials of high purity by fusion
US3416890A (en) 1965-12-16 1968-12-17 Owens Illinois Inc Process of producing oxides of metals and metalloids
US3823995A (en) * 1972-03-30 1974-07-16 Corning Glass Works Method of forming light focusing fiber waveguide
US3826560A (en) 1972-03-30 1974-07-30 Corning Glass Works Method of forming a light focusing fiber waveguide
US3806224A (en) * 1972-10-06 1974-04-23 Bell Telephone Labor Inc Optical transmission line
CA967173A (en) 1973-01-04 1975-05-06 Peter C. Schultz Fused oxide type glasses
US3932162A (en) * 1974-06-21 1976-01-13 Corning Glass Works Method of making glass optical waveguide
JPS5156641A (ja) * 1974-11-13 1976-05-18 Sumitomo Electric Industries Hikaridensoyofuaibaano seizohoho
DE2546162B1 (de) 1975-10-15 1976-09-23 Jenaer Glaswerk Schott & Gen Lichtleitfaser mit Brechungsindexgradient zur Nachrichtenuebertragung
JPS5263213A (en) 1975-11-20 1977-05-25 Komatsu Denshi Kinzoku Kk Process for preparing highhpurity transparent silica glass products
JPS5423614A (en) * 1977-07-22 1979-02-22 Asahi Glass Co Ltd Method of forming metal oxide coating layer on glass sheet surface
US4156689A (en) 1978-02-13 1979-05-29 General Electric Company Purification of hydrosilanes and siloxanes
JPS54145642A (en) 1978-05-09 1979-11-14 Tokushiyu Muki Zairiyou Kenkiy Method of manufacturing heat resisting semiiinorganic compound
DE2909815C2 (de) * 1979-03-13 1984-11-22 Wacker-Chemie GmbH, 8000 München Verfahren zur Herstellung von hochdispersem Siliciumdioxid
GB2065633B (en) 1979-10-25 1984-03-21 Nippon Telegraph & Telephone Optical transmission fiber and process for producing the same
GB2083806B (en) * 1980-09-11 1984-08-08 Nippon Telegraph & Telephone Fabrication methods of doped silica glass and optical fibre preform by using the doped silica glass
JPS57170835A (en) * 1981-04-15 1982-10-21 Nippon Telegr & Teleph Corp <Ntt> Manufacture of single-mode optical fiber
JPS583981A (ja) * 1981-06-30 1983-01-10 Moai:Kk 鉄七宝製品の製造法
JPS58151318A (ja) 1982-02-26 1983-09-08 Shin Etsu Chem Co Ltd 合成シリカおよびこれを含有してなる電子部品封止用樹脂組成物
JPS58213638A (ja) * 1982-06-04 1983-12-12 Nippon Telegr & Teleph Corp <Ntt> 光学系ガラス製造法におけるド−プ方法
JPS59455A (ja) * 1982-06-23 1984-01-05 旭化成株式会社 壁パネル
SE446055B (sv) * 1982-07-01 1986-08-11 Landstingens Inkopscentral Ikontinensskydd eller bloja med vesentligen rektanguler form
JPS5911536A (ja) * 1982-07-10 1984-01-21 Victor Co Of Japan Ltd 情報信号の記録媒体
US4501602A (en) * 1982-09-15 1985-02-26 Corning Glass Works Process for making sintered glasses and ceramics
US4472510A (en) * 1982-12-23 1984-09-18 Dow Corning Corporation Carbon-containing monolithic glasses and ceramics prepared by a sol-gel process
JPS59207845A (ja) * 1983-05-10 1984-11-26 Fujikura Ltd 光フアイバ母材の製法
JPS603017A (ja) * 1983-06-17 1985-01-09 Ricoh Co Ltd カナ漢字変換処理装置
JPS6090836A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 合成石英の製造方法
JPS6090837A (ja) 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPS6090838A (ja) * 1983-10-25 1985-05-22 Shin Etsu Chem Co Ltd 光伝送用石英ガラス母材の製造方法
JPH0624987B2 (ja) * 1984-07-13 1994-04-06 旭硝子株式会社 多孔質石英ガラス母材合成用バーナ
US4689420A (en) 1985-11-19 1987-08-25 Dow Corning Corporation Process for preparation of cyclopolydiorganosiloxanes
US4810673A (en) 1986-09-18 1989-03-07 Texas Instruments Incorporated Oxide deposition method
JPH0791072B2 (ja) * 1987-06-15 1995-10-04 株式会社フジクラ 希土類元素ド−プガラスの製造方法
JPH01183421A (ja) 1988-01-19 1989-07-21 Shin Etsu Chem Co Ltd 石英ガラスの製造方法
JPH02145448A (ja) * 1988-11-25 1990-06-04 Furukawa Electric Co Ltd:The 光フアイバ母材の製造方法
GB8905966D0 (en) 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
JPH03198338A (ja) * 1989-12-27 1991-08-29 Handotai Process Kenkyusho:Kk 気相成長膜の形成方法および半導体装置
DE4026379A1 (de) * 1990-08-21 1992-02-27 Vaw Ver Aluminium Werke Ag Verfahren zur herstellung von schichtsilikaten des magadiit-typs

Also Published As

Publication number Publication date
US5043002A (en) 1991-08-27
DE69123659T2 (de) 1997-06-05
CA2037102C (en) 1997-10-21
AU7535591A (en) 1992-02-27
JPH04270130A (ja) 1992-09-25
EP0471139A3 (en) 1993-01-07
JP2683727B2 (ja) 1997-12-03
CA2037102A1 (en) 1992-02-17
EP0471139B1 (en) 1996-12-18
USRE39535E1 (en) 2007-04-03
DE69123659D1 (de) 1997-01-30
EP0471139A2 (en) 1992-02-19
AU633206B2 (en) 1993-01-21

Similar Documents

Publication Publication Date Title
DE4190992T (show.php)
DE4193093T (show.php)
DE4190468T (show.php)
DE4190020T (show.php)
DE4190152T (show.php)
EP0455376A3 (show.php)
DE4190940T (show.php)
DE4191772T (show.php)
DE4191630T (show.php)
DE4191620T (show.php)
DE4191484T (show.php)
DE4190942T1 (show.php)
DE4191827T (show.php)
EP0467312A3 (show.php)
AU632261B2 (show.php)
AU631347B2 (show.php)
ECSM90459U (show.php)
ECSM90474U (show.php)
ECSM90521U (show.php)
ECSM90506U (show.php)
ECSM90497U (show.php)
ECSM90404U (show.php)
ECSM90428U (show.php)
ECSM90432U (show.php)
JPH0491812U (show.php)