DE69841741D1 - VERFAHREN ZUR HERSTELLUNG VON GESCHMOLZENES SiO2-TiO2 GLAS - Google Patents
VERFAHREN ZUR HERSTELLUNG VON GESCHMOLZENES SiO2-TiO2 GLASInfo
- Publication number
- DE69841741D1 DE69841741D1 DE69841741T DE69841741T DE69841741D1 DE 69841741 D1 DE69841741 D1 DE 69841741D1 DE 69841741 T DE69841741 T DE 69841741T DE 69841741 T DE69841741 T DE 69841741T DE 69841741 D1 DE69841741 D1 DE 69841741D1
- Authority
- DE
- Germany
- Prior art keywords
- sio2
- melted
- preparing
- tio2 glass
- tio2
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/09—Other methods of shaping glass by fusing powdered glass in a shaping mould
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1415—Reactant delivery systems
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1476—Means for heating during or immediately prior to deposition
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/30—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi
- C03B2201/40—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn
- C03B2201/42—Doped silica-based glasses doped with metals, e.g. Ga, Sn, Sb, Pb or Bi doped with transition metals other than rare earth metals, e.g. Zr, Nb, Ta or Zn doped with titanium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
- C03B2207/32—Non-halide
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2207/00—Glass deposition burners
- C03B2207/50—Multiple burner arrangements
- C03B2207/52—Linear array of like burners
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Glass Melting And Manufacturing (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5985997P | 1997-09-24 | 1997-09-24 | |
PCT/US1998/018067 WO1999015468A1 (en) | 1997-09-24 | 1998-08-31 | FUSED SiO2-TiO2 GLASS METHOD |
Publications (1)
Publication Number | Publication Date |
---|---|
DE69841741D1 true DE69841741D1 (de) | 2010-08-05 |
Family
ID=22025746
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69841741T Expired - Lifetime DE69841741D1 (de) | 1997-09-24 | 1998-08-31 | VERFAHREN ZUR HERSTELLUNG VON GESCHMOLZENES SiO2-TiO2 GLAS |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1030822B1 (de) |
JP (1) | JP4108926B2 (de) |
KR (1) | KR100574123B1 (de) |
DE (1) | DE69841741D1 (de) |
WO (1) | WO1999015468A1 (de) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FI114548B (fi) * | 1999-10-19 | 2004-11-15 | Liekki Oy | Menetelmä materiaalin värjäämiseksi |
EP1283819A1 (de) * | 2000-05-25 | 2003-02-19 | Corning Incorporated | Verfahren zur herstellung einer vorform aus mit titandioxid dotiertem geschmolzenem siliciumdioxid |
US6988378B1 (en) | 2000-07-27 | 2006-01-24 | Corning Incorporated | Light weight porous structure |
US6387511B1 (en) | 2000-07-27 | 2002-05-14 | Corning Incorporated | Light weight porous structure |
US6776006B2 (en) * | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
JP2004516214A (ja) * | 2000-12-21 | 2004-06-03 | コーニング インコーポレイテッド | 溶融シリカ製造炉のための耐火物 |
US8047023B2 (en) | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
JP4792705B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造法 |
JP4792706B2 (ja) * | 2003-04-03 | 2011-10-12 | 旭硝子株式会社 | TiO2を含有するシリカガラスおよびその製造方法 |
JPWO2004092082A1 (ja) * | 2003-04-11 | 2006-07-06 | 株式会社ニコン | SiO2−TiO2系ガラスの製造方法、SiO2−TiO2系ガラス及び露光装置 |
TW200940472A (en) | 2007-12-27 | 2009-10-01 | Asahi Glass Co Ltd | TiO2-containing silica glass |
JPWO2012105513A1 (ja) | 2011-01-31 | 2014-07-03 | 旭硝子株式会社 | チタニアを含有するシリカガラス体の製造方法およびチタニアを含有するシリカガラス体 |
JP5992842B2 (ja) * | 2013-01-24 | 2016-09-14 | 信越石英株式会社 | シリカチタニアガラスの製造方法及びシリカチタニアガラスの選別方法 |
EP3002262B1 (de) | 2014-10-01 | 2018-06-27 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur Herstellung von synthetischem Quarzglas mittels einer polymerisierbaren Polyalkylsiloxanverbindung |
US10604437B2 (en) | 2014-10-20 | 2020-03-31 | Navus Automation, Inc. | Fused silica furnace system and method for continuous production of fused silica |
EP3034476A1 (de) | 2014-12-16 | 2016-06-22 | Heraeus Quarzglas GmbH & Co. KG | Verfahren zur herstellung von synthetischem quarzglas unter verwendung einer reinigungsvorrichtung |
EP3059212A1 (de) | 2015-02-18 | 2016-08-24 | Heraeus Quarzglas GmbH & Co. KG | Verfahren und vorrichtung zur herstellung von quarzglas aus einer polymerisierbaren polyalkylsiloxanverbindung mit membranfilter als reinigungsvorrichtung |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5043002A (en) * | 1990-08-16 | 1991-08-27 | Corning Incorporated | Method of making fused silica by decomposing siloxanes |
US5152819A (en) * | 1990-08-16 | 1992-10-06 | Corning Incorporated | Method of making fused silica |
US5154744A (en) * | 1991-08-26 | 1992-10-13 | Corning Incorporated | Method of making titania-doped fused silica |
US5332702A (en) * | 1993-04-16 | 1994-07-26 | Corning Incorporated | Low sodium zircon refractory and fused silica process |
US5558687A (en) * | 1994-12-30 | 1996-09-24 | Corning Incorporated | Vertical, packed-bed, film evaporator for halide-free, silicon-containing compounds |
US5632797A (en) * | 1994-12-30 | 1997-05-27 | Corning Incorporated | Method of providing vaporized halide-free, silicon-containing compounds |
JP2000505036A (ja) * | 1996-02-21 | 2000-04-25 | コーニング インコーポレイテッド | 純粋な溶融シリカ、炉および方法 |
-
1998
- 1998-08-31 JP JP2000512783A patent/JP4108926B2/ja not_active Expired - Lifetime
- 1998-08-31 EP EP98945813A patent/EP1030822B1/de not_active Expired - Lifetime
- 1998-08-31 KR KR1020007003139A patent/KR100574123B1/ko not_active IP Right Cessation
- 1998-08-31 DE DE69841741T patent/DE69841741D1/de not_active Expired - Lifetime
- 1998-08-31 WO PCT/US1998/018067 patent/WO1999015468A1/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
JP2001517597A (ja) | 2001-10-09 |
WO1999015468A1 (en) | 1999-04-01 |
EP1030822A1 (de) | 2000-08-30 |
JP4108926B2 (ja) | 2008-06-25 |
KR100574123B1 (ko) | 2006-04-25 |
EP1030822A4 (de) | 2004-12-15 |
KR20010024261A (ko) | 2001-03-26 |
EP1030822B1 (de) | 2010-06-23 |
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