TW202328290A - 聚醯亞胺樹脂、感光性樹脂組成物、硬化物、有機el顯示器、電子零件、及半導體裝置 - Google Patents

聚醯亞胺樹脂、感光性樹脂組成物、硬化物、有機el顯示器、電子零件、及半導體裝置 Download PDF

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Publication number
TW202328290A
TW202328290A TW111133315A TW111133315A TW202328290A TW 202328290 A TW202328290 A TW 202328290A TW 111133315 A TW111133315 A TW 111133315A TW 111133315 A TW111133315 A TW 111133315A TW 202328290 A TW202328290 A TW 202328290A
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TW
Taiwan
Prior art keywords
formula
polyimide resin
residues
diamine
represented
Prior art date
Application number
TW111133315A
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English (en)
Chinese (zh)
Inventor
佐伯昭典
石川曉宏
Original Assignee
日商東麗股份有限公司
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Publication date
Application filed by 日商東麗股份有限公司 filed Critical 日商東麗股份有限公司
Publication of TW202328290A publication Critical patent/TW202328290A/zh

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/44Polymerisation in the presence of compounding ingredients, e.g. plasticisers, dyestuffs, fillers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • C08G73/06Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
    • C08G73/10Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • C08G73/14Polyamide-imides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09FDISPLAYING; ADVERTISING; SIGNS; LABELS OR NAME-PLATES; SEALS
    • G09F9/00Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements
    • G09F9/30Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements in which the desired character or characters are formed by combining individual elements
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/12Light sources with substantially two-dimensional radiating surfaces
    • H05B33/22Light sources with substantially two-dimensional radiating surfaces characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Engineering & Computer Science (AREA)
  • Theoretical Computer Science (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
  • Electroluminescent Light Sources (AREA)
TW111133315A 2021-09-15 2022-09-02 聚醯亞胺樹脂、感光性樹脂組成物、硬化物、有機el顯示器、電子零件、及半導體裝置 TW202328290A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021149993 2021-09-15
JP2021-149993 2021-09-15

Publications (1)

Publication Number Publication Date
TW202328290A true TW202328290A (zh) 2023-07-16

Family

ID=85602131

Family Applications (1)

Application Number Title Priority Date Filing Date
TW111133315A TW202328290A (zh) 2021-09-15 2022-09-02 聚醯亞胺樹脂、感光性樹脂組成物、硬化物、有機el顯示器、電子零件、及半導體裝置

Country Status (4)

Country Link
KR (1) KR20240054961A (ja)
CN (1) CN117836352A (ja)
TW (1) TW202328290A (ja)
WO (1) WO2023042608A1 (ja)

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008081718A (ja) 2006-09-01 2008-04-10 Kaneka Corp ポリイミド樹脂粒子の製造方法
KR101167483B1 (ko) * 2006-12-15 2012-07-27 코오롱인더스트리 주식회사 무색투명한 폴리이미드 수지와 이를 이용한 액정 배향막 및필름
JP2008297231A (ja) * 2007-05-30 2008-12-11 Nippon Kayaku Co Ltd ヒドロキシアミド基含有脂環式ポリイミド及びその前駆体、並びにそれらを用いたポジ型感光性樹脂組成物、並びにそれらの硬化物
CN104054200B (zh) * 2012-01-31 2017-02-22 独立行政法人产业技术综合研究所 锂离子电池正极用树脂组合物
KR101827071B1 (ko) * 2013-04-04 2018-03-22 미쓰이 가가쿠 가부시키가이샤 폴리아마이드산 및 이것을 포함하는 바니쉬, 및 폴리이미드 필름
CN106795283B (zh) * 2014-09-02 2020-07-10 东丽株式会社 树脂及感光性树脂组合物
CN108779251B (zh) * 2016-04-25 2021-05-18 东丽株式会社 树脂组合物
KR102430152B1 (ko) * 2017-12-08 2022-08-08 주식회사 두산 폴리아믹산 용액, 이를 이용한 투명 폴리이미드 수지 필름 및 투명 기판
KR20200135312A (ko) 2018-03-23 2020-12-02 도레이 카부시키가이샤 경화막의 제조 방법 및 유기 el 디스플레이의 제조 방법

Also Published As

Publication number Publication date
WO2023042608A1 (ja) 2023-03-23
CN117836352A (zh) 2024-04-05
KR20240054961A (ko) 2024-04-26

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