TW202121554A - 搬運系統、檢查系統及檢查方法 - Google Patents
搬運系統、檢查系統及檢查方法 Download PDFInfo
- Publication number
- TW202121554A TW202121554A TW109116860A TW109116860A TW202121554A TW 202121554 A TW202121554 A TW 202121554A TW 109116860 A TW109116860 A TW 109116860A TW 109116860 A TW109116860 A TW 109116860A TW 202121554 A TW202121554 A TW 202121554A
- Authority
- TW
- Taiwan
- Prior art keywords
- inspection
- unit
- cassette
- housing
- mentioned
- Prior art date
Links
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/26—Testing of individual semiconductor devices
- G01R31/2642—Testing semiconductor operation lifetime or reliability, e.g. by accelerated life tests
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
- G01R31/2867—Handlers or transport devices, e.g. loaders, carriers, trays
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07314—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07342—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being at an angle other than perpendicular to test object, e.g. probe card
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2893—Handling, conveying or loading, e.g. belts, boats, vacuum fingers
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01S—RADIO DIRECTION-FINDING; RADIO NAVIGATION; DETERMINING DISTANCE OR VELOCITY BY USE OF RADIO WAVES; LOCATING OR PRESENCE-DETECTING BY USE OF THE REFLECTION OR RERADIATION OF RADIO WAVES; ANALOGOUS ARRANGEMENTS USING OTHER WAVES
- G01S19/00—Satellite radio beacon positioning systems; Determining position, velocity or attitude using signals transmitted by such systems
- G01S19/01—Satellite radio beacon positioning systems transmitting time-stamped messages, e.g. GPS [Global Positioning System], GLONASS [Global Orbiting Navigation Satellite System] or GALILEO
- G01S19/13—Receivers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67098—Apparatus for thermal treatment
- H01L21/67103—Apparatus for thermal treatment mainly by conduction
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67248—Temperature monitoring
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67276—Production flow monitoring, e.g. for increasing throughput
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67294—Apparatus for monitoring, sorting or marking using identification means, e.g. labels on substrates or labels on containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67724—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations by means of a cart or a vehicule
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/67727—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations using a general scheme of a conveying path within a factory
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67703—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
- H01L21/6773—Conveying cassettes, containers or carriers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67769—Storage means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2868—Complete testing stations; systems; procedures; software aspects
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Remote Sensing (AREA)
- Radar, Positioning & Navigation (AREA)
- Toxicology (AREA)
- Health & Medical Sciences (AREA)
- Computer Networks & Wireless Communication (AREA)
- Automation & Control Theory (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Abstract
本揭示之一態樣所致的搬運系統係具備收容複數構造體而能對檢查單元供給上述構造體之移動式的卡匣單元的搬運系統,上述構造體具有形成複數裝置之基板,和包含與上述複數裝置之電極電性接觸之接觸部的配線構件。
Description
本揭示係關於搬運系統、檢查系統及檢查方法。
已知有可以在共用的搬運機械手臂或移動台對被配置在檢查室內之複數檢查單元之中之一個進行基板之搬運之期間,以其他檢查單元對另外的基板進行檢查的檢查裝置(例如,參照專利文獻1)。
[先前技術文獻]
[專利文獻]
[專利文獻1]日本特開2016-46285號公報
[發明所欲解決之課題]
本揭示係提供可以提升檢查單元之運轉率的技術。
[用以解決課題之手段]
本揭示之一態樣所致的搬運系統係具備收容複數構造體而能對檢查單元供給上述構造體之移動式的卡匣單元的搬運系統,上述構造體具有形成複數裝置之基板,和包含與上述複數裝置之電極電性接觸之接觸部的配線構件。
[發明之效果]
若藉由本揭示時,可以提升檢查單元之運轉率。
以下,一面參照圖面,一面針對本發明之非限定的例示之實施型態予以說明。在附件的所有圖面中,針對相同或對應的構件或零件,標示相同或對應的參照符號,省略重複說明。
[第1實施型態]
針對第1實施型態之檢查系統予以說明。檢查系統係對被形成在被檢查體之複數被檢查裝置(DUT:Device Under Test)供給電訊號而檢查裝置之各種電特性的系統。被檢查體係例如半導體晶圓(以下,稱為「晶圓」)等的基板。
圖1為表示第1實施型態之檢查系統之一例的圖。 如圖1所示般,檢查系統1具備複數檢查單元100、搬運系統200和管理裝置300。
複數檢查單元100係在相同平面內,被排列配置在左右方向(圖1之X方向)及前後方向(圖1之Y方向)。各檢查單元100具有複數檢查裝置110和冷卻器120。
各檢查裝置110係接收藉由後述卡匣單元220被搬運的殼體10,檢查被形成在晶圓11之各DUT的電特性。
圖2為表示殼體10之一例的圖。如圖2所示般,殼體10係具有晶圓11、探針卡12和框體13的構造體。但是,即使殼體10不具有框體13亦可。在晶圓11之表面形成複數DUT。探針卡12係配線構件之一例,具有基部12a和複數探針12b。基部12a係在上面具有複數端子(無圖示)的板狀構件。複數探針12b係接觸部之一例,被設置在基部12a之下面,成為與被形成在晶圓11之DUT接觸。框體13收容晶圓11和探針卡12。
圖3為表示測試器之一例的圖。如圖3所示般,各檢查裝置110具有平台111、測試器112和中間連接構件113。
平台111係載置藉由卡匣單元220被搬運的殼體10。平台111被構成藉由升降機構(無圖示),在與卡匣單元220之間進行殼體10之收授的位置(圖3所示的高度位置),和使殼體10接觸於中間連接構件113而進行檢查之位置之間能夠升降。在平台111,設置真空夾具、靜電夾具等之晶圓保持部(無圖示),被構成可以在平台111之上面載置殼體10之狀態下吸附殼體10。再者,在平台111設置加熱器、熱媒流路等之溫度調整部(無圖示),被構成可以在平台111之上面載置殼體10之狀態下調整晶圓11之溫度。
測試器112具有測試器主機板112a,和複數檢査電路板112b,和框體112c。測試器主機板112a被設置成水平,在底部設置有複數端子(無圖示)。複數檢査電路板112b係以豎立狀態被安裝於測試器主機板112a之槽孔。框體112c收容檢查電路板112b。
中間連接構件113係用以電性連接測試器112和探針卡12的構件,具有彈性框113a,和彈針塊113b。
彈性框113a係由高強度且剛性高,熱膨脹係數小的材料,例如NiFe合金構成。彈性框113a具有在厚度方向(Z方向)貫通的複數長方形的插嵌孔,在該插嵌孔內被插嵌彈針塊113b。
彈針塊113b被定位於彈性框113a,連接在測試器112之測試器主機板112a之端子,和探針卡12中的基部12a之端子。
在測試器主機板112a和彈性框113a之間,設置密封構件114。藉由測試器主機板112a和中間連接構件113之間的空間被抽真空,測試器主機板112a隔著密封構件114被吸附於中間連接構件113。再者,在彈性框113a和探針卡12之間也設置密封構件(無圖示)。藉由中間連接構件113和探針卡12之間的空間被抽真空,探針卡12隔著密封構件被吸附於中間連接構件113。
在上述說明的各檢查裝置110中,首先,在殼體10被吸附於各檢查裝置110之平台111之狀態下藉由定位銷(無圖示)被定位。依此,探針卡12之上面之複數端子經由中間連接構件113與測試器主機板112a之底部之複數端子電性連接。而且,被形成在晶圓11之DUT之電特性檢查係經由探針卡12而藉由測試器112被進行。
冷卻器120係藉由被設置在複數檢查裝置110之平台111的熱媒流路供給冷卻水等之冷媒,冷卻平台111。在圖1之例中,冷卻器120對4個檢查裝置110設置一個。但是,即使冷卻器120被設置在每個檢查裝置110亦可。
搬運系統200具有複數裝載單元210,和複數卡匣單元220。
複數裝載單元210係在相同平面內,於前後方向(圖1之Y方向)排列而被配置。各裝載單元210具有FOUP儲藏器211、探針卡儲藏器212、針研磨部213、殼體儲藏器214、裝卸部215和搬運部216。
FOUP儲藏器211係保管收容複數晶圓11之搬運容器(FOUP:Front Opening Unified Pod)的區域。在FOUP儲藏器211設置保管例如FOUP之複數保管棚架。在FOUP儲藏器211從檢查系統1之外部被搬入FOUP。成為FOUP儲存器211可以藉由後述搬運部216之搬運裝置216a而存取。
探針卡儲藏器212係保管複數探針卡12的區域。在探針卡儲藏器212設置保管例如探針卡12之複數保管棚架。在探針卡儲藏器212從檢查系統1之外部被搬入探針卡12。成為探針卡儲存器212可以藉由後述搬運部216之搬運裝置216a而存取。
針研磨部213係研磨探針卡12之探針12b之前端,修復附著塵埃等之探針12b的區域。在針研磨部213設置用以研磨例如探針12b之前端的針研磨盤。成為針研磨部213可以藉由後述搬運部216之搬運裝置216a而存取。
殼體儲藏器214係保管複數殼體10的區域。在殼體儲藏器214設置保管例如殼體10之複數保管棚架。在殼體儲藏器214保管在裝卸部215形成的殼體10及在檢查單元100完成檢查的殼體10。成為探針卡儲存器214可以藉由後述搬運部216之搬運裝置216a及卡匣單元220而存取。
裝卸部215係形成晶圓11和探針卡12成為一體的殼體10,並且將殼體10分離成晶圓11和探針卡12的區域。在裝卸部215中,在使晶圓11吸附保持於對準器(無圖示)之狀態進行位置對準,使與探針卡12對應的探針12b接觸於複數DUT之電極之各者後,收容在框體13內。再者,在裝卸部215中,使作為殼體10而成為一體的晶圓11和探針卡12予以分離。成為裝卸部215可以藉由後述搬運部216之搬運裝置216a而存取。
搬運部216係在各區域間搬運殼體10、晶圓11及探針卡12的區域。在搬運部216設置搬運裝置216a。搬運裝置216a係保持殼體10、晶圓11及探針卡12而在各區域間搬運。例如,搬運裝置216a係在裝卸部215和殼體儲藏器214之間搬運殼體10。再者,搬運裝置216a係在FOUP儲藏器211和裝卸部215之間搬運晶圓11。再者,搬運裝置216a係在探針儲藏器212和針研磨部213和裝卸部215之間搬運探針卡12。
複數卡匣單元220係分別收容複數殼體10而對複數檢查單元100供給殼體10的移動式之單元。在圖1之例中,卡匣單元220係自動搬運車(AGV:Automated Guided Vehicle)。卡匣單元220係沿著例如鋪設於地板的磁帶等之感應線225而自走。
圖4為表示卡匣單元220之一例的圖。如圖4所示般,卡匣單元220具有收容部221、收授部222、驅動部223和調溫部224。
收容部221收容複數殼體10。收容部221包含例如複數載置台221a,在各載置台221a上載置殼體10。
收授部222係在收容部221和複數檢查單元100之間進行殼體10之收授。收授部222包含例如多關節臂等之搬運機器人(無圖示)。搬運機器人係在收容部221和殼體儲藏器214之間收授殼體10之位置,保持殼體10而將殼體10從一方移載至另一方。再者,搬運機器人係在收容部221和檢查單元100之間收授殼體10之位置,保持殼體10而將殼體10從一方移載至另一方。
驅動部223係使卡匣單元220驅動。驅動部223包含使例如行走用之車輪、車輪或搬運機器人的馬達、使馬達驅動的電池。再者,即使驅動部223以能夠進行例如非接觸供電或軌道所致的供電之方式,包含受電部亦可。
調溫部224調整被收容在收容部221之殼體10之溫度。即使調溫部224係調整收容部221之一部分的區域,例如僅有殼體10之溫度的機構亦可,即使為調整收容部221內之全體溫度的恆溫槽亦可。在圖4之例中,調溫部224包含被埋入至設置在例如收容部221之載置台221a的加熱器224a。但是,即使調溫部224包含被埋入至載置台221a之加熱器224a以外之加熱裝置亦可,即使包含被形成於載置台221a之內部的熱媒流路和使熱媒體在該熱媒流路循環的冷卻器等亦可。
管理裝置300係根據藉由測位裝置被測量的複數卡匣單元220之位置資訊,控制複數卡匣單元220之動作。例如,管理裝置300係根據藉由測位裝置被測量的複數卡匣單元220之位置資訊,決定使哪一個卡匣單元220朝向檢查裝置110。作為一例,使位於最接近於對象之檢查裝置110的卡匣單元220朝向檢查裝置110。再者,管理裝置300係針對決定的卡匣單元220算出搬運殼體10之時的最佳路徑,以該最佳路徑使卡匣單元220動作。再者,即使管理裝置300取得被收容在各卡匣單元220之收容部221的殼體10的數量,根據所取得的殼體10之數量,控制複數卡匣單元220之動作亦可。作為一例,使所取得的殼體10之數量多的卡匣單元220優先動作。
若測位裝置測量複數卡匣單元220之各者的位置資訊即可,不限定於其種類。作為測位裝置,即使為被複數設置在例如感應線225上,能檢測卡匣單元220通過的位置檢測感測器亦可。再者,作為測位裝置,即使為被搭載於例如各卡匣單元220,接收來自以GPS為代表的GNSS(Global Navigation Satellite System)衛星之測位訊號,取得卡匣單元220之位置資訊的GNSS接收機亦可。
如上述說明般,在第1實施型態中,具備複數檢查單元100、收容複數殼體10而能對複數檢查單元100供給殼體10的移動式卡匣單元220。依此,因可以對複數檢查單元100同時搬運殼體10,故可以縮短對檢查單元100搬運殼體10(晶圓)所需的時間。其結果,可以縮短檢查單元100之待機時間,並可以提升檢查單元100之運轉率。
再者,在第1實施型態中,具有卡匣單元220收容殼體10之收容部221,和調整被收容於收容部221之殼體10之溫度的調溫部224。依此,在檢查單元100中,以與室溫不同的溫度進行檢查之情況,可以在藉由卡匣單元220搬運殼體10之期間,藉由調溫部224調整晶圓之溫度。因此,可以縮短在檢查單元100調整晶圓之溫度所需的時間。其結果,可以縮短殼體10被搬運至檢查單元100後至開始晶圓之檢查的時間。
再者,在第1實施型態中,設置複數在裝載單元210和檢查單元100之間搬運殼體10的卡匣單元220。依此,因假設在一台卡匣單元220故障之情況,亦可以藉由另外的卡匣單元220來補救,故不需要隨著卡匣單元220之故障而停止檢查單元100。
再者,在第1實施型態中,在使探針卡12之探針12b電性地接觸於被形成在晶圓11之複數DUT之電極的狀態下,藉由卡匣單元220,使晶圓11和探針卡12成為一體而搬運至檢查單元100。依此,在檢查單元100中,不需要晶圓11和探針卡12之定位。因此,因不需要在每個檢查單元100設置對準器,故檢查單元100之構造變得簡單。另外,在檢查單元100中,雖然進行探針卡12和測試器112之定位,但是因彼此電極間的間隔比起探針12b間之間隔大很多,故比起晶圓11和探針卡12之定位,該定位不要求高精度。因此,可以使用例如定位銷進行定位。作為定位精度之要求規格的一例,在晶圓11和探針卡12之定位中為μm等級,對此在探針卡12和測試器112之定位中為mm等級。
接著,針對使用第1實施型態之檢查系統的檢查方法之一例,參照圖1~圖4予以說明。
首先,藉由搬運裝置216a,將被保管於FOUP儲藏器211之FOUP內之晶圓11搬運至裝卸部215。再者,藉由搬運裝置216a將被保管於探針卡儲藏器212之探針卡12搬運至裝卸部215。
接著,在裝卸部215中,於被形成在晶圓11上之複數DUT的電極,接觸與該電極對應而設置的探針卡12之探針12b,形成組裝晶圓11和探針卡12的殼體10。
接著,藉由搬運裝置216a,將在裝卸部215被形成的殼體10搬運至殼體儲藏器214。
接著,藉由卡匣單元220之收授部222,接收被保管於殼體儲藏器214之殼體10,載置於收容部221之載置台221a上。再者,以殼體10之溫度成為與檢查單元100中之檢查溫度略相同之方式,藉由加熱器224a加熱載置台221a。
接著,藉由卡匣單元220將被載置於載置台221a之殼體10供給至特定的檢查單元100。具體而言,於卡匣單元220移動至特定的檢查單元100之前面後,藉由卡匣單元220之收授部222,將被載置於載置台221a之殼體10供給至檢查單元100之檢查裝置110。
接著,在檢查裝置110中,進行被形成在殼體10所含的晶圓11的複數DUT之檢查。
接著,藉由卡匣單元220,將在檢查單元100之檢查裝置110中完成檢查的殼體10搬運至殼體儲藏器214。
接著,藉由搬運裝置216a將被保管於殼體儲藏器214之殼體10搬運至裝卸部215。
接著,在裝卸部215中,將殼體10分離成晶圓11和探針卡12。
接著,藉由搬運裝置216a,將在裝卸部215被分離的晶圓11及探針卡12搬運至分別被保管於FOUP儲藏器211的FOUP內及探針卡儲藏器212。
藉由上述,被形成在一片晶圓11的複數DUT之電特性的檢查結束。
[第2實施型態]
針對第2實施型態之檢查系統予以說明。
圖5為表示第2實施型態之檢查系統之一例的圖。如圖5所示般,第2實施型態之檢查系統1A以具有擁有裝載埠217的裝載單元210A,以取代FOUP儲藏器211及探針卡儲藏器212之點,與第1實施型態之檢查系統1不同。另外,針對其他之點,因與第1實施型態之檢查系統1相同,故以下,以不同之點為中心予以說明。
檢查系統1A具備複數檢查單元100、搬運系統200A和管理裝置300。
搬運系統200A具有複數裝載單元210A、複數卡匣單元220、FOUP儲藏器230、探針卡儲藏器240和搬運單元250。
複數裝載單元210A係在相同平面內,於前後方向(圖5之Y方向)排列而被配置。各裝載單元210A具有針研磨部213、殼體儲藏器214、裝卸部215、搬運部216和裝載埠217。
針研磨部213、殼體儲藏器214、裝卸部215及搬運部216與第1實施型態相同。
裝載埠217係承接收容複數晶圓11之FOUP及探針卡12的區域。成為裝載埠217可以藉由後述搬運單元250而存取。在裝載埠217,藉由搬運單元250,FOUP及探針卡12從被設置在裝載單元210A之外部的FOUP儲藏器230及探針卡儲藏器240被搬入。
FOUP儲藏器230保管收容複數晶圓11之FOUP。在FOUP儲藏器230設置保管例如FOUP之複數保管棚架。成為FOUP儲藏器230可以藉由後述搬運單元250而存取。
探針卡儲藏器240係保管複數探針卡12。在探針卡儲藏器240設置保管例如探針卡12之複數保管棚架。成為探針卡儲藏器240可以藉由後述搬運單元250而存取。
搬運單元250係對裝載單元210A供給FOUP及探針卡12的移動式之單元。在圖5之例中,搬運單元250為AGV。搬運單元250係沿著例如鋪設於地板的磁帶等之感應線251而自走。
如上述說明般,在第2實施型態中,具備複數檢查單元100、收容複數殼體10而能對複數檢查單元100供給殼體10的移動式卡匣單元220。依此,因可以對複數檢查單元100同時搬運殼體10,故可以縮短對檢查單元100搬運殼體10(晶圓)所需的時間。其結果,可以縮短檢查單元100之待機時間,並可以提升檢查單元100之運轉率。
再者,在第2實施型態中,具有卡匣單元220收容殼體10之收容部221,和調整被收容於收容部221之殼體10之溫度的調溫部224。依此,在檢查單元100中,以與室溫不同的溫度進行檢查之情況,可以在藉由卡匣單元220搬運殼體10之期間,藉由調溫部224調整晶圓之溫度。因此,可以縮短在檢查單元100調整晶圓之溫度所需的時間。其結果,可以縮短殼體10被搬運至檢查單元100後至開始晶圓之檢查的時間。
再者,在第2實施型態中,設置複數在裝載單元210A和檢查單元100之間搬運殼體10的卡匣單元220。依此,因假設在一台卡匣單元220故障之情況,亦可以藉由另外的卡匣單元220來補救,故不需要隨著卡匣單元220之故障而停止檢查單元100。
再者,在第2實施型態中,在使探針卡12之探針12b電性地接觸於被形成在晶圓11之複數DUT之電極的狀態下,藉由卡匣單元220,使晶圓11和探針卡12成為一體而搬運至檢查單元100。依此,在檢查單元100中,不需要晶圓11和探針卡12之定位。因此,因不需要在每個檢查單元100設置對準器,故檢查單元100之構造變得簡單。另外,在檢查單元100中,雖然進行探針卡12和測試器112之定位,但是因彼此電極間的間隔比起探針12b間之間隔大很多,故比起晶圓11和探針卡12之定位,該定位不要求高精度。因此,可以使用例如定位銷進行定位。作為定位精度之要求規格的一例,在晶圓11和探針卡12之定位中為μm等級,對此在探針卡12和測試器112之定位中為mm等級。
並且,此次所揭示之實施型態所有方面都應視為例示性而非限制性。上述實施型態即使在不脫離附件的申請專利範圍及其要旨,以各種型態進行省略、置換、變更亦可。
本國際申請係根據2019年5月28日申請的日本國專利申請號2019-099727號而主張優先權,本國際申請援用該申請案之全內容。
1,1A:檢查系統
10:殼體
11:晶圓
12:探針卡
100:檢查單元
200:搬運系統
220:卡匣單元
221:收容部
221a:載置台
222:收授部
223:驅動部
224:調溫部
300:管理裝置
[圖1]為表示第1實施型態之檢查系統之構成例的圖。
[圖2]為表示殼體之一例的圖。
[圖3]為表示測試器之一例的圖。
[圖4]為表示卡匣單元之一例的圖。
[圖5]為表示第2實施型態之檢查系統之構成例的圖。
10:殼體
11:晶圓
12:探針卡
12a:基部
12b:探針
13:框體
Claims (10)
- 一種搬運系統,係具備收容複數構造體而能對檢查單元供給上述構造體之移動式的卡匣單元的搬運系統, 上述構造體具有: 形成複數裝置之基板,和 包含與上述複數裝置之電極電性接觸之接觸部的配線構件。
- 如請求項1之搬運系統,其中 上述卡匣單元具有: 收容上述構造體的收容部;和 在上述收容部和上述檢查單元之間進行上述構造體之收授的收授部;及 使上述卡匣單元驅動的驅動部。
- 如請求項2之搬運系統,其中 上述卡匣單元具有調整被收容在上述收容部的上述構造體之溫度的調溫部。
- 如請求項1至3中之任一項之搬運系統,其中 上述卡匣單元為自動搬運車。
- 如請求項1至4中之任一項之搬運系統,其中 上述配線構件係具有使接觸於上述複數裝置之電極的探針的探針卡。
- 如請求項1至5中之任一項之搬運系統,其中 上述卡匣單元被設置複數。
- 如請求項6之搬運系統,其中 進一步具備測量上述複數卡匣單元之各者之位置的測位裝置。
- 如請求項7之搬運系統,其中 進一步具備根據上述測位裝置所測量的上述複數卡匣單元之位置資訊,控制上述卡匣單元之動作的管理裝置。
- 一種檢查系統,具備: 複數檢查單元; 收容複數構造體而能對上述複數檢查單元供給上述構造體的移動式的卡匣單元, 上述構造體具有: 形成複數裝置之基板,和 包含與上述複數裝置之電極電性接觸之接觸部的配線構件。
- 一種檢查方法,具備: 使被形成於基板上的複數裝置之電極,接觸與上述電極對應而被設置的配線構件的接觸部,而形成組裝上述基板和上述配線構件的構造體的工程; 在移動式的卡匣單元收容上述構造體的工程;及 對檢查單元供給被收容於上述卡匣單元之上述構造體的工程; 在上述檢查單元中進行上述構造體所含的上述複數裝置之檢查的工程。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2019-099727 | 2019-05-28 | ||
JP2019099727A JP7274350B2 (ja) | 2019-05-28 | 2019-05-28 | 搬送システム、検査システム及び検査方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW202121554A true TW202121554A (zh) | 2021-06-01 |
Family
ID=73545918
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109116860A TW202121554A (zh) | 2019-05-28 | 2020-05-21 | 搬運系統、檢查系統及檢查方法 |
Country Status (6)
Country | Link |
---|---|
US (1) | US12013429B2 (zh) |
JP (1) | JP7274350B2 (zh) |
KR (1) | KR20220009438A (zh) |
CN (1) | CN113841227B (zh) |
TW (1) | TW202121554A (zh) |
WO (1) | WO2020241306A1 (zh) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7274350B2 (ja) * | 2019-05-28 | 2023-05-16 | 東京エレクトロン株式会社 | 搬送システム、検査システム及び検査方法 |
DE112021007343T5 (de) | 2021-03-23 | 2024-05-02 | Kioxia Corporation | Speichersystem |
JP7456066B2 (ja) | 2021-03-23 | 2024-03-26 | キオクシア株式会社 | カセット筐体、プローバー、サーバーラックおよびストレージシステム |
KR20230032399A (ko) | 2021-08-31 | 2023-03-07 | 삼성전자주식회사 | 기판 분석 설비 및 방법 |
DE112021008171T5 (de) * | 2021-09-02 | 2024-08-08 | Kioxia Corporation | Speichersystem |
JP2024102559A (ja) * | 2023-01-19 | 2024-07-31 | 株式会社東京精密 | プローバ |
Family Cites Families (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0727933B2 (ja) * | 1986-09-25 | 1995-03-29 | 東京エレクトロン株式会社 | プロ−ブ装置 |
JP2606554Y2 (ja) * | 1992-01-17 | 2000-11-27 | 株式会社東京精密 | プロービング装置 |
JP3238246B2 (ja) * | 1993-05-31 | 2001-12-10 | 東京エレクトロン株式会社 | 半導体ウエハの検査リペア装置及びバーンイン検査装置 |
JP3016992B2 (ja) * | 1993-05-31 | 2000-03-06 | 東京エレクトロン株式会社 | 半導体ウエハの検査リペア装置及びバーンイン検査装置 |
KR100291110B1 (ko) * | 1993-06-19 | 2001-06-01 | 히가시 데쓰로 | 프로우브장치 및 그것을 사용한 피검사체의 검사방법 |
JP3251194B2 (ja) * | 1997-04-03 | 2002-01-28 | 松下電器産業株式会社 | 半導体ウェハ収納器 |
JP4173309B2 (ja) * | 2002-01-28 | 2008-10-29 | 東京エレクトロン株式会社 | センタリング装置及び枚葉式検査装置 |
JP4342921B2 (ja) * | 2003-12-09 | 2009-10-14 | 東京エレクトロン株式会社 | 基板処理装置の制御方法及び基板処理装置 |
JP2005274243A (ja) * | 2004-03-23 | 2005-10-06 | Olympus Corp | 被検体の検査装置及びその検査方法 |
JP5032170B2 (ja) * | 2007-03-23 | 2012-09-26 | 東京エレクトロン株式会社 | 検査装置 |
US7538564B2 (en) * | 2005-10-18 | 2009-05-26 | Gsi Group Corporation | Methods and apparatus for utilizing an optical reference |
KR20070095148A (ko) * | 2006-03-20 | 2007-09-28 | 주식회사 탑 엔지니어링 | 칩 공급 유닛 로딩 장치 |
JP5120017B2 (ja) * | 2007-05-15 | 2013-01-16 | 東京エレクトロン株式会社 | プローブ装置 |
WO2008144437A1 (en) * | 2007-05-15 | 2008-11-27 | Seubert Ronald C | Wafer probe test and inspection system |
JP5120018B2 (ja) * | 2007-05-15 | 2013-01-16 | 東京エレクトロン株式会社 | プローブ装置 |
US20100111650A1 (en) * | 2008-01-31 | 2010-05-06 | Applied Materials, Inc. | Automatic substrate loading station |
TWI364809B (en) * | 2008-02-14 | 2012-05-21 | Chipmos Technologies Inc | A wafer testing system integrated with rfid techniques and testing method thereof |
JP5260172B2 (ja) * | 2008-07-31 | 2013-08-14 | 東京エレクトロン株式会社 | 被検査体の検査方法及び被検査体の検査用プログラム |
JP5381118B2 (ja) * | 2009-01-21 | 2014-01-08 | 東京エレクトロン株式会社 | プローブ装置 |
JP4949454B2 (ja) * | 2009-11-17 | 2012-06-06 | 東京エレクトロン株式会社 | プローブ装置 |
US8872532B2 (en) * | 2009-12-31 | 2014-10-28 | Formfactor, Inc. | Wafer test cassette system |
KR101334767B1 (ko) | 2012-04-12 | 2013-11-29 | 미래산업 주식회사 | 반도체 소자 핸들링 시스템 |
JP6031292B2 (ja) * | 2012-07-31 | 2016-11-24 | 東京エレクトロン株式会社 | プローブカードへの基板当接方法 |
US9335347B2 (en) * | 2012-09-10 | 2016-05-10 | Advantest Corporation | Method and apparatus for massively parallel multi-wafer test |
JP6042761B2 (ja) * | 2013-03-28 | 2016-12-14 | 東京エレクトロン株式会社 | プローブ装置 |
JP6042760B2 (ja) * | 2013-03-28 | 2016-12-14 | 東京エレクトロン株式会社 | プローブ装置 |
WO2015098892A1 (ja) * | 2013-12-26 | 2015-07-02 | コニカミノルタ株式会社 | 電子デバイスの印刷製造システム |
JP6333112B2 (ja) * | 2014-08-20 | 2018-05-30 | 東京エレクトロン株式会社 | ウエハ検査装置 |
KR20160055010A (ko) * | 2014-11-07 | 2016-05-17 | 삼성전자주식회사 | 웨이퍼 이송 로봇 및 그 제어 방법 |
KR102328101B1 (ko) * | 2015-07-07 | 2021-11-17 | 삼성전자주식회사 | 프로브 카드, 프로브 카드용 단열 커버 어셈블리, 및 이를 갖는 반도체 디바이스의 검사 장치 |
JP6445957B2 (ja) * | 2015-11-17 | 2018-12-26 | 株式会社エス・イー・アール | 集積回路テスト装置 |
CN107422241B (zh) * | 2016-03-23 | 2019-10-15 | 创意电子股份有限公司 | 使用探针卡的方法及系统 |
JP2017183422A (ja) * | 2016-03-29 | 2017-10-05 | 株式会社東京精密 | プローバ |
JP6655516B2 (ja) * | 2016-09-23 | 2020-02-26 | 東京エレクトロン株式会社 | 基板検査装置 |
US11774935B2 (en) * | 2016-10-08 | 2023-10-03 | Capcon Limited | Apparatus, control method and control device of semiconductor packaging |
JP6803542B2 (ja) * | 2016-10-18 | 2020-12-23 | 株式会社東京精密 | プローバ及びプローブ検査方法 |
JP6801166B2 (ja) * | 2016-10-18 | 2020-12-16 | 株式会社東京精密 | プローバ及びプローブ検査方法 |
JP6811951B2 (ja) * | 2017-02-03 | 2021-01-13 | 株式会社ディスコ | 搬送機構 |
JP6887332B2 (ja) * | 2017-07-19 | 2021-06-16 | 東京エレクトロン株式会社 | 検査システム |
KR20190016695A (ko) * | 2017-08-09 | 2019-02-19 | 세메스 주식회사 | 웨이퍼 정렬 방법 및 이를 이용하는 웨이퍼 검사 방법 |
JP6471401B1 (ja) * | 2017-10-31 | 2019-02-20 | 合同会社Pleson | 半導体ウエハーの試験ユニット |
KR102049413B1 (ko) | 2017-11-16 | 2019-11-27 | 한국생산기술연구원 | 멀티 프로브 시스템 |
US11099234B2 (en) * | 2018-09-18 | 2021-08-24 | Taiwan Semiconductor Manufacturing Co., Ltd. | False detection method for loading probe card |
KR20200106774A (ko) * | 2019-03-05 | 2020-09-15 | 세메스 주식회사 | 반도체 소자 검사 방법 및 장치 |
JP7274350B2 (ja) * | 2019-05-28 | 2023-05-16 | 東京エレクトロン株式会社 | 搬送システム、検査システム及び検査方法 |
-
2019
- 2019-05-28 JP JP2019099727A patent/JP7274350B2/ja active Active
-
2020
- 2020-05-15 WO PCT/JP2020/019449 patent/WO2020241306A1/ja active Application Filing
- 2020-05-15 US US17/595,461 patent/US12013429B2/en active Active
- 2020-05-15 KR KR1020217041144A patent/KR20220009438A/ko not_active Application Discontinuation
- 2020-05-15 CN CN202080036678.9A patent/CN113841227B/zh active Active
- 2020-05-21 TW TW109116860A patent/TW202121554A/zh unknown
Also Published As
Publication number | Publication date |
---|---|
JP2020194889A (ja) | 2020-12-03 |
US20220206058A1 (en) | 2022-06-30 |
CN113841227B (zh) | 2024-03-22 |
KR20220009438A (ko) | 2022-01-24 |
US12013429B2 (en) | 2024-06-18 |
JP7274350B2 (ja) | 2023-05-16 |
WO2020241306A1 (ja) | 2020-12-03 |
CN113841227A (zh) | 2021-12-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW202121554A (zh) | 搬運系統、檢查系統及檢查方法 | |
JP4491513B1 (ja) | 半導体ウェハ試験装置 | |
US8905700B2 (en) | Transfer and inspection devices of object to be inspected | |
US20120242359A1 (en) | Probe card detecting apparatus, wafer position alignment apparatus and wafer position alignment method | |
CN112018023B (zh) | 定位装置和定位方法 | |
KR102479608B1 (ko) | 콘택트 정밀도 보증 방법, 콘택트 정밀도 보증 기구, 및 검사 장치 | |
US9568501B2 (en) | Probe card attaching method | |
US11486924B2 (en) | Inspection apparatus | |
JP2010186998A6 (ja) | 半導体ウェハ試験装置 | |
CN113161273B (zh) | 位置偏离检测方法及装置、位置异常判定及搬送控制方法 | |
KR20220005507A (ko) | 탑재대, 검사 장치 및 온도 교정 방법 | |
CN110931390A (zh) | 检查装置和检查方法 | |
JP2006317346A (ja) | プロービングシステム及びプローバ | |
KR102014334B1 (ko) | 기판 검사 카트리지 및 이의 제조 방법 | |
CN114365270A (zh) | 检查系统以及检查方法 | |
CN114496838A (zh) | 载置台、检查装置和检查方法 | |
WO2024062887A1 (ja) | 測温用基板の校正方法、基板測温システム及び測温用基板 | |
TW202405435A (zh) | 檢查方法 | |
CN118150866A (zh) | 探针卡传送设备和方法 | |
KR20210055136A (ko) | 싱글 프로버 및 이를 포함하는 웨이퍼 테스팅 팩토리 시스템 | |
JPH08213438A (ja) | 検査方法及び検査装置 |