TW201922847A - 感光性樹脂組成物、硬化膜、具備硬化膜之元件、具備硬化膜之有機el顯示裝置、硬化膜之製造方法及有機el顯示裝置之製造方法 - Google Patents
感光性樹脂組成物、硬化膜、具備硬化膜之元件、具備硬化膜之有機el顯示裝置、硬化膜之製造方法及有機el顯示裝置之製造方法 Download PDFInfo
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- TW201922847A TW201922847A TW107133438A TW107133438A TW201922847A TW 201922847 A TW201922847 A TW 201922847A TW 107133438 A TW107133438 A TW 107133438A TW 107133438 A TW107133438 A TW 107133438A TW 201922847 A TW201922847 A TW 201922847A
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- Prior art keywords
- photosensitive resin
- resin composition
- acid
- cured film
- compound
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- 239000011342 resin composition Substances 0.000 title claims abstract description 102
- 238000004519 manufacturing process Methods 0.000 title claims description 19
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims abstract description 128
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 104
- 150000001875 compounds Chemical class 0.000 claims abstract description 103
- 239000011347 resin Substances 0.000 claims abstract description 98
- 229920005989 resin Polymers 0.000 claims abstract description 98
- 239000002253 acid Substances 0.000 claims abstract description 78
- 239000003431 cross linking reagent Substances 0.000 claims abstract description 41
- 238000010494 dissociation reaction Methods 0.000 claims abstract description 34
- 230000005593 dissociations Effects 0.000 claims abstract description 34
- 239000003963 antioxidant agent Substances 0.000 claims abstract description 32
- 230000003078 antioxidant effect Effects 0.000 claims abstract description 31
- -1 phenolic hydroxyl compound Chemical class 0.000 claims description 58
- 239000000758 substrate Substances 0.000 claims description 41
- 239000002530 phenolic antioxidant Substances 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 33
- 229920001721 polyimide Polymers 0.000 claims description 27
- 239000003086 colorant Substances 0.000 claims description 24
- 239000002243 precursor Substances 0.000 claims description 24
- KAESVJOAVNADME-UHFFFAOYSA-N Pyrrole Chemical compound C=1C=CNC=1 KAESVJOAVNADME-UHFFFAOYSA-N 0.000 claims description 23
- 238000010438 heat treatment Methods 0.000 claims description 23
- 239000004642 Polyimide Substances 0.000 claims description 20
- 239000000463 material Substances 0.000 claims description 17
- 125000004849 alkoxymethyl group Chemical group 0.000 claims description 10
- 229920001577 copolymer Polymers 0.000 claims description 10
- 239000011229 interlayer Substances 0.000 claims description 10
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims description 4
- 239000004971 Cross linker Substances 0.000 claims description 2
- 238000005452 bending Methods 0.000 abstract description 36
- 239000000126 substance Substances 0.000 abstract description 32
- 238000012360 testing method Methods 0.000 abstract description 28
- 125000006575 electron-withdrawing group Chemical group 0.000 abstract 1
- 239000010408 film Substances 0.000 description 153
- 239000000049 pigment Substances 0.000 description 112
- 238000006243 chemical reaction Methods 0.000 description 68
- 239000010410 layer Substances 0.000 description 43
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 27
- 239000002270 dispersing agent Substances 0.000 description 26
- FPVGTPBMTFTMRT-UHFFFAOYSA-L disodium;2-amino-5-[(4-sulfonatophenyl)diazenyl]benzenesulfonate Chemical compound [Na+].[Na+].C1=C(S([O-])(=O)=O)C(N)=CC=C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 FPVGTPBMTFTMRT-UHFFFAOYSA-L 0.000 description 23
- 235000019233 fast yellow AB Nutrition 0.000 description 23
- 229920000642 polymer Polymers 0.000 description 23
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 21
- 239000000243 solution Substances 0.000 description 21
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- 238000003786 synthesis reaction Methods 0.000 description 19
- 150000001412 amines Chemical class 0.000 description 16
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical class OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 15
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 15
- 230000000052 comparative effect Effects 0.000 description 13
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 13
- 239000012860 organic pigment Substances 0.000 description 12
- 239000003513 alkali Substances 0.000 description 11
- 238000011161 development Methods 0.000 description 11
- 230000018109 developmental process Effects 0.000 description 11
- 239000000975 dye Substances 0.000 description 11
- 235000012431 wafers Nutrition 0.000 description 11
- 239000007864 aqueous solution Substances 0.000 description 10
- 239000011324 bead Substances 0.000 description 10
- 150000002148 esters Chemical class 0.000 description 10
- 125000000962 organic group Chemical group 0.000 description 10
- VRVDFJOCCWSFLI-UHFFFAOYSA-K trisodium 3-[[4-[(6-anilino-1-hydroxy-3-sulfonatonaphthalen-2-yl)diazenyl]-5-methoxy-2-methylphenyl]diazenyl]naphthalene-1,5-disulfonate Chemical compound [Na+].[Na+].[Na+].COc1cc(N=Nc2cc(c3cccc(c3c2)S([O-])(=O)=O)S([O-])(=O)=O)c(C)cc1N=Nc1c(O)c2ccc(Nc3ccccc3)cc2cc1S([O-])(=O)=O VRVDFJOCCWSFLI-UHFFFAOYSA-K 0.000 description 10
- 125000000217 alkyl group Chemical group 0.000 description 9
- NIHNNTQXNPWCJQ-UHFFFAOYSA-N fluorene Chemical compound C1=CC=C2CC3=CC=CC=C3C2=C1 NIHNNTQXNPWCJQ-UHFFFAOYSA-N 0.000 description 9
- 150000003254 radicals Chemical class 0.000 description 9
- 238000003860 storage Methods 0.000 description 9
- IHZXTIBMKNSJCJ-UHFFFAOYSA-N 3-{[(4-{[4-(dimethylamino)phenyl](4-{ethyl[(3-sulfophenyl)methyl]amino}phenyl)methylidene}cyclohexa-2,5-dien-1-ylidene)(ethyl)azaniumyl]methyl}benzene-1-sulfonate Chemical compound C=1C=C(C(=C2C=CC(C=C2)=[N+](C)C)C=2C=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC(S(O)(=O)=O)=C1 IHZXTIBMKNSJCJ-UHFFFAOYSA-N 0.000 description 8
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 8
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 238000011156 evaluation Methods 0.000 description 8
- 238000013007 heat curing Methods 0.000 description 8
- 239000001023 inorganic pigment Substances 0.000 description 8
- 150000002576 ketones Chemical class 0.000 description 8
- 239000003960 organic solvent Substances 0.000 description 8
- 239000002244 precipitate Substances 0.000 description 8
- 239000004094 surface-active agent Substances 0.000 description 8
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical class S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 7
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
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- 125000000524 functional group Chemical group 0.000 description 7
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- 238000012986 modification Methods 0.000 description 7
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 7
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 6
- WTQZSMDDRMKJRI-UHFFFAOYSA-N 4-diazoniophenolate Chemical class [O-]C1=CC=C([N+]#N)C=C1 WTQZSMDDRMKJRI-UHFFFAOYSA-N 0.000 description 6
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Natural products CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 6
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 6
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 6
- 125000001931 aliphatic group Chemical group 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 150000004985 diamines Chemical class 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 6
- 238000001914 filtration Methods 0.000 description 6
- 238000009413 insulation Methods 0.000 description 6
- 230000001681 protective effect Effects 0.000 description 6
- 230000009257 reactivity Effects 0.000 description 6
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 6
- ACZGCWSMSTYWDQ-UHFFFAOYSA-N 3h-1-benzofuran-2-one Chemical compound C1=CC=C2OC(=O)CC2=C1 ACZGCWSMSTYWDQ-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 5
- OFOBLEOULBTSOW-UHFFFAOYSA-N Malonic acid Chemical compound OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 230000002378 acidificating effect Effects 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 239000013256 coordination polymer Substances 0.000 description 5
- 238000004132 cross linking Methods 0.000 description 5
- UZUODNWWWUQRIR-UHFFFAOYSA-L disodium;3-aminonaphthalene-1,5-disulfonate Chemical compound [Na+].[Na+].C1=CC=C(S([O-])(=O)=O)C2=CC(N)=CC(S([O-])(=O)=O)=C21 UZUODNWWWUQRIR-UHFFFAOYSA-L 0.000 description 5
- 229910052757 nitrogen Inorganic materials 0.000 description 5
- 230000003647 oxidation Effects 0.000 description 5
- 238000007254 oxidation reaction Methods 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- MSTZGVRUOMBULC-UHFFFAOYSA-N 2-amino-4-[2-(3-amino-4-hydroxyphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]phenol Chemical compound C1=C(O)C(N)=CC(C(C=2C=C(N)C(O)=CC=2)(C(F)(F)F)C(F)(F)F)=C1 MSTZGVRUOMBULC-UHFFFAOYSA-N 0.000 description 4
- 206010059866 Drug resistance Diseases 0.000 description 4
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000007983 Tris buffer Substances 0.000 description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 4
- 150000008065 acid anhydrides Chemical class 0.000 description 4
- MWPLVEDNUUSJAV-UHFFFAOYSA-N anthracene Chemical compound C1=CC=CC2=CC3=CC=CC=C3C=C21 MWPLVEDNUUSJAV-UHFFFAOYSA-N 0.000 description 4
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 4
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 4
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 4
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 4
- 239000011521 glass Substances 0.000 description 4
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- 230000000704 physical effect Effects 0.000 description 4
- 229920005575 poly(amic acid) Polymers 0.000 description 4
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 4
- 238000007789 sealing Methods 0.000 description 4
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- 125000000542 sulfonic acid group Chemical group 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- ASLNDVUAZOHADR-UHFFFAOYSA-N 2-butyl-3-methylphenol Chemical compound CCCCC1=C(C)C=CC=C1O ASLNDVUAZOHADR-UHFFFAOYSA-N 0.000 description 3
- CWLKGDAVCFYWJK-UHFFFAOYSA-N 3-aminophenol Chemical compound NC1=CC=CC(O)=C1 CWLKGDAVCFYWJK-UHFFFAOYSA-N 0.000 description 3
- 229940018563 3-aminophenol Drugs 0.000 description 3
- QQGYZOYWNCKGEK-UHFFFAOYSA-N 5-[(1,3-dioxo-2-benzofuran-5-yl)oxy]-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(OC=2C=C3C(=O)OC(C3=CC=2)=O)=C1 QQGYZOYWNCKGEK-UHFFFAOYSA-N 0.000 description 3
- DXKZEUUVPWJJCX-UHFFFAOYSA-N 9h-fluorene;hydrochloride Chemical class Cl.C1=CC=C2CC3=CC=CC=C3C2=C1 DXKZEUUVPWJJCX-UHFFFAOYSA-N 0.000 description 3
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 3
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- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
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- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 3
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- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- PYKYMHQGRFAEBM-UHFFFAOYSA-N anthraquinone Natural products CCC(=O)c1c(O)c2C(=O)C3C(C=CC=C3O)C(=O)c2cc1CC(=O)OC PYKYMHQGRFAEBM-UHFFFAOYSA-N 0.000 description 3
- 150000004056 anthraquinones Chemical class 0.000 description 3
- 230000003064 anti-oxidating effect Effects 0.000 description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 3
- 125000004122 cyclic group Chemical group 0.000 description 3
- 239000012954 diazonium Substances 0.000 description 3
- 150000001989 diazonium salts Chemical class 0.000 description 3
- QDOXWKRWXJOMAK-UHFFFAOYSA-N dichromium trioxide Chemical compound O=[Cr]O[Cr]=O QDOXWKRWXJOMAK-UHFFFAOYSA-N 0.000 description 3
- 238000004090 dissolution Methods 0.000 description 3
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- 125000003566 oxetanyl group Chemical group 0.000 description 3
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- IZUPBVBPLAPZRR-UHFFFAOYSA-N pentachloro-phenol Natural products OC1=C(Cl)C(Cl)=C(Cl)C(Cl)=C1Cl IZUPBVBPLAPZRR-UHFFFAOYSA-N 0.000 description 3
- 150000002989 phenols Chemical class 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
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- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 3
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- LUNUTDXQTSGSJG-LFABVHOISA-N (2S)-2-amino-2-cyclohexyl-N-(1-diphenoxyphosphorylethyl)acetamide Chemical compound C1([C@H](N)C(=O)NC(C)P(=O)(OC=2C=CC=CC=2)OC=2C=CC=CC=2)CCCCC1 LUNUTDXQTSGSJG-LFABVHOISA-N 0.000 description 2
- RYNQKSJRFHJZTK-UHFFFAOYSA-N (3-methoxy-3-methylbutyl) acetate Chemical compound COC(C)(C)CCOC(C)=O RYNQKSJRFHJZTK-UHFFFAOYSA-N 0.000 description 2
- ASOKPJOREAFHNY-UHFFFAOYSA-N 1-Hydroxybenzotriazole Chemical compound C1=CC=C2N(O)N=NC2=C1 ASOKPJOREAFHNY-UHFFFAOYSA-N 0.000 description 2
- RMSGQZDGSZOJMU-UHFFFAOYSA-N 1-butyl-2-phenylbenzene Chemical group CCCCC1=CC=CC=C1C1=CC=CC=C1 RMSGQZDGSZOJMU-UHFFFAOYSA-N 0.000 description 2
- BSWWXRFVMJHFBN-UHFFFAOYSA-N 2,4,6-tribromophenol Chemical compound OC1=C(Br)C=C(Br)C=C1Br BSWWXRFVMJHFBN-UHFFFAOYSA-N 0.000 description 2
- FAXWFCTVSHEODL-UHFFFAOYSA-N 2,4-dibromophenol Chemical compound OC1=CC=C(Br)C=C1Br FAXWFCTVSHEODL-UHFFFAOYSA-N 0.000 description 2
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- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 2
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- NQBXSWAWVZHKBZ-UHFFFAOYSA-N 2-butoxyethyl acetate Chemical compound CCCCOCCOC(C)=O NQBXSWAWVZHKBZ-UHFFFAOYSA-N 0.000 description 2
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 2
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- YFSRRLXAGNGNNQ-UHFFFAOYSA-L disodium 4-hydroxy-3-[[3-methyl-4-[2-methyl-4-[[4-(4-methylphenyl)sulfonyloxyphenyl]diazenyl]phenyl]phenyl]diazenyl]naphthalene-2,7-disulfonate Chemical compound CC1=CC=C(C=C1)S(=O)(=O)OC2=CC=C(C=C2)N=NC3=CC(=C(C=C3)C4=C(C=C(C=C4)N=NC5=C(C=C6C=C(C=CC6=C5[O-])S(=O)(=O)[O-])S(=O)(=O)O)C)C.[Na+].[Na+] YFSRRLXAGNGNNQ-UHFFFAOYSA-L 0.000 description 1
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- NJPXFJXCALXJCX-UHFFFAOYSA-L disodium 7-anilino-3-[[4-[(2,4-dimethyl-6-sulfonatophenyl)diazenyl]-2,5-dimethylphenyl]diazenyl]-4-hydroxynaphthalene-2-sulfonate Chemical compound [Na+].[Na+].Cc1cc(C)c(N=Nc2cc(C)c(cc2C)N=Nc2c(O)c3ccc(Nc4ccccc4)cc3cc2S([O-])(=O)=O)c(c1)S([O-])(=O)=O NJPXFJXCALXJCX-UHFFFAOYSA-L 0.000 description 1
- LARMRMCFZNGNNX-UHFFFAOYSA-L disodium 7-anilino-3-[[4-[(2,4-dimethyl-6-sulfonatophenyl)diazenyl]-2-methoxy-5-methylphenyl]diazenyl]-4-hydroxynaphthalene-2-sulfonate Chemical compound [Na+].[Na+].COc1cc(N=Nc2c(C)cc(C)cc2S([O-])(=O)=O)c(C)cc1N=Nc1c(O)c2ccc(Nc3ccccc3)cc2cc1S([O-])(=O)=O LARMRMCFZNGNNX-UHFFFAOYSA-L 0.000 description 1
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- PCILLCXFKWDRMK-UHFFFAOYSA-N naphthalene-1,4-diol Chemical compound C1=CC=C2C(O)=CC=C(O)C2=C1 PCILLCXFKWDRMK-UHFFFAOYSA-N 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- DFFZOPXDTCDZDP-UHFFFAOYSA-N naphthalene-1,5-dicarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=CC2=C1C(O)=O DFFZOPXDTCDZDP-UHFFFAOYSA-N 0.000 description 1
- WSKHYOXDVZCOJP-UHFFFAOYSA-N naphthalene-1,6-diamine Chemical compound NC1=CC=CC2=CC(N)=CC=C21 WSKHYOXDVZCOJP-UHFFFAOYSA-N 0.000 description 1
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- FZZQNEVOYIYFPF-UHFFFAOYSA-N naphthalene-1,6-diol Chemical compound OC1=CC=CC2=CC(O)=CC=C21 FZZQNEVOYIYFPF-UHFFFAOYSA-N 0.000 description 1
- JSKSILUXAHIKNP-UHFFFAOYSA-N naphthalene-1,7-dicarboxylic acid Chemical compound C1=CC=C(C(O)=O)C2=CC(C(=O)O)=CC=C21 JSKSILUXAHIKNP-UHFFFAOYSA-N 0.000 description 1
- ZUVBIBLYOCVYJU-UHFFFAOYSA-N naphthalene-1,7-diol Chemical compound C1=CC=C(O)C2=CC(O)=CC=C21 ZUVBIBLYOCVYJU-UHFFFAOYSA-N 0.000 description 1
- JRNGUTKWMSBIBF-UHFFFAOYSA-N naphthalene-2,3-diol Chemical compound C1=CC=C2C=C(O)C(O)=CC2=C1 JRNGUTKWMSBIBF-UHFFFAOYSA-N 0.000 description 1
- RXOHFPCZGPKIRD-UHFFFAOYSA-N naphthalene-2,6-dicarboxylic acid Chemical compound C1=C(C(O)=O)C=CC2=CC(C(=O)O)=CC=C21 RXOHFPCZGPKIRD-UHFFFAOYSA-N 0.000 description 1
- MNZMMCVIXORAQL-UHFFFAOYSA-N naphthalene-2,6-diol Chemical compound C1=C(O)C=CC2=CC(O)=CC=C21 MNZMMCVIXORAQL-UHFFFAOYSA-N 0.000 description 1
- OBJNZHVOCNPSCS-UHFFFAOYSA-N naphtho[2,3-f]quinazoline Chemical compound C1=NC=C2C3=CC4=CC=CC=C4C=C3C=CC2=N1 OBJNZHVOCNPSCS-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- IPSIPYMEZZPCPY-UHFFFAOYSA-N new fuchsin Chemical compound [Cl-].C1=CC(=[NH2+])C(C)=CC1=C(C=1C=C(C)C(N)=CC=1)C1=CC=C(N)C(C)=C1 IPSIPYMEZZPCPY-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 238000010943 off-gassing Methods 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 239000001053 orange pigment Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 125000006353 oxyethylene group Chemical group 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229960003540 oxyquinoline Drugs 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 150000002941 palladium compounds Chemical class 0.000 description 1
- 235000012736 patent blue V Nutrition 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- SVHOVVJFOWGYJO-UHFFFAOYSA-N pentabromophenol Chemical compound OC1=C(Br)C(Br)=C(Br)C(Br)=C1Br SVHOVVJFOWGYJO-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- 125000002080 perylenyl group Chemical group C1(=CC=C2C=CC=C3C4=CC=CC5=CC=CC(C1=C23)=C45)* 0.000 description 1
- CSHWQDPOILHKBI-UHFFFAOYSA-N peryrene Natural products C1=CC(C2=CC=CC=3C2=C2C=CC=3)=C3C2=CC=CC3=C1 CSHWQDPOILHKBI-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- REJGOFYVRVIODZ-UHFFFAOYSA-N phosphanium;chloride Chemical compound P.Cl REJGOFYVRVIODZ-UHFFFAOYSA-N 0.000 description 1
- 235000021317 phosphate Nutrition 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical group 0.000 description 1
- 150000003016 phosphoric acids Chemical class 0.000 description 1
- 239000001007 phthalocyanine dye Substances 0.000 description 1
- CLYVDMAATCIVBF-UHFFFAOYSA-N pigment red 224 Chemical compound C=12C3=CC=C(C(OC4=O)=O)C2=C4C=CC=1C1=CC=C2C(=O)OC(=O)C4=CC=C3C1=C42 CLYVDMAATCIVBF-UHFFFAOYSA-N 0.000 description 1
- 229940099800 pigment red 48 Drugs 0.000 description 1
- 229940067265 pigment yellow 138 Drugs 0.000 description 1
- 239000002798 polar solvent Substances 0.000 description 1
- 229920003210 poly(4-hydroxy benzoic acid) Polymers 0.000 description 1
- 229920000083 poly(allylamine) Polymers 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 238000006116 polymerization reaction Methods 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229910000027 potassium carbonate Inorganic materials 0.000 description 1
- 229940088417 precipitated calcium carbonate Drugs 0.000 description 1
- RSRNHSYYBLEMOI-UHFFFAOYSA-M primuline Chemical compound [Na+].S1C2=C(S([O-])(=O)=O)C(C)=CC=C2N=C1C(C=C1S2)=CC=C1N=C2C1=CC=C(N)C=C1 RSRNHSYYBLEMOI-UHFFFAOYSA-M 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 235000019260 propionic acid Nutrition 0.000 description 1
- 125000005767 propoxymethyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])[#8]C([H])([H])* 0.000 description 1
- ILPVOWZUBFRIAX-UHFFFAOYSA-N propyl 2-oxopropanoate Chemical compound CCCOC(=O)C(C)=O ILPVOWZUBFRIAX-UHFFFAOYSA-N 0.000 description 1
- HUAZGNHGCJGYNP-UHFFFAOYSA-N propyl butyrate Chemical compound CCCOC(=O)CCC HUAZGNHGCJGYNP-UHFFFAOYSA-N 0.000 description 1
- 229940116423 propylene glycol diacetate Drugs 0.000 description 1
- 229960003351 prussian blue Drugs 0.000 description 1
- 239000013225 prussian blue Substances 0.000 description 1
- 238000010298 pulverizing process Methods 0.000 description 1
- 239000008213 purified water Substances 0.000 description 1
- 239000001057 purple pigment Substances 0.000 description 1
- FYNROBRQIVCIQF-UHFFFAOYSA-N pyrrolo[3,2-b]pyrrole-5,6-dione Chemical compound C1=CN=C2C(=O)C(=O)N=C21 FYNROBRQIVCIQF-UHFFFAOYSA-N 0.000 description 1
- MCJGNVYPOGVAJF-UHFFFAOYSA-N quinolin-8-ol Chemical compound C1=CN=C2C(O)=CC=CC2=C1 MCJGNVYPOGVAJF-UHFFFAOYSA-N 0.000 description 1
- 239000004172 quinoline yellow Substances 0.000 description 1
- 229940051201 quinoline yellow Drugs 0.000 description 1
- 235000012752 quinoline yellow Nutrition 0.000 description 1
- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 1
- AQLYZDRHNHZHIS-UHFFFAOYSA-N quinoline-2,6-diol Chemical compound N1C(=O)C=CC2=CC(O)=CC=C21 AQLYZDRHNHZHIS-UHFFFAOYSA-N 0.000 description 1
- WPPDXAHGCGPUPK-UHFFFAOYSA-N red 2 Chemical compound C1=CC=CC=C1C(C1=CC=CC=C11)=C(C=2C=3C4=CC=C5C6=CC=C7C8=C(C=9C=CC=CC=9)C9=CC=CC=C9C(C=9C=CC=CC=9)=C8C8=CC=C(C6=C87)C(C=35)=CC=2)C4=C1C1=CC=CC=C1 WPPDXAHGCGPUPK-UHFFFAOYSA-N 0.000 description 1
- 239000001044 red dye Substances 0.000 description 1
- 239000001054 red pigment Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000007261 regionalization Effects 0.000 description 1
- 238000001226 reprecipitation Methods 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- PYWVYCXTNDRMGF-UHFFFAOYSA-N rhodamine B Chemical compound [Cl-].C=12C=CC(=[N+](CC)CC)C=C2OC2=CC(N(CC)CC)=CC=C2C=1C1=CC=CC=C1C(O)=O PYWVYCXTNDRMGF-UHFFFAOYSA-N 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 150000003839 salts Chemical group 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- QERXHBDEEFLTOL-UHFFFAOYSA-M sodium 1-[[4-[(4-sulfophenyl)diazenyl]phenyl]diazenyl]naphthalen-2-olate Chemical compound [Na+].Oc1ccc2ccccc2c1N=Nc1ccc(cc1)N=Nc1ccc(cc1)S([O-])(=O)=O QERXHBDEEFLTOL-UHFFFAOYSA-M 0.000 description 1
- JXRBVOFBCVPZOV-UHFFFAOYSA-M sodium 4-[4-[(4-hydroxy-2-methylphenyl)diazenyl]anilino]-3-nitrobenzenesulfonate Chemical compound [Na+].Cc1cc(O)ccc1N=Nc1ccc(Nc2ccc(cc2[N+]([O-])=O)S([O-])(=O)=O)cc1 JXRBVOFBCVPZOV-UHFFFAOYSA-M 0.000 description 1
- UWMZZSRDUVJJDP-UHFFFAOYSA-N sodium 4-[[9-(2-carboxyphenyl)-6-(2-methylanilino)xanthen-10-ium-3-yl]amino]-3-methylbenzenesulfonate Chemical compound [Na+].Cc1ccccc1Nc1ccc2c(-c3ccccc3C(O)=O)c3ccc(Nc4ccc(cc4C)S([O-])(=O)=O)cc3[o+]c2c1 UWMZZSRDUVJJDP-UHFFFAOYSA-N 0.000 description 1
- RXWFEYPZHNITEP-UHFFFAOYSA-M sodium 4-phenyl-2-[[4-(2-sulfooxyethoxy)phenyl]diazenyl]phenolate Chemical compound [Na+].Oc1ccc(cc1N=Nc1ccc(OCCOS([O-])(=O)=O)cc1)-c1ccccc1 RXWFEYPZHNITEP-UHFFFAOYSA-M 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- GTKIEPUIFBBXJQ-UHFFFAOYSA-M sodium;2-[(4-hydroxy-9,10-dioxoanthracen-1-yl)amino]-5-methylbenzenesulfonate Chemical compound [Na+].[O-]S(=O)(=O)C1=CC(C)=CC=C1NC1=CC=C(O)C2=C1C(=O)C1=CC=CC=C1C2=O GTKIEPUIFBBXJQ-UHFFFAOYSA-M 0.000 description 1
- RWVGQQGBQSJDQV-UHFFFAOYSA-M sodium;3-[[4-[(e)-[4-(4-ethoxyanilino)phenyl]-[4-[ethyl-[(3-sulfonatophenyl)methyl]azaniumylidene]-2-methylcyclohexa-2,5-dien-1-ylidene]methyl]-n-ethyl-3-methylanilino]methyl]benzenesulfonate Chemical compound [Na+].C1=CC(OCC)=CC=C1NC1=CC=C(C(=C2C(=CC(C=C2)=[N+](CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=2C(=CC(=CC=2)N(CC)CC=2C=C(C=CC=2)S([O-])(=O)=O)C)C=C1 RWVGQQGBQSJDQV-UHFFFAOYSA-M 0.000 description 1
- WYLWMAWLDZBLRN-UHFFFAOYSA-M sodium;4-[3-methyl-4-[[4-methyl-3-(phenylsulfamoyl)phenyl]diazenyl]-5-oxo-4h-pyrazol-1-yl]benzenesulfonate Chemical compound [Na+].CC1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1N=NC(C=1)=CC=C(C)C=1S(=O)(=O)NC1=CC=CC=C1 WYLWMAWLDZBLRN-UHFFFAOYSA-M 0.000 description 1
- UWGCNDBLFSEBDW-UHFFFAOYSA-M sodium;4-[[4-(diethylamino)phenyl]-(4-diethylazaniumylidenecyclohexa-2,5-dien-1-ylidene)methyl]naphthalene-2,7-disulfonate Chemical compound [Na+].C1=CC(N(CC)CC)=CC=C1C(C=1C2=CC=C(C=C2C=C(C=1)S([O-])(=O)=O)S([O-])(=O)=O)=C1C=CC(=[N+](CC)CC)C=C1 UWGCNDBLFSEBDW-UHFFFAOYSA-M 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- NECLQTPQJZSWOE-UHFFFAOYSA-N spiro[5.5]undecane Chemical compound C1CCCCC21CCCCC2 NECLQTPQJZSWOE-UHFFFAOYSA-N 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000004763 sulfides Chemical class 0.000 description 1
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 1
- 229940124530 sulfonamide Drugs 0.000 description 1
- 150000003456 sulfonamides Chemical class 0.000 description 1
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- 239000004149 tartrazine Substances 0.000 description 1
- 235000012756 tartrazine Nutrition 0.000 description 1
- UJMBCXLDXJUMFB-GLCFPVLVSA-K tartrazine Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1\N=N\C1=CC=C(S([O-])(=O)=O)C=C1 UJMBCXLDXJUMFB-GLCFPVLVSA-K 0.000 description 1
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- XRFRTDKENRGSSX-UHFFFAOYSA-J tetrasodium;3-[[4-[[4-[(4,8-disulfonatonaphthalen-2-yl)diazenyl]-3-methylphenyl]carbamoylamino]-2-methylphenyl]diazenyl]naphthalene-1,5-disulfonate Chemical compound [Na+].[Na+].[Na+].[Na+].C1=CC=C(S([O-])(=O)=O)C2=CC(N=NC3=CC=C(NC(=O)NC=4C=C(C)C(N=NC=5C=C6C(=CC=CC6=C(C=5)S([O-])(=O)=O)S([O-])(=O)=O)=CC=4)C=C3C)=CC(S([O-])(=O)=O)=C21 XRFRTDKENRGSSX-UHFFFAOYSA-J 0.000 description 1
- WNQPPENQFWLADQ-UHFFFAOYSA-J tetrasodium;4-hydroxy-5-[[4-[[4-[(8-hydroxy-3,6-disulfonatonaphthalen-1-yl)diazenyl]-2-methoxy-5-methylphenyl]carbamoylamino]-5-methoxy-2-methylphenyl]diazenyl]naphthalene-2,7-disulfonate Chemical compound [Na+].[Na+].[Na+].[Na+].[O-]S(=O)(=O)C1=CC(O)=C2C(N=NC3=C(C)C=C(C(=C3)OC)NC(=O)NC3=CC(C)=C(N=NC=4C5=C(O)C=C(C=C5C=C(C=4)S([O-])(=O)=O)S([O-])(=O)=O)C=C3OC)=CC(S([O-])(=O)=O)=CC2=C1 WNQPPENQFWLADQ-UHFFFAOYSA-J 0.000 description 1
- 238000004227 thermal cracking Methods 0.000 description 1
- 238000009823 thermal lamination Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- JADVWWSKYZXRGX-UHFFFAOYSA-M thioflavine T Chemical compound [Cl-].C1=CC(N(C)C)=CC=C1C1=[N+](C)C2=CC=C(C)C=C2S1 JADVWWSKYZXRGX-UHFFFAOYSA-M 0.000 description 1
- JOUDBUYBGJYFFP-FOCLMDBBSA-N thioindigo Chemical compound S\1C2=CC=CC=C2C(=O)C/1=C1/C(=O)C2=CC=CC=C2S1 JOUDBUYBGJYFFP-FOCLMDBBSA-N 0.000 description 1
- CZIRZNRQHFVCDZ-UHFFFAOYSA-L titan yellow Chemical compound [Na+].[Na+].C1=C(C)C(S([O-])(=O)=O)=C2SC(C3=CC=C(C=C3)/N=N/NC3=CC=C(C=C3)C3=NC4=CC=C(C(=C4S3)S([O-])(=O)=O)C)=NC2=C1 CZIRZNRQHFVCDZ-UHFFFAOYSA-L 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- IJFSHBYRKXAYFV-UHFFFAOYSA-N triethoxy(3-propoxypropyl)silane Chemical compound CCCOCCC[Si](OCC)(OCC)OCC IJFSHBYRKXAYFV-UHFFFAOYSA-N 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- JLGLQAWTXXGVEM-UHFFFAOYSA-N triethylene glycol monomethyl ether Chemical compound COCCOCCOCCO JLGLQAWTXXGVEM-UHFFFAOYSA-N 0.000 description 1
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- YUYCVXFAYWRXLS-UHFFFAOYSA-N trimethoxysilane Chemical compound CO[SiH](OC)OC YUYCVXFAYWRXLS-UHFFFAOYSA-N 0.000 description 1
- VIIUOXGZDWUVCX-UHFFFAOYSA-K trisodium 4-hydroxy-3-[[2-methyl-4-[5-methyl-4-[[4-(4-methylphenyl)sulfonyloxyphenyl]diazenyl]-2-sulfonatophenyl]-5-sulfonatophenyl]diazenyl]naphthalene-1-sulfonate Chemical compound [Na+].[Na+].[Na+].Cc1ccc(cc1)S(=O)(=O)Oc1ccc(cc1)N=Nc1cc(c(cc1C)-c1cc(C)c(cc1S([O-])(=O)=O)N=Nc1cc(c2ccccc2c1O)S([O-])(=O)=O)S([O-])(=O)=O VIIUOXGZDWUVCX-UHFFFAOYSA-K 0.000 description 1
- NZDSGDCNEHVEEX-UHFFFAOYSA-K trisodium 4-hydroxy-7-[[5-hydroxy-7-sulfonato-6-[(4-sulfonatonaphthalen-1-yl)diazenyl]naphthalen-2-yl]carbamoylamino]-3-[(2-methoxyphenyl)diazenyl]naphthalene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].COc1ccccc1N=Nc1c(O)c2ccc(NC(=O)Nc3ccc4c(O)c(N=Nc5ccc(c6ccccc56)S([O-])(=O)=O)c(cc4c3)S([O-])(=O)=O)cc2cc1S([O-])(=O)=O NZDSGDCNEHVEEX-UHFFFAOYSA-K 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
- 239000001043 yellow dye Substances 0.000 description 1
- 239000001052 yellow pigment Substances 0.000 description 1
- 229910052984 zinc sulfide Inorganic materials 0.000 description 1
- DRDVZXDWVBGGMH-UHFFFAOYSA-N zinc;sulfide Chemical compound [S-2].[Zn+2] DRDVZXDWVBGGMH-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/0008—Organic ingredients according to more than one of the "one dot" groups of C08K5/01 - C08K5/59
- C08K5/0025—Crosslinking or vulcanising agents; including accelerators
-
- C—CHEMISTRY; METALLURGY
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Abstract
本發明的感光性樹脂組成物係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及具有25℃下酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2);或者,本發明的感光性樹脂組成物係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及除(D)以外具酚系羥基之化合物(E)的感光性樹脂組成物;其中,上述除(D)以外具酚系羥基之化合物(E),係含有分子內具親電子性基與酚系羥基的化合物(E1)。
本發明所提供的感光性樹脂組成物,係硬化膜經可靠性試驗後仍具有高彎折耐性,且耐藥性亦優異。
Description
本發明係關於感光性樹脂組成物及使用其之硬化膜、具備硬化膜之元件、具備硬化膜之有機EL顯示裝置、硬化膜之製造方法以及有機EL顯示裝置之製造方法。
例如智慧手機、平板電腦及電視機等具薄型顯示器的顯示裝置,開發了大量使用有機電激發光(以下稱「有機EL」)顯示裝置的製品。
一般有機EL顯示裝置係在基板上設有:驅動電路、平坦化層、第一電極、絕緣層、發光層及第二電極,藉由在相對向的第一電極與第二電極之間施加電壓或流通電流,便可發光。該等之中,平坦化層用材料及絕緣層用材料一般係使用利用紫外線照射便可圖案化的感光性樹脂組成物。
另一方面,對有機EL顯示裝置的高可靠化要求正逐年趨於嚴苛,針對平坦化層用材料及絕緣層用材料,要求即便在高溫、高濕、光照射等加速條件下進行可靠度試驗後,仍能維持較高膜物性的材料。
再者,特別於近年盛行形成於樹脂薄膜基板上之可撓性有機EL顯示裝置的開發。可撓性有機EL顯示裝置係具有構造 上能彎曲的部分及/或依彎曲狀態固定化的部分(以下稱「彎曲部分」),該彎曲部分會對平坦化層、絕緣層施加彎曲應力。含有此種彎曲部分的可撓性有機EL顯示裝置,針對平坦化層用材料及絕緣層用材料要求高彎折耐性。
使用聚醯亞胺系、聚苯并唑系樹脂的感光性樹脂組成物,因為樹脂耐熱性高、由硬化膜生成的氣體成分少,因而能提供可靠度高之有機EL顯示裝置,就此點而言係屬較適合使用的材料(例如參照專利文獻1)。又,例如為提升彎折耐性,有提案使用經對樹脂骨架導入長鏈脂肪族柔軟性基之聚醯亞胺先質的感光性樹脂組成物(例如參照專利文獻2)。
專利文獻1:日本專利特開2002-91343號公報
專利文獻2:WO2011-059089號公報
如上述般,針對有機EL顯示裝置的高可靠化要求正逐年趨於嚴苛,例如若將專利文獻1所記載的感光性樹脂組成物使用於平坦化層用材料及絕緣層用材料,則會有在高溫、高濕、光照射等加速條件下進行可靠性試驗後,無法維持膜物性的問題。
再者,經導入長鏈柔軟性基的專利文獻2之技術,雖剛加工後的彎折耐性獲提升,但可靠性試驗時的膜物性大幅降低,且亦發現耐藥性降低,實用上會有課題出現。
緣是,本發明之目的在於提供:硬化膜經可靠性試驗 後仍具高彎折耐性,且耐藥性亦優異的感光性樹脂組成物,以及具備有上述感光性樹脂組成物之硬化膜的有機EL顯示裝置。
為解決上述課題,本發明的感光性樹脂組成物係具有下述RC1或RC2中之任一項構成。即,RC1:感光性樹脂組成物係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及具有25℃下酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2);或,RC2:感光性樹脂組成物係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及除(D)以外具酚系羥基之化合物(E)的感光性樹脂組成物,其中,上述除(D)以外具酚系羥基之化合物(E),係含有分子內具親電子性基與酚系羥基的化合物(E1)。
為解決上述課題,本發明的硬化膜係具有下述構成。即,一種硬化膜,係由上述感光性樹脂組成物之硬化物構成。
為解決上述課題,本發明具備硬化膜之元件係具有下述構成。即,具備上述硬化膜的元件。
為解決上述課題,本發明具備硬化膜之有機EL顯示裝置係具有下述構成。即,具備上述硬化膜之有機EL顯示裝置。
為解決上述課題,本發明的電子零件係具有下述構成。即, 將上述硬化膜當作再配線間之層間絕緣膜配置的電子零件。
為解決上述課題,本發明硬化膜之製造方法係具有下述構成。即,一種硬化膜之製造方法,係包括有:(1)將上述感光性樹脂組成物塗佈於基板上,形成感光性樹脂膜的步驟;(2)將該感光性樹脂膜乾燥的步驟;(3)對經乾燥的感光性樹脂膜隔著光罩施行曝光的步驟;(4)對經曝光的感光性樹脂膜施行顯影的步驟;以及(5)對經顯影的感光性樹脂膜施行加熱處理的步驟。
為解決上述課題,本發明之有機EL顯示裝置之製造方法係具有下述構成。即,一種有機EL顯示裝置之製造方法,係包括有:利用上述硬化膜之製造方法形成硬化膜的步驟。
本發明的感光性樹脂組成物RC1中,上述酚系抗氧化劑(D)的25℃下酚性羥基之酸解離常數pKa,較佳係10.1以上且13.0以下。
本發明的感光性樹脂組成物RC1中,上述酚系抗氧化劑(D)含量、與上述具25℃下酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)含量之質量比(E2/D),較佳係2以上且20以下。
本發明的感光性樹脂組成物RC2中,上述酚系抗氧化劑(D)含量、與上述分子內具親電子性基與酚系羥基的化合物(E1)含量之質量比(E1/D),較佳係2以上且20以下。
本發明的感光性樹脂組成物RC1與RC2中,上述鹼可溶性樹脂(A)較佳係含有:聚醯亞胺、聚醯亞胺先質、聚苯并唑先質及/或該等的共聚合體。
本發明的感光性樹脂組成物RC1與RC2中,上述酚系抗氧化劑(D)較佳係含有受阻式酚系抗氧化劑。
本發明的感光性樹脂組成物RC1與RC2,較佳係供形成具有可彎曲部分及/或依彎曲狀態固定化部分的有機EL顯示裝置之絕緣膜用。
本發明的感光性樹脂組成物RC1與RC2中,上述熱交聯劑(C)較佳係含有具酚性羥基,且上述酚性羥基之二鄰位具有羥甲基及/或烷氧甲基的熱交聯劑。
本發明的感光性樹脂組成物RC1與RC2中,較佳係更進一步含有著色劑(F)。
本發明的感光性樹脂組成物RC1與RC2中,上述感光性樹脂組成物較佳係呈片狀。
本發明的有機EL顯示裝置中,具備上述有機EL顯示裝置之硬化膜的部分之至少其中一部分,較佳係具有可彎曲部分及/或依彎曲狀態固定化的部分,且上述可彎曲部分及/或依彎曲狀態固定化部分的曲率半徑係0.1mm以上且5mm以下範圍。
本發明的感光性樹脂組成物係可提供:硬化膜經可靠性試驗後仍具有高彎折耐性,且耐藥性亦優異的感光性樹脂組成物。又,藉由使用上述感光性樹脂組成物的硬化膜,便可提供:經可靠性試驗後仍具有高彎折耐性且可靠性優異的有機EL顯示裝 置。
1‧‧‧TFT
2‧‧‧配線
3‧‧‧TFT絕緣膜
4‧‧‧平坦化層
5‧‧‧電極
6‧‧‧基板
7‧‧‧接觸窗
8‧‧‧絕緣層
圖1係已形成平坦化層與絕緣層的TFT基板剖視圖。
針對本發明之實施形態進行詳細說明。
本發明的感光性樹脂組成物係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及具25℃下酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2);或者含有:鹼可溶性樹脂(A)、光酸產生劑(B)、交聯劑(C)、酚系抗氧化劑(D)、含有(D)以外具酚系羥基之化合物(E)的感光性樹脂組成物,其中,上述(D)以外具酚系羥基的化合物(E),係含有分子內具有親電子性基與酚系羥基的化合物(E1)。
本發明的感光性樹脂組成物係含有鹼可溶性樹脂(A)。本發明所謂「鹼可溶性」係指將樹脂溶解於γ-丁內酯中的溶液塗佈於矽晶圓上,依120℃施行4分鐘預烘烤而形成膜厚10μm±0.5μm預烘烤膜,再將該預烘烤膜於23±1℃的2.38質量%氫氧化四甲銨水溶液中浸漬1分鐘後,利用純水施行沖洗處理時,從膜厚減少所求得之溶解速度達50nm/分以上。
鹼可溶性樹脂(A)係可舉例如:聚醯亞胺、聚醯亞胺先質、聚苯并唑先質、聚胺基醯胺、聚醯胺、含自由基聚合性單體的聚合體、矽氧烷樹脂、卡多樹脂(cardo resin)、酚樹脂等,但在具有上述鹼可溶性之前提下,其餘並無特別的限定。該等鹼可溶性樹脂亦可併用2種以上。上述鹼可溶性樹脂中,較佳係耐熱性優異、 高溫下的逸氣量少、伸長率等膜物性優異者。具體較佳係聚醯亞胺、聚醯亞胺先質、聚苯并唑先質、及/或該等的共聚合體。
本發明中,從能當作鹼可溶性樹脂(A)使用的聚醯亞胺、聚醯亞胺先質及聚苯并唑先質中選擇的鹼可溶性樹脂或該等的共聚合體,為能賦予上述鹼可溶性,較佳為樹脂構造單元中及/或其主鏈末端具有酸性基。酸性基係可舉例如:羧基、酚性羥基、磺酸基、硫醇基等。又,上述鹼可溶性樹脂或該等的共聚合體較佳係具有氟原子,利用鹼水溶液進行顯影時,可對膜與基材的界面賦予撥水性,能抑制鹼水溶液滲入於界面。上述鹼可溶性樹脂或該等的共聚合體中之氟原子含量,就從防止鹼水溶液滲入於界面之效果的觀點,較佳係5質量%以上,就從對鹼水溶液的溶解性觀點,較佳係20質量%以下。
上述聚醯亞胺較佳係具有下述一般式(1)所示構造單元,而聚醯亞胺先質及聚苯并唑先質較佳係具有下述一般式(2)所示構造單元。該等亦可含有2種以上,亦可使用由一般式(1)所示構造單元與一般式(2)所示構造單元進行共聚合的樹脂。
一般式(1)中,R1係表示4~10價有機基,R2係表示2~8價有機基。R3與R4係表示酚性羥基、羧基、磺酸基或硫醇基, 各自係可為單一者、亦可由不同者混雜。p與q係表示0~6之整數。
一般式(2)中,R5係表示2~8價有機基;R6係表示2~8價有機基。R7與R8係表示酚性羥基、磺酸基、硫醇基或COOR9,各自係可為單一者、亦可由不同者混雜。R9係表示氫原子或碳數1~20之1價烴基。r與s係表示0~6之整數。但,r+s>0。
從聚醯亞胺、聚醯亞胺先質及聚苯并唑先質中選擇的鹼可溶性樹脂或該等的共聚合體,較佳係一般式(1)或(2)所示構造單元具有5~100,000。又,除一般式(1)或(2)所示構造單元之外,尚亦可含有其他構造單元。此情況,一般式(1)或(2)所示構造單元,較佳為在總構造單元數中佔50莫耳%以上。
上述一般式(1)中,R1-(R3)p係表示酸二酐的殘基。R1係4價~10價有機基,尤其較佳係含有芳香族環或環狀脂肪族基的碳原子數5~40之有機基。
酸二酐具體係可舉例如:均苯四甲酸二酐、3,3',4,4'-聯苯四羧酸二酐、2,3,3',4'-聯苯四羧酸二酐、2,2',3,3'-聯苯四羧酸二酐、3,3',4,4'-二苯基酮四羧酸二酐、2,2',3,3'-二苯基酮四羧酸二酐、2,2-雙(3,4-二羧苯基)丙烷二酸酐、2,2-雙(2,3-二羧苯基)丙烷二酸酐、1,1-雙(3,4-二羧苯基)乙烷二酸酐、1,1-雙(2,3-二羧苯基)乙烷二酸酐、雙(3,4-二羧苯基)甲烷二酸酐、雙(2,3-二羧苯基)甲烷二酸酐、雙(3,4-二羧苯基)醚二酸酐、1,2,5,6-萘四羧酸二酐、9,9-雙(3,4-二羧 苯基)茀酸二酐、9,9-雙{4-(3,4-二羧苯氧基)苯基}茀酸二酐、2,3,6,7-萘四羧酸二酐、2,3,5,6-吡啶四羧酸二酐、3,4,9,10-苝四羧酸二酐、2,2-雙(3,4-二羧苯基)六氟丙烷二酸酐、及下述所示構造的酸二酐等芳香族四羧酸二酐;丁烷四羧酸二酐、1,2,3,4-環戊烷四羧酸二酐等脂肪族的四羧酸二酐等。該等亦可使用2種以上。
R9係表示氧原子、C(CF3)2、或C(CH3)2。R10、R11、R12及R13係表示氫原子或羥基。
上述一般式(2)中,R5-(R7)r係表示酸的殘基。R5係表示2價~8價有機基,尤其較佳係含有芳香族環或環狀脂肪族基的碳原子數5~40之有機基。
酸成分,就二羧酸之例係可舉例如:對酞酸、異酞酸、二苯醚二羧酸、雙(羧苯基)六氟丙烷、聯苯二羧酸、二苯基酮二羧酸、三苯基二羧酸等;就三羧酸例係可舉例如:偏苯三酸、均苯三甲酸、二苯醚三羧酸、聯苯三羧酸等;就四羧酸例係可舉例如:均苯四甲酸、3,3',4,4'-聯苯四羧酸、2,3,3',4'-聯苯四羧酸、2,2',3,3'-聯苯四羧酸、3,3',4,4'-二苯基酮四羧酸、2,2',3,3'-二苯基酮四羧酸、2,2-雙(3,4-二羧苯基)六氟丙烷、2,2-雙(2,3-二羧苯基)六氟丙烷、1,1-雙(3,4-二羧苯基)乙烷、1,1-雙(2,3-二羧苯基)乙烷、雙(3,4-二羧苯基)甲烷、雙(2,3-二羧苯基)甲烷、雙(3,4-二羧苯基)醚、1,2,5,6-萘四羧酸、2,3,6,7-萘四羧酸、2,3,5,6-吡啶四羧酸、3,4,9,10-苝四羧酸及下 述所示之構造的芳香族四羧酸、丁烷四羧酸、1,2,3,4-環戊烷四羧酸等脂肪族的四羧酸等。該等亦可使用2種以上。
R9係表示氧原子、C(CF3)2、或C(CH3)2。R10、R11、R12及R13係表示氫原子或羥基。
該等之中,若三羧酸、四羧酸則有1或2個羧基相當於一般式(2)的R7基。又,以上所例示之二羧酸、三羧酸、四羧酸的氫原子,更佳係利用1~4個一般式(2)的R7基(較佳係酚性羥基)取代。該等酸係可直接使用,或形成酸酐、活性酯使用。
上述一般式(1)的R2-(R4)q及上述一般式(2)的R6-(R8)s係表示二胺的殘基。R2與R8係2~8價之有機基,尤其較佳係含有芳香族環或環狀脂肪族基的碳原子數5~40之有機基。
二胺的具體例係可舉例如:3,4'-二胺基二苯醚、4,4'-二胺基二苯醚、3,4'-二胺基二苯基甲烷、4,4'-二胺基二苯基甲烷、1,4-雙(4-胺基苯氧基)苯、聯苯胺、間伸苯二胺、對伸苯二胺、1,5-萘二胺、2,6-萘二胺、雙(4-胺基苯氧基)聯苯、雙{4-(4-胺基苯氧基)苯基}醚、1,4-雙(4-胺基苯氧基)苯、2,2'-二甲基-4,4'-二胺基聯苯、2,2'-二乙基-4,4'-二胺基聯苯、3,3'-二甲基-4,4'-二胺基聯苯、3,3'-二乙基-4,4'-二胺基聯苯、2,2',3,3'-四甲基-4,4'-二胺基聯苯、3,3',4,4'-四甲基-4,4'-二胺基聯苯、2,2-二(三氟甲基)-4,4'-二胺基聯苯、9,9-雙(4-胺基苯基)茀或該等芳香族環的氫原子至少其中一部分被烷基或鹵原子取代的化合物、脂肪族的環己二胺、亞甲基雙環己胺以及 下述構造的二胺等。該等亦可使用2種以上。
R14與R17係表示氧原子、C(CF3)2或C(CH3)2。R15、R16、及R18~R28係表示各自獨立的氫原子或羥基。
該等二胺係可使用二胺、或對應的二異氰酸酯化合物、三甲矽烷化二胺。
再者,藉由將該等樹脂的末端,利用具有酸性基的單胺、酸酐、單羧醯單醯氯、單活性酯進行封端,便可獲得主鏈末端具有酸性基的樹脂。
具有酸性基的單胺較佳例係可舉例如:5-胺基-8-羥喹啉、1-羥-7-胺基萘、1-羥-6-胺基萘、1-羥-5-胺基萘、1-羥-4-胺基萘、 2-羥-7-胺基萘、2-羥-6-胺基萘、2-羥-5-胺基萘、1-羧-7-胺基萘、1-羧-6-胺基萘、1-羧-5-胺基萘、2-羧-7-胺基萘、2-羧-6-胺基萘、2-羧-5-胺基萘、2-胺基苯甲酸、3-胺基苯甲酸、4-胺基苯甲酸、4-胺基水楊酸、5-胺基水楊酸、6-胺基水楊酸、3-胺基-4,6-二羥基嘧啶、2-胺基酚、3-胺基酚、4-胺基酚、2-胺基硫酚、3-胺基硫酚、4-胺基硫酚等。該等亦可使用2種以上。
酸酐、醯氯、單羧酸的較佳例係可舉例如:酞酸酐、順丁烯二酸酐、納迪克酸酐、環己烷二羧酸酐、3-羥酞酸酐等酸酐;3-羧酚、4-羧酚、3-羧硫酚、4-羧硫酚、1-羥-7-羧基萘、1-羥-6-羧基萘、1-羥-5-羧基萘、1-巰基-7-羧基萘、1-巰基-6-羧基萘、1-巰基-5-羧基萘等單羧酸,及該等羧基經醯氯化的單醯氯;對酞酸、酞酸、順丁烯二酸、環己烷二羧酸、1,5-二羧萘、1,6-二羧萘、1,7-二羧萘、2,6-二羧萘等二羧酸類僅有1個羧基被醯氯化的單醯氯;由單醯氯與N-羥基苯并三唑、N-羥-5-降烯-2,3-二羧基醯亞胺進行反應而獲得的單活性酯。該等亦可使用2種以上。
上述單胺、酸酐、單羧酸、單醯氯、單活性酯等末端終止劑的含量,相對於構成樹脂的酸成分與胺成分總和100莫耳%,較佳係2~25莫耳%。
經導入樹脂中的末端終止劑係利用以下方法便可輕易檢測。例如將經導入末端終止劑的樹脂溶解於酸性溶液中,分解為樹脂構成單位的胺成分與酸成分,將利用施行氣相色層分析(GC)、NMR測定,便可輕易檢測末端終止劑。除此之外,直接將已導入末端終止劑的樹脂,施行熱裂解氣相層析(PGC)、紅外光譜及13C-NMR質譜測定便可檢測。
本發明所使用的鹼可溶性樹脂(A)係利用公知方法便可合成。
聚醯胺酸或聚醯胺酸酯的情況,可利用例如在低溫中使四羧酸二酐與二胺化合物進行反應的方法;利用四羧酸二酐與醇獲得二酯,然後再於胺與縮合劑存在下進行反應的方法;利用四羧酸二酐與醇獲得二酯,然後將剩餘的二羧酸施行醯氯化,並與胺進行反應的方法等製造方法便可合成。
聚苯并唑先質的情況,利用製造方法之例如使雙胺基酚化合物與二羧酸進行縮合反應便可獲得。具體而言,使例如二環己基羰二醯亞胺(DCC)之類的脫水縮合劑與酸進行反應,再於其中添加雙胺基酚化合物的方法;或者於經添加吡啶等三級胺的雙胺基酚化合物溶液中,滴下二醯氯(dicarboxylic acid dichloride)溶液等。
聚醯亞胺的情況,利用製造方法例如:將依上述方法所獲得之聚醯胺酸或聚醯胺酸酯,利用加熱、或酸、鹼等化學處理施行脫水閉環,便可獲得。
本發明的感光性樹脂組成物係含有光酸產生劑(B)。藉由含有光酸產生劑(B),在光照射部產生酸,使光照射部對鹼水溶液的溶解性增加,便可獲得光照射部溶解的正型浮雕圖案。又,藉由含有光酸產生劑(B)與環氧化合物或後述熱交聯劑,則在光照射部所產生的酸會促進環氧化合物、熱交聯劑的交聯反應,便可獲得光照射部不溶化的負型浮雕圖案。
光酸產生劑(B)係可舉例如:醌二疊氮化合物、鋶鹽、鏻鹽、重氮鎓鹽、碘鎓鹽等。
醌二疊氮化合物係可舉例如:醌二疊氮的磺酸利用酯鍵結於聚羥化合物者;醌二疊氮的磺酸利用磺醯胺鍵結於多胺化合物者;醌二疊氮的磺酸利用酯鍵結及/或磺醯胺鍵結於聚羥多胺化合物者等。較佳係該等聚羥化合物、多胺化合物的官能基全體達50莫耳%以上,被醌二疊氮所取代。又,較佳係光酸產生劑(B)含有2種以上,可獲得高感度的感光性樹脂組成物。
本發明中,醌二疊氮化合物較佳係使用5-萘醌二疊氮磺醯基、4-萘醌二疊氮磺醯基中之任一者。4-萘醌二疊氮磺醯酯化合物係在水銀燈的i線區域具有吸收,適於i線曝光。5-萘醌二疊氮磺醯酯化合物的吸收延伸至水銀燈的g線區域,適用於g線曝光。本發明中,依照進行曝光的波長,較佳為選擇4-萘醌二疊氮磺醯酯化合物、5-萘醌二疊氮磺醯酯化合物。又,亦可含有同一分子中具4-萘醌二疊氮磺醯基、5-萘醌二疊氮磺醯基的萘醌二疊氮磺醯酯化合物,亦可含有4-萘醌二疊氮磺醯酯化合物與5-萘醌二疊氮磺醯酯化合物。
上述醌二疊氮化合物係藉由具酚性羥基的化合物、與醌二疊氮磺酸化合物的酯化反應便可合成,且利用公知方法便可合成。藉由使用該等萘醌二疊氮化合物,便可更加提升解像度、感度、殘膜率。
光酸產生劑(B)中,因為鋶鹽、鏻鹽、重氮鎓鹽可使利用曝光產生的酸成分適度安定化,故較佳。其中,較佳係鋶鹽。亦可更進一步視需要含有增感劑等。
本發明中,光酸產生劑(B)含量相對於鹼可溶性樹脂(A)100質量份,較佳係0.1質量份以上、更佳係1質量份以上。又, 較佳係50質量份以下、更佳係30質量份以下。藉由將光酸產生劑(B)含量設為0.1質量份以上,便可提升曝光時的感度;而藉由設為50質量份以下,便可抑制耐熱性降低。另外,醌二疊氮化合物的情況較佳係3~40質量份,鋶鹽、鏻鹽、重氮鎓鹽的情況,總量較佳係0.5~20質量份。
本發明的感光性樹脂組成物係含有熱交聯劑(C)。所謂「熱交聯劑」係指分子內具有至少2個例如羥甲基、烷氧甲基、環氧基、氧雜環丁烷基等熱反應性官能基的化合物。熱交聯劑(C)係與鹼可溶性樹脂(A)或其他添加成分進行交聯,便可提高硬化膜的耐藥性與耐熱性。
具有至少2個烷氧甲基或羥甲基的化合物較佳例,係可舉例如:DML-PC、DML-PEP、DML-OC、DML-OEP、DML-34X、DML-PTBP、DML-PCHP、DML-OCHP、DML-PFP、DML-PSBP、DML-POP、DML-POP、DML-MBOC、DML-MBPC、DML-MTrisPC、DML-BisOC-Z、DML-BisOCHP-Z、DML-BPC、DML-BisOC-P、DMOM-PC、DMOM-PTBP、DMOM-MBPC、TriML-P、TriML-35XL、TML-HQ、TML-BP、TML-pp-BPF、TML-BPE、TML-BPA、TML-BPAF、TML-BPAP、TMOM-BP、TMOM-BPE、TMOM-BPA、TMOM-BPAF、TMOM-BPAP、HML-TPPHBA、HML-TPHAP、HMOM-TPPHBA、HMOM-TPHAP(以上均為商品名,本州化學工業(股)製);「NIKALAC」(註冊商標)MX-290、「NIKALAC」(註冊商標)MX-280、「NIKALAC」(註冊商標)MX-270、「NIKALAC」(註冊商標)MX-279、「NIKALAC」(註冊商標)MW-100LM、「NIKALAC」(註冊商標)MX-750LM(以上均為商品名,三和化學(股)製),分別可 從上述各公司取得。
具環氧基或氧雜環丁烷基的化合物,就一分子內具有2個環氧基者,係可舉例如:「EPIKOTE」(註冊商標)807、「EPIKOTE」(註冊商標)828、「EPIKOTE」(註冊商標)1002、「EPIKOTE」(註冊商標)1750、「EPIKOTE」(註冊商標)1007、YX8100-BH30、E1256、E4250、E4275(以上均係商品名,Japan Epoxy(股)製);「EPICRON」(註冊商標)EXA-4880、「EPICRON」(註冊商標)EXA-4822、「EPICRON」(註冊商標)EXA-9583、HP4032(以上均係商品名,大日本油墨化學工業(股)製);「EPOLITE」(註冊商標)40E、「EPOLITE」(註冊商標)100E、「EPOLITE」(註冊商標)200E、「EPOLITE」(註冊商標)400E、「EPOLITE」(註冊商標)70P、「EPOLITE」(註冊商標)200P、「EPOLITE」(註冊商標)400P、「EPOLITE」(註冊商標)1500NP、「EPOLITE」(註冊商標)80MF、「EPOLITE」(註冊商標)4000、「EPOLITE」(註冊商標)3002(以上均係商品名,共榮社化學(股)製);「DENACOL」(註冊商標)EX-212L、「DENACOL」(註冊商標)EX-214L、「DENACOL」(註冊商標)EX-216L、「DENACOL」(註冊商標)EX-252、「DENACOL」(註冊商標)EX-850L(以上均係商品名,Nagase ChemteX(股)製);GAN、GOT(以上均係商品名,日本化藥(股)製);「CELLOXIDE」(註冊商標)2021P(商品名,Daicel(股)製);「RIKARESIN」(註冊商標)DME-100、「RIKARESIN」(註冊商標)BEO-60E(以上均係商品名,新日本理化(股)製)等,分別可從各公司取得。
再者,就具有3個以上環氧基者係可舉例如:VG3101L(商品名,Printec(股)製);「TEPIC」(註冊商標)S、「TEPIC」 (註冊商標)G、「TEPIC」(註冊商標)P(以上均係商品名,日產化學工業(股)製);「EPICRON」(註冊商標)N660、「EPICRON」(註冊商標)N695、HP7200(以上均係商品名,大日本油墨化學工業(股)製);「DENACOL」(註冊商標)EX-321L(商品名,Nagase ChemteX(股)製);NC6000、EPPN502H、NC3000(以上均係商品名,日本化藥(股)製);「EPOTOHTO」(註冊商標)YH-434L(商品名,東都化成(股)製);EHPE-3150(商品名,Daicel(股)製);就具有2個以上氧雜環丁烷基的化合物係可舉例如:OXT-121、OXT-221、OX-SQ-H、OXT-191、PNOX-1009、RSOX(以上均係商品名,東亞合成(股)製);「ETERNACOLL」(註冊商標)OXBP、「ETERNACOLL」(註冊商標)OXTP(以上均係商品名,宇部興產(股)製)等,分別可從各公司取得。
熱交聯劑(C)較佳係一分子中具有酚性羥基,且上述酚性羥基的二鄰位具有羥甲基及/或烷氧甲基者。藉由羥甲基及/或烷氧甲基鄰接於酚性羥基,便可達與後述酚系抗氧化劑(D)同樣的效果,可更加提高可靠性試驗後的彎折耐性。烷氧甲基係可舉例如:甲氧基甲基、乙氧基甲基、丙氧基甲基、丁氧基甲基,惟並不僅侷限於該等。
一分子中具有酚性羥基、且上述酚性羥基的二鄰位具有羥甲基及/或烷氧甲基的熱交聯劑之例,係可例如以下者,惟並不僅侷限於該等。
[化6]
再者,熱交聯劑(C)較佳係一分子中具有3個以上酚性羥基的交聯劑。藉由具有3個以上酚性羥基便可更加提高抗氧化效果,可更加提高可靠性試驗後的彎折耐性。此種較佳例係可具例如以下者,惟並不僅侷限於該等。
(式中,c、d及e分別係表示1以上的整數,較佳係3≦c≦20、1≦d≦30、1≦c≦30。)
熱交聯劑(C)的含量相對於鹼可溶性樹脂(A)100質量份,較佳係5質量份以上、更佳係10質量份以上、特佳係15質量份以上。又,較佳係50質量份以下、更佳係40質量份以下、特佳係30質量份以下。藉由將熱交聯劑(C)含量設為5質量份以上,便可提升硬化膜的耐藥性,而藉由設在50質量份以下,便可防止硬化膜的伸長率降低。
本發明的感光性樹脂組成物係含有酚系抗氧化劑(D)。所謂「酚系抗氧化劑(D)」係指分子內含有酚性羥基,且酚性羥基之鄰位之至少其中一者具有龐大基的化合物。此處所謂「龐大基」係指直鏈狀烷基以外的分支烷基或芳香環基。具體係可舉例 如:第三丁基、第三戊基、第三己基等三級烷基;異丙基、第二丁基、第二戊基等二級烷基;異丁基、異戊基等分支一級烷基;環己基、環戊基等環烷基;及苯基、苄基、萘基等芳香環基。該等之中,就從耐熱可靠性與硬化性取得均衡的觀點,更佳係三級烷基、特佳係第三丁基。酚系抗氧化劑係具有當施加熱、光時,能抑制高分子膜遭氧化劣化的機能。若對硬化膜施加過剩的熱、光時,會有在高分子膜中生成自由基的情況。若高分子膜中生成自由基,便會有以此為起端更進一步生成不被喜歡的自由基、過氧化物之情況。因為此種自由基、過氧化物的化學性不安定,因而容易與其他化合物產生反應,更進一步生成新的自由基,而連鎖性引發氧化劣化,成為誘發硬化膜之膜物性降低的肇因。酚系抗氧化劑(D)係藉由捕捉在硬化膜中所產生的自由基,便可抑制上述膜物性降低情形。
酚系抗氧化劑(D)係可舉例如:受阻式酚系抗氧化劑、半受阻式酚系抗氧化劑、低受阻式酚系抗氧化劑。所謂「受阻式酚系抗氧化劑」係指酚性羥基鄰位雙方均係龐大基的抗氧化劑;所謂「半受阻式酚系抗氧化劑」係指酚性羥基鄰位其中一者係龐大基,而另一者係甲基的抗氧化劑;所謂「低受阻式酚系抗氧化劑」係指酚性羥基鄰位其中一者係龐大基,而另一者為氫的抗氧化劑。
酚系抗氧化劑(D)就從所補足自由基的安定性高之觀點,較佳係受阻式酚系抗氧化劑、半受阻式酚系抗氧化劑,更佳係受阻式酚系抗氧化劑。
酚系抗氧化劑(D)的25℃酚性羥基之酸解離常數pKa,較佳係10.1以上且13.0以下。酸解離常數(pKa)係25℃稀薄水溶液中的酸解離常數pKa之倒數對數值,若多段解離的情況,便 採用第1段的解離常數(即pKa1)。25℃酸解離常數pKa為10.1以上且13.0以下的酚系抗氧化劑,相較於無取代酚的酸性度(pKa=10.0)之下,酚性羥基的酸性度低。本發明的感光性樹脂組成物係含有以分子內具有親電子性基與酚系羥基的化合物(E1)、或具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)中之任一者為必要成分。該等化合物相較於無取代酚的酸性度(pKa=10.0)之下,均呈較高的酚性羥基酸性度。詳細容後述,藉由相對於酚系抗氧化劑(D)的酸性度之下,(E1)與(E2)成分的酚性羥基酸性度係充分高,便可抑制加熱硬化時的酚系抗氧化劑(D)之改質,能提升硬化膜的抗氧化效果、特別係可靠性試驗後的彎折耐性。
受阻式酚系抗氧化劑的具體例係可舉例如:2,6-二第三丁基酚、2,6-二第三丁基-4-甲酚、2,2'-亞甲基雙(6-第三丁基-4-甲酚)、1,3,5-三(3,5-二第三丁基-4-羥苄基)-1,3,5-三-2,4,6(1H,3H,5H)-三酮[例如:「ADKSTAB」(註冊商標)AO-20、ADEKA(股)製];季戊四醇四[3-(3,5-二第三丁基-4-羥苯基)丙酸酯][例如:「ADKSTAB」(註冊商標)AO-50、ADEKA(股)製];十八烷基-3-(3,5-二第三丁基-4-羥苯基)丙酸酯[例如:「ADKSTAB」(註冊商標)AO-60、ADEKA(股)製]等。
半受阻式酚系抗氧化劑具體例係可舉例如:雙[3-(3-第三丁基-4-羥-5-甲基苯基)丙酸][伸乙基雙(氧乙烯)][例如:"IRGANOX"(註冊商標)245、BASF Japan(股)製];3,9-雙[1,1-二甲基-2-[(3-第三丁基-4-羥-5-甲基苯基)丙醯氧基]乙基]-2,4,8,10-四螺[5.5]十一烷[例如:「ADKSTAB」(註冊商標)AO-80、ADEKA(股)製];三乙二醇雙[3-(3-第三丁基-4-羥-5-甲基苯基)丙酸酯][例如: 「ADKSTAB」(註冊商標)AO-70、ADEKA(股)製]等。
低受阻式酚系抗氧化劑的具體例,係可舉例如:1,1,3-三(2-甲基-4-羥-5-第三丁基苯基)丁烷[例如:「ADKSTAB」(註冊商標)AO-30、ADEKA(股)製];4,4'-亞丁基雙(6-第三丁基間甲酚)[例如:「ADKSTAB」(註冊商標)AO-40、ADEKA(股)製];1,1,3-三(2-甲基-4-羥-5-第三丁基苯基)丁烷[例如:Topanol CA、ICI公司製];4,4'-硫代雙(6-第三丁基間甲酚)[例如:「SUMILIZER」(註冊商標)WX-R、住友化學(股)製];4,4'-亞丁基雙(6-第三丁基間甲酚)[例如:「SUMILIZER」(註冊商標)BBM、住友化學(股)製];丙烯酸-2-第三丁基-4-甲基-6-(2-羥-3-第三丁基-5-甲基苄基)苯酯[例如:「SUMILIZER」(註冊商標)GM、住友化學(股)製]等。
相對於鹼可溶性樹脂(A)100質量份,酚系抗氧化劑(D)含量較佳係0.1質量份以上、更佳係0.5質量份以上、特佳係1質量份以上。又,較佳係20質量份以下、更佳係10質量份以下、特佳係5質量份以下。藉由將酚系抗氧化劑(D)含量設在0.1質量份以上,便可提高經可靠性試驗後的彎折耐性;而藉由設在20質量份以下,便可抑制耐熱性之降低。
本發明的感光性樹脂組成物係含有(D)以外具酚系羥基的化合物(E)。所謂「(D)以外具酚系羥基的化合物」係指分子內具有酚性羥基,但酚性羥基的鄰位雙方均未具有龐大基,且未具熱反應性官能基的化合物。此處所謂「龐大基」係指直鏈狀烷基以外之分支烷基或芳香環基;所謂「熱反應性官能基」係指例如羥甲基、烷氧甲基、環氧基、氧雜環丁烷基等,利用熱處理便可進行分子間交聯的官能基。
本發明所使用(D)以外具酚系羥基的化合物(E),係含有:分子內具親電子性基與酚系羥基的化合物(E1)、或具25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)。
此處所謂「分子內具親電子性基與酚系羥基的化合物(E1)之親電子性基」,係指具有降低被取代基所取代α位的碳電荷密度效果之取代基,例如Hammett取代基常數σp為正值的取代基。分子內具有親電子性基與酚系羥基的化合物(E1),係藉由分子內具有親電子性基,而提高酚性羥基的酸性度。一般熱交聯劑(C)在加熱處理步驟中,會與在感光性樹脂膜中所存在之化合物的活性氫基產生反應而形成交聯構造,而關於屬於活性氫基中之一種的酚性羥基,係酸性度越高,則與熱交聯劑(C)的反應性越高。即,本發明所使用之分子內具有親電子性基與酚系羥基的化合物(E1),係藉由分子內具有親電子性基而提高與熱交聯劑(C)間之反應性,而較熱交聯劑(C)與酚系抗氧化劑(D)的反應更優先進行反應。結果,抑制加熱硬化時出現酚系抗氧化劑(D)之改質,俾能提升硬化膜的抗氧化效果,特別係提升經可靠性試驗後的彎折耐性。
親電子性基的具體例係可舉例如:磺基、磺醯基、磺酸基、磺酸酯基、磺酸醯胺基、磺酸醯亞胺基、羧基、羰基、羧酸酯基、氰基、鹵基、三氟甲基、硝基等,惟並不僅侷限於該等,只要為公知任意之親電子性基便可。
具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)中,酸解離常數(pKa)係在25℃稀薄水溶液中的酸解離常數之倒數對數值,於多段解離的情況係採用第1段的解離常數(即pKa1)。具有25℃酸解離常數pKa為6.0以上且9.5以下之 酚系羥基的化合物(E2),相較於無取代酚的酸性度(pKa=10.0)之下,酚性羥基的酸性度較高。一般熱交聯劑(C)在加熱處理步驟中,會與在感光性樹脂膜中所存在化合物的活性氫基產生反應而形成交聯構造,而相關屬於活性氫基中之一種的酚性羥基,係酸性度越高,則與熱交聯劑(C)的反應性越高。即,本發明的感光性樹脂組成物中,所使用具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2),係藉由酚性羥基的高酸性度,而提高與熱交聯劑(C)間之反應性,而較熱交聯劑(C)與酚系抗氧化劑(D)的反應更優先進行反應。結果,抑制加熱硬化時出現酚系抗氧化劑(D)之改質,俾能提升硬化膜的抗氧化效果,特別係能提升經可靠性試驗後的彎折耐性。藉由將化合物(E2)的25℃酸解離常數pKa設在9.5以下,便可提高與熱交聯劑(C)的反應性,結果能抑制加熱硬化時出現酚系抗氧化劑(D)之改質,俾能提升硬化膜的抗氧化效果,特別係能提升經可靠性試驗後的彎折耐性。化合物(E2)的25℃酸解離常數pKa較佳係9.2以下、更佳係9.0以下、特佳係8.5以下。藉由將25℃酸解離常數pKa設為6.0以上,便可提高感光性樹脂組成物在室溫中的保存安定性,較佳係6.3以上、更佳係6.6以上、特佳係7.0以上。
分子內具有親電子性基與酚系羥基的化合物(E1)、以及具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2),較佳係分子內具有2個以上酚性羥基。藉由分子內具有2個以上酚性羥基,便成為與熱交聯劑(C)的反應點存在有2個以上之形式,俾能提高硬化膜的交聯密度,並提升耐藥性。
分子內具有親電子性基與酚系羥基的化合物(E1),及 具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2),較佳係酚性羥基的二鄰位均為氫原子。藉由酚性羥基的二鄰位均為氫原子、即二鄰位並未具有體積龐大的基,便可更加提升與熱交聯劑(C)的反應性,而較熱交聯劑(C)與酚系抗氧化劑(D)的反應更優先進行反應。結果,可更加抑制加熱硬化時出現酚系抗氧化劑(D)之改質,俾能更加提升硬化膜的抗氧化效果,特別係經可靠性試驗後的彎折耐性。
分子內具有親電子性基與酚系羥基的化合物(E1),及具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)之較佳例,係可舉例如一般式(3)所示化合物:
(一般式(3)中,X係表示從羰基、磺醯基、六氟異丙基中選擇的任一基;a、b係表示0~3之整數,且a+b係表示2~4之整數。)
一般式(3)所示化合物的具體例,係可舉例如:2,2'-二羥二苯基酮、4,4'-二羥二苯基酮、2,4-二羥二苯基酮、3,4-二羥二苯基酮、2,3,4-三羥二苯基酮、2,4,4'-三羥二苯基酮、2,3,4,4'-四羥二苯基酮、2,2',4,4'-四羥二苯基酮、雙酚S、雙酚AF等。
除一般式(3)所示化合物以外的具體例,尚可舉例如:2-氟酚、3-氟酚、4-氟酚、2,4-二氟酚、2,6-二氟酚、3,4-二氟酚、3,5-二氟酚、2,4,6-三氟酚、3,4,5-三氟酚、2,3,5,6-四氟酚、五氟酚、2,3,5,6-四氟-4-三氟甲酚、2,3,5,6-四氟-4-五氟苯基酚、全氟-1-萘 酚、全氟-2-萘酚、2-氯酚、3-氯酚、4-氯酚、2,4-二氯酚、2,6-二氯酚、3,4-二氯酚、3,5-二氯酚、2,4,6-三氯酚、3,4,5-三氯酚、2,3,5,6-四氯酚、五氯酚、2,3,5,6-四氯-4-三氯甲酚、2,3,5,6-四氯-4-五氯苯基酚、全氯-1-萘酚、全氯-2-萘酚、2-溴酚、3-溴酚、4-溴酚、2,4-二溴酚、2,6-二溴酚、3,4-二溴酚、3,5-二溴酚、2,4,6-三溴酚、3,4,5-三溴酚、2,3,5,6-四溴酚、五溴酚、2,3,5,6-四溴-4-三溴甲酚、2,3,5,6-四溴-4-五溴苯基酚、全溴-1-萘酚、全溴-2-萘酚、2-碘酚、3-碘酚、4-碘酚、2,4-二碘酚、2,6-二碘酚、3,4-二碘酚、3,5-二碘酚、2,4,6-三碘酚、3,4,5-三碘酚、2,3,5,6-四碘酚、五碘酚、2,3,5,6-四碘-4-三碘甲酚、2,3,5,6-四碘-4-五碘苯基酚、全碘-1-萘酚、全碘-2-萘酚、2-(三氟甲基)酚、3-(三氟甲基)酚、4-(三氟甲基)酚、2,6-雙(三氟甲基)酚、3,5-雙(三氟甲基)酚、2,4,6-三(三氟甲基)酚、2-氰基酚、3-氰基酚、4-氰基酚、2-硝基酚、3-硝基酚、4-硝基酚、2-羥基苯乙酮、3-羥基苯乙酮、4-羥基苯乙酮、水楊酸、水楊酸甲酯等。
分子內具有親電子性基與酚系羥基的化合物(E1),以及具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)之含量,相對於鹼可溶性樹脂(A)100質量份,較佳係1質量份以上、更佳係5質量份以上、特佳係10質量份以上。又,較佳係40質量份以下、更佳係30質量份以下、特佳係20質量份以下。藉由將分子內具有親電子性基與酚系羥基的化合物(E1),以及具有25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)之含量,設定在1質量份以上,便可提高經可靠性試驗後的彎折耐性,而藉由設定在40質量份以下,便可抑制耐熱性降低。
本發明的感光性樹脂組成物中,酚系抗氧化劑(D)之 含量與分子內具親電子性基及酚系羥基的化合物(E1)之含量之質量比(E1/D),較佳係2以上且40以下。藉由將(E1/D)設為2以上,便可在加熱處理步驟中,有效地抑制熱交聯劑(C)與酚系抗氧化劑(D)的反應。結果可抑制加熱硬化時的酚系抗氧化劑(D)改質,能提升硬化膜的抗氧化效果,特別係能提升經可靠性試驗後的彎折耐性。藉由將(E1/D)設在40以下,便可抑制因分子內具有親電子性基與酚系羥基的化合物(E1)之含量過剩而造成的耐熱性降低。(E1/D)更佳係3以上、特佳係5以上,且較佳係30以下、更佳係20以下。
本發明的感光性樹脂組成物中,酚系抗氧化劑(D)之含量與具25℃酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E2)之含量之質量比(E2/D),較佳係2以上且40以下。藉由將(E2/D)設為2以上,便可在加熱處理步驟中,有效地抑制熱交聯劑(C)與酚系抗氧化劑(D)的反應。結果可抑制加熱硬化時出現酚系抗氧化劑(D)之改質,能提升硬化膜的抗氧化效果,特別係能提升經可靠性試驗後的彎折耐性。藉由將(E2/D)設在40以下,便可抑制因分子內具有親電子性基與酚系羥基的化合物(E1)含量過剩而造成的耐熱性降低。(E2/D)更佳係3以上、特佳係5以上,且較佳係30以下、更佳係20以下。本發明的感光性樹脂組成物所使用之(D)以外具酚系羥基的化合物(E),視需要亦可和(E1)化合物或(E2)化合物一起併用(E1)與(E2)以外的化合物(E3),(E3)即分子內未具親電子性基、但具有酚系羥基的化合物。分子內未具親電子性基、但具酚系羥基的化合物(E3),係可舉例如:Bis-Z、BisOC-Z、BisOPP-Z、BisP-CP、Bis26X-Z、BisOTBP-Z、BisOCHP-Z、BisOCR-CP、BisP-MZ、BisP-EZ、Bis26X-CP、BisP-PZ、BisP-IPZ、BisCRIPZ、 BisOCP-IPZ、BisOIPP-CP、Bis26X-IPZ、BisOTBP-CP、TekP-4HBPA(TetrakisP-DO-BPA)、TrisP-HAP、TrisP-PA、TrisP-PHBA、TrisP-SA、TrisOCR-PA、BisOFP-Z、BisRS-2P、BisPG-26X、BisRS-3P、BisOC-OCHP、BisPC-OCHP、Bis25X-OCHP、Bis26X-OCHP、BisOCHP-OC、Bis236T-OCHP、亞甲基三-FR-CR、BisRS-26X、BisRS-OCHP[以上均為商品名,本州化學工業(股)];BIR-OC、BIP-PCBIR-PC、BIR-PTBP、BIR-PCHP、BIP-BIOC-F、4PC、BIR-BIPC-F、TEP-BIP-A[以上均為商品名,旭有機材工業(股)];1,4-二羥萘、1,5-二羥萘、1,6-二羥萘、1,7-二羥萘、2,3-二羥萘、2,6-二羥萘、2,7-二羥萘、2,4-二羥喹啉、2,6-二羥喹啉、2,3-二羥喹啉、蒽-1,2,10-三醇、蒽-1,8,9-三醇、8-喹啉酚等,分別可從各公司取得。藉由含有該等分子內未具親電子性基、但具有酚性羥基的化合物(E3),則所獲得之感光性樹脂組成物便可提高對鹼顯影液的溶解性,俾能縮短顯影時間。
分子內未具親電子性基、但具有酚性羥基的化合物(E3)之含量,相對於鹼可溶性樹脂(A)100質量份,較佳係1質量份以上、更佳係5質量份以上。且,較佳係20質量份以下、更佳係10質量份以下。藉由將分子內未具親電子性基、但具有酚性羥基的化合物(E3)之含量設為1質量份以上,便可縮短顯影時間,又,藉由設在20質量份以下,便可抑制耐熱性降低。
本發明的感光性樹脂組成物係可含有著色劑(F)。所謂「著色劑(F)」係指電子資訊材料領域中一般所使用的有機顏料、無機顏料或染料。著色劑(F)較佳係有機顏料及/或無機顏料。
有機顏料係可舉例如:吡咯并吡咯二酮系顏料、偶 氮、雙偶氮或多偶氮等偶氮系顏料;酞菁銅、鹵化酞菁銅或無金屬酞菁等酞菁系顏料;胺基蒽醌、二胺基二蒽醌、蒽嘧啶、黃士酮(flavanthrone)、蒽嵌蒽醌、陰丹士林、皮蒽酮或紫蒽酮等蒽醌系顏料;喹吖酮系顏料、二系顏料、培利酮系顏料、苝系顏料、硫代靛藍系顏料、異吲哚啉系顏料、異吲哚啉酮系顏料、喹啉黃系顏料、蒽系顏料、苯并呋喃酮系、或金屬錯合物系顏料。
無機顏料係可舉例如:氧化鈦、鋅華、硫化鋅、鉛白、碳酸鈣、沉澱性硫酸鋇、白碳、氧化鋁白、高嶺土系黏土、滑石、膨潤土、黑色氧化鐵、鎘紅、氧化鐵紅、鉬紅、鉬酸橙、鉬鉻紅、鉛黃、鎘黃、黃色氧化鐵、鈦黃、氧化鉻、鉻綠、鈦鈷綠、鈷綠、鈷鉻綠、孔雀石綠、群青、普魯士藍、鈷藍、天藍、鈷二氧化矽藍、鈷鋅二氧化矽藍、錳紫或鈷紫。
染料係可舉例如:偶氮染料、蒽醌染料、縮合多環芳香族羰基染料、靛染料、染料、酞菁染料、次甲基或聚次甲基染料。
紅色顏料係可舉例如:顏料紅9、顏料紅48、顏料紅97、顏料紅122、顏料紅123、顏料紅144、顏料紅149、顏料紅166、顏料紅168、顏料紅177、顏料紅179、顏料紅180、顏料紅192、顏料紅209、顏料紅215、顏料紅216、顏料紅217、顏料紅220、顏料紅223、顏料紅224、顏料紅226、顏料紅227、顏料紅228、顏料紅240或顏料紅254[數值均係顏料索引(以下稱「C.I.」號碼)]。
橙色顏料係可舉例如:顏料橙13、顏料橙36、顏料橙38、顏料橙43、顏料橙51、顏料橙55、顏料橙59、顏料橙61、顏料橙64、顏料橙65或顏料橙71(數值均係C.I.號碼)。
黃色顏料係可舉例如:顏料黃12、顏料黃13、顏料黃17、顏料黃20、顏料黃24、顏料黃83、顏料黃86、顏料黃93、顏料黃95、顏料黃109、顏料黃110、顏料黃117、顏料黃125、顏料黃129、顏料黃137、顏料黃138、顏料黃139、顏料黃147、顏料黃148、顏料黃150、顏料黃153、顏料黃154、顏料黃166、顏料黃168或顏料黃185(數值均係C.I.號碼)。
紫色顏料係可舉例如:顏料紫19、顏料紫23、顏料紫29、顏料紫30、顏料紫32、顏料紫37、顏料紫40或顏料紫50(數值均係C.I.號碼)。
藍色顏料係可舉例如:顏料藍15、顏料藍15:3、顏料藍15:4、顏料藍15:6、顏料藍22、顏料藍60或顏料藍64(數值均係C.I.號碼)。
綠色顏料係可舉例如:顏料綠7、顏料綠10、顏料綠36或顏料綠58(數值均係C.I.號碼)。
黑色顏料係可舉例如:黑色有機顏料及黑色無機顏料等。黑色有機顏料係可舉例如:碳黑、苯并呋喃酮系黑色顏料(國際公開第2010/081624號所記載)、苝系黑色顏料、苯胺系黑色顏料或蒽醌系黑色顏料。該等之中,就能獲得感度更優異之負型感光性樹脂組成物的觀點,特佳係苯并呋喃酮系黑色顏料或苝系黑色顏料。理由係苯并呋喃酮系黑色顏料、苝系黑色顏料在可見區域的穿透率低而能實現高遮光性,且紫外區域的穿透率相對高,藉此可有效率地進行曝光時的化學反應。亦可同時含有苯并呋喃酮系黑色顏料與苝系黑色顏料。黑色無機顏料係可舉例如:石墨、或鈦、銅、鐵、錳、鈷、鉻、鎳、鋅、鈣或銀等金屬微粒子、氧化物、複合氧 化物、硫化物、氮化物或氮氧化物,較佳係具有高遮光性的碳黑或鈦氮化物。
白色顏料係可舉例如:二氧化鈦、碳酸鋇、氧化鋯、碳酸鈣、硫酸鋇、氧化鋁白或二氧化矽。
染料係可舉例如:直接紅2、直接紅4、直接紅9、直接紅23、直接紅26、直接紅28、直接紅31、直接紅39、直接紅62、直接紅63、直接紅72、直接紅75、直接紅76、直接紅79、直接紅80、直接紅81、直接紅83、直接紅84、直接紅89、直接紅92、直接紅95、直接紅111、直接紅173、直接紅184、直接紅207、直接紅211、直接紅212、直接紅214、直接紅218、直接紅221、直接紅223、直接紅224、直接紅225、直接紅226、直接紅227、直接紅232、直接紅233、直接紅240、直接紅241、直接紅242、直接紅243或直接紅247;酸性紅35、酸性紅42、酸性紅51、酸性紅52、酸性紅57、酸性紅62、酸性紅80、酸性紅82、酸性紅111、酸性紅114、酸性紅118、酸性紅119、酸性紅127、酸性紅128、酸性紅131、酸性紅143、酸性紅145、酸性紅151、酸性紅154、酸性紅157、酸性紅158、酸性紅211、酸性紅249、酸性紅254、酸性紅257、酸性紅261、酸性紅263、酸性紅266、酸性紅289、酸性紅299、酸性紅301、酸性紅305、酸性紅319、酸性紅336、酸性紅337、酸性紅361、酸性紅396或酸性紅397;反應紅3、反應紅13、反應紅17、反應紅19、反應紅21、反應紅22、反應紅23、反應紅24、反應紅29、反應紅35、反應紅37、反應紅40、反應紅41、反應紅43、反應紅45、反應紅49或反應紅55;鹼性紅12、鹼性紅13、鹼性紅14、鹼性紅15、鹼性紅18、鹼性紅 22、鹼性紅23、鹼性紅24、鹼性紅25、鹼性紅27、鹼性紅29、鹼性紅35、鹼性紅36、鹼性紅38、鹼性紅39、鹼性紅45或鹼性紅46;直接紫7、直接紫9、直接紫47、直接紫48、直接紫51、直接紫66、直接紫90、直接紫93、直接紫94、直接紫95、直接紫98、直接紫100或直接紫101;酸性紫5、酸性紫9、酸性紫11、酸性紫34、酸性紫43、酸性紫47、酸性紫48、酸性紫51、酸性紫75、酸性紫90、酸性紫103或酸性紫126;反應紫1、反應紫3、4、反應紫5、反應紫6、反應紫7、反應紫8、反應紫9、反應紫16、反應紫17、反應紫22、反應紫23、反應紫24、反應紫26、反應紫27、反應紫33或反應紫34;鹼性紫1、鹼性紫2、鹼性紫3、鹼性紫7、鹼性紫10、鹼性紫15、鹼性紫16、鹼性紫20、鹼性紫21、鹼性紫25、鹼性紫27、鹼性紫28、鹼性紫35、鹼性紫37、鹼性紫39、鹼性紫40或鹼性紫48;直接黃8、直接黃9、直接黃11、直接黃12、直接黃27、直接黃28、直接黃29、直接黃33、直接黃35、直接黃39、直接黃41、直接黃44、直接黃50、直接黃53、直接黃58、直接黃59、直接黃68、直接黃87、直接黃93、直接黃95、直接黃96、直接黃98、直接黃100、直接黃106、直接黃108、直接黃109、直接黃110、直接黃130、直接黃142、直接黃144、直接黃161或直接黃163;酸性黃17、酸性黃19、酸性黃23、酸性黃25、酸性黃39、酸性黃40、酸性黃42、酸性黃44、酸性黃49、酸性黃50、酸性黃61、酸性黃64、酸性黃76、酸性黃79、酸性黃110、酸性黃127、酸性黃135、酸性黃143、酸性黃151、酸性黃159、酸性黃169、酸性黃174、酸性黃190、酸性黃195、酸性黃196、酸性黃197、酸性黃199、酸性黃218、酸性黃219、酸 性黃222或酸性黃227;反應黃2、反應黃3、反應黃13、反應黃14、反應黃15、反應黃17、反應黃18、反應黃23、反應黃24、反應黃25、反應黃26、反應黃27、反應黃29、反應黃35、反應黃37、反應黃41或反應黃42;鹼性黃1、鹼性黃2、4、鹼性黃11、鹼性黃13、鹼性黃14、鹼性黃15、鹼性黃19、鹼性黃21、鹼性黃23、鹼性黃24、鹼性黃25、鹼性黃28、鹼性黃29、鹼性黃32、鹼性黃36、鹼性黃39或鹼性黃40;酸性綠16、酸性藍9、酸性藍45、酸性藍80、酸性藍83、酸性藍90或酸性藍185或鹼性橙21或鹼性橙23(數值均係C.I.號碼);Sumilan、「Lanyl」(註冊商標)系列(以上均係住友化學工業(股)製);「Orasol」(註冊商標)、「Oracet」(註冊商標)、「Filamid」(註冊商標)、「Irgasperse」(註冊商標)、Zapon、「Neozapon」(註冊商標)、Neptune、Acidol系列(以上均係BASF(股)製)、「Kayaset」(註冊商標)、「Kayakalan」(註冊商標)系列(以上均係日本化藥(股)製);「Valifast」(註冊商標)Colors系列(Orient化學工業(股)製);Savinyl、Sandoplast、「Polysynthren」(註冊商標)、「Lanasyn」(註冊商標)系列(以上均係Clariant Japan(股)製);「Aizen」(註冊商標)、「Spilon」(註冊商標)系列(以上均係保土谷化學工業(股)製);機能性色素(山田化學工業(股)製);Plast Color、Oil Color系列(有本化學工業(股)製)等。
在提升有機EL顯示裝置對比之目的下,著色劑顏色較佳係橫跨可見光全波長域均可遮光的黑色,只要使用從有機顏料、無機顏料及染料中選擇之至少1種以上,當形成硬化膜時能呈黑色的著色劑便可。所以,亦可使用上述黑色有機顏料及黑色無機顏料,亦可藉由將二種以上的有機顏料與染料相混合而擬黑色化。 擬黑色化時,從上述紅色、橙色、黃色、紫色、藍色、綠色等有機顏料及染料中選擇二種以上相混合便可獲得。另外,本發明的感光性樹脂組成物本身未必一定要為黑色,亦可使用藉由在加熱硬化時改變顏色而使硬化膜呈黑色的著色劑。
該等之中,就從可確保高耐熱性的觀點,較佳係使用含有有機顏料及/或無機顏料,且形成硬化膜時呈黑色的著色劑。又,就從確保高絕緣性的觀點,較佳係使用含有有機顏料及/或染料,且形成硬化膜時呈黑色的著色劑。即,就從能兼顧高耐熱性與絕緣性的觀點,較佳係使用含有有機顏料,且形成硬化膜時呈黑色的著色劑。
著色劑(F)的含量,相對於鹼可溶性樹脂(A)100質量份,較佳係10質量份以上、更佳係20重質量份以上、特佳係30質量份以上,且較佳係300質量份以下、更佳係200質量份以下、特佳係150質量份以下。藉由將著色劑的含量設在10質量份以上,便可獲得硬化膜所必要的著色性,又藉由設在300質量份以下,便可使保存安定性呈良好。
本發明的感光性樹脂組成物中,當著色劑(F)係使用顏料時,較佳係併用分散劑。藉由併用分散劑,便可使著色劑在樹脂組成物中呈均勻且安定地分散。分散劑並無特別的限制,較佳係高分子分散劑。高分子分散劑係可舉例如:聚酯系高分子分散劑、丙烯酸系高分子分散劑、聚胺酯系高分子分散劑、聚烯丙基胺系高分子分散劑或羰二醯亞胺系分散劑。更具體而言,所謂「高分子分散劑」係指主鏈由多胺、聚醚、聚酯、聚胺酯、聚丙烯酸酯等構成,且側鏈或主鏈末端具有胺、羧酸、磷酸、胺鹽、羧酸鹽、磷酸鹽等 極性基的高分子化合物。極性基會吸附於顏料上,具有利用主鏈聚合物的立體障礙,使顏料分散安定化的功用。
分散劑係分類為:僅具胺值的(高分子)分散劑、僅具酸值的(高分子)分散劑、具有胺值與酸值的(高分子)分散劑、或胺值與酸值均未具有的(高分子)分散劑,較佳係具有胺值與酸值的(高分子)分散劑、僅具有胺值的(高分子)分散劑,更佳係僅具有胺值的(高分子)分散劑。
僅具有胺值的高分子分散劑具體例,係可舉例如:「DISPERBYK」(註冊商標)102、「DISPERBYK」(註冊商標)160、「DISPERBYK」(註冊商標)161、「DISPERBYK」(註冊商標)162、「DISPERBYK」(註冊商標)2163、「DISPERBYK」(註冊商標)164、「DISPERBYK」(註冊商標)2164、「DISPERBYK」(註冊商標)166、「DISPERBYK」(註冊商標)167、「DISPERBYK」(註冊商標)168、「DISPERBYK」(註冊商標)2000、「DISPERBYK」(註冊商標)2050、「DISPERBYK」(註冊商標)2150、「DISPERBYK」(註冊商標)2155、「DISPERBYK」(註冊商標)9075、「DISPERBYK」(註冊商標)9077、BYK-LP N6919、BYK-LP N21116或BYK-LP N21234(以上均係BYK-Chemie JAPAN(股)製);「EFKA」(註冊商標)4015、「EFKA」(註冊商標)4020、「EFKA」(註冊商標)4046、「EFKA」(註冊商標)4047、「EFKA」(註冊商標)4050、「EFKA」(註冊商標)4055、「EFKA」(註冊商標)4060、「EFKA」(註冊商標)4080、「EFKA」(註冊商標)4300、「EFKA」(註冊商標)4330、「EFKA」(註冊商標)4340、「EFKA」(註冊商標)4400、「EFKA」(註冊商標)4401、「EFKA」(註冊商標)4402、「EFKA」(註冊商標)4403或「EFKA」(註冊商標)4800(以上均係 BASF Japan(股)製);「AJISPER」(註冊商標)PB711(Ajinomoto Fine-Techno(股)製);或「SOLSPERSE」(註冊商標)13240、「SOLSPERSE」(註冊商標)13940、「SOLSPERSE」(註冊商標)20000、「SOLSPERSE」(註冊商標)71000或「SOLSPERSE」(註冊商標)76500(以上均係Lubrizol公司製)。
僅具胺值的高分子分散劑中,就從可獲得更微細之顏料分散、由感光性樹脂組成物所獲得之硬化膜的表面粗糙度變小(即膜表面的平滑性變得良好)之觀點,較佳係具有顏料吸附基為三級胺基或吡啶、嘧啶、吡、異三聚氰酸酯等含氮雜環等等鹼性官能基的高分子分散劑。具有三級胺基或含氮雜環之鹼性官能基的高分子分散劑,係可舉例如:「DISPERBYK」(註冊商標)164、「DISPERBYK」(註冊商標)167、BYK-LP N6919或BYK-LP N21116、或「SOLSPERSE」(註冊商標)20000。
具有胺值與酸值的高分子分散劑,係可舉例如:「DISPERBYK」(註冊商標)142、「DISPERBYK」(註冊商標)145、「DISPERBYK」(註冊商標)2001、"DISPERBYK(註冊商標)2010、「DISPERBYK」(註冊商標)2020、「DISPERBYK」(註冊商標)2025或「DISPERBYK」(註冊商標)9076、「Anti-Terra」(註冊商標)-205(以上均係BYK-Chemie JAPAN(股)製);「AJISPER」(註冊商標)PB821、「AJISPER」(註冊商標)PB880或「AJISPER」(註冊商標)PB881(以上均係Ajinomoto Fine-Techno(股)製);或「SOLSPERSE」(註冊商標)9000、「SOLSPERSE」(註冊商標)11200、「SOLSPERSE」(註冊商標)13650、「SOLSPERSE」(註冊商標)24000、「SOLSPERSE」(註冊商標)24000SC、「SOLSPERSE」(註冊商標)24000GR、 「SOLSPERSE」(註冊商標)32000、「SOLSPERSE」(註冊商標)32500、「SOLSPERSE」(註冊商標)32550、「SOLSPERSE」(註冊商標)326000、「SOLSPERSE」(註冊商標)33000、「SOLSPERSE」(註冊商標)34750、「SOLSPERSE」(註冊商標)35100、「SOLSPERSE」(註冊商標)35200、「SOLSPERSE」(註冊商標)37500、「SOLSPERSE」(註冊商標)39000或「SOLSPERSE」(註冊商標)56000(以上均係Lubrizol公司製)。
分散劑相對於著色劑的比例,為能在維持耐熱性情況下提升分散安定性,較佳係1質量%以上、更佳係3質量%以上。又,較佳係100質量%以下、更佳係50質量%以下。
本發明的感光性樹脂組成物較佳係含有有機溶劑。有機溶劑係可舉例如:醚類、醋酸酯類、酯類、酮類、芳香族烴類、醯胺類或醇類的化合物。
更具體係可舉例如:乙二醇單甲醚、乙二醇單乙醚、乙二醇單正丙醚、乙二醇單正丁醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單正丙醚、二乙二醇單正丁醚、三乙二醇單甲醚、三乙二醇單乙醚、丙二醇單甲醚、丙二醇單乙醚、丙二醇單正丙醚、丙二醇單正丁醚、二丙二醇單甲醚、二丙二醇單乙醚、二丙二醇單正丙醚、二丙二醇單正丁醚、二丙二醇二甲醚、二丙二醇甲基正丁醚、三丙二醇單甲醚、三丙二醇單乙醚、二乙二醇二甲醚、二乙二醇甲基乙醚、二乙二醇二乙醚或四氫呋喃等醚類;醋酸丁酯、乙二醇單甲醚醋酸酯、乙二醇單乙醚醋酸酯、丙二醇單甲醚醋酸酯、醋酸-3-甲氧基丁酯、乙二醇單丁醚醋酸酯、二乙二醇單甲醚醋酸酯、二乙二醇單乙醚醋酸酯、二乙二醇單丁醚醋酸酯、環己醇醋酸酯、 丙二醇二醋酸酯、丙二醇單甲醚醋酸酯、丙二醇單乙醚醋酸酯(以下稱「PGMEA」)、二丙二醇甲醚醋酸酯、醋酸-3-甲氧基-3-甲基-1-丁酯、1,4-丁二醇二醋酸酯、1,3-丁二醇二醋酸酯或1,6-己二醇二醋酸酯等醋酸酯類;甲乙酮、環己酮、2-庚酮或3-庚酮等酮類;2-羥基丙酸甲酯或2-羥基丙酸乙酯等乳酸烷基酯類;2-羥-2-甲基丙酸乙酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸乙酯、3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乙氧基醋酸乙酯、羥醋酸乙酯、2-羥-3-甲基丁酸甲酯、醋酸-3-甲氧基丁酯、醋酸-3-甲基-3-甲氧基丁酯、丙酸-3-甲基-3-甲氧基丁酯、醋酸乙酯、醋酸正丙酯、醋酸異丙酯、醋酸正丁酯、醋酸異丁酯、甲酸正戊酯、醋酸異戊酯、丙酸正丁酯、丁酸乙酯、丁酸正丙酯、丁酸異丙酯、丁酸正丁酯、丙酮酸甲酯、丙酮酸乙酯、丙酮酸正丙酯、乙醯醋酸甲酯、乙醯醋酸乙酯或2-氧丁酸乙酯等其他酯類;甲苯或二甲苯等芳香族烴類;N-甲基吡咯啶酮、N,N-二甲基甲醯胺或N,N-二甲基乙醯胺等醯胺類;丁醇、異丁醇、戊醇、4-甲基-2-戊醇、3-甲基-2-丁醇、3-甲基-3-甲氧基丁醇或二丙酮醇等醇類。
當著色劑(F)係使用顏料時,為使顏料能分散安定化,有機溶劑較佳係使用醋酸酯類化合物。在本發明之感光性樹脂組成物所含有之全部有機溶劑中,醋酸酯類化合物的所佔比例較佳係50質量%以上、更佳係70質量%以上。又,較佳係100質量%以下、更佳係90質量%以下。
隨基板的大型化,利用模具塗佈裝置進行塗佈已成主流,而為使該塗佈時能實現較佳之揮發性與乾燥性,較佳為由二以上化合物混合的有機溶劑。為使本發明感光性樹脂組成物的感光性 樹脂膜之膜厚均勻、並使表面平滑性與黏著性良好,在所有的有機溶劑中,沸點120~180℃之化合物所佔的比例較佳係30質量%以上。又,較佳係95質量%以下。
有機溶劑相對於本發明感光性樹脂組成物總固形份的比例,相對於總固形份100質量份,較佳係50質量份以上、更佳係100質量份以上。又,較佳係2,000質量份以下、更佳係1,000質量份以下。
本發明的感光性樹脂組成物係可含有密接改良劑。密接改良劑係可舉例如:乙烯三甲氧基矽烷、乙烯三乙氧基矽烷、環氧環己基乙基三甲氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、對苯乙烯基三甲氧基矽烷、3-胺丙基三甲氧基矽烷、3-胺丙基三乙氧基矽烷、N-苯基-3-胺丙基三甲氧基矽烷等矽烷偶合劑;鈦螯合劑、鋁螯合劑;由芳香族胺化合物與含烷氧基的矽化合物進行反應而獲得的化合物等。該等亦可含有2種以上。藉由含有該等密接改良劑,當對感光性樹脂膜施行顯影等情況時,可提高與矽晶圓、ITO、SiO2、氮化矽等底層基材的密接性。又,可提高對洗淨等所使用氧電漿、UV臭氧處理的耐性。密接改良劑含量相對於鹼可溶性樹脂(A)100質量份,較佳係0.1質量份以上、更佳係0.3質量份以上。又,較佳係10質量份以下、更佳係5質量份以下。
本發明的感光性樹脂組成物視需要在提升與基板間之潤濕性之目的下,亦可含有界面活性劑。界面活性劑係可使用市售化合物,具體聚矽氧系界面活性劑係可舉例如:Toray‧Dow Corning(股)的SH系列、SD系列、ST系列;BYK-Chemie JAPAN(股) 的BYK系列;信越化學工業(股)的KP系列;GE東芝聚矽氧(股)的TSF系列等;氟系界面活性劑係可舉例如:DIC(股)的「MEGAFAC(註冊商標)」系列;3M Japan(股)的FLUORAD系列;旭硝子(股)的「SURFLON(註冊商標)」系列、「ASAHIGUARD(註冊商標)」系列;Omnova Solutions公司的PolyFox系列等;由丙烯酸系及/或甲基丙烯酸系聚合物構成的界面活性劑係可舉例如:共榮社化學(股)的Poly Flow系列、楠本化成(股)的「DISPARON(註冊商標)」系列等,惟並不僅侷限於該等。
界面活性劑含量相對於鹼可溶性樹脂(A)100質量份,較佳係0.001質量份以上、更佳係0.002質量份以上。又,較佳係1質量份以下、更佳係0.5質量份以下。
其次,針對本發明感光性樹脂組成物之製造方法進行說明。例如藉由使上述(A)~(E)成分,與視必要的自由基聚合性化合物、著色劑(F)、分散劑、鏈轉移劑、聚合終止劑、密接改良劑、界面活性劑等,溶解於有機溶劑中,便可獲得感光性樹脂組成物。溶解方法係可例如:攪拌、加熱。施行加熱時,加熱溫度較佳在不致損及樹脂組成物性能的範圍內設定,通常係室溫~80℃。又,各成分的溶解順序並無特別的限定,例如從溶解性較低的化合物開始起依序溶解的方法。又,相關界面活性劑、部分密接改良劑等在攪拌溶解時容易產生氣泡的成分,藉由在其他成分溶解後最後才添加,便可防止因氣泡產生造成的其他成分溶解不良情形。
再者,當作為著色劑係使用顏料的情況,可例如使用分散機,使含有顏料的著色劑分散於(A)成分之樹脂溶液中的方法。
分散機係可舉例如:球磨機、珠磨機、砂輪機、三輥 研磨機或高速碰撞研磨機,為求分散效率化與微分散化,較佳係珠磨機。珠磨機係可舉例如:雙錐型磨機、籃式珠磨機、角柱式粉碎機或Dyno臥式分散珠磨機。珠磨機的球珠係可舉例如:二氧化鈦球珠、二氧化鋯球珠或鋯球珠。珠磨機的球珠徑較佳係0.01mm以上、更佳係0.03mm以上。又,較佳係5.0mm以下、更佳係1.0mm以下。當著色劑的初級粒徑以及由初級粒子凝聚所形成之次級粒子的粒徑較小之情況,較佳係0.03mm以上且0.10mm以下的微小球珠。此情況,較佳係可具備有利用離心分離方式可將微小球珠與分散液予以分離之隔板的珠磨機。
另一方面,當使含有次微米程度之粗大粒子的著色劑分散時,為能獲得充分的粉碎力,較佳係0.10mm以上的球珠。
所獲得之樹脂組成物較佳係使用過濾用過濾器進行過濾而除去雜質、粒子。過濾器孔徑係例如:0.5μm、0.2μm、0.1μm、0.05μm等,惟並不僅侷限於該等。過濾用濾器的材質係有如:聚丙烯(PP)、聚乙烯(PE)、尼龍(NY)、聚四氟乙烯(PTFE)等,較佳係聚乙烯、尼龍。當感光性樹脂組成物中含有顏料的情況,較佳係使用孔徑較顏料粒徑大的過濾用濾器。
其次,針對本發明硬化膜之製造方法進行詳細說明。
本發明之硬化膜之製造方法,係包括有:(1)將上述感光性樹脂組成物塗佈於基板上,形成感光性樹脂膜的步驟;(2)將該感光性樹脂膜施行乾燥的步驟;(3)對經乾燥之感光性樹脂膜隔著光罩施行曝光的步驟;(4)對經曝光之感光性樹脂膜施行顯影的步驟;以及 (5)對經顯影之感光性樹脂膜施行加熱處理的步驟。
形成感光性樹脂膜的步驟中,將本發明的感光性樹脂組成物利用例如:旋塗法、狹縫式塗佈法、浸塗法、噴塗法、印刷法等施行塗佈,而獲得感光性樹脂組成物的感光性樹脂膜。在塗佈之前,亦可將待塗佈感光性樹脂組成物的基材,預先利用前述密接改良劑施行前處理。例如使用由密接改良劑,在例如:異丙醇、乙醇、甲醇、水、四氫呋喃、丙二醇單甲醚醋酸酯、丙二醇單甲醚、乳酸乙酯、己二酸二乙酯等溶劑中溶解0.5~20質量%的溶液,對基材表面施行處理的方法。基材表面的處理方法係可舉例如:旋塗、狹縫式模具塗佈、棒塗、浸塗、噴塗、蒸氣處理等方法。
在將感光性樹脂膜施行乾燥的步驟中,對經塗佈的感光性樹脂膜視需要施行減壓乾燥處理,然後再使用例如:加熱板、烤箱、紅外線等,依50℃~180℃範圍施行1分鐘~數小時的熱處理,而獲得感光性樹脂膜。
其次,針對經乾燥的感光性樹脂膜隔著光罩施行曝光的步驟進行說明。對感光性樹脂膜上透過具有所需圖案之光罩照射光化射線。曝光所使用的光化射線係可有如:紫外線、可見光線、電子束、X射線等,本發明較佳係使用水銀燈的i線(365nm)、h線(405nm)、g線(436nm)。經光化射線照射後,亦可施行曝光後烘烤。藉由施行曝光後烘烤,便可期待顯影後的解像度提升、或顯影條件的容許幅度增加等效果。曝光後烘烤係可使用例如:烤箱、加熱板、紅外線、閃爍退火裝置(flash anneal)或雷射退火裝置等。曝光後烘烤溫度較佳係50~180℃、更佳係60~150℃。曝光後烘烤時間較佳係10秒~數小時。若曝光後烘烤時間在上述範圍內,則反應良好進 行,會有能縮短顯影時間的情況。
在對經曝光之感光性樹脂膜施行顯影而形成圖案的步驟中,將經曝光之感光性樹脂膜使用顯影液施行顯影,而除去曝光部以外的部分。顯影液較佳係例如:氫氧化四甲銨、二乙醇胺、二乙胺基乙醇、氫氧化鈉、氫氧化鉀、碳酸鈉、碳酸鉀、三乙胺、二乙胺、甲胺、二甲胺、醋酸二甲胺基乙酯、二甲胺基乙醇、甲基丙烯酸二甲胺基乙酯、環己胺、伸乙二胺、己二胺等呈鹼性的化合物之水溶液。又,依情況,亦可在該等鹼水溶液中,單獨添加或組合添加數種例如:N-甲基-2-吡咯啶酮、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲亞碸、γ-丁內酯、二甲基丙烯醯胺等極性溶劑;甲醇、乙醇、異丙醇等醇類;乳酸乙酯、丙二醇單甲醚醋酸酯等酯類;環戊酮、環己酮、異丁酮、甲基異丁酮等酮類等等。顯影方式係可採用例如:噴霧、攪練、浸漬、超音波等方式。
其次,經顯影形成的圖案,較佳為利用蒸餾水施行沖洗處理。此處亦可將例如:乙醇、異丙醇等醇類;乳酸乙酯、丙二醇單甲醚醋酸酯等酯類等添加於蒸餾水中施行沖洗處理。
其次,對經顯影的感光性樹脂膜施行加熱處理步驟。因為利用加熱處理便可除去殘留溶劑、低耐熱性成分,因而可提升耐熱性與耐藥性。本發明之感光性樹脂組成物係當含有聚醯亞胺先質、聚苯并唑先質及/或該等的共聚合體時,利用加熱處理便可形成醯亞胺環、唑環,因而能提升耐熱性與耐藥性。又,當含有熱交聯劑時,利用加熱處理便可進行熱交聯反應,俾能提升耐熱性與耐藥性。該加熱處理係選擇溫度進行階段式升溫,或者選擇某溫度範圍進行連續式升溫,並實施5分鐘~5小時。作為其中一例係分別 依150℃、250℃各施行30分鐘熱處理。或者,歷時2小時從室溫直線性升溫至300℃等方法。本發明的加熱處理條件較佳係180℃以上、更佳係200℃以上、特佳係230℃以上、最佳係250℃以上。又,加熱處理條件較佳係400℃以下、更佳係350℃以下、特佳係300℃以下。
其次,針對使用由本發明之感光性樹脂組成物所形成之片狀感光性片進行的硬化膜之製造方法進行說明。另外,此處所謂「感光性片」係指在剝離性基材上塗佈感光性樹脂組成物,經乾燥而獲得的片狀感光性樹脂組成物。
使用由本發明之感光性樹脂組成物形成片狀的感光性片時,若於上述感光性片設有保護薄膜的情況便將其剝離,使感光性片與基板相對向,利用熱壓接進行貼合便可獲得感光性樹脂膜。感光性片係藉由將本發明之感光性樹脂組成物塗佈於屬於剝離性基材之由聚對苯二甲酸乙二酯等構成的支撐薄膜上,經乾燥便可獲得。
熱壓接係可利用例如:熱壓處理、熱層壓處理、熱真空層壓處理等實施。貼合溫度就從對基板的密接性、埋藏性觀點,較佳係40℃以上。又,當感光性片具有感光性的情況,為防止貼合時出現感光性片硬化,導致曝光、顯影步驟中的圖案形成解像度降低,貼合溫度較佳為140℃以下。
將感光性片貼合於基板上而獲得的感光性樹脂膜,係可利用:對上述感光性樹脂膜施行曝光的步驟、對經曝光的感光性樹脂膜施行顯影的步驟,以及施行加熱硬化的步驟,便可形成硬化膜。
利用本發明之感光性樹脂組成物所形成的硬化膜,係可使用為包含有在基板上所形成之第一電極,以及相對向於上述第一電極所設置之第二電極的顯示裝置的平坦化層及/或絕緣層,上述顯示裝置具體係例如:LCD、ECD、ELD、有機EL等顯示裝置。以下,就有機EL顯示裝置為例進行說明。
本發明的有機EL顯示裝置係在基板上設有:驅動電路、平坦化層、第1電極、絕緣層、發光層及第2電極,而平坦化層及/或絕緣層係由本發明之硬化膜構成。若舉主動矩陣型顯示裝置為例,在例如玻璃、樹脂薄膜等基板上,設置:薄膜電晶體(以下稱「TFT」),以及位於TFT側邊且與TFT連接的配線,在其上面依覆蓋凹凸之方式設有平坦化層,更在平坦化層上設置顯示元件。顯示元件與配線係經由在平坦化層中所形成的接觸窗進行連接。特別係近年有機EL顯示裝置的可撓性化已成主流,前述具有驅動電路的基板較佳係由樹脂薄膜購成的有機EL顯示裝置。
本發明的有機EL顯示裝置較佳係設有硬化膜之部分的至少其中一部分具有可彎曲部分及/或依彎曲狀態固定化的部分。藉由使用由本發明之感光性樹脂組成物或感光性樹脂片硬化的硬化膜,便可獲得彎折耐性優異的有機EL顯示裝置。上述可彎曲部分及/或依彎曲狀態固定化之部分的曲率半徑較佳係0.1mm以上、且較佳係5mm以下。若曲率半徑達0.1mm以上,便可確保彎曲部的彎折性耐性,若在5mm以下,便可確保窄邊框化等設計性。本發明的有機EL顯示裝置係可在任意適當部分進行彎曲。例如有機EL顯示裝置亦可如折疊式顯示裝置般地可在中央處彎曲,就從確保設計性與顯示畫面最大極限的觀點,亦可在端部進行彎曲。 又,有機EL顯示裝置亦可沿長邊方向進行彎曲,亦可沿短邊方向進行彎曲。只要配合用途,使有機EL顯示裝置的特定部分能彎曲(例如四角落其中一部分或全部可朝斜向彎曲)便可。
圖1所示係已形成有平坦化層與絕緣層的TFT基板一例之剖視圖。在基板6上呈矩陣狀設置底閘極型或頂閘極型TFT1,依覆蓋該TFT1的狀態形成TFT絕緣層3。又,在該TFT絕緣層3上設有連接於TFT1的配線2。更,在絕緣層3上,依埋藏配線2的狀態設置平坦化層4。在平坦化層4中設有到達配線2的接觸窗7。然後,經由該接觸窗7,依連接於配線2的狀態,在平坦化層4上形成ITO(透明電極)5。此處,ITO5成為顯示元件(例如有機EL元件)的電極。然後,依覆蓋ITO5周緣的方式形成絕緣層8。有機EL元件係可為從基板6之對向側釋放出發光光的頂部發光型,亦可為從基板6側取出光的底部發光型。依此可獲得各有機EL元件連接至供驅動該等元件的TFT1而形成之主動矩陣型有機EL顯示裝置。
該TFT絕緣層3、平坦化層4及/或絕緣層8,如前述,藉由下述步驟便可形成:形成由本發明感光性樹脂組成物或感光性樹脂片所構成之感光性樹脂膜的步驟、對上述感光性樹脂膜施行曝光的步驟、對經曝光之感光性樹脂膜施行顯影的步驟以及對經顯影之感光性樹脂膜施行加熱處理的步驟。藉由包括有該等步驟的製造方法,便可獲得有機EL顯示裝置。
再者,由本發明之感光性樹脂組成物所形成的硬化膜,係可使用為構成電子零件的絕緣膜、保護膜。此處,電子零件係可舉例如:電晶體、二極體、積體電路(以下稱「IC」)、記憶體 等具半導體的主動元件;電阻、電容器、電感器等被動元件。又,使用半導體的電子零件亦稱「半導體裝置」。電子零件內的硬化膜具體例係可適用為例如:半導體的鈍化膜、半導體元件、TFT等的表面保護膜、2~10層之高密度安裝用多層配線的層間絕緣膜、觸控板顯示器的絕緣膜、保護膜等用途,惟並不僅侷限於此,亦可採取各種構造。又,形成硬化膜的基板表面係可配合用途、步驟再行適當選擇,可例如:矽、陶瓷、金屬、玻璃、環氧樹脂等,亦可在同一面內複數配置該等。具有已配置本發明硬化膜的表面保護膜、層間絕緣膜等的電子裝置,係可例如低耐熱性的MRAM等。即,本發明的硬化膜頗適用為MRAM的表面保護膜。又,除MRAM之外,其他例如可望成為新世代記憶體的聚合物記憶體(Polymer Ferroelectric RAM:PFRAM)、相變化記憶體(Phase Change RAM:PCRAM、或Ovonics Unified Memory:OUM),因為使用耐熱性較習知記憶體低的新材料,因而本發明硬化膜適用的可能性頗高。所以,本發明硬化膜亦頗適用為該等的表面保護膜用。又,亦頗適用於扇出(Fan-out)型晶圓級封裝(以下稱「扇出WLP」)。扇出WLP係在半導體晶片周邊使用環氧樹脂等密封樹脂設置擴充部分,從半導體晶片上的電極起施行再佈線直到該擴充部分處,藉由擴充部分處亦搭載焊球,而確保必要端子數的半導體封裝。扇出WLP中,依跨越由半導體晶片主面與密封樹脂主面所形成邊界線方式設置配線。即,在由經施行金屬配線的半導體晶片與密封樹脂之2種以上材料構成的基材上,形成層間絕緣膜,在該層間絕緣膜上形成配線。除此之外,將半導體晶片埋藏於在玻璃環氧樹脂基板上所形成凹部中之形式的半導體封裝,跨越由半導體晶片主面與印刷電路基 板主面的邊界線方式設置配線。此種態樣亦是在由2種以上材料構成的基材上形成層間絕緣膜,並在該層間絕緣膜上形成配線。由本發明感光性樹脂組成物硬化形成的硬化膜,因為對已施行金屬配線的半導體晶片具有高密接力,且密封樹脂對環氧樹脂等亦具有高密接力,因而頗適用為在由2種以上材料所構成基材上設置的層間絕緣膜。
以下舉實施例等針對本發明進行說明,惟本發明並不因該等例子而受限定。另外,實施例中的感光性樹脂組成物評價係依照以下方法實施。
實施例所使用樹脂(P1)~(P4)的分子量,係使用GPC(凝膠滲透色層分析儀)裝置Waters2690-996(Nihon Waters(股)製),且展開溶劑係使用N-甲基-2-吡咯啶酮(以下稱「NMP」)進行測定,依聚苯乙烯換算計算出數量平均分子量(Mn)。
使用表面粗糙度、輪廓形狀測定機(SURFCOM1400D;東京精密(股)),依測定倍率10,000倍、測定長度1.0mm、測定速度0.30mm/s,分別測定經預烘烤後、顯影後及硬化後的膜厚。
將各實施例的感光性樹脂組成物,利用旋塗法依任意轉數塗佈於聚醯亞胺薄膜基板上,而獲得感光性樹脂膜,然後在120℃加熱板上施行2分鐘預烘烤的乾燥步驟,獲得感光性樹脂膜。其次,使用自動顯影裝置(龍澤產業(股)製AD-2000),利用2.38質量%氫氧 化四甲銨水溶液施行90秒鐘淋灑顯影,接著利用純水施行30秒鐘沖洗。經顯影後附有感光性樹脂膜的基板,在氮環境下,於250℃烤箱中施行60分鐘硬化(加熱處理),獲得膜厚2.0μm的硬化膜。
其次,將具備有硬化膜的聚醯亞胺薄膜基板,切取10片長50mm×寬10mm大小。其次,將靠硬化膜之一面朝外側,在將聚醯亞胺薄膜基板從縱25mm線上彎折180°狀態下保持30秒鐘。經30秒鐘後,打開彎折的聚醯亞胺薄膜基板,使用FPD檢查顯微鏡(MX-61L,Olympus(股)製),觀察硬化膜表面的縱25mm線上之彎折部,評價硬化膜表面的外觀變化。彎折試驗係依曲率半徑0.1~1.0mm範圍實施,記錄硬化膜沒有從聚醯亞胺薄膜基板剝離、或硬化膜表面沒有發生龜裂等外觀變化的最小曲率半徑。
除在彎折耐性試驗前,追加將設有硬化膜的聚醯亞胺薄膜基板,在空氣環境下,依85℃條件保持100小時的步驟之外,其餘均依照與(3)相同的方法實施彎折耐性試驗,記錄沒有發生外觀變化的最小曲率半徑。
除基板係由聚醯亞胺薄膜改變為OA-10玻璃板(日本電氣硝子(股)製)之外,其餘均依照與(3)相同的方法製作感光性樹脂組成物的硬化膜。將硬化膜在東京應化工業(股)製剝離液106中,於60℃下施行10分鐘浸漬處理,測定處理前後的膜厚,求取因浸漬處理造成的減膜量。
相關實施例與比較例使用的化合物,如下所示。
使2,2-雙(3-胺基-4-羥苯基)六氟丙烷(以下稱「BAHF」)18.3g(0.05莫耳)溶解於丙酮100mL、環氧丙烷17.4g(0.3莫耳)中,冷卻至-15℃。在其中滴下使3-硝基氯化苯甲醯20.4g(0.11莫耳)溶解於丙酮100mL中的溶液。待滴下結束後,依-15℃進行4小時反應,然後回復室溫。過濾所析出的白色固體,依50℃施行真空乾燥。
將固體30g放入300mL不銹鋼熱壓鍋中,使分散於甲基賽珞蘇250mL中,添加5%鈀-碳2g。在其中利用氣球導入氫,再於室溫下進行還原反應。經約2小時後,確認氣球已不再縮小而結束反應。但反應結束後,經過濾而除去屬於觸媒的鈀化合物,利用旋轉式蒸發器施行濃縮,獲得下式所示含羥基之二胺化合物。
在乾燥氮氣流下,使3,3',4,4'-二苯醚四羧酸二酐(以下稱「ODPA」)62.0g(0.20莫耳)溶解於N-甲基-2-吡咯啶酮(以下稱「NMP」)500g中。在其中一起添加合成例1所獲得之含羥基之二胺化合物96.7g(0.16莫耳)與NMP:100g,於20℃下進行1小時反應,接著在50℃下進行2小時反應。其次,一起添加當作末端終止劑用之3-胺基酚8.7g(0.08莫耳)與NMP50g,於50℃下進行2小時反應。然後,歷時10分鐘滴下N,N-二甲基甲醯胺二甲縮醛 47.7g(0.40莫耳)經NMP:100g稀釋過的溶液。待滴下後,於50℃下攪拌3小時。待攪拌結束後,將溶液冷卻至室溫後,將溶液丟入水5L中而獲得白色沉澱。過濾收集該沉澱,利用水施行3次洗淨後,利用80℃真空乾燥機進行24小時乾燥,獲得目標之聚醯亞胺先質(P1)。聚醯亞胺先質(P1)的數量平均分子量係11,000。
在乾燥氮氣流下,使BAHF:58.6g(0.16莫耳)以及當作末端終止劑用的3-胺基酚8.7g(0.08莫耳),溶解於N-甲基-2-吡咯啶酮(NMP)300g中。在其中一起添加ODPA:62.0g(0.20莫耳)與NMP:100g,於20℃下攪拌1小時,接著在50℃下攪拌4小時。然後,添加二甲苯15g,一邊將水與二甲苯進行共沸,一邊在150℃下攪拌5小時。待攪拌結束後,將溶液丟入水5L中並收集白色沉澱。過濾收集該沉澱,利用水施行3次洗淨後,利用80℃真空乾燥機進行24小時乾燥,獲得目標之聚醯亞胺(P2)。聚醯亞胺(P2)的數量平均分子量係8,200。
在乾燥氮氣流下,使由二苯醚-4,4'-二羧酸41.3g(0.16莫耳)與1-羥-1,2,3-苯并三唑43.2g(0.32莫耳)進行反應而獲得之二羧酸衍生物的混合物0.16莫耳與BAHF:73.3g(0.20莫耳)溶解於NMP:570g中,然後依75℃進行12小時反應。其次,添加溶解於NMP:70g中的5-降烯-2,3-二羧酸酐13.1g(0.08莫耳),進而攪拌12小時而結束反應。過濾反應混合物後,將反應混合物丟入水/甲醇=3/1(容積比)之溶液中,獲得白色沉澱。過濾收集該沉澱,利用水施行3次洗淨後,利用80℃真空乾燥機進行24小時乾燥,獲得目標之聚 苯并唑(PBO)先質(P3)。PBO先質(P3)的數量平均分子量係8,500。
利用公知方法(日本專利第3120476號,實施例1),合成甲基丙烯酸甲酯/甲基丙烯酸/苯乙烯共聚合體(質量比30/40/30)。相對於該共聚合體100質量份,添加甲基丙烯酸環氧丙酯40質量份,利用淨化水施行再沉澱,經過濾與乾燥,獲得重量平均分子量(Mw)15,000、酸值110(mgKOH/g)、屬於含有自由基聚合性單體之聚合體的丙烯酸樹脂(P4)。
在乾燥氮氣流下,使TrisP-PA(商品名,本州化學工業(股)製)21.22g(0.05莫耳)、與氯化-5-萘醌二疊氮磺醯酸36.27g(0.135莫耳),溶解於1,4-二烷450g中,並設為室溫。在其中依系統內不會達35℃以上的方式,滴下與1,4-二烷50g混合的三乙胺15.18g。待滴下後,於30℃下攪拌2小時。過濾三乙胺鹽,將濾液丟入水中。然後,利用過濾收集所析出的沉澱。將該沉澱利用真空乾燥機施行乾燥,獲得下述式所示之光酸產生劑1。
HMOM-TPHAP:(具酚性羥基且上述酚性羥基的二鄰位具有分子量40以上的取代基、下述化學式所示之化合物,本州化學工業(股)製)
MX-270:「NIKALAC」(註冊商標)MX-270(下述化學式所示化合物,NIPPON CARBIDE工業(股)製)
VG3101L:「TECHMORE」(註冊商標)VG3101L(下述化學式所示化合物,Printec(股)製)。
[化13]
AO-60:「ADKSTAB」(註冊商標)AO-60(受阻式酚系抗氧化劑、ADEKA(股)製)(25℃的pKa=12.8)
AO-80:「ADKSTAB」(註冊商標)AO-80(半受阻式酚系抗氧化劑、ADEKA(股)製)(25℃的pKa=12.0)
AO-30:「ADKSTAB」(註冊商標)AO-80(低受阻式酚系抗氧化劑、ADEKA(股)製)(25℃的pKa=11.6)
E(i):雙酚AF(25℃的pKa=8.7)
E(ii):雙酚S(25℃的pKa=7.6)
E(iii):4,4'-二羥二苯基酮(25℃的pKa=7.7)
E(iv):2,2'-二羥二苯基酮(25℃的pKa=7.3)
E(v):4-(三氟甲基)酚(25℃的pKa=8.5)
E(vi):1,1,1-三(4-羥苯基)乙烷(25℃的pKa=10.0)
Y201:C.I.分散黃201(黃色染料)
R18:C.I.溶劑紅18(紅色染料)
B63:C.I.溶劑藍63(藍色染料)
PGME:丙二醇單甲醚
GBL:γ-丁內酯。
在黃色燈下,秤量:鹼可溶性樹脂(A)之由合成例2所獲得(P1):10.0g、光酸產生劑(B)之由合成例1所獲得之光酸產生劑1:2.0g、熱交聯劑(C)之HMOM-TPHAP:2.0g、酚系抗氧化劑(D)之AO-60(25℃酸解離常數pKa=12.8)0.5g、以及(D)以外具酚系羥基的化合物(E)之E(i)(25℃酸解離常數pKa=8.7)1.0g,使其溶解於PGME:40.0g與GBL:10.0g中。然後,所獲得溶液利用孔徑1μm過濾器施行過濾,獲得感光性樹脂組成物。該組成物的(E2/D)或(E1/D)係2。使用所獲得之感光性樹脂組成物,實施上述(3)~(5)的評價。
除分別改為使用與E(i)同量的E(ii)、E(iii)、E(iv)、E(v)取代E(i)作為(D)以外具酚系羥基的化合物(E)之外,其餘均設為與實施例1相同的組成。
除將(D)以外具酚系羥基的化合物(E)的E(i)含量分別變更為 3、5、20質量份之外,其餘均與實施例1同樣。
除(E3)成分係更進一步使用E(vi)10質量份之外,其餘均設為與實施例1相同的組成。
除分別改為使用與AO-60同量的AO-80(25℃的pKa=12.0)、AO-30(25℃的pKa=11.6)取代AO-60作為酚系抗氧化劑(D)之外,其餘均設為與實施例1相同組成。
除分別改為使用與HMOM-TPHAP同量的MX-270、VG3101L取代HMOM-TPHAP作為熱交聯劑(C)之外,其餘均設為與實施例1相同組成。
除分別改為使用與(P1)同量的合成例3所獲得(P2)、合成例4所獲得(P3)、合成例5所獲得(P4)取代合成例2所獲得(P1)作為鹼可溶性樹脂(A)之外,其餘均設為與實施例1相同組成。
除作為酚系抗氧化劑(D)係將AO-60含量由5質量份變更為1質量份,且分別改為使用E(ii)1、2、3、5、10、15、20、30質量 份取代E(i)作為(D)以外具酚系羥基的化合物(E)之外,其餘均與實施例1同樣。
除作為著色劑(F)成分係更進一步使用Y201:5質量份、R18:5質量份及B63:10質量份之外,其餘均設為與實施例1相同組成。
各實施例中所獲得之組成物的(E2/D)或(E1/D)係如表1~4所示。使用所獲得之感光性樹脂組成物,實施上述(3)~(5)的評價。
比較例1,除未使用(D)以外具酚系羥基的化合物(E)之外,其餘均設為與實施例1相同組成。比較例2中,除改為使用(E3)成分之E(vi)10質量份取代(D)以外具酚系羥基的化合物(E)之外,其餘均設為與實施例1相同組成。比較例3中,除未使用酚系抗氧化劑(D)之外,其餘均設為與實施例1相同組成。比較例4中,除未使用熱交聯劑(C)之外,其餘均設為與實施例1相同組成。比較例5中,除未使用(D)以外具酚系羥基的化合物(E)之外,其餘均設為與實施例25相同組成。
該等組成物的(E2/D)或(E1/D)係如表1~4所示。使用所獲得之感光性樹脂組成物,實施上述(3)~(5)的評價。
各實施例及比較例的組成及評價結果,如表1~4所示。
實施例1~25,針對彎折耐性、高溫保管試驗後的彎折耐性及耐藥性均呈現良好結果。相對於此,未使用(E1)與(E2)成分的比較例1、比較例2、比較例5、未使用(D)成分的比較例3、未使用(C)成分的比較例4,針對彎折耐性與高溫保管試驗後的彎折耐性均呈現較差的結果。
再者,(A)成分係分別使用聚醯亞胺、聚醯亞胺先質、聚苯并唑先質的實施例1、實施例14、實施例15,相較於使用丙烯酸樹脂的實施例16,彎折耐性及高溫保管試驗後的彎折耐性呈現更良好的結果。
再者,(C)成分係使用具酚性羥基,且上述酚性羥基的二鄰位具有羥甲基及/或烷氧甲基之屬於熱交聯劑的HMOM-TPHAP之實施例1,相較於使用其他熱交聯劑的實施例12、實施例13,針對彎折耐性、高溫保管試驗後的彎折耐性及耐藥性均能獲得更良好的結果。
再者,(D)成分係使用屬於受阻式酚系抗氧化劑的AO-60之實施例1,相較於使用其他酚系抗氧化劑的實施例10、實施例11,針對高溫保管試驗後的彎折耐性可獲得更良好的結果。
再者,(E1)及(E2)成分係使用分子內具有2個以上酚性羥基之化合物的實施例1~4,相較於使用分子內具有1個酚性羥基之化合物的實施例5,針對耐藥性可獲得更良好的結果。又,(E1)與(E2)成分係使用酚性羥基二鄰位為氫原子之化合物的實施例1、實施例2、實施例3、實施例5,相較於酚性羥基鄰位具有羥基以外基的實施例4,針對高溫保管試驗後的彎折耐性能獲得更良好的結果。
由本發明感光性樹脂組成物所形成的硬化膜,可使用為包含有:在基板上所形成之第一電極,以及相對向於上述第一電極所設置之第二電極的顯示裝置(具體係例如:LCD、ECD、ELD、有機EL等顯示裝置)的平坦化層及/或絕緣層。又,可使用為構成電子零件的絕緣膜、保護膜。此處,電子零件係可舉例如:電晶體、二極體、IC、記憶體等具有半導體的主動零件;電阻、電容器、電感器等被動零件。又,使用半導體的電子零件亦稱「半導體裝置」。電子零件內的硬化膜具體例係可適用為例如:半導體的鈍化膜、半導體元件、TFT等的表面保護膜、2~10層高密度安裝用多層配線的層間絕緣膜、觸控板顯示器的絕緣膜、保護膜、有機電場發光元件的絕緣層等用途,惟並不僅侷限於此,亦可採用各種構造。又,本發明的感光性樹脂組成物亦頗適用於扇出型晶圓級封裝(Fan-Out WLP)。
Claims (18)
- 一種感光性樹脂組成物,係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及具有25℃下酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E 2)。
- 如請求項1之感光性樹脂組成物,其中,上述酚系抗氧化劑(D)的25℃下酚性羥基之酸解離常數pKa係10.1以上且13.0以下。
- 如請求項1或2之感光性樹脂組成物,其中,上述酚系抗氧化劑(D)含量與上述具25℃下酸解離常數pKa為6.0以上且9.5以下之酚系羥基的化合物(E 2)含量之質量比(E 2/D)係2以上且20以下。
- 一種感光性樹脂組成物,係含有:鹼可溶性樹脂(A)、光酸產生劑(B)、熱交聯劑(C)、酚系抗氧化劑(D)以及除(D)以外具酚系羥基之化合物(E)的感光性樹脂組成物;其中,上述除(D)以外具酚系羥基之化合物(E),係含有分子內具親電子性基與酚系羥基的化合物(E 1)。
- 如請求項4之感光性樹脂組成物,其中,上述分子內具親電子性基與酚系羥基的化合物(E 1)含量之質量比(E 1/D)係2以上且20以下。
- 如請求項1至5中任一項之感光性樹脂組成物,其中,上述鹼可溶性樹脂(A)係含有:聚醯亞胺、聚醯亞胺先質、聚苯并 唑先質、及/或該等的共聚合體。
- 如請求項1至6中任一項之感光性樹脂組成物,其中,上述酚系抗氧化劑(D)係含有受阻式酚系抗氧化劑。
- 如請求項1至7中任一項之感光性樹脂組成物,其中,供形成具有可彎曲部分及/或依彎曲狀態固定化部分的有機EL顯示裝置之 絕緣膜用。
- 如請求項1至8中任一項之感光性樹脂組成物,其中,上述熱交聯劑(C)含有具酚性羥基且上述酚性羥基二鄰位具有羥甲基及/或烷氧甲基的熱交聯劑。
- 如請求項1至9中任一項之感光性樹脂組成物,其中,更進一步含有著色劑(F)。
- 如請求項1至10中任一項之感光性樹脂組成物,其中,上述感光性樹脂組成物係呈片狀。
- 一種硬化膜,係由請求項1至11中任一項之感光性樹脂組成物的硬化物構成。
- 一種元件,係具備有請求項12之硬化膜。
- 一種有機EL顯示裝置,係具備有請求項12之硬化膜。
- 如請求項14之有機EL顯示裝置,其中,具備上述有機EL顯示裝置之硬化膜的部分之至少其中一部分,係具有可彎曲部分及/或依彎曲狀態固定化的部分,且上述可彎曲部分及/或依彎曲狀態固定化部分的曲率半徑係在0.1mm以上且5mm以下之範圍。
- 一種電子零件,係將請求項12之硬化膜當作再配線間之層間絕緣膜而配置。
- 一種硬化膜之製造方法,係包括有:(1)將請求項1至10中任一項之感光性樹脂組成物塗佈於基板上,形成感光性樹脂膜的步驟;(2)將該感光性樹脂膜乾燥的步驟;(3)對經乾燥的感光性樹脂膜隔著光罩施行曝光的步驟;(4)對經曝光的感光性樹脂膜施行顯影的步驟;以及 (5)對經顯影的感光性樹脂膜施行加熱處理的步驟。
- 一種有機EL顯示裝置之製造方法,係包括有:利用請求項17之方法形成硬化膜的步驟。
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