TW201543051A - 探測器 - Google Patents
探測器 Download PDFInfo
- Publication number
- TW201543051A TW201543051A TW104104051A TW104104051A TW201543051A TW 201543051 A TW201543051 A TW 201543051A TW 104104051 A TW104104051 A TW 104104051A TW 104104051 A TW104104051 A TW 104104051A TW 201543051 A TW201543051 A TW 201543051A
- Authority
- TW
- Taiwan
- Prior art keywords
- platform
- substrate
- wafer
- probe card
- detector
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07314—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card the body of the probe being perpendicular to test object, e.g. bed of nails or probe with bump contacts on a rigid support
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R1/00—Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
- G01R1/02—General constructional details
- G01R1/06—Measuring leads; Measuring probes
- G01R1/067—Measuring probes
- G01R1/073—Multiple probes
- G01R1/07307—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
- G01R1/07364—Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card with provisions for altering position, number or connection of probe tips; Adapting to differences in pitch
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014025579A JP6276053B2 (ja) | 2014-02-13 | 2014-02-13 | プローバ |
Publications (1)
Publication Number | Publication Date |
---|---|
TW201543051A true TW201543051A (zh) | 2015-11-16 |
Family
ID=53774734
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW104104051A TW201543051A (zh) | 2014-02-13 | 2015-02-06 | 探測器 |
Country Status (4)
Country | Link |
---|---|
US (1) | US9684014B2 (ja) |
JP (1) | JP6276053B2 (ja) |
KR (1) | KR101838604B1 (ja) |
TW (1) | TW201543051A (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115638757A (zh) * | 2022-11-11 | 2023-01-24 | 法博思(宁波)半导体设备有限公司 | 一种硅片量测范围无限制的装置及方法 |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102566162B1 (ko) | 2016-08-23 | 2023-08-10 | 삼성전자주식회사 | 웨이퍼 검사 장치 및 이를 이용한 웨이퍼 검사 방법 |
KR102367037B1 (ko) * | 2017-06-21 | 2022-02-24 | 도쿄엘렉트론가부시키가이샤 | 검사 시스템 |
US10527649B2 (en) * | 2017-07-14 | 2020-01-07 | International Business Machines Corporation | Probe card alignment |
JP6958338B2 (ja) * | 2017-12-22 | 2021-11-02 | 東京エレクトロン株式会社 | 基板処理装置及び基板処理装置の運転方法 |
CN109406921B (zh) * | 2018-11-07 | 2023-08-29 | 东莞市柏尔电子科技有限公司 | 一种圆柱形电容的圆盘输送检测装置 |
WO2021124862A1 (ja) * | 2019-12-20 | 2021-06-24 | 日本電産リード株式会社 | 検査装置 |
JP2022043453A (ja) | 2020-09-04 | 2022-03-16 | 株式会社ニューフレアテクノロジー | θステージ機構及び電子ビーム検査装置 |
CN114088992B (zh) * | 2021-11-17 | 2024-03-19 | 佛山中科灿光微电子设备有限公司 | 电阻基板中心定位夹持装置及包含该装置的测阻仪 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5853149U (ja) * | 1981-10-05 | 1983-04-11 | 株式会社 東京精密 | ウエハ搬送装置 |
JPS5972146A (ja) | 1982-10-18 | 1984-04-24 | Nec Corp | ウエハ−プロ−ビング装置 |
US4892455A (en) * | 1987-05-21 | 1990-01-09 | Hine Derek L | Wafer alignment and transport mechanism |
JP3156192B2 (ja) | 1994-04-19 | 2001-04-16 | 東京エレクトロン株式会社 | プローブ方法及びその装置 |
JPH11297772A (ja) * | 1998-04-07 | 1999-10-29 | Mitsubishi Electric Corp | プローブ装置及びウエハ検査方法 |
JP4971416B2 (ja) | 1999-01-29 | 2012-07-11 | 東京エレクトロン株式会社 | 被検査体の載置機構 |
JP4173309B2 (ja) * | 2002-01-28 | 2008-10-29 | 東京エレクトロン株式会社 | センタリング装置及び枚葉式検査装置 |
US7547181B2 (en) * | 2004-11-15 | 2009-06-16 | Dainippon Screen Mfg. Co., Ltd. | Substrate position correcting method and apparatus using either substrate radius or center of rotation correction adjustment sum |
WO2007057944A1 (ja) * | 2005-11-15 | 2007-05-24 | Advantest Corporation | 電子部品試験装置及び電子部品試験装置へのパフォーマンスボードの装着方法 |
JP5581713B2 (ja) * | 2009-02-12 | 2014-09-03 | 株式会社Sumco | ウェーハ表面測定装置 |
-
2014
- 2014-02-13 JP JP2014025579A patent/JP6276053B2/ja active Active
-
2015
- 2015-02-06 TW TW104104051A patent/TW201543051A/zh unknown
- 2015-02-11 US US14/619,279 patent/US9684014B2/en active Active
- 2015-02-11 KR KR1020150020878A patent/KR101838604B1/ko active IP Right Grant
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN115638757A (zh) * | 2022-11-11 | 2023-01-24 | 法博思(宁波)半导体设备有限公司 | 一种硅片量测范围无限制的装置及方法 |
CN115638757B (zh) * | 2022-11-11 | 2023-11-28 | 法博思(宁波)半导体设备有限公司 | 一种硅片量测范围无限制的装置及方法 |
Also Published As
Publication number | Publication date |
---|---|
JP2015153860A (ja) | 2015-08-24 |
JP6276053B2 (ja) | 2018-02-07 |
US20150226767A1 (en) | 2015-08-13 |
KR101838604B1 (ko) | 2018-03-14 |
KR20150095584A (ko) | 2015-08-21 |
US9684014B2 (en) | 2017-06-20 |
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