TW201130103A - Semiconductor memory devices and semiconductor packages - Google Patents

Semiconductor memory devices and semiconductor packages

Info

Publication number
TW201130103A
TW201130103A TW100101125A TW100101125A TW201130103A TW 201130103 A TW201130103 A TW 201130103A TW 100101125 A TW100101125 A TW 100101125A TW 100101125 A TW100101125 A TW 100101125A TW 201130103 A TW201130103 A TW 201130103A
Authority
TW
Taiwan
Prior art keywords
semiconductor
input
pad part
memory devices
bump pad
Prior art date
Application number
TW100101125A
Other languages
English (en)
Inventor
Ho-Cheol Lee
Chi-Sung Oh
Jin-Kuk Kim
Original Assignee
Samsung Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020100018362A external-priority patent/KR20110099384A/ko
Application filed by Samsung Electronics Co Ltd filed Critical Samsung Electronics Co Ltd
Publication of TW201130103A publication Critical patent/TW201130103A/zh

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/03Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes
    • H01L25/04Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers
    • H01L25/065Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof all the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. assemblies of rectifier diodes the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L25/0657Stacked arrangements of devices
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/02Disposition of storage elements, e.g. in the form of a matrix array
    • G11C5/025Geometric lay-out considerations of storage- and peripheral-blocks in a semiconductor storage device
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11CSTATIC STORES
    • G11C5/00Details of stores covered by group G11C11/00
    • G11C5/06Arrangements for interconnecting storage elements electrically, e.g. by wiring
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/30Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
    • H01L22/32Additional lead-in metallisation on a device or substrate, e.g. additional pads or pad portions, lines in the scribe line, sacrificed conductors
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    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • H01L24/07Structure, shape, material or disposition of the bonding areas after the connecting process
    • H01L24/09Structure, shape, material or disposition of the bonding areas after the connecting process of a plurality of bonding areas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/0203Particular design considerations for integrated circuits
    • H01L27/0248Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection
    • H01L27/0251Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices
    • H01L27/0255Particular design considerations for integrated circuits for electrical or thermal protection, e.g. electrostatic discharge [ESD] protection for MOS devices using diodes as protective elements
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10BELECTRONIC MEMORY DEVICES
    • H10B12/00Dynamic random access memory [DRAM] devices
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    • H01L2224/09179Corner adaptations, i.e. disposition of the bonding areas at the corners of the semiconductor or solid-state body
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    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • H01L2224/16146Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked the bump connector connecting to a via connection in the semiconductor or solid-state body
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    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
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    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
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    • H01L2224/732Location after the connecting process
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    • H01L2224/73207Bump and wire connectors
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    • H01L2224/732Location after the connecting process
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    • H01L2225/03All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00
    • H01L2225/04All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers
    • H01L2225/065All the devices being of a type provided for in the same subgroup of groups H01L27/00 - H01L33/648 and H10K99/00 the devices not having separate containers the devices being of a type provided for in group H01L27/00
    • H01L2225/06503Stacked arrangements of devices
    • H01L2225/06541Conductive via connections through the device, e.g. vertical interconnects, through silicon via [TSV]
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    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Semiconductor Memories (AREA)
  • Dram (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Static Random-Access Memory (AREA)
  • Read Only Memory (AREA)
TW100101125A 2010-02-09 2011-01-12 Semiconductor memory devices and semiconductor packages TW201130103A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30277310P 2010-02-09 2010-02-09
KR1020100018362A KR20110099384A (ko) 2010-03-02 2010-03-02 와이드 입출력 반도체 메모리 장치 및 이를 포함하는 반도체 패키지
US12/891,141 US8796863B2 (en) 2010-02-09 2010-09-27 Semiconductor memory devices and semiconductor packages

Publications (1)

Publication Number Publication Date
TW201130103A true TW201130103A (en) 2011-09-01

Family

ID=44316781

Family Applications (1)

Application Number Title Priority Date Filing Date
TW100101125A TW201130103A (en) 2010-02-09 2011-01-12 Semiconductor memory devices and semiconductor packages

Country Status (4)

Country Link
US (2) US8796863B2 (zh)
JP (1) JP2011166147A (zh)
DE (1) DE102010061616A1 (zh)
TW (1) TW201130103A (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
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CN103681591A (zh) * 2012-09-14 2014-03-26 瑞萨电子株式会社 半导体器件
TWI641109B (zh) * 2016-09-23 2018-11-11 日商東芝記憶體股份有限公司 Memory device

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JP5627197B2 (ja) 2009-05-26 2014-11-19 ピーエスフォー ルクスコ エスエイアールエルPS4 Luxco S.a.r.l. 半導体記憶装置及びこれを備える情報処理システム並びにコントローラ
JP2011112411A (ja) 2009-11-25 2011-06-09 Elpida Memory Inc 半導体装置
KR20120056018A (ko) * 2010-11-24 2012-06-01 삼성전자주식회사 범프들과 테스트 패드들이 십자 모양으로 배열되는 반도체 장치
US9490003B2 (en) * 2011-03-31 2016-11-08 Intel Corporation Induced thermal gradients
US9658678B2 (en) 2011-03-31 2017-05-23 Intel Corporation Induced thermal gradients
JP5864957B2 (ja) * 2011-08-31 2016-02-17 ルネサスエレクトロニクス株式会社 半導体装置
CN104115227B (zh) 2011-12-23 2017-02-15 英特尔公司 使用系统热传感器数据的存储器操作
KR101896665B1 (ko) * 2012-01-11 2018-09-07 삼성전자주식회사 반도체 패키지
US9117496B2 (en) 2012-01-30 2015-08-25 Rambus Inc. Memory device comprising programmable command-and-address and/or data interfaces
JP2013196740A (ja) * 2012-03-22 2013-09-30 Toshiba Corp 半導体記憶装置およびその駆動方法
JP2013211292A (ja) * 2012-03-30 2013-10-10 Elpida Memory Inc 半導体装置
US8987787B2 (en) * 2012-04-10 2015-03-24 Macronix International Co., Ltd. Semiconductor structure and method for manufacturing the same
JP6058336B2 (ja) * 2012-09-28 2017-01-11 ルネサスエレクトロニクス株式会社 半導体装置
JP5439567B1 (ja) * 2012-10-11 2014-03-12 株式会社東芝 半導体装置
KR102048255B1 (ko) * 2012-10-25 2019-11-25 삼성전자주식회사 비트 라인 감지 증폭기 및 이를 포함하는 반도체 메모리 장치 및 메모리 시스템
JP2014106917A (ja) * 2012-11-29 2014-06-09 Canon Inc 情報処理装置、その制御方法、及びプログラム
KR102032887B1 (ko) * 2012-12-10 2019-10-16 삼성전자 주식회사 반도체 패키지 및 반도체 패키지의 라우팅 방법
KR102029682B1 (ko) 2013-03-15 2019-10-08 삼성전자주식회사 반도체 장치 및 반도체 패키지
JP6207190B2 (ja) * 2013-03-22 2017-10-04 ルネサスエレクトロニクス株式会社 半導体装置の製造方法
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