TW200917246A - Semiconductor memory device - Google Patents
Semiconductor memory device Download PDFInfo
- Publication number
- TW200917246A TW200917246A TW097123709A TW97123709A TW200917246A TW 200917246 A TW200917246 A TW 200917246A TW 097123709 A TW097123709 A TW 097123709A TW 97123709 A TW97123709 A TW 97123709A TW 200917246 A TW200917246 A TW 200917246A
- Authority
- TW
- Taiwan
- Prior art keywords
- circuit
- bit line
- memory cell
- line driver
- voltage
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title claims description 25
- 230000015654 memory Effects 0.000 claims abstract description 209
- 230000008859 change Effects 0.000 claims description 19
- 238000000034 method Methods 0.000 abstract description 13
- 239000007784 solid electrolyte Substances 0.000 description 31
- 238000012795 verification Methods 0.000 description 13
- 238000010586 diagram Methods 0.000 description 11
- 229910052751 metal Inorganic materials 0.000 description 10
- 239000002184 metal Substances 0.000 description 10
- 230000008569 process Effects 0.000 description 8
- 229910021645 metal ion Inorganic materials 0.000 description 6
- 230000009471 action Effects 0.000 description 5
- 230000002093 peripheral effect Effects 0.000 description 4
- 230000001360 synchronised effect Effects 0.000 description 4
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000009792 diffusion process Methods 0.000 description 3
- 229910052717 sulfur Inorganic materials 0.000 description 3
- 239000011593 sulfur Substances 0.000 description 3
- BUGBHKTXTAQXES-UHFFFAOYSA-N Selenium Chemical compound [Se] BUGBHKTXTAQXES-UHFFFAOYSA-N 0.000 description 2
- 239000003990 capacitor Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 229910052711 selenium Inorganic materials 0.000 description 2
- 239000011669 selenium Substances 0.000 description 2
- 101001105315 Bacillus subtilis (strain 168) 50S ribosomal protein L17 Proteins 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000003071 parasitic effect Effects 0.000 description 1
- 238000006479 redox reaction Methods 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/02—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using elements whose operation depends upon chemical change
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0064—Verifying circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0009—RRAM elements whose operation depends upon chemical change
- G11C13/0011—RRAM elements whose operation depends upon chemical change comprising conductive bridging RAM [CBRAM] or programming metallization cells [PMCs]
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
- G11C16/3436—Arrangements for verifying correct programming or erasure
- G11C16/3468—Prevention of overerasure or overprogramming, e.g. by verifying whilst erasing or writing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0064—Verifying circuits or methods
- G11C2013/0066—Verify correct writing whilst writing is in progress, e.g. by detecting onset or cessation of current flow in cell and using the detector output to terminate writing
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C13/00—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00
- G11C13/0002—Digital stores characterised by the use of storage elements not covered by groups G11C11/00, G11C23/00, or G11C25/00 using resistive RAM [RRAM] elements
- G11C13/0021—Auxiliary circuits
- G11C13/0069—Writing or programming circuits or methods
- G11C2013/009—Write using potential difference applied between cell electrodes
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/50—Resistive cell structure aspects
- G11C2213/52—Structure characterized by the electrode material, shape, etc.
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C2213/00—Indexing scheme relating to G11C13/00 for features not covered by this group
- G11C2213/70—Resistive array aspects
- G11C2213/79—Array wherein the access device being a transistor
Landscapes
- Semiconductor Memories (AREA)
- Read Only Memory (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007188328A JP2009026382A (ja) | 2007-07-19 | 2007-07-19 | 半導体記憶装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200917246A true TW200917246A (en) | 2009-04-16 |
Family
ID=40398066
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW097123709A TW200917246A (en) | 2007-07-19 | 2008-06-25 | Semiconductor memory device |
Country Status (4)
| Country | Link |
|---|---|
| US (2) | US7835171B2 (enExample) |
| JP (1) | JP2009026382A (enExample) |
| KR (1) | KR100944058B1 (enExample) |
| TW (1) | TW200917246A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112292727A (zh) * | 2018-06-27 | 2021-01-29 | 江苏时代全芯存储科技股份有限公司 | 记忆体驱动装置 |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009026382A (ja) * | 2007-07-19 | 2009-02-05 | Hitachi Ltd | 半導体記憶装置 |
| US8189365B2 (en) * | 2007-11-21 | 2012-05-29 | Nec Corporation | Semiconductor device configuration method |
| JP5161697B2 (ja) * | 2008-08-08 | 2013-03-13 | 株式会社東芝 | 不揮発性半導体記憶装置 |
| CN102171764B (zh) * | 2008-10-06 | 2014-08-27 | 株式会社日立制作所 | 半导体器件 |
| IT1392578B1 (it) * | 2008-12-30 | 2012-03-09 | St Microelectronics Rousset | Metodo di programmazione multilivello di celle di memoria a cambiamento di fase utilizzante impulsi di reset adattativi |
| US8270199B2 (en) * | 2009-04-03 | 2012-09-18 | Sandisk 3D Llc | Cross point non-volatile memory cell |
| WO2010125852A1 (ja) * | 2009-04-27 | 2010-11-04 | 株式会社日立製作所 | 半導体装置 |
| JP4705204B1 (ja) | 2009-10-15 | 2011-06-22 | パナソニック株式会社 | 抵抗変化型不揮発性記憶装置 |
| US8878153B2 (en) * | 2009-12-08 | 2014-11-04 | Nec Corporation | Variable resistance element having gradient of diffusion coefficient of ion conducting layer |
| JP2011253595A (ja) * | 2010-06-03 | 2011-12-15 | Toshiba Corp | 不揮発性半導体記憶装置 |
| JP2011258288A (ja) * | 2010-06-10 | 2011-12-22 | Toshiba Corp | 半導体記憶装置 |
| US8274812B2 (en) * | 2010-06-14 | 2012-09-25 | Crossbar, Inc. | Write and erase scheme for resistive memory device |
| JP5521850B2 (ja) * | 2010-07-21 | 2014-06-18 | ソニー株式会社 | 抵抗変化型メモリデバイスおよびその駆動方法 |
| US8259485B2 (en) * | 2010-08-31 | 2012-09-04 | Hewlett-Packard Development Company, L.P. | Multilayer structures having memory elements with varied resistance of switching layers |
| JP5626529B2 (ja) * | 2011-02-08 | 2014-11-19 | ソニー株式会社 | 記憶装置およびその動作方法 |
| JP5490961B2 (ja) * | 2011-03-14 | 2014-05-14 | パナソニック株式会社 | 不揮発性記憶素子の駆動方法及び不揮発性記憶装置 |
| JP5694053B2 (ja) * | 2011-05-26 | 2015-04-01 | 株式会社東芝 | 半導体記憶装置 |
| US8619471B2 (en) | 2011-07-27 | 2013-12-31 | Micron Technology, Inc. | Apparatuses and methods including memory array data line selection |
| CN103177761A (zh) * | 2011-12-23 | 2013-06-26 | 北京大学 | 阻变存储设备及其操作方法 |
| US9275731B1 (en) * | 2012-10-05 | 2016-03-01 | Marvell International Ltd. | Systems and methods for increasing the read sensitivity of a resistive random access memory (RRAM) |
| US9042159B2 (en) | 2012-10-15 | 2015-05-26 | Marvell World Trade Ltd. | Configuring resistive random access memory (RRAM) array for write operations |
| US9047945B2 (en) | 2012-10-15 | 2015-06-02 | Marvell World Trade Ltd. | Systems and methods for reading resistive random access memory (RRAM) cells |
| US8885388B2 (en) | 2012-10-24 | 2014-11-11 | Marvell World Trade Ltd. | Apparatus and method for reforming resistive memory cells |
| US9042162B2 (en) | 2012-10-31 | 2015-05-26 | Marvell World Trade Ltd. | SRAM cells suitable for Fin field-effect transistor (FinFET) process |
| WO2014074362A1 (en) | 2012-11-12 | 2014-05-15 | Marvell World Trade Ltd. | Concurrent use of sram cells with both nmos and pmos pass gates in a memory system |
| AT514477B1 (de) * | 2013-07-05 | 2015-03-15 | Nano Tecct Weiz Forschungsgmbh | Speicher-Sensoranordnung mit einem Sensorelement und einem Speicher |
| KR102284643B1 (ko) * | 2014-03-24 | 2021-07-30 | 고쿠리츠 다이가쿠 호진 도호쿠 다이가쿠 | 저항 변화형 기억 소자의 데이터 기록 장치 |
| JP6372203B2 (ja) | 2014-07-07 | 2018-08-15 | 株式会社ソシオネクスト | データ保持回路および保持データ復元方法 |
| WO2016157719A1 (ja) * | 2015-03-27 | 2016-10-06 | パナソニックIpマネジメント株式会社 | 半導体記憶装置の書き換え方法及び半導体記憶装置 |
| KR102401581B1 (ko) * | 2015-10-26 | 2022-05-24 | 삼성전자주식회사 | 저항식 메모리 소자 |
| KR102770122B1 (ko) | 2016-10-24 | 2025-02-21 | 에스케이하이닉스 주식회사 | 전자 장치 |
| KR102803096B1 (ko) | 2016-10-28 | 2025-05-07 | 에스케이하이닉스 주식회사 | 전자 장치 |
| JP2020205003A (ja) * | 2019-06-19 | 2020-12-24 | キオクシア株式会社 | メモリシステム、メモリコントローラ、及び半導体記憶装置 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2000076873A (ja) | 1998-08-26 | 2000-03-14 | Oki Micro Design:Kk | メモリセルのしきい値電圧制御方法及び半導体記憶装置 |
| JP4907011B2 (ja) | 2001-04-27 | 2012-03-28 | 株式会社半導体エネルギー研究所 | 不揮発性メモリとその駆動方法、及び半導体装置 |
| US7184301B2 (en) * | 2002-11-27 | 2007-02-27 | Nec Corporation | Magnetic memory cell and magnetic random access memory using the same |
| JP4249992B2 (ja) | 2002-12-04 | 2009-04-08 | シャープ株式会社 | 半導体記憶装置及びメモリセルの書き込み並びに消去方法 |
| JP4804133B2 (ja) * | 2005-12-06 | 2011-11-02 | ルネサスエレクトロニクス株式会社 | 不揮発性半導体記憶装置 |
| JP2009026382A (ja) * | 2007-07-19 | 2009-02-05 | Hitachi Ltd | 半導体記憶装置 |
-
2007
- 2007-07-19 JP JP2007188328A patent/JP2009026382A/ja not_active Withdrawn
-
2008
- 2008-06-25 TW TW097123709A patent/TW200917246A/zh unknown
- 2008-07-10 KR KR1020080067061A patent/KR100944058B1/ko not_active Expired - Fee Related
- 2008-07-11 US US12/172,198 patent/US7835171B2/en not_active Expired - Fee Related
-
2010
- 2010-10-30 US US12/916,499 patent/US20110044092A1/en not_active Abandoned
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112292727A (zh) * | 2018-06-27 | 2021-01-29 | 江苏时代全芯存储科技股份有限公司 | 记忆体驱动装置 |
| CN112292727B (zh) * | 2018-06-27 | 2024-05-24 | 北京时代全芯存储技术股份有限公司 | 记忆体驱动装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US20110044092A1 (en) | 2011-02-24 |
| KR100944058B1 (ko) | 2010-02-24 |
| US20090262568A1 (en) | 2009-10-22 |
| US7835171B2 (en) | 2010-11-16 |
| JP2009026382A (ja) | 2009-02-05 |
| KR20090009111A (ko) | 2009-01-22 |
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