TW200704590A - Dispersion containing hollow SiO2, coating composition, and substrate with antireflection coating film - Google Patents
Dispersion containing hollow SiO2, coating composition, and substrate with antireflection coating filmInfo
- Publication number
- TW200704590A TW200704590A TW095112489A TW95112489A TW200704590A TW 200704590 A TW200704590 A TW 200704590A TW 095112489 A TW095112489 A TW 095112489A TW 95112489 A TW95112489 A TW 95112489A TW 200704590 A TW200704590 A TW 200704590A
- Authority
- TW
- Taiwan
- Prior art keywords
- coating composition
- dispersion
- substrate
- antireflection
- coating film
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/113—Anti-reflection coatings using inorganic layer materials only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
- C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/046—Forming abrasion-resistant coatings; Forming surface-hardening coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/054—Forming anti-misting or drip-proofing coatings
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
- C08J7/04—Coating
- C08J7/06—Coating with compositions not containing macromolecular substances
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/42—Gloss-reducing agents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/61—Additives non-macromolecular inorganic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/67—Particle size smaller than 100 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/66—Additives characterised by particle size
- C09D7/68—Particle size between 100-1000 nm
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/70—Additives characterised by shape, e.g. fibres, flakes or microspheres
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/11—Anti-reflection coatings
- G02B1/111—Anti-reflection coatings using layers comprising organic materials
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
- C03C2217/45—Inorganic continuous phases
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/40—Coatings comprising at least one inhomogeneous layer
- C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
- C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
- C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
- C03C2217/475—Inorganic materials
- C03C2217/478—Silica
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K7/00—Use of ingredients characterised by shape
- C08K7/22—Expanded, porous or hollow particles
- C08K7/24—Expanded, porous or hollow particles inorganic
- C08K7/26—Silicon- containing compounds
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/25—Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles
- Y10T428/259—Silicic material
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005162487A JP4883383B2 (ja) | 2005-06-02 | 2005-06-02 | 中空状SiO2を含有する分散液、塗料組成物及び反射防止塗膜付き基材 |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200704590A true TW200704590A (en) | 2007-02-01 |
Family
ID=37481344
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW095112489A TW200704590A (en) | 2005-06-02 | 2006-04-07 | Dispersion containing hollow SiO2, coating composition, and substrate with antireflection coating film |
Country Status (7)
Country | Link |
---|---|
US (1) | US20080124539A1 (zh) |
EP (1) | EP1887059B1 (zh) |
JP (1) | JP4883383B2 (zh) |
CN (1) | CN101184815B (zh) |
HK (1) | HK1118304A1 (zh) |
TW (1) | TW200704590A (zh) |
WO (1) | WO2006129411A1 (zh) |
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JP4872739B2 (ja) * | 2006-03-23 | 2012-02-08 | 住友化学株式会社 | 積層体の製造方法 |
EP2128091B1 (en) * | 2007-03-16 | 2013-07-03 | Asahi Glass Company, Limited | Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon |
EP2128090B1 (en) * | 2007-03-16 | 2012-05-16 | Asahi Glass Company, Limited | Hollow microparticle, method for production thereof, coating composition, and article having coating film formed thereon |
JP2008233290A (ja) * | 2007-03-19 | 2008-10-02 | Mitsubishi Plastics Ind Ltd | 反射フィルム及び反射板 |
WO2009001905A1 (ja) * | 2007-06-26 | 2008-12-31 | Denki Kagaku Kogyo Kabushiki Kaisha | 球状有機ポリマー-シリコン化合物複合粒子、中空粒子およびそれらの製造方法 |
JP5423945B2 (ja) * | 2007-08-22 | 2014-02-19 | Jsr株式会社 | シリカ系中空粒子分散体の製造方法 |
JP5284632B2 (ja) * | 2007-12-12 | 2013-09-11 | 日揮触媒化成株式会社 | 導電性繊維状中空シリカ微粒子分散質およびその製造方法 |
WO2009106456A1 (en) * | 2008-02-29 | 2009-09-03 | Dsm Ip Assets B.V. | Articles comprising coating |
US8936833B2 (en) | 2008-02-29 | 2015-01-20 | The University Of Houston System | Anti-reflection coatings and methods of preparing and using same |
US8795773B2 (en) | 2008-03-13 | 2014-08-05 | Guardian Industries Corp. | Nano-particle loaded metal oxide matrix coatings deposited via combustion deposition |
US20090233105A1 (en) * | 2008-03-13 | 2009-09-17 | Remington Jr Michael P | Composite coatings comprising hollow and/or shell like metal oxide particles deposited via combustion deposition |
CN101579672A (zh) * | 2008-05-16 | 2009-11-18 | 3M创新有限公司 | 用于提高亲水性/透射率的二氧化硅涂层 |
EP2298694A4 (en) * | 2008-06-03 | 2011-06-01 | Asahi Glass Co Ltd | PROCESS FOR PRODUCTION OF CORE / ENVELOPE PARTICLES, CORE / ENVELOPE PARTICLES, METHOD FOR PRODUCTION OF HOLLOW PARTICLES, COMPOSITION OF PAINTS AND ARTICLE |
US20100035039A1 (en) * | 2008-08-07 | 2010-02-11 | 3M Innovative Properties Company | Acicular silica coating for enhanced hydrophilicity/transmittivity |
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JP5387331B2 (ja) * | 2008-10-31 | 2014-01-15 | 日立化成株式会社 | 中空状無機粒子の前駆体、中空状無機粒子及びこの製造方法、並びに中空状無機粒子を用いた光学部材及び光学部材体 |
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DE102008056792B4 (de) * | 2008-11-11 | 2018-06-28 | Schott Ag | Verfahren zum Aufbringen einer porösen selbstreinigenden Entspiegelungsschicht sowie Glas mit dieser Entspiegelungsschicht und Verwendung einer selbstreinigenden porösen Entspiegelungsschicht |
KR20100069799A (ko) * | 2008-12-17 | 2010-06-25 | 삼성코닝정밀소재 주식회사 | 모아레 무늬 저감 및 공기 오염물질 제거가 가능한 디스플레이 장치용 필터 |
JP5339627B2 (ja) * | 2009-02-17 | 2013-11-13 | 国立大学法人 名古屋工業大学 | 低密度シリカ殻からなるナノ中空粒子及びその製造方法 |
CN101941001B (zh) | 2009-07-03 | 2014-04-02 | 3M创新有限公司 | 亲水涂层、制品、涂料组合物和方法 |
SG179016A1 (en) * | 2009-09-07 | 2012-04-27 | Asahi Glass Co Ltd | Article having low-reflection film on surface of base material |
KR101781661B1 (ko) * | 2009-10-24 | 2017-09-25 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 구배 나노공극형 물품을 위한 방법 |
CN102241899B (zh) | 2010-05-11 | 2014-05-14 | 3M创新有限公司 | 涂料组合物,改性基体表面的方法和制品 |
JP5742519B2 (ja) * | 2010-07-06 | 2015-07-01 | 三菱化学株式会社 | セラミックス多孔質体 |
KR101256552B1 (ko) * | 2010-07-08 | 2013-04-19 | 주식회사 엘지화학 | 반사 방지 필름 및 이의 제조 방법 |
JP2012063687A (ja) * | 2010-09-17 | 2012-03-29 | Toppan Printing Co Ltd | 反射防止フィルム、反射防止性偏光板、及び透過型液晶ディスプレイ |
CN102675932A (zh) * | 2011-03-07 | 2012-09-19 | 深圳市优纳科技有限公司 | 复合介孔隔热保温涂料 |
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CN102838889B (zh) * | 2011-06-21 | 2015-06-24 | 国家纳米科学中心 | 一种可见光全波段多层减反射涂层的制备方法 |
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WO2013143615A1 (en) * | 2012-03-30 | 2013-10-03 | Applied Materials, Inc. | Transparent body for use in a touch panel and its manufacturing method and apparatus |
CN104671672B (zh) * | 2013-11-26 | 2017-06-06 | 比亚迪股份有限公司 | 一种减反射镀膜液及其制备方法、光伏玻璃及其制备方法、太阳能电池组件 |
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CN103951282B (zh) * | 2014-04-03 | 2017-02-01 | 中国科学院宁波材料技术与工程研究所 | 一种基于杂化溶胶的折射率渐变薄膜及其制备方法 |
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JP4048912B2 (ja) * | 2002-10-22 | 2008-02-20 | 松下電工株式会社 | 表面防汚性複合樹脂フィルム、表面防汚性物品、化粧板 |
JP4309744B2 (ja) * | 2002-11-07 | 2009-08-05 | パナソニック電工株式会社 | フッ素系複合樹脂フィルム及び太陽電池 |
KR101163539B1 (ko) * | 2003-11-06 | 2012-07-06 | 니끼 쇼꾸바이 카세이 가부시키가이샤 | 체인 무기 산화물 미립자 그룹, 미립자 그룹 분산의제조방법 및 미립자 그룹의 이용 |
TWI388876B (zh) * | 2003-12-26 | 2013-03-11 | Fujifilm Corp | 抗反射膜、偏光板,其製造方法,液晶顯示元件,液晶顯示裝置,及影像顯示裝置 |
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2005
- 2005-06-02 JP JP2005162487A patent/JP4883383B2/ja not_active Expired - Fee Related
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2006
- 2006-03-20 EP EP06729565.9A patent/EP1887059B1/en not_active Not-in-force
- 2006-03-20 CN CN2006800190391A patent/CN101184815B/zh not_active Expired - Fee Related
- 2006-03-20 WO PCT/JP2006/305597 patent/WO2006129411A1/ja active Application Filing
- 2006-04-07 TW TW095112489A patent/TW200704590A/zh unknown
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2007
- 2007-11-30 US US11/947,848 patent/US20080124539A1/en not_active Abandoned
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2008
- 2008-08-21 HK HK08109359.8A patent/HK1118304A1/xx not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JP4883383B2 (ja) | 2012-02-22 |
CN101184815A (zh) | 2008-05-21 |
HK1118304A1 (en) | 2009-02-06 |
CN101184815B (zh) | 2010-12-08 |
WO2006129411A1 (ja) | 2006-12-07 |
EP1887059A1 (en) | 2008-02-13 |
US20080124539A1 (en) | 2008-05-29 |
EP1887059B1 (en) | 2014-01-08 |
EP1887059A4 (en) | 2008-12-17 |
JP2006335881A (ja) | 2006-12-14 |
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