SG97790A1 - Spin tunnel magneto-resistance effect type magnetic sensor and production method thereof - Google Patents

Spin tunnel magneto-resistance effect type magnetic sensor and production method thereof

Info

Publication number
SG97790A1
SG97790A1 SG9902116A SG1999002116A SG97790A1 SG 97790 A1 SG97790 A1 SG 97790A1 SG 9902116 A SG9902116 A SG 9902116A SG 1999002116 A SG1999002116 A SG 1999002116A SG 97790 A1 SG97790 A1 SG 97790A1
Authority
SG
Singapore
Prior art keywords
production method
magnetic sensor
type magnetic
effect type
resistance effect
Prior art date
Application number
SG9902116A
Other languages
English (en)
Inventor
Matahiro Komuro
Yoshiaki Kawato
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Publication of SG97790A1 publication Critical patent/SG97790A1/en

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N50/00Galvanomagnetic devices
    • H10N50/10Magnetoresistive devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/093Magnetoresistive devices using multilayer structures, e.g. giant magnetoresistance sensors
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B82NANOTECHNOLOGY
    • B82YSPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y25/00Nanomagnetism, e.g. magnetoimpedance, anisotropic magnetoresistance, giant magnetoresistance or tunneling magnetoresistance
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R33/00Arrangements or instruments for measuring magnetic variables
    • G01R33/02Measuring direction or magnitude of magnetic fields or magnetic flux
    • G01R33/06Measuring direction or magnitude of magnetic fields or magnetic flux using galvano-magnetic devices
    • G01R33/09Magnetoresistive devices
    • G01R33/098Magnetoresistive devices comprising tunnel junctions, e.g. tunnel magnetoresistance sensors
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3906Details related to the use of magnetic thin film layers or to their effects
    • G11B5/3909Arrangements using a magnetic tunnel junction
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/33Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only
    • G11B5/39Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects
    • G11B5/3903Structure or manufacture of flux-sensitive heads, i.e. for reproduction only; Combination of such heads with means for recording or erasing only using magneto-resistive devices or effects using magnetic thin film layers or their effects, the films being part of integrated structures
    • G11B5/3967Composite structural arrangements of transducers, e.g. inductive write and magnetoresistive read
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00Metal working
    • Y10T29/49Method of mechanical manufacture
    • Y10T29/49002Electrical device making
    • Y10T29/4902Electromagnet, transformer or inductor
    • Y10T29/49021Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032Fabricating head structure or component thereof
    • Y10T29/49036Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043Depositing magnetic layer or coating
    • Y10T29/49044Plural magnetic deposition layers

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Manufacturing & Machinery (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Hall/Mr Elements (AREA)
  • Magnetic Heads (AREA)
  • Measuring Magnetic Variables (AREA)
SG9902116A 1998-04-30 1999-04-28 Spin tunnel magneto-resistance effect type magnetic sensor and production method thereof SG97790A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10120504A JPH11316919A (ja) 1998-04-30 1998-04-30 スピントンネル磁気抵抗効果型磁気ヘッド

Publications (1)

Publication Number Publication Date
SG97790A1 true SG97790A1 (en) 2003-08-20

Family

ID=14787841

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9902116A SG97790A1 (en) 1998-04-30 1999-04-28 Spin tunnel magneto-resistance effect type magnetic sensor and production method thereof

Country Status (5)

Country Link
US (4) US6327107B1 (ko)
EP (1) EP0953849A3 (ko)
JP (1) JPH11316919A (ko)
KR (1) KR19990083593A (ko)
SG (1) SG97790A1 (ko)

Families Citing this family (92)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6542342B1 (en) * 1998-11-30 2003-04-01 Nec Corporation Magnetoresistive effect transducer having longitudinal bias layer directly connected to free layer
JP2000285409A (ja) * 1999-03-29 2000-10-13 Toshiba Corp 磁気ヘッドの製造方法および磁気ヘッド
US6181537B1 (en) * 1999-03-29 2001-01-30 International Business Machines Corporation Tunnel junction structure with junction layer embedded in amorphous ferromagnetic layers
KR100378414B1 (ko) 1999-05-31 2003-03-29 닛뽕덴끼 가부시끼가이샤 자기저항효과소자, 그 제조방법, 및 그것을 사용한 자기기억장치
JP2001006126A (ja) * 1999-06-17 2001-01-12 Nec Corp 磁気抵抗効果ヘッド及びそのヘッドを備えた磁気抵抗検出システム並びにそのヘッドを備えた磁気記憶システム
JP2001006127A (ja) * 1999-06-18 2001-01-12 Tdk Corp トンネル磁気抵抗効果型ヘッド
JP3400750B2 (ja) * 1999-07-23 2003-04-28 ティーディーケイ株式会社 トンネル磁気抵抗効果型ヘッドの製造方法
US6556391B1 (en) * 1999-12-07 2003-04-29 Fujitsu Limited Biasing layers for a magnetoresistance effect magnetic head using perpendicular current flow
US6721147B2 (en) 1999-12-07 2004-04-13 Fujitsu Limited Longitudinally biased magnetoresistance effect magnetic head and magnetic reproducing apparatus
JP2001176027A (ja) * 1999-12-14 2001-06-29 Nec Corp 磁気抵抗効果ヘッド及びこれを用いた磁気記憶装置
JP2001196659A (ja) * 2000-01-12 2001-07-19 Tdk Corp トンネル磁気抵抗効果素子、薄膜磁気ヘッド、メモリ素子ならびにこれらの製造方法
US6415500B1 (en) * 2000-01-13 2002-07-09 Headway Technologies, Inc. Method to prevent electrostatic discharge for MR/GMR wafer fabrication
JP2001217483A (ja) * 2000-02-04 2001-08-10 Alps Electric Co Ltd トンネル型磁気抵抗効果型素子及びその製造方法
JP2001237469A (ja) 2000-02-22 2001-08-31 Fujitsu Ltd 磁気センサ及びその製造方法
DE10009944A1 (de) * 2000-03-02 2001-09-13 Forschungszentrum Juelich Gmbh Anordnung zum Messen eines Magnetfeldes und Verfahren zum Herstellen einer Anordnung zum Messen eines Magnetfeldes
JP2001312803A (ja) * 2000-04-28 2001-11-09 Fujitsu Ltd 磁気ヘッド及び磁気ヘッドの製造方法
JP2001325704A (ja) * 2000-05-15 2001-11-22 Nec Corp 磁気抵抗効果センサ、磁気抵抗効果センサの製造方法、磁気抵抗検出システム、および磁気記憶システム
US6700759B1 (en) * 2000-06-02 2004-03-02 Western Digital (Fremont), Inc. Narrow track width magnetoresistive sensor and method of making
JP3550533B2 (ja) 2000-07-06 2004-08-04 株式会社日立製作所 磁界センサー、磁気ヘッド、磁気記録再生装置及び磁気記憶素子
JP2002025018A (ja) 2000-07-10 2002-01-25 Tdk Corp 磁気抵抗効果型薄膜磁気ヘッド及びその製造方法
JP2002025017A (ja) 2000-07-10 2002-01-25 Tdk Corp 磁気抵抗効果型薄膜磁気ヘッド
US6504689B1 (en) * 2000-07-12 2003-01-07 International Business Machines Corporation Tunnel junction read head with flux guide coupled to and magnetically extending a recessed free layer to an air bearing surface
JP2002033532A (ja) 2000-07-17 2002-01-31 Alps Electric Co Ltd トンネル型磁気抵抗効果型素子及びその製造方法
JP2002050011A (ja) 2000-08-03 2002-02-15 Nec Corp 磁気抵抗効果素子、磁気抵抗効果ヘッド、磁気抵抗変換システム及び磁気記録システム
US6542343B1 (en) * 2000-08-09 2003-04-01 International Business Machines Corporation Tunnel valve head design to lower resistance
JP2002092829A (ja) 2000-09-21 2002-03-29 Fujitsu Ltd 磁気抵抗センサ及び磁気抵抗ヘッド
JPWO2002050924A1 (ja) 2000-12-21 2004-04-22 富士通株式会社 磁気抵抗効果素子、磁気ヘッド及びこれを用いる磁気再生装置
JP3890893B2 (ja) * 2000-12-28 2007-03-07 日本電気株式会社 スピントンネル磁気抵抗効果膜及び素子及びそれを用いた磁気抵抗センサー、及び磁気装置及びその製造方法
US6724582B2 (en) * 2001-01-19 2004-04-20 Kabushiki Kaisha Toshiba Current perpendicular to plane type magnetoresistive device, magnetic head, and magnetic recording/reproducing apparatus
JP3971934B2 (ja) * 2001-03-07 2007-09-05 ヤマハ株式会社 磁気センサとその製法
US6661626B2 (en) * 2001-03-20 2003-12-09 International Business Machines Corporation Tunnel valve sensor having a pinned layer structure with an iron oxide (Fe3O4) layer
JP3583079B2 (ja) * 2001-03-26 2004-10-27 株式会社東芝 磁気抵抗効果素子、磁気ヘッド、磁気再生装置及び磁気記憶装置
US6833982B2 (en) * 2001-05-03 2004-12-21 Hitachi Global Storage Technologies Netherlands B.V. Magnetic tunnel junction sensor with a free layer biased by longitudinal layers interfacing top surfaces of free layer extensions which extend beyond an active region of the sensor
WO2002099906A1 (fr) * 2001-06-04 2002-12-12 Matsushita Electric Industrial Co., Ltd. Element magnetoresistant, element de memorisation par magnetoresistance et memoire magnetique
JP3877985B2 (ja) * 2001-08-15 2007-02-07 富士通株式会社 磁気抵抗ヘッド及びその製造方法
US7027274B1 (en) * 2001-08-30 2006-04-11 Western Digital (Fremont), Inc. Spin-dependent tunneling read/write sensor for hard disk drives
US6485989B1 (en) 2001-08-30 2002-11-26 Micron Technology, Inc. MRAM sense layer isolation
US6937447B2 (en) * 2001-09-19 2005-08-30 Kabushiki Kaisha Toshiba Magnetoresistance effect element, its manufacturing method, magnetic reproducing element and magnetic memory
JP4032695B2 (ja) * 2001-10-23 2008-01-16 ソニー株式会社 磁気メモリ装置
JP2003198002A (ja) * 2001-12-25 2003-07-11 Fujitsu Ltd 磁気抵抗効果膜および強磁性積層構造体
US6735058B2 (en) * 2002-02-04 2004-05-11 International Business Machines Corporation Current-perpendicular-to-plane read head with an amorphous magnetic bottom shield layer and an amorphous nonmagnetic bottom lead layer
KR100617282B1 (ko) 2002-03-20 2006-08-30 후지쯔 가부시끼가이샤 Cpp 구조 자기 저항 효과 소자
US7005242B2 (en) 2002-03-22 2006-02-28 International Business Machines Corporation Magnetic head and method of making the same using an etch-stop layer for removing portions of the capping layer
US6989971B2 (en) * 2002-04-05 2006-01-24 Hitachi Global Storage Technologies Netherlands, B.V. Giant magnetoresistance (GMR) read head with reactive-ion-etch defined read width and fabrication process
JP2004039769A (ja) * 2002-07-02 2004-02-05 Alps Electric Co Ltd 磁気検出素子及びその製造方法
JP2004056037A (ja) * 2002-07-24 2004-02-19 Fujitsu Ltd Cpp構造磁気抵抗効果素子
US7211339B1 (en) * 2002-08-22 2007-05-01 Western Digital (Fremont), Inc. Highly conductive lead adjoining MR stripe and extending beyond stripe height at junction
JP3866641B2 (ja) * 2002-09-24 2007-01-10 株式会社東芝 磁気記憶装置およびその製造方法
US6887355B2 (en) * 2002-10-31 2005-05-03 Headway Technologies, Inc. Self-aligned pole trim process
JP3817223B2 (ja) 2002-12-19 2006-09-06 Tdk株式会社 薄膜磁気ヘッド及びその製造方法
JP4266692B2 (ja) 2003-04-23 2009-05-20 Tdk株式会社 磁気検出素子の製造方法
WO2007013887A2 (en) * 2004-10-15 2007-02-01 The Trustees Of Columbia University In The City Of New York Methods of manipulating the relaxation rate in magnetic materials and devices for using the same
US7765676B2 (en) * 2004-11-18 2010-08-03 Hitachi Global Storage Technologies Netherlands B.V. Method for patterning a magnetoresistive sensor
JP2006260685A (ja) * 2005-03-17 2006-09-28 Fujitsu Ltd 磁気抵抗効果型ヘッド
JP2005197764A (ja) * 2005-03-22 2005-07-21 Nec Corp 磁気抵抗効果センサ、磁気抵抗検出システム、および磁気記憶システム
JP2006344728A (ja) * 2005-06-08 2006-12-21 Alps Electric Co Ltd 磁気検出素子及びその製造方法
US7765675B2 (en) * 2005-09-01 2010-08-03 Hitachi Global Storage Technologies Netherlands B.V. CPP read sensors having constrained current paths made of lithographically-defined conductive vias and methods of making the same
JP2007179657A (ja) * 2005-12-28 2007-07-12 Hitachi Global Storage Technologies Netherlands Bv 磁気ヘッド及びその製造方法
JP2007299880A (ja) 2006-04-28 2007-11-15 Toshiba Corp 磁気抵抗効果素子,および磁気抵抗効果素子の製造方法
JP2008004223A (ja) * 2006-06-26 2008-01-10 Fujitsu Ltd 薄膜磁気ヘッドの製造方法
US20080003245A1 (en) * 2006-06-30 2008-01-03 Beiersdorf Ag Use of octyl salicylate in cosmetic preparations containing 1,3-dihydroxyacetone
JP2008085220A (ja) * 2006-09-28 2008-04-10 Toshiba Corp 磁気抵抗効果素子、磁気ヘッド、および磁気再生装置
JP2008160031A (ja) * 2006-12-26 2008-07-10 Sony Corp 記憶素子及びメモリ
JP4380707B2 (ja) * 2007-01-19 2009-12-09 ソニー株式会社 記憶素子
JP4869987B2 (ja) * 2007-03-08 2012-02-08 株式会社アルバック 磁気デバイスの製造方法、及び磁気デバイスの製造装置
JP2008277586A (ja) * 2007-04-27 2008-11-13 Toshiba Corp 磁気素子、磁気記録ヘッド及び磁気記録装置
US8557708B2 (en) * 2007-05-02 2013-10-15 HGST Netherlands B.V. Methods for fabricating a magnetic head reader using a chemical mechanical polishing (CMP) process for sensor stripe height patterning
JP4358279B2 (ja) * 2007-08-22 2009-11-04 株式会社東芝 磁気記録ヘッド及び磁気記録装置
US8994587B2 (en) 2010-05-14 2015-03-31 Qualcomm Incorporated Compressed sensing for navigation data
JP2009070439A (ja) * 2007-09-11 2009-04-02 Toshiba Corp 磁気記録ヘッド及び磁気記録装置
JP2009080875A (ja) 2007-09-25 2009-04-16 Toshiba Corp 磁気ヘッド及び磁気記録装置
US8335056B2 (en) * 2007-12-16 2012-12-18 HGST Netherlands, B.V. CPP sensors with hard bias structures that shunt sense current towards a shield
US20110049659A1 (en) * 2008-05-02 2011-03-03 Yoshishige Suzuki Magnetization control method, information storage method, information storage element, and magnetic function element
JP5377893B2 (ja) * 2008-06-19 2013-12-25 株式会社東芝 磁気ヘッドアセンブリおよび磁気記録再生装置
JP5361259B2 (ja) * 2008-06-19 2013-12-04 株式会社東芝 スピントルク発振子、磁気記録ヘッド、磁気ヘッドアセンブリ及び磁気記録装置
JP2010040060A (ja) * 2008-07-31 2010-02-18 Toshiba Corp 高周波アシスト記録用磁気ヘッドおよびそれを用いた磁気記録装置
JP2010040126A (ja) 2008-08-06 2010-02-18 Toshiba Corp 磁気記録ヘッド、磁気ヘッドアセンブリ及び磁気記録装置
JP5039006B2 (ja) 2008-09-26 2012-10-03 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5032430B2 (ja) * 2008-09-26 2012-09-26 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5039007B2 (ja) * 2008-09-26 2012-10-03 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5032429B2 (ja) * 2008-09-26 2012-09-26 株式会社東芝 磁気抵抗効果素子の製造方法、磁気抵抗効果素子、磁気ヘッドアセンブリ及び磁気記録再生装置
JP5173750B2 (ja) * 2008-11-06 2013-04-03 株式会社東芝 スピントルク発振子、磁気記録ヘッド、磁気ヘッドアセンブリ及び磁気記録装置
JP5558698B2 (ja) 2008-11-28 2014-07-23 株式会社東芝 磁気記録ヘッド、磁気ヘッドアセンブリ、磁気記録装置及び磁気記録方法
JP4891354B2 (ja) * 2009-01-14 2012-03-07 キヤノンアネルバ株式会社 磁気抵抗デバイスの製造方法及び製造装置
JP2011008861A (ja) * 2009-06-25 2011-01-13 Sony Corp メモリ
US8629518B2 (en) * 2009-07-02 2014-01-14 Taiwan Semiconductor Manufacturing Company, Ltd. Sacrifice layer structure and method for magnetic tunnel junction (MTJ) etching process
US8553370B2 (en) 2010-11-24 2013-10-08 HGST Netherlands B.V. TMR reader structure having shield layer
JP5606482B2 (ja) 2012-03-26 2014-10-15 株式会社東芝 磁気ヘッド、磁気ヘッドアセンブリ、磁気記録再生装置及び磁気ヘッドの製造方法
US8988835B1 (en) 2013-10-14 2015-03-24 International Business Machines Corporation Contact recording tunnel magnetoresistive sensor with layer of refractory metal
JP2017083173A (ja) * 2014-03-11 2017-05-18 コニカミノルタ株式会社 磁気センサー
US10971176B2 (en) 2019-02-21 2021-04-06 International Business Machines Corporation Tunnel magnetoresistive sensor with adjacent gap having chromium alloy seed layer and refractory material layer
JP7172939B2 (ja) * 2019-10-01 2022-11-16 Tdk株式会社 磁気センサ装置

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0652550A1 (fr) * 1993-11-08 1995-05-10 Commissariat A L'energie Atomique Tête magnétique de lecture à élément magnétorésistant multicouche et à concentrateur et son procédé de réalisation
US5650958A (en) * 1996-03-18 1997-07-22 International Business Machines Corporation Magnetic tunnel junctions with controlled magnetic response
WO1997041601A1 (en) * 1996-05-02 1997-11-06 Integrated Microtransducer Electronics Corporation All-metal, giant magnetoresistive, solid-state component

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2501727A1 (fr) 1981-03-13 1982-09-17 Vide Traitement Procede de traitements thermochimiques de metaux par bombardement ionique
JPH07296340A (ja) * 1994-04-26 1995-11-10 Sumitomo Metal Ind Ltd 磁気抵抗効果素子およびその素子を使用した薄膜磁気ヘッド
JPH08235542A (ja) * 1995-02-28 1996-09-13 Sumitomo Metal Ind Ltd 磁気抵抗効果素子
JP3625336B2 (ja) * 1995-03-13 2005-03-02 株式会社東芝 磁気抵抗効果ヘッド
JPH09106514A (ja) * 1995-10-06 1997-04-22 Fujitsu Ltd 強磁性トンネル素子及びその製造方法
US6084752A (en) * 1996-02-22 2000-07-04 Matsushita Electric Industrial Co., Ltd. Thin film magnetic head
JPH09282616A (ja) * 1996-04-18 1997-10-31 Fujitsu Ltd 磁気ヘッド及び磁気記録装置
US5729410A (en) * 1996-11-27 1998-03-17 International Business Machines Corporation Magnetic tunnel junction device with longitudinal biasing
US5966012A (en) * 1997-10-07 1999-10-12 International Business Machines Corporation Magnetic tunnel junction device with improved fixed and free ferromagnetic layers
US5898548A (en) * 1997-10-24 1999-04-27 International Business Machines Corporation Shielded magnetic tunnel junction magnetoresistive read head
JPH11175920A (ja) * 1997-12-05 1999-07-02 Nec Corp 磁気抵抗効果型複合ヘッドおよびその製造方法
US6330136B1 (en) * 1998-10-14 2001-12-11 Read-Rite Corporation Magnetic read sensor with SDT tri-layer and method for making same
US6353318B1 (en) * 2000-03-10 2002-03-05 Read-Rite Corporation Magnetoresistive sensor having hard biased current perpendicular to the plane sensor
JP2002025012A (ja) * 2000-07-10 2002-01-25 Tdk Corp 磁気抵抗効果型薄膜磁気ヘッド
JP4693292B2 (ja) * 2000-09-11 2011-06-01 株式会社東芝 強磁性トンネル接合素子およびその製造方法

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0652550A1 (fr) * 1993-11-08 1995-05-10 Commissariat A L'energie Atomique Tête magnétique de lecture à élément magnétorésistant multicouche et à concentrateur et son procédé de réalisation
US5650958A (en) * 1996-03-18 1997-07-22 International Business Machines Corporation Magnetic tunnel junctions with controlled magnetic response
WO1997041601A1 (en) * 1996-05-02 1997-11-06 Integrated Microtransducer Electronics Corporation All-metal, giant magnetoresistive, solid-state component

Also Published As

Publication number Publication date
US20020097536A1 (en) 2002-07-25
EP0953849A3 (en) 2000-03-15
JPH11316919A (ja) 1999-11-16
KR19990083593A (ko) 1999-11-25
US6504690B2 (en) 2003-01-07
US6325900B1 (en) 2001-12-04
US6587318B2 (en) 2003-07-01
EP0953849A2 (en) 1999-11-03
US6327107B1 (en) 2001-12-04
US20010005301A1 (en) 2001-06-28

Similar Documents

Publication Publication Date Title
SG97790A1 (en) Spin tunnel magneto-resistance effect type magnetic sensor and production method thereof
SG76599A1 (en) Tunneling magnetoresistance element and magnetic sensor magnetic head and magnetic memory using the element
DE69936461D1 (de) Magnetsensor und zugehöriges herstellungsverfahren
EP0694788A3 (en) Magnetoresistive spin valve sensor, method of manufacturing the sensor, and magnetic recording device using the sensor
SG72760A1 (en) Ferromagnetic tunnel junction magnetoresistive element and magnetic head
GB2388701B (en) Tunnel junction and charge prependicular-to-plane magnetic recording sensors and method of manufacture
GB2339294B (en) Differential solenoidal magnetic field sensing device and method for manufacturing the same
SG77708A1 (en) Low moment/high coercivity pinned layer for magnetic tunnel juction sensors
DE69632123D1 (de) Ferrimagnetischer Magnetowiderstandsensor mit Tunneleffekt
SG87185A1 (en) Magnetic element with improved field response and fabricating method thereof
DE69941585D1 (de) Nahfeld Abtastkopf und Herstellungsverfahren dafür
DE69904168D1 (de) Magnetfeldfühler
EP1208348A4 (en) LINEAR AND ROTATING MAGNETIC SENSOR
DE69631917D1 (de) Magnetsensor mit einem Riesenmagnetowiderstand und sein Herstellungsverfahren
DE60027629D1 (de) Magnetaufzeichnungsgerät und -methode
EP1408562A4 (en) MAGNETIC SENSOR AND METHOD FOR THE PRODUCTION THEREOF
HK1033707A1 (en) A magnetoresistive read sensor and method for making the same
SG86331A1 (en) Lapping control sensor for magnetoresistive effect head, lapping control method using the sensor and manufacturing method of the sensor
IL129403A0 (en) Spin stabilized projectile and method for its production
DE69825031D1 (de) Magnetfeldsensor mit spin tunnelübergang
DE69700776D1 (de) Ferrit-magnet, pulver und herstellungsverfahren dafür
EP1154263A4 (en) OXYGEN DETECTOR AND METHOD FOR MANUFACTURING DETECTION ELEMENT
DE10080670T1 (de) Magnetsensor und Herstellungsverfahren dafür, ferromagnetisches Tunnelübergangselement und Magnetkopf
SG53048A1 (en) Magnetoresistance sensor with enhanced magnetoresistive effect
HK1035523A1 (en) Magnetic ferrite material and manufacture method thereof.