SG141460A1 - Lithographic projection apparatus, purge gas supply system and gas purging method - Google Patents
Lithographic projection apparatus, purge gas supply system and gas purging methodInfo
- Publication number
- SG141460A1 SG141460A1 SG200802367-3A SG2008023673A SG141460A1 SG 141460 A1 SG141460 A1 SG 141460A1 SG 2008023673 A SG2008023673 A SG 2008023673A SG 141460 A1 SG141460 A1 SG 141460A1
- Authority
- SG
- Singapore
- Prior art keywords
- purge gas
- supply system
- projection apparatus
- lithographic projection
- gas supply
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Optics & Photonics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Toxicology (AREA)
- Computer Networks & Wireless Communication (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Separation Using Semi-Permeable Membranes (AREA)
- Fuel Cell (AREA)
- Air Humidification (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/623,180 US7384149B2 (en) | 2003-07-21 | 2003-07-21 | Lithographic projection apparatus, gas purging method and device manufacturing method and purge gas supply system |
Publications (1)
Publication Number | Publication Date |
---|---|
SG141460A1 true SG141460A1 (en) | 2008-04-28 |
Family
ID=34079792
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200802367-3A SG141460A1 (en) | 2003-07-21 | 2004-07-21 | Lithographic projection apparatus, purge gas supply system and gas purging method |
Country Status (9)
Country | Link |
---|---|
US (4) | US7384149B2 (fr) |
EP (3) | EP1649325B1 (fr) |
JP (4) | JP4487108B2 (fr) |
KR (3) | KR100846184B1 (fr) |
CN (3) | CN1853142B (fr) |
DE (1) | DE602004027497D1 (fr) |
SG (1) | SG141460A1 (fr) |
TW (3) | TWI251130B (fr) |
WO (2) | WO2005008339A2 (fr) |
Families Citing this family (111)
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EP2945016B1 (fr) | 2003-02-26 | 2017-09-06 | Nikon Corporation | Appareil d'exposition, procédé d'exposition et procédé de production du dispositif |
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2003
- 2003-07-21 US US10/623,180 patent/US7384149B2/en not_active Expired - Lifetime
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2004
- 2004-07-20 EP EP04774827A patent/EP1649325B1/fr not_active Not-in-force
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- 2004-07-20 CN CN2004800266052A patent/CN1853142B/zh active Active
- 2004-07-20 WO PCT/NL2004/000519 patent/WO2005008339A2/fr active Application Filing
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- 2004-07-21 WO PCT/US2004/023490 patent/WO2005010619A2/fr active Application Filing
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