SG11202010535YA - Mask blank, phase shift mask, and method of manufacturing semiconductor device - Google Patents
Mask blank, phase shift mask, and method of manufacturing semiconductor deviceInfo
- Publication number
- SG11202010535YA SG11202010535YA SG11202010535YA SG11202010535YA SG11202010535YA SG 11202010535Y A SG11202010535Y A SG 11202010535YA SG 11202010535Y A SG11202010535Y A SG 11202010535YA SG 11202010535Y A SG11202010535Y A SG 11202010535YA SG 11202010535Y A SG11202010535Y A SG 11202010535YA
- Authority
- SG
- Singapore
- Prior art keywords
- mask
- semiconductor device
- phase shift
- manufacturing semiconductor
- mask blank
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/26—Phase shift masks [PSM]; PSM blanks; Preparation thereof
- G03F1/32—Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/54—Absorbers, e.g. of opaque materials
- G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0332—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their composition, e.g. multilayer masks, materials
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/033—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers
- H01L21/0334—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane
- H01L21/0337—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising inorganic layers characterised by their size, orientation, disposition, behaviour, shape, in horizontal or vertical plane characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018103482A JP7109996B2 (ja) | 2018-05-30 | 2018-05-30 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
PCT/JP2019/018396 WO2019230313A1 (fr) | 2018-05-30 | 2019-05-08 | Ébauche de masque, masque à déphasage et procédé de production de dispositif à semi-conducteur |
Publications (1)
Publication Number | Publication Date |
---|---|
SG11202010535YA true SG11202010535YA (en) | 2020-11-27 |
Family
ID=68697347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG11202010535YA SG11202010535YA (en) | 2018-05-30 | 2019-05-08 | Mask blank, phase shift mask, and method of manufacturing semiconductor device |
Country Status (7)
Country | Link |
---|---|
US (1) | US11442357B2 (fr) |
JP (1) | JP7109996B2 (fr) |
KR (1) | KR102660488B1 (fr) |
CN (1) | CN112189167B (fr) |
SG (1) | SG11202010535YA (fr) |
TW (1) | TWI801587B (fr) |
WO (1) | WO2019230313A1 (fr) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102018213056A1 (de) * | 2018-08-03 | 2020-02-06 | Robert Bosch Gmbh | Verfahren und Vorrichtung zum Ermitteln einer Erklärungskarte |
CN113809047B (zh) * | 2020-06-12 | 2024-02-06 | 长鑫存储技术有限公司 | 半导体结构及其制备方法 |
Family Cites Families (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5054766U (fr) | 1973-09-20 | 1975-05-24 | ||
JPS60133831A (ja) * | 1983-12-21 | 1985-07-17 | Yamatoyo Shokuhin Kk | 漬物の製造法 |
JP3213345B2 (ja) | 1991-08-27 | 2001-10-02 | 松下電工株式会社 | タイマ付き配線器具 |
JPH07159981A (ja) * | 1993-12-03 | 1995-06-23 | Toshiba Corp | 露光用マスク基板 |
US5629115A (en) | 1993-04-30 | 1997-05-13 | Kabushiki Kaisha Toshiba | Exposure mask and method and apparatus for manufacturing the same |
US5514499A (en) | 1993-05-25 | 1996-05-07 | Kabushiki Kaisha Toshiba | Phase shifting mask comprising a multilayer structure and method of forming a pattern using the same |
JP3115185B2 (ja) | 1993-05-25 | 2000-12-04 | 株式会社東芝 | 露光用マスクとパターン形成方法 |
JPH10186632A (ja) | 1996-10-24 | 1998-07-14 | Toppan Printing Co Ltd | ハーフトーン型位相シフトマスク用ブランク及びハーフトーン型位相シフトマスク |
US5935735A (en) | 1996-10-24 | 1999-08-10 | Toppan Printing Co., Ltd. | Halftone phase shift mask, blank for the same, and methods of manufacturing these |
NL2007303A (en) | 2010-09-23 | 2012-03-26 | Asml Netherlands Bv | Process tuning with polarization. |
JP6005530B2 (ja) | 2013-01-15 | 2016-10-12 | Hoya株式会社 | マスクブランク、位相シフトマスクおよびこれらの製造方法 |
WO2014112457A1 (fr) | 2013-01-15 | 2014-07-24 | Hoya株式会社 | Ébauche de masque, masque de déphasage, et méthode de fabrication d'ébauche de masque et de masque de déphasage |
JP6185721B2 (ja) * | 2013-01-29 | 2017-08-23 | Hoya株式会社 | マスクブランク、マスクブランクの製造方法、転写用マスクの製造方法、および半導体デバイスの製造方法 |
US9177796B2 (en) * | 2013-05-03 | 2015-11-03 | Applied Materials, Inc. | Optically tuned hardmask for multi-patterning applications |
JP2018063441A (ja) * | 2013-11-06 | 2018-04-19 | 信越化学工業株式会社 | ハーフトーン位相シフト型フォトマスクブランク、ハーフトーン位相シフト型フォトマスク及びパターン露光方法 |
JP6264238B2 (ja) | 2013-11-06 | 2018-01-24 | 信越化学工業株式会社 | ハーフトーン位相シフト型フォトマスクブランク、ハーフトーン位相シフト型フォトマスク及びパターン露光方法 |
JP6524614B2 (ja) | 2014-05-27 | 2019-06-05 | 大日本印刷株式会社 | マスクブランクス、ネガ型レジスト膜付きマスクブランクス、位相シフトマスク、およびそれを用いるパターン形成体の製造方法 |
JP6430155B2 (ja) * | 2014-06-19 | 2018-11-28 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法 |
US10481485B2 (en) * | 2015-05-15 | 2019-11-19 | Hoya Corporation | Mask blank, transfer mask, method of manufacturing transfer mask and method of manufacturing semiconductor device |
JP6058757B1 (ja) * | 2015-07-15 | 2017-01-11 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法および半導体デバイスの製造方法 |
JP6087401B2 (ja) * | 2015-08-14 | 2017-03-01 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
TWI684822B (zh) | 2015-09-30 | 2020-02-11 | 日商Hoya股份有限公司 | 空白遮罩、相位移轉遮罩及半導體元件之製造方法 |
JP6328863B1 (ja) * | 2016-08-26 | 2018-05-23 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法及び半導体デバイスの製造方法 |
JP6271780B2 (ja) * | 2017-02-01 | 2018-01-31 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
JP6321265B2 (ja) * | 2017-05-29 | 2018-05-09 | Hoya株式会社 | マスクブランク、位相シフトマスク、位相シフトマスクの製造方法及び半導体デバイスの製造方法 |
JP6490786B2 (ja) * | 2017-12-25 | 2019-03-27 | Hoya株式会社 | マスクブランク、位相シフトマスクおよび半導体デバイスの製造方法 |
-
2018
- 2018-05-30 JP JP2018103482A patent/JP7109996B2/ja active Active
-
2019
- 2019-05-08 WO PCT/JP2019/018396 patent/WO2019230313A1/fr active Application Filing
- 2019-05-08 CN CN201980034001.9A patent/CN112189167B/zh active Active
- 2019-05-08 KR KR1020207032557A patent/KR102660488B1/ko active IP Right Grant
- 2019-05-08 US US17/058,631 patent/US11442357B2/en active Active
- 2019-05-08 SG SG11202010535YA patent/SG11202010535YA/en unknown
- 2019-05-24 TW TW108118002A patent/TWI801587B/zh active
Also Published As
Publication number | Publication date |
---|---|
US11442357B2 (en) | 2022-09-13 |
KR102660488B1 (ko) | 2024-04-24 |
US20210208497A1 (en) | 2021-07-08 |
KR20210015777A (ko) | 2021-02-10 |
CN112189167B (zh) | 2024-05-03 |
WO2019230313A1 (fr) | 2019-12-05 |
JP7109996B2 (ja) | 2022-08-01 |
CN112189167A (zh) | 2021-01-05 |
TWI801587B (zh) | 2023-05-11 |
TW202012164A (zh) | 2020-04-01 |
JP2019207361A (ja) | 2019-12-05 |
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