SG11201802520YA - Wafer inspection method and wafer inspection device - Google Patents

Wafer inspection method and wafer inspection device

Info

Publication number
SG11201802520YA
SG11201802520YA SG11201802520YA SG11201802520YA SG11201802520YA SG 11201802520Y A SG11201802520Y A SG 11201802520YA SG 11201802520Y A SG11201802520Y A SG 11201802520YA SG 11201802520Y A SG11201802520Y A SG 11201802520YA SG 11201802520Y A SG11201802520Y A SG 11201802520YA
Authority
SG
Singapore
Prior art keywords
wafer inspection
inspection device
inspection method
wafer
inspection
Prior art date
Application number
SG11201802520YA
Other languages
English (en)
Inventor
Hiroshi Yamada
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of SG11201802520YA publication Critical patent/SG11201802520YA/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2891Features relating to contacting the IC under test, e.g. probe heads; chucks related to sensing or controlling of force, position, temperature
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R1/00Details of instruments or arrangements of the types included in groups G01R5/00 - G01R13/00 and G01R31/00
    • G01R1/02General constructional details
    • G01R1/06Measuring leads; Measuring probes
    • G01R1/067Measuring probes
    • G01R1/073Multiple probes
    • G01R1/07307Multiple probes with individual probe elements, e.g. needles, cantilever beams or bump contacts, fixed in relation to each other, e.g. bed of nails fixture or probe card
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/286External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2865Holding devices, e.g. chucks; Handlers or transport devices
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2855Environmental, reliability or burn-in testing
    • G01R31/286External aspects, e.g. related to chambers, contacting devices or handlers
    • G01R31/2868Complete testing stations; systems; procedures; software aspects
    • G01R31/287Procedures; Software aspects
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01RMEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R31/00Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
    • G01R31/28Testing of electronic circuits, e.g. by signal tracer
    • G01R31/2851Testing of integrated circuits [IC]
    • G01R31/2886Features relating to contacting the IC under test, e.g. probe heads; chucks
    • G01R31/2887Features relating to contacting the IC under test, e.g. probe heads; chucks involving moving the probe head or the IC under test; docking stations
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/68Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • General Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Power Engineering (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Tests Of Electronic Circuits (AREA)
SG11201802520YA 2015-09-30 2016-07-11 Wafer inspection method and wafer inspection device SG11201802520YA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015194390A JP6515007B2 (ja) 2015-09-30 2015-09-30 ウエハ検査方法及びウエハ検査装置
PCT/JP2016/070923 WO2017056643A1 (ja) 2015-09-30 2016-07-11 ウエハ検査方法及びウエハ検査装置

Publications (1)

Publication Number Publication Date
SG11201802520YA true SG11201802520YA (en) 2018-04-27

Family

ID=58423417

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201802520YA SG11201802520YA (en) 2015-09-30 2016-07-11 Wafer inspection method and wafer inspection device

Country Status (7)

Country Link
US (1) US10416229B2 (zh)
JP (1) JP6515007B2 (zh)
KR (1) KR102012608B1 (zh)
CN (1) CN108140590B (zh)
SG (1) SG11201802520YA (zh)
TW (1) TWI720019B (zh)
WO (1) WO2017056643A1 (zh)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR3052869B1 (fr) * 2016-06-17 2018-06-22 Unity Semiconductor Dispositif de positionnement d'une plaquette de circuit integre, et appareil d'inspection d'une plaquette de circuit integre comprenant un tel dispositif de positionnement
US10840121B2 (en) 2016-10-31 2020-11-17 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for unpacking semiconductor wafer container
WO2018235411A1 (ja) * 2017-06-21 2018-12-27 東京エレクトロン株式会社 検査システム
JP7174316B2 (ja) * 2018-02-26 2022-11-17 株式会社東京精密 荷重分散板
JP2020047860A (ja) * 2018-09-20 2020-03-26 東京エレクトロン株式会社 検査装置及び検査方法
JP7101577B2 (ja) * 2018-09-21 2022-07-15 株式会社日本マイクロニクス 検査方法及び検査システム
JP7257880B2 (ja) * 2019-05-23 2023-04-14 東京エレクトロン株式会社 試験用ウエハおよび試験方法
JP7267111B2 (ja) * 2019-05-31 2023-05-01 東京エレクトロン株式会社 位置決め機構及び位置決め方法
JP6906128B2 (ja) * 2019-06-26 2021-07-21 末晴 宮川 ウエハー試験装置
JP7281981B2 (ja) 2019-06-27 2023-05-26 東京エレクトロン株式会社 プローバおよびプローブカードのプリヒート方法
JP7458161B2 (ja) * 2019-09-24 2024-03-29 東京エレクトロン株式会社 検査装置の制御方法および検査装置
JP7412208B2 (ja) * 2020-02-17 2024-01-12 東京エレクトロン株式会社 搬送装置、処理システム及び搬送方法
KR20210115439A (ko) 2020-03-13 2021-09-27 손서용 셔틀콕 자동 수거 및 적재 장치
JP7437991B2 (ja) * 2020-03-25 2024-02-26 東京エレクトロン株式会社 検査装置、及び、チャックトップの位置調整方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3219844B2 (ja) * 1992-06-01 2001-10-15 東京エレクトロン株式会社 プローブ装置
JPH0621166A (ja) * 1992-06-30 1994-01-28 Mitsubishi Electric Corp ウエハプローバ
JPH11251379A (ja) 1998-02-27 1999-09-17 Toshiba Microelectronics Corp ウエハプロービング装置
DE10296944T5 (de) * 2001-06-18 2004-04-29 Advantest Corp. Prüfkontaktsystem, das eine Planaritätseinstellmechanismus besitzt
JP2006258687A (ja) * 2005-03-18 2006-09-28 Koyo Technos:Kk 検査装置
US7764076B2 (en) * 2007-02-20 2010-07-27 Centipede Systems, Inc. Method and apparatus for aligning and/or leveling a test head
JP5295588B2 (ja) * 2008-02-28 2013-09-18 東京エレクトロン株式会社 プローブカードの傾き調整方法、プローブカードの傾き検出方法及びプローブカードの傾き検出方法を記録したプログラム記録媒体
JP5889581B2 (ja) * 2010-09-13 2016-03-22 東京エレクトロン株式会社 ウエハ検査装置
JP2013175572A (ja) * 2012-02-24 2013-09-05 Tokyo Electron Ltd プローブ装置及びプローブカードの平行調整機構
JP6031292B2 (ja) * 2012-07-31 2016-11-24 東京エレクトロン株式会社 プローブカードへの基板当接方法
JP6099347B2 (ja) 2012-10-03 2017-03-22 東京エレクトロン株式会社 ウエハ取り付け方法及びウエハ検査装置
JP2014115115A (ja) * 2012-12-06 2014-06-26 Advantest Corp 補正装置、プローブ装置、および試験装置
CN104280651B (zh) * 2013-07-10 2018-08-17 晶豪科技股份有限公司 测试系统以及半导体元件
JP5737536B2 (ja) * 2013-11-21 2015-06-17 株式会社東京精密 プローバ
JP6423660B2 (ja) * 2014-09-09 2018-11-14 東京エレクトロン株式会社 ウエハ検査装置における検査用圧力設定値決定方法
JP5747428B2 (ja) * 2015-02-06 2015-07-15 株式会社東京精密 位置決め固定装置
US9927463B2 (en) * 2015-10-20 2018-03-27 International Business Machines Corporation Wafer probe alignment

Also Published As

Publication number Publication date
US20180275192A1 (en) 2018-09-27
CN108140590B (zh) 2022-05-17
CN108140590A (zh) 2018-06-08
JP2017069428A (ja) 2017-04-06
JP6515007B2 (ja) 2019-05-15
US10416229B2 (en) 2019-09-17
KR20180043814A (ko) 2018-04-30
WO2017056643A1 (ja) 2017-04-06
KR102012608B1 (ko) 2019-08-20
TW201727242A (zh) 2017-08-01
TWI720019B (zh) 2021-03-01

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