SG11201702286WA - Residual-stress measurement device and residual-stress measurement method - Google Patents
Residual-stress measurement device and residual-stress measurement methodInfo
- Publication number
- SG11201702286WA SG11201702286WA SG11201702286WA SG11201702286WA SG11201702286WA SG 11201702286W A SG11201702286W A SG 11201702286WA SG 11201702286W A SG11201702286W A SG 11201702286WA SG 11201702286W A SG11201702286W A SG 11201702286WA SG 11201702286W A SG11201702286W A SG 11201702286WA
- Authority
- SG
- Singapore
- Prior art keywords
- residual
- stress measurement
- measurement device
- measurement method
- stress
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2015123248A JP6394513B2 (en) | 2015-06-18 | 2015-06-18 | Residual stress measuring device and residual stress measuring method |
| PCT/JP2015/083613 WO2016203672A1 (en) | 2015-06-18 | 2015-11-30 | Residual-stress measurement device and residual-stress measurement method |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG11201702286WA true SG11201702286WA (en) | 2018-01-30 |
Family
ID=57545890
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG11201702286WA SG11201702286WA (en) | 2015-06-18 | 2015-11-30 | Residual-stress measurement device and residual-stress measurement method |
Country Status (11)
| Country | Link |
|---|---|
| US (1) | US10520455B2 (en) |
| EP (1) | EP3133388B1 (en) |
| JP (1) | JP6394513B2 (en) |
| KR (1) | KR102353547B1 (en) |
| CN (1) | CN107923857B (en) |
| BR (1) | BR112017008617B1 (en) |
| CA (1) | CA2962222C (en) |
| MX (1) | MX2017007480A (en) |
| SG (1) | SG11201702286WA (en) |
| TW (1) | TWI664405B (en) |
| WO (1) | WO2016203672A1 (en) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BR102012000368B1 (en) * | 2011-11-14 | 2022-08-23 | Tai-Her Yang | DUAL FORCE DRIVE SYSTEM WITH SERIAL TRANSMISSION EPIC CYCLOIDAL GEAR SET |
| US9939393B2 (en) * | 2015-09-28 | 2018-04-10 | United Technologies Corporation | Detection of crystallographic properties in aerospace components |
| CN105628283B (en) * | 2016-03-31 | 2018-02-27 | 西南交通大学 | A kind of ultrasonic wave residual stress test equipment |
| MX2018013681A (en) * | 2016-05-16 | 2019-05-02 | Sintokogio Ltd | Surface treatment processing method and surface treatment processing device. |
| KR102501482B1 (en) | 2017-06-30 | 2023-02-21 | 신토고교 가부시키가이샤 | shot handling device |
| CN107764450B (en) * | 2017-09-06 | 2020-08-11 | 北京航空航天大学 | Synchronous cross-scale residual stress detection device |
| US10613042B2 (en) | 2017-09-28 | 2020-04-07 | International Business Machines Corporation | Measuring and analyzing residual stresses and their gradients in materials using high resolution grazing incidence X-ray diffraction |
| DE112018005472T5 (en) | 2017-09-29 | 2020-06-25 | Sintokogio, Ltd. | Gear positioning device, voltage measuring system, gear positioning method and stress measuring method |
| JP7009230B2 (en) * | 2018-01-23 | 2022-01-25 | 株式会社日立ビルシステム | Non-destructive inspection equipment and non-destructive inspection method |
| JP6881420B2 (en) | 2018-11-07 | 2021-06-02 | 新東工業株式会社 | Deterioration evaluation method |
| JP6676241B1 (en) * | 2018-12-11 | 2020-04-08 | パルステック工業株式会社 | X-ray diffractometer |
| JP6818224B2 (en) * | 2019-02-12 | 2021-01-20 | パルステック工業株式会社 | X-ray diffraction measuring device |
| KR20240005356A (en) | 2022-07-05 | 2024-01-12 | 현대자동차주식회사 | Device and method for estimating residual stress |
Family Cites Families (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3402291A (en) * | 1966-04-06 | 1968-09-17 | Gen Motors Corp | Method and apparatus of measuring residual stress in metals and the amount of a known constituent |
| JPS5222553B2 (en) * | 1973-02-20 | 1977-06-17 | ||
| JPS533884A (en) * | 1976-07-01 | 1978-01-13 | Mitsubishi Heavy Ind Ltd | Stress measuring apparatus x-ray |
| US4125771A (en) * | 1977-11-18 | 1978-11-14 | Net Systems Inc. | Apparatus for determining stress in nickel and titanium alloyed materials |
| JPS5744841A (en) * | 1980-09-01 | 1982-03-13 | Hitachi Ltd | Method and apparatus for x-ray diffraction |
| US4489425A (en) * | 1983-01-14 | 1984-12-18 | Science Applications, Inc. | Means and method for determining residual stress on a polycrystalline sample by X-ray diffraction |
| US4561062A (en) * | 1983-02-18 | 1985-12-24 | Her Majesty The Queen In Right Of Canada, As Represented By The Minister Of Energy, Mines And Resources | Stress measurement by X-ray diffractometry |
| FI67956C (en) * | 1983-09-22 | 1985-06-10 | Mexpert Oy | ROO GENDER FACTORY WITHOUT FUNCTIONAL ORGANIZATION FOR MAINTENANCE OF SPA |
| US5125016B1 (en) * | 1983-09-22 | 1998-02-24 | Outokumpu Oy | Procedure and measuring apparatus based on x-ray diffraction for measuring stresses |
| US4686631A (en) * | 1985-02-08 | 1987-08-11 | Ruud Clayton O | Method for determining internal stresses in polycrystalline solids |
| US5148458A (en) * | 1990-01-18 | 1992-09-15 | Clayton Ruud | Method and apparatus for simultaneous phase composition and residual stress measurement by x-ray diffraction |
| JP2904891B2 (en) * | 1990-08-31 | 1999-06-14 | 日新製鋼株式会社 | Online alloying degree measuring device for galvanized steel sheet |
| US5414747A (en) * | 1993-02-22 | 1995-05-09 | The Penn State Research Foundation | Method and apparatus for in-process analysis of polycrystalline films and coatings by x-ray diffraction |
| US5848122A (en) * | 1997-03-25 | 1998-12-08 | Advanced Technology Materials, Inc. | Apparatus for rapid in-situ X-ray stress measurement during thermal cycling of semiconductor wafers |
| US5966423A (en) * | 1997-03-28 | 1999-10-12 | Philips Electronics North America Corporation | Arc diffractometer |
| TW442656B (en) | 1998-02-23 | 2001-06-23 | Ind Tech Res Inst | Method for examining the distribution of residual stress |
| US6353656B1 (en) * | 1998-07-24 | 2002-03-05 | Technology For Energy Corporation | Radioisotope based x-ray residual stress analysis apparatus |
| EP1147406A1 (en) * | 1998-12-22 | 2001-10-24 | American Science & Engineering, Inc. | Unilateral hand-held x-ray inspection apparatus |
| JP2000213999A (en) * | 1999-01-22 | 2000-08-04 | Rigaku Corp | X-ray stress measuring method |
| JP2001056303A (en) * | 1999-08-18 | 2001-02-27 | Mac Science Co Ltd | X-ray stress measuring apparatus |
| JP2002181638A (en) * | 2000-12-11 | 2002-06-26 | Mitsubishi Heavy Ind Ltd | Residual stress measuring device and method by x-ray |
| JP2002333409A (en) * | 2001-05-09 | 2002-11-22 | Shimadzu Corp | X-ray stress measuring device |
| ITMI20020097A1 (en) * | 2002-01-21 | 2003-07-21 | Consorzio Pisa Ricerche | DIFFRACTOMETER AND METHOD FOR PERFORMING DIFFRACTOMETRIC ANALYSIS |
| US7646847B2 (en) * | 2008-05-01 | 2010-01-12 | Bruker Axs Inc. | Handheld two-dimensional X-ray diffractometer |
| CN201210151Y (en) * | 2008-06-12 | 2009-03-18 | 浙江师范大学 | Material internal stress ultrasonic detection apparatus |
| GB0823093D0 (en) * | 2008-12-19 | 2009-01-28 | Durham Scient Crystals Ltd | Apparatus and method for characterisation of materials |
| US8848871B2 (en) * | 2010-11-04 | 2014-09-30 | Ut-Battelle, Llc | X-ray backscatter imaging of nuclear materials |
| TWI442036B (en) | 2010-11-16 | 2014-06-21 | Univ Feng Chia | Measurement of Residual Stress in Thin Films |
| CN102435623B (en) | 2011-09-19 | 2013-08-14 | 中国原子能科学研究院 | Neutron diffraction residual stress measuring device and method |
| JP5826578B2 (en) * | 2011-09-29 | 2015-12-02 | 株式会社Ｓｃｒｅｅｎホールディングス | Image acquisition device |
| JP5408234B2 (en) | 2011-11-29 | 2014-02-05 | パルステック工業株式会社 | X-ray diffraction measurement apparatus and residual stress measurement method |
| TWI463122B (en) | 2011-11-30 | 2014-12-01 | Fei Yi Hung | Method for measuring residual stress of aluminum plate by means of drilling |
| US9031188B2 (en) * | 2012-02-08 | 2015-05-12 | Georgetown Rail Equipment Company | Internal imaging system |
| JP5958999B2 (en) * | 2012-07-04 | 2016-08-02 | Ntn株式会社 | Bearing part inspection method and bearing part inspection apparatus |
| JP6001960B2 (en) * | 2012-08-23 | 2016-10-05 | 大塚電子株式会社 | Light distribution characteristic measuring apparatus and light distribution characteristic measuring method |
| US9613728B2 (en) * | 2013-03-15 | 2017-04-04 | Proto Manufacturing Ltd. | X-ray diffraction apparatus and method |
| US9535019B1 (en) * | 2013-10-04 | 2017-01-03 | American Science And Engineering, Inc. | Laterally-offset detectors for long-range x-ray backscatter imaging |
| CN104634799A (en) | 2013-11-15 | 2015-05-20 | 郑琪 | Device and method for measuring multi-wavelength characteristic X ray diffraction |
| CN104374499B (en) * | 2014-11-17 | 2017-01-18 | 西安交通大学 | Welding residual stress measuring method based on XJTUOM three-dimensional optical surface scanning and measuring system |
| GB2547564B (en) * | 2014-11-24 | 2020-10-28 | Halliburton Energy Services Inc | Backscattering spectrometry for determining a concentration of solids in a solids-laden fluid |
-
2015
- 2015-06-18 JP JP2015123248A patent/JP6394513B2/en active Active
- 2015-11-30 EP EP15841035.7A patent/EP3133388B1/en active Active
- 2015-11-30 MX MX2017007480A patent/MX2017007480A/en unknown
- 2015-11-30 SG SG11201702286WA patent/SG11201702286WA/en unknown
- 2015-11-30 CA CA2962222A patent/CA2962222C/en active Active
- 2015-11-30 US US15/035,024 patent/US10520455B2/en active Active
- 2015-11-30 WO PCT/JP2015/083613 patent/WO2016203672A1/en active Application Filing
- 2015-11-30 KR KR1020177015182A patent/KR102353547B1/en active IP Right Grant
- 2015-11-30 CN CN201580002362.7A patent/CN107923857B/en active Active
- 2015-11-30 BR BR112017008617-4A patent/BR112017008617B1/en active IP Right Grant
-
2016
- 2016-01-21 TW TW105101912A patent/TWI664405B/en active
Also Published As
| Publication number | Publication date |
|---|---|
| BR112017008617B1 (en) | 2021-05-04 |
| KR20180016968A (en) | 2018-02-20 |
| BR112017008617A2 (en) | 2017-12-26 |
| US20170167988A1 (en) | 2017-06-15 |
| TW201700961A (en) | 2017-01-01 |
| US10520455B2 (en) | 2019-12-31 |
| EP3133388A4 (en) | 2017-12-13 |
| JP6394513B2 (en) | 2018-09-26 |
| JP2017009356A (en) | 2017-01-12 |
| EP3133388A1 (en) | 2017-02-22 |
| CN107923857A (en) | 2018-04-17 |
| WO2016203672A1 (en) | 2016-12-22 |
| MX2017007480A (en) | 2018-03-28 |
| EP3133388B1 (en) | 2019-10-23 |
| CA2962222A1 (en) | 2016-12-22 |
| TWI664405B (en) | 2019-07-01 |
| CN107923857B (en) | 2020-05-08 |
| KR102353547B1 (en) | 2022-01-21 |
| CA2962222C (en) | 2021-06-15 |
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