JPS533884A - Stress measuring apparatus x-ray - Google Patents

Stress measuring apparatus x-ray

Info

Publication number
JPS533884A
JPS533884A JP7702476A JP7702476A JPS533884A JP S533884 A JPS533884 A JP S533884A JP 7702476 A JP7702476 A JP 7702476A JP 7702476 A JP7702476 A JP 7702476A JP S533884 A JPS533884 A JP S533884A
Authority
JP
Japan
Prior art keywords
ray
measuring apparatus
stress measuring
diffracted
specimen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP7702476A
Other languages
Japanese (ja)
Other versions
JPS5424316B2 (en
Inventor
Katsukage Uehara
Katsuhiko Ogiso
Tsutomu Kawasaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
RIGAKU DENKI KK
Mitsubishi Heavy Industries Ltd
Rigaku Denki Co Ltd
Original Assignee
RIGAKU DENKI KK
Mitsubishi Heavy Industries Ltd
Rigaku Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by RIGAKU DENKI KK, Mitsubishi Heavy Industries Ltd, Rigaku Denki Co Ltd filed Critical RIGAKU DENKI KK
Priority to JP7702476A priority Critical patent/JPS533884A/en
Publication of JPS533884A publication Critical patent/JPS533884A/en
Publication of JPS5424316B2 publication Critical patent/JPS5424316B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/207—Diffractometry using detectors, e.g. using a probe in a central position and one or more displaceable detectors in circumferential positions

Abstract

PURPOSE:To carry out measurement of stress easily with simple constitution, by moving detector, whose angular position is controlled with intensity of diffracted X-ray, along circle centered at point of incidence of X ray to specimen.
JP7702476A 1976-07-01 1976-07-01 Stress measuring apparatus x-ray Granted JPS533884A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7702476A JPS533884A (en) 1976-07-01 1976-07-01 Stress measuring apparatus x-ray

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7702476A JPS533884A (en) 1976-07-01 1976-07-01 Stress measuring apparatus x-ray

Publications (2)

Publication Number Publication Date
JPS533884A true JPS533884A (en) 1978-01-13
JPS5424316B2 JPS5424316B2 (en) 1979-08-20

Family

ID=13622171

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7702476A Granted JPS533884A (en) 1976-07-01 1976-07-01 Stress measuring apparatus x-ray

Country Status (1)

Country Link
JP (1) JPS533884A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107923857A (en) * 2015-06-18 2018-04-17 新东工业株式会社 Residual stress analysis device and residual stress analysis method
CN110542506A (en) * 2019-10-16 2019-12-06 丹东浩元仪器有限公司 detection device and detection method for X-ray stress determinator

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3051834A (en) * 1959-09-16 1962-08-28 Shimula Yoshihiro Automatic recording system of x-ray diffraction patterns

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3051834A (en) * 1959-09-16 1962-08-28 Shimula Yoshihiro Automatic recording system of x-ray diffraction patterns

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107923857A (en) * 2015-06-18 2018-04-17 新东工业株式会社 Residual stress analysis device and residual stress analysis method
US10520455B2 (en) 2015-06-18 2019-12-31 Sintokogio, Ltd. Residual stress measuring apparatus and residual stress measuring method
CN107923857B (en) * 2015-06-18 2020-05-08 新东工业株式会社 Residual stress measuring device and residual stress measuring method
CN110542506A (en) * 2019-10-16 2019-12-06 丹东浩元仪器有限公司 detection device and detection method for X-ray stress determinator

Also Published As

Publication number Publication date
JPS5424316B2 (en) 1979-08-20

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