SG11201603456VA - Field-effect transistor, display element, image display device, and system - Google Patents

Field-effect transistor, display element, image display device, and system

Info

Publication number
SG11201603456VA
SG11201603456VA SG11201603456VA SG11201603456VA SG11201603456VA SG 11201603456V A SG11201603456V A SG 11201603456VA SG 11201603456V A SG11201603456V A SG 11201603456VA SG 11201603456V A SG11201603456V A SG 11201603456VA SG 11201603456V A SG11201603456V A SG 11201603456VA
Authority
SG
Singapore
Prior art keywords
field
effect transistor
display device
image display
display element
Prior art date
Application number
SG11201603456VA
Other languages
English (en)
Inventor
Ryoichi Saotome
Naoyuki Ueda
Yuki Nakamura
Yukiko Abe
Shinji Matsumoto
Yuji Sone
Sadanori Arae
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Publication of SG11201603456VA publication Critical patent/SG11201603456VA/en

Links

Classifications

    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers
    • G09G3/3696Generation of voltages supplied to electrode drivers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers
    • G09G3/3674Details of drivers for scan electrodes
    • G09G3/3677Details of drivers for scan electrodes suitable for active matrices only
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G3/00Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes
    • G09G3/20Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters
    • G09G3/34Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source
    • G09G3/36Control arrangements or circuits, of interest only in connection with visual indicators other than cathode-ray tubes for presentation of an assembly of a number of characters, e.g. a page, by composing the assembly by combination of individual elements arranged in a matrix no fixed position being assigned to or needed to be assigned to the individual characters or partial characters by control of light from an independent source using liquid crystals
    • G09G3/3611Control of matrices with row and column drivers
    • G09G3/3685Details of drivers for data electrodes
    • G09G3/3688Details of drivers for data electrodes suitable for active matrices only
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1222Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer
    • H01L27/1225Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition, shape or crystalline structure of the active layer with semiconductor materials not belonging to the group IV of the periodic table, e.g. InGaZnO
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/02Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
    • H01L27/12Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body
    • H01L27/1214Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs
    • H01L27/1248Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being other than a semiconductor body, e.g. an insulating body comprising a plurality of TFTs formed on a non-semiconducting substrate, e.g. driving circuits for AMLCDs with a particular composition or shape of the interlayer dielectric specially adapted to the circuit arrangement
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/78606Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
    • H01L29/78618Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device characterised by the drain or the source properties, e.g. the doping structure, the composition, the sectional shape or the contact structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • H01L29/7869Thin film transistors, i.e. transistors with a channel being at least partly a thin film having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G02F1/1362Active matrix addressed cells
    • G02F1/1368Active matrix addressed cells in which the switching element is a three-electrode device
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2300/00Aspects of the constitution of display devices
    • G09G2300/08Active matrix structure, i.e. with use of active elements, inclusive of non-linear two terminal elements, in the pixels together with light emitting or modulating elements
    • G09G2300/0809Several active elements per pixel in active matrix panels
    • G09G2300/0842Several active elements per pixel in active matrix panels forming a memory circuit, e.g. a dynamic memory with one capacitor
    • GPHYSICS
    • G09EDUCATION; CRYPTOGRAPHY; DISPLAY; ADVERTISING; SEALS
    • G09GARRANGEMENTS OR CIRCUITS FOR CONTROL OF INDICATING DEVICES USING STATIC MEANS TO PRESENT VARIABLE INFORMATION
    • G09G2310/00Command of the display device
    • G09G2310/02Addressing, scanning or driving the display screen or processing steps related thereto
    • G09G2310/0264Details of driving circuits
    • G09G2310/0278Details of driving circuits arranged to drive both scan and data electrodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/78Field effect transistors with field effect produced by an insulated gate
    • H01L29/786Thin film transistors, i.e. transistors with a channel being at least partly a thin film
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00
    • H10K59/10OLED displays
    • H10K59/12Active-matrix OLED [AMOLED] displays

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Ceramic Engineering (AREA)
  • Theoretical Computer Science (AREA)
  • Thin Film Transistor (AREA)
SG11201603456VA 2013-10-30 2014-10-23 Field-effect transistor, display element, image display device, and system SG11201603456VA (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2013225182 2013-10-30
JP2014164080A JP6394171B2 (ja) 2013-10-30 2014-08-12 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
PCT/JP2014/078842 WO2015064670A1 (en) 2013-10-30 2014-10-23 Field-effect transistor, display element, image display device, and system

Publications (1)

Publication Number Publication Date
SG11201603456VA true SG11201603456VA (en) 2016-05-30

Family

ID=53004268

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201603456VA SG11201603456VA (en) 2013-10-30 2014-10-23 Field-effect transistor, display element, image display device, and system

Country Status (10)

Country Link
US (2) US9972274B2 (no)
EP (1) EP3063783B1 (no)
JP (1) JP6394171B2 (no)
KR (2) KR101856078B1 (no)
CN (2) CN105684135B (no)
BR (1) BR112016009806B1 (no)
RU (1) RU2630708C1 (no)
SG (1) SG11201603456VA (no)
TW (1) TWI568000B (no)
WO (1) WO2015064670A1 (no)

Families Citing this family (35)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6015389B2 (ja) * 2012-11-30 2016-10-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6394171B2 (ja) * 2013-10-30 2018-09-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6582655B2 (ja) * 2015-07-14 2019-10-02 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6794706B2 (ja) * 2015-10-23 2020-12-02 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
JP6878820B2 (ja) * 2015-11-17 2021-06-02 株式会社リコー 電界効果型トランジスタ、表示素子、表示装置、システム、及び電界効果型トランジスタの製造方法
US10600916B2 (en) 2015-12-08 2020-03-24 Ricoh Company, Ltd. Field-effect transistor, display element, image display device, and system
JP2017105013A (ja) 2015-12-08 2017-06-15 株式会社リコー ガスバリア性積層体、半導体装置、表示素子、表示装置、システム
JP6607013B2 (ja) 2015-12-08 2019-11-20 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
US10170635B2 (en) 2015-12-09 2019-01-01 Ricoh Company, Ltd. Semiconductor device, display device, display apparatus, and system
JP6907512B2 (ja) * 2015-12-15 2021-07-21 株式会社リコー 電界効果型トランジスタの製造方法
CN106952948A (zh) * 2016-01-06 2017-07-14 中华映管股份有限公司 主动元件及其制作方法
JP6665536B2 (ja) 2016-01-12 2020-03-13 株式会社リコー 酸化物半導体
EP3432348A4 (en) 2016-02-01 2019-03-20 Ricoh Company, Ltd. FIELD EFFECT TRANSISTOR, METHOD FOR MANUFACTURING THE SAME, DISPLAY ELEMENT, DISPLAY APPARATUS, AND SYSTEM
JP6701835B2 (ja) * 2016-03-11 2020-05-27 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
CN108780756B (zh) 2016-03-18 2021-10-22 株式会社理光 用于制造场效应晶体管的方法
JP6855848B2 (ja) * 2016-03-18 2021-04-07 株式会社リコー 電界効果型トランジスタの製造方法、揮発性半導体メモリ素子の製造方法、不揮発性半導体メモリ素子の製造方法、表示素子の製造方法、画像表示装置の製造方法、システムの製造方法
US10818705B2 (en) * 2016-03-18 2020-10-27 Ricoh Company, Ltd. Method for manufacturing a field effect transistor, method for manufacturing a volatile semiconductor memory element, method for manufacturing a non-volatile semiconductor memory element, method for manufacturing a display element, method for manufacturing an image display device, and method for manufacturing a system
US20180016678A1 (en) 2016-07-15 2018-01-18 Applied Materials, Inc. Multi-layer coating with diffusion barrier layer and erosion resistant layer
KR20180033352A (ko) 2016-09-23 2018-04-03 삼성디스플레이 주식회사 캡핑층을 포함하는 유기발광 표시장치
JP6848405B2 (ja) * 2016-12-07 2021-03-24 株式会社リコー 電界効果型トランジスタの製造方法
JP2018148145A (ja) * 2017-03-08 2018-09-20 株式会社リコー 電界効果型トランジスタ、表示素子、表示装置、システム
JP2018156963A (ja) * 2017-03-15 2018-10-04 株式会社リコー 電界効果型トランジスタ、表示素子、表示装置、システム、及びそれらの製造方法
CN111051968A (zh) * 2017-05-11 2020-04-21 贝勒大学 场效应可调谐介电常数近零吸收体
US10688811B2 (en) 2018-02-27 2020-06-23 Ricoh Company, Ltd. Air blower, drying device, liquid discharge apparatus, and treatment-liquid application device
JP7246365B2 (ja) * 2018-03-06 2023-03-27 株式会社半導体エネルギー研究所 表示装置および電子機器
JP6986231B2 (ja) 2018-03-16 2021-12-22 株式会社リコー 塗布装置及び画像形成システム
EP3544047A3 (en) 2018-03-19 2019-11-20 Ricoh Company, Ltd. Coating liquid for forming oxide, method for producing oxide film, and method for producing field-effect transistor
CN108933179B (zh) * 2018-07-05 2020-06-16 深圳市华星光电半导体显示技术有限公司 一种薄膜晶体管及其制作方法
JP7305933B2 (ja) 2018-07-23 2023-07-11 株式会社リコー 金属酸化物膜形成用塗布液、酸化物絶縁体膜、電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
CN110752255A (zh) 2018-07-23 2020-02-04 株式会社理光 金属氧化物、场效应晶体管及其制造方法
JP7135682B2 (ja) 2018-09-28 2022-09-13 株式会社リコー 給送装置、画像形成装置及び画像形成システム
CN112242441A (zh) * 2019-07-16 2021-01-19 联华电子股份有限公司 高电子迁移率晶体管
RU2748455C1 (ru) * 2020-07-08 2021-05-25 Федеральное государственное бюджетное образовательное учреждение высшего образования "Чеченский государственный университет" Способ изготовления полупроводникового прибора
CN112687554B (zh) * 2020-12-28 2023-05-09 深圳市华星光电半导体显示技术有限公司 阵列基板制备方法、阵列基板及显示装置
US20220231153A1 (en) * 2021-01-15 2022-07-21 Taiwan Semiconductor Manufacturing Co., Ltd. CMOS Fabrication Methods for Back-Gate Transistor

Family Cites Families (42)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59150430A (ja) * 1983-02-17 1984-08-28 Toshiba Corp 半導体デバイス
JP3666915B2 (ja) 1993-12-17 2005-06-29 Azエレクトロニックマテリアルズ株式会社 セラミックスの低温形成方法
JP4472056B2 (ja) 1999-07-23 2010-06-02 株式会社半導体エネルギー研究所 エレクトロルミネッセンス表示装置及びその作製方法
EP1434282A3 (en) * 2002-12-26 2007-06-27 Konica Minolta Holdings, Inc. Protective layer for an organic thin-film transistor
JP4278405B2 (ja) * 2003-02-28 2009-06-17 シャープ株式会社 酸化物半導体発光素子およびその製造方法
JP4108633B2 (ja) 2003-06-20 2008-06-25 シャープ株式会社 薄膜トランジスタおよびその製造方法ならびに電子デバイス
JP2007073705A (ja) 2005-09-06 2007-03-22 Canon Inc 酸化物半導体チャネル薄膜トランジスタおよびその製造方法
US20070152276A1 (en) * 2005-12-30 2007-07-05 International Business Machines Corporation High performance CMOS circuits, and methods for fabricating the same
CN101632179B (zh) * 2007-04-06 2012-05-30 夏普株式会社 半导体元件及其制造方法、以及包括该半导体元件的电子器件
KR20080099084A (ko) * 2007-05-08 2008-11-12 삼성전자주식회사 박막 트랜지스터 및 그 제조 방법
CN101911303B (zh) 2007-12-25 2013-03-27 出光兴产株式会社 氧化物半导体场效应晶体管及其制造方法
JP5141325B2 (ja) * 2008-03-21 2013-02-13 凸版印刷株式会社 有機elディスプレイパネルの製造方法
JP5430248B2 (ja) * 2008-06-24 2014-02-26 富士フイルム株式会社 薄膜電界効果型トランジスタおよび表示装置
KR101538283B1 (ko) * 2008-08-27 2015-07-22 이데미쓰 고산 가부시키가이샤 전계 효과형 트랜지스터, 그의 제조 방법 및 스퍼터링 타겟
JP5305790B2 (ja) * 2008-08-28 2013-10-02 株式会社東芝 半導体発光素子
JP5552753B2 (ja) * 2008-10-08 2014-07-16 ソニー株式会社 薄膜トランジスタおよび表示装置
JP2010103203A (ja) 2008-10-22 2010-05-06 Konica Minolta Holdings Inc 薄膜トランジスタおよびその製造方法
KR101711249B1 (ko) 2008-11-07 2017-02-28 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치의 제작 방법
JP5515281B2 (ja) 2008-12-03 2014-06-11 ソニー株式会社 薄膜トランジスタ、表示装置、電子機器および薄膜トランジスタの製造方法
JP2010182819A (ja) 2009-02-04 2010-08-19 Sony Corp 薄膜トランジスタおよび表示装置
US20100308418A1 (en) 2009-06-09 2010-12-09 Knut Stahrenberg Semiconductor Devices and Methods of Manufacture Thereof
CN103151387A (zh) 2009-09-04 2013-06-12 株式会社半导体能源研究所 半导体器件及其制造方法
CN102598248B (zh) 2009-10-21 2015-09-23 株式会社半导体能源研究所 半导体器件
JP5633346B2 (ja) 2009-12-25 2014-12-03 株式会社リコー 電界効果型トランジスタ、半導体メモリ、表示素子、画像表示装置及びシステム
WO2011078398A1 (en) * 2009-12-25 2011-06-30 Ricoh Company, Ltd. Field-effect transistor, semiconductor memory, display element, image display device, and system
JP5899615B2 (ja) * 2010-03-18 2016-04-06 株式会社リコー 絶縁膜の製造方法及び半導体装置の製造方法
TWI589042B (zh) * 2010-01-20 2017-06-21 半導體能源研究所股份有限公司 發光裝置,撓性發光裝置,電子裝置,照明設備,以及發光裝置和撓性發光裝置的製造方法
JP2012216780A (ja) 2011-03-31 2012-11-08 Ricoh Co Ltd p型酸化物、p型酸化物製造用組成物、p型酸化物の製造方法、半導体素子、表示素子、画像表示装置、及びシステム
JP6076038B2 (ja) * 2011-11-11 2017-02-08 株式会社半導体エネルギー研究所 表示装置の作製方法
KR101942980B1 (ko) * 2012-01-17 2019-01-29 삼성디스플레이 주식회사 반도체 디바이스 및 그 형성 방법
US9653614B2 (en) * 2012-01-23 2017-05-16 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
US9159288B2 (en) * 2012-03-09 2015-10-13 Apple Inc. Gate line driver circuit for display element array
WO2013183733A1 (ja) * 2012-06-06 2013-12-12 株式会社神戸製鋼所 薄膜トランジスタ
JP5562384B2 (ja) * 2012-08-28 2014-07-30 キヤノン株式会社 薄膜トランジスタおよびその製造方法
WO2014034512A1 (ja) * 2012-08-30 2014-03-06 シャープ株式会社 薄膜トランジスタ基板及び表示装置
US20150214374A1 (en) * 2012-08-30 2015-07-30 Sharp Kabushiki Kaisha Circuit board and display device
US9853164B2 (en) * 2012-10-03 2017-12-26 Sharp Kabushiki Kaisha Semiconductor device and display device
JP6015389B2 (ja) 2012-11-30 2016-10-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム
US9035287B2 (en) * 2013-02-01 2015-05-19 Polyera Corporation Polymeric materials for use in metal-oxide-semiconductor field-effect transistors
KR20150001154A (ko) * 2013-06-26 2015-01-06 삼성디스플레이 주식회사 박막 트랜지스터 표시판 및 그 제조 방법
KR102146070B1 (ko) * 2013-07-01 2020-08-21 삼성디스플레이 주식회사 유기 발광 표시 장치
JP6394171B2 (ja) * 2013-10-30 2018-09-26 株式会社リコー 電界効果型トランジスタ、表示素子、画像表示装置、及びシステム

Also Published As

Publication number Publication date
KR102137664B1 (ko) 2020-07-24
BR112016009806B1 (pt) 2022-07-26
JP2015111653A (ja) 2015-06-18
US20180226046A1 (en) 2018-08-09
US9972274B2 (en) 2018-05-15
KR20180049246A (ko) 2018-05-10
US10565954B2 (en) 2020-02-18
KR101856078B1 (ko) 2018-05-09
EP3063783A1 (en) 2016-09-07
CN105684135B (zh) 2019-04-12
BR112016009806A2 (no) 2017-08-01
TW201523891A (zh) 2015-06-16
CN110047938A (zh) 2019-07-23
US20160267873A1 (en) 2016-09-15
JP6394171B2 (ja) 2018-09-26
EP3063783A4 (en) 2017-06-28
RU2630708C1 (ru) 2017-09-12
WO2015064670A1 (en) 2015-05-07
TWI568000B (zh) 2017-01-21
KR20160078424A (ko) 2016-07-04
EP3063783B1 (en) 2020-02-12
CN105684135A (zh) 2016-06-15

Similar Documents

Publication Publication Date Title
SG11201603456VA (en) Field-effect transistor, display element, image display device, and system
EP2926366A4 (en) FIELD EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DEVICE AND SYSTEM
EP2985651A4 (en) IMAGE DISPLAY DEVICE AND DISPLAY DEVICE
EP2985652A4 (en) IMAGE DISPLAY DEVICE AND DISPLAY DEVICE
TWI561892B (en) Curved display device
EP3013042A4 (en) IMAGE DISPLAY DEVICE AND METHOD
GB2526959B (en) Planar device on fin-based transistor architecture
EP2960896A4 (en) VISIOCASQUE AND IMAGE DISPLAY DEVICE
SG10201605788RA (en) Field-effect transistor, display element, image display device, and system
EP2993497A4 (en) OPTICAL DIFFUSION FILM FOR AN INDICATION AND DISPLAY DEVICE THEREFOR
EP2963917A4 (en) IMAGING ELEMENT AND ELECTRONIC DEVICE THEREFOR
EP3086546A4 (en) IMAGE CAPTURE MODULE AND IMAGE CAPTURE DEVICE
EP2972574A4 (en) ELECTROCHROMIC DISPLAY ELEMENT AND IMAGE DISPLAY DEVICE
EP2942774A4 (en) IMAGE DISPLAY DEVICE
EP2953116A4 (en) DISPLAY DEVICE AND DEVICE
GB201306989D0 (en) Information display device
EP2965307A4 (en) DISPLAY DEVICE
EP3079356A4 (en) Imaging element and imaging device
GB2511541B (en) Field effect transistor device
EP3041216A4 (en) Imaging system and imaging device
EP3043551A4 (en) DISPLAY DEVICE
EP2960916A4 (en) DISPLAY DEVICE
EP3432363A4 (en) FIELD EFFECT TRANSISTOR, DISPLAY ELEMENT, IMAGE DISPLAY DEVICE, AND SYSTEM
EP3032330A4 (en) Light-source device, light-source unit, and image display device
EP2849080A4 (en) METHOD AND DEVICE FOR DISPLAYING IMAGES