JP5141325B2 - 有機elディスプレイパネルの製造方法 - Google Patents
有機elディスプレイパネルの製造方法 Download PDFInfo
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- JP5141325B2 JP5141325B2 JP2008072925A JP2008072925A JP5141325B2 JP 5141325 B2 JP5141325 B2 JP 5141325B2 JP 2008072925 A JP2008072925 A JP 2008072925A JP 2008072925 A JP2008072925 A JP 2008072925A JP 5141325 B2 JP5141325 B2 JP 5141325B2
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Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices adapted for rectifying, amplifying, oscillating or switching, or capacitors or resistors with at least one potential-jump barrier or surface barrier, e.g. PN junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/76—Unipolar devices, e.g. field effect transistors
- H01L29/772—Field effect transistors
- H01L29/78—Field effect transistors with field effect produced by an insulated gate
- H01L29/786—Thin film transistors, i.e. transistors with a channel being at least partly a thin film
- H01L29/78606—Thin film transistors, i.e. transistors with a channel being at least partly a thin film with supplementary region or layer in the thin film or in the insulated bulk substrate supporting it for controlling or increasing the safety of the device
Description
図1に示すように、本発明の実施の形態に係る有機EL表示装置100に用いる基板(バックプレーン)には、薄膜トランジスタと画素電極14と有機媒体層1と対向電極19とが設けられている。
図1に示すように、本発明の実施の形態に係る画素電極14は、基板6上の薄膜トランジスタのソース電極13に電気的に接続されて、必要に応じてパターニングで形成される。画素電極14は隔壁15によって区画され、各画素に対応した画素電極14となる。ここで、パッシブマトリクス駆動型の有機EL表示装置の画素電極14は、基板6上に成膜して、必要に応じてパターニングを行うことができる。
本発明の実施の形態に係る隔壁15は、画素に対応した発光領域を区画するように形成することができる。図1に示すように、画素電極14の端部を覆うように形成するのが好ましい。アクティブマトリクス駆動型の有機EL表示装置100は各画素に対して画素電極14が形成され、各画素ができるだけ広い面積を占有しようとする。そのため、画素電極14の端部を覆うように形成される隔壁15の最も好ましい形状は各画素電極14を最短距離で区切る格子状を基本とする。
本発明の実施の形態に係る有機媒体層2は、正孔輸送層16、インターレイヤ層17及び有機発光層18を備えている。有機媒体層2として用いることができる発光補助層は、正孔輸送層16やインターレイヤ層17に限定されるわけではなく、図示しないが正孔注入層、電子輸送層、電子注入層などを用いることができる。
図1に示すように、本発明の実施の形態に係る対向電極19を陰極とする場合には有機発光層18への電子注入効率の高い、仕事関数の低い物質を用いることができる。
図3は、有機EL素子1上に形成された第1の保護層20と第2の保護層21とを示す。本発明の実施の形態に係る第1の保護層20には、第1の保護層20と接する電極材料と第2の保護層21として用いる保護層材料との混合層を成膜することができる。第1の保護層20は、封止材を設けた際に、封止材と対向電極19との界面を通って外部から酸素や水分などが侵入するのを防ぐために成膜される。第1の保護層20の電極材料としては前述した対向電極19の材料が用いることができる。第1の保護層20の保護層材料としては例えばLi、Na、K、Rb、Cs、Cu、Mg、Ba、Ca、Sr、Zn、Cd、Al、Ga、In、Sc、Y、Si、Ge、Ti、Zr、Hf、Sb、Nb、Ta、Se、Cr、W、Fe、Co、Yb、Eu、Ce、La、Rb、Lu、Ho、Er、SmまたはTmから選ばれた一種単独または二種以上の原子を含む酸化物、窒化物、酸窒化物、硫化物、炭化物、または弗化物等の無機化合物が挙げられるが本発明はこれらに限定されるわけではない。さらに有機化合物として、第1の保護層20の構成材料には、カーボンを用いることも好ましい。
第1の保護層20の膜厚が5nm未満だと、第1の保護層20と対向電極19との界面、第1の保護層20と第2の保護層21との界面を通って外部から酸素や水分などが侵入してしまう。
電極材料と保護層材料との界面を無くし、界面からのガスの浸入を防ぐ目的で設けられる第1の保護層20に対し、本発明の実施の形態に係る第2の保護層21はガスが成膜面を通過して侵入するのを防ぐ目的で設けられる。第2の保護層21は第1の保護層20材料と同一の材料が成膜される。
有機EL素子1に大気のガスが到達しないようにするために通常は、外部と遮断するために封止材と樹脂層とを有する封止体30を設けることができる。
第1の保護層20を成膜する前までは実施例1と同様の手順で作製した。次に、図6に示すように、保護層83としてSiOxを対向電極19のパターンを全て覆うように、対向電極19を蒸着する時に用いたメタルマスクの開口より1mm大きくした開口を持つメタルマスクを用いて、真空蒸着法にて蒸着レート5nm/secで200nm成膜した。
封止を行う前までは比較例1と同様の手順で作製した。次に、封止材として有機EL素子1全てをカバーするような凹型のキャップ状とキャップ状の周辺部に樹脂層を塗布した。次に、更に凹部に水分のトラップ材31としてBaO含有の厚さ0.2mmのテープを貼り付けた封止体30を有機EL素子1の発光領域が凹型の内側に配置されるように有機EL素子1が成膜された基板6と貼り合わせ、約90℃で1時間樹脂層を熱硬化して封止を行った。
Claims (4)
- 基板を準備し、
前記基板上に複数の画素電極を形成し、
前記複数の画素電極上に有機媒体層を形成し、
前記有機媒体層上に対向電極を形成し、
前記対向電極上に第1の保護層を形成し、
前記第1の保護層上に第2の保護層を形成し、
前記第2の保護層は、上記第1の保護層の全てを覆うように形成することを含み、
前記第1の保護層は、前記対向電極と前記第2の保護層との混合膜であり、
前記対向電極と前記第1の保護層は、同じメタルマスクを用いて形成され、
前記第2の保護層は、前記メタルマスクより大きな開口を有するメタルマスクを用いて形成されることを特徴とする有機ELディスプレイパネルの製造方法。 - 前記第1の保護層の混合膜が混合割合に勾配があることを特徴とする請求項1に記載の有機ELディスプレイパネルの製造方法。
- 前記第1の保護層の膜厚は5nm以上であることを特徴とする請求項1または2に記載の有機ELディスプレイパネルの製造方法。
- 水蒸気透過率が10−6g/m2/day以下の板状部材を有する封止材と、前記封止材を接着させる樹脂層と、を有する封止体を具備することを特徴とする請求項1乃至3のいずれかに記載の有機ELディスプレイパネルの製造方法。
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