SG11201504237XA - Composition, infrared transmission filter and method for manufacturing the same and infrared sensor - Google Patents

Composition, infrared transmission filter and method for manufacturing the same and infrared sensor

Info

Publication number
SG11201504237XA
SG11201504237XA SG11201504237XA SG11201504237XA SG11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA
Authority
SG
Singapore
Prior art keywords
manufacturing
composition
same
infrared
transmission filter
Prior art date
Application number
SG11201504237XA
Other languages
English (en)
Inventor
Hirotaka TAKISHITA
Toshihito Kuge
Yoshinori Taguchi
Hiroshi Taguchi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of SG11201504237XA publication Critical patent/SG11201504237XA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Structural Engineering (AREA)
  • Architecture (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
SG11201504237XA 2012-11-29 2013-11-22 Composition, infrared transmission filter and method for manufacturing the same and infrared sensor SG11201504237XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012261422 2012-11-29
PCT/JP2013/081560 WO2014084147A1 (ja) 2012-11-29 2013-11-22 組成物、赤外線透過フィルタ及びその製造方法、並びに赤外線センサー

Publications (1)

Publication Number Publication Date
SG11201504237XA true SG11201504237XA (en) 2015-07-30

Family

ID=50827785

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201504237XA SG11201504237XA (en) 2012-11-29 2013-11-22 Composition, infrared transmission filter and method for manufacturing the same and infrared sensor

Country Status (7)

Country Link
US (1) US10025011B2 (zh)
JP (1) JP6091009B2 (zh)
KR (1) KR101646944B1 (zh)
CN (1) CN104823082B (zh)
SG (1) SG11201504237XA (zh)
TW (1) TWI595313B (zh)
WO (1) WO2014084147A1 (zh)

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US9570491B2 (en) 2014-10-08 2017-02-14 Omnivision Technologies, Inc. Dual-mode image sensor with a signal-separating color filter array, and method for same
CN107003453B (zh) 2014-12-19 2019-10-11 Ａｇｃ株式会社 光学滤波器和使用该光学滤波器的装置
TWI697545B (zh) * 2015-03-10 2020-07-01 日商富士軟片股份有限公司 組成物套組、積層體及其製造方法以及帶通濾波器
JP6645243B2 (ja) * 2015-03-19 2020-02-14 Jsr株式会社 硬化性組成物、硬化膜、赤外光透過フィルタ及び固体撮像装置
KR102206015B1 (ko) * 2015-03-27 2021-01-20 동우 화인켐 주식회사 적외선 투과 감광성 수지 조성물
KR102325532B1 (ko) * 2015-03-27 2021-11-11 동우 화인켐 주식회사 적외선 투과 감광성 수지 조성물
JP6498284B2 (ja) * 2015-05-01 2019-04-10 富士フイルム株式会社 膜、膜の製造方法、固体撮像素子および赤外線センサ
TWI723994B (zh) 2015-05-22 2021-04-11 日商富士軟片股份有限公司 著色組成物、膜、彩色濾光片、圖案形成方法、彩色濾光片的製造方法、固體攝像元件及紅外線感測器
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TWI553410B (zh) * 2015-10-08 2016-10-11 新應材股份有限公司 組成物、紅外線透過濾光片及其製造方法以及紅外線感測器
CN105511003A (zh) * 2015-12-08 2016-04-20 江苏星浪光学仪器有限公司 一种高性能滤光片生产加工工艺方法
JP6899061B2 (ja) * 2016-03-18 2021-07-07 日東電工株式会社 Ｌｉｄａｒ用選択波長吸収樹脂組成物およびその製造方法
KR102129746B1 (ko) 2016-07-21 2020-07-03 후지필름 가부시키가이샤 조성물, 막, 적층체, 적외선 투과 필터, 고체 촬상 소자 및 적외선 센서
JP6734384B2 (ja) * 2016-09-21 2020-08-05 富士フイルム株式会社 組成物、形成体、積層体、遠赤外線透過フィルタ、固体撮像素子、赤外線カメラおよび赤外線センサ
TWI756347B (zh) 2017-01-30 2022-03-01 日商富士軟片股份有限公司 組成物、膜、紅外線透過濾波器、固體攝像元件、圖像顯示裝置及紅外線感測器
WO2019013108A1 (ja) 2017-07-13 2019-01-17 富士フイルム株式会社 組成物、膜、赤外線透過フィルタ、固体撮像素子、画像表示装置および赤外線センサ
KR102483100B1 (ko) 2017-09-15 2022-12-30 후지필름 가부시키가이샤 조성물, 막, 적층체, 적외선 투과 필터, 고체 촬상 소자 및 적외선 센서
JP6812936B2 (ja) * 2017-09-22 2021-01-13 豊田合成株式会社 近赤外線センサ用カバー装置
JP6837568B2 (ja) * 2017-09-28 2021-03-03 富士フイルム株式会社 組成物、膜、光学フィルタ、固体撮像素子および赤外線センサ
CN107908886A (zh) * 2017-11-22 2018-04-13 西南大学 基于稳态最小聚合度建立高分子绝缘材料仿真模型的方法
TW201934706A (zh) * 2017-12-27 2019-09-01 日商住友化學股份有限公司 附黏著劑層之光學膜及顯示裝置
TWI765958B (zh) * 2018-01-19 2022-06-01 南韓商東友精細化工有限公司 著色感光性樹脂組成物、包括使用著色感光性樹脂組成物製造之黑色矩陣、柱間隔物或黑色柱間隔物的彩色濾光片、以及包括彩色濾光片的顯示裝置
KR101977886B1 (ko) * 2018-06-18 2019-05-13 영창케미칼 주식회사 패턴 프로파일 개선용 화학증폭형 포지티브 포토레지스트 조성물
KR20200015092A (ko) * 2018-08-02 2020-02-12 동우 화인켐 주식회사 적외선 투과성 착색 감광성 조성물 및 적외선 투과 필터
JP7114724B2 (ja) 2018-09-20 2022-08-08 富士フイルム株式会社 硬化性組成物、硬化膜、赤外線透過フィルタ、積層体、固体撮像素子、センサ、及び、パターン形成方法
CN109917500A (zh) * 2018-11-29 2019-06-21 北京科易达知识产权服务有限公司 有机热红外薄膜透镜的结构、设计及其制备方法
CN109593202A (zh) * 2018-11-30 2019-04-09 北京科易达知识产权服务有限公司 高红外透过率的聚合物红外透镜材料设计与制备
CN110333646A (zh) * 2019-07-17 2019-10-15 深圳市华星光电技术有限公司 一种红色彩膜光刻胶
WO2021070694A1 (ja) 2019-10-07 2021-04-15 住友化学株式会社 着色樹脂組成物
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Also Published As

Publication number Publication date
KR101646944B1 (ko) 2016-08-09
CN104823082B (zh) 2017-07-28
TWI595313B (zh) 2017-08-11
KR20150080538A (ko) 2015-07-09
TW201428422A (zh) 2014-07-16
US20150260885A1 (en) 2015-09-17
US10025011B2 (en) 2018-07-17
WO2014084147A1 (ja) 2014-06-05
JP6091009B2 (ja) 2017-03-08
JP2014130338A (ja) 2014-07-10
CN104823082A (zh) 2015-08-05

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