SG11201504237XA - Composition, infrared transmission filter and method for manufacturing the same and infrared sensor - Google Patents

Composition, infrared transmission filter and method for manufacturing the same and infrared sensor

Info

Publication number
SG11201504237XA
SG11201504237XA SG11201504237XA SG11201504237XA SG11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA SG 11201504237X A SG11201504237X A SG 11201504237XA
Authority
SG
Singapore
Prior art keywords
manufacturing
composition
same
infrared
transmission filter
Prior art date
Application number
SG11201504237XA
Inventor
Hirotaka TAKISHITA
Toshihito Kuge
Yoshinori Taguchi
Hiroshi Taguchi
Original Assignee
Fujifilm Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Publication of SG11201504237XA publication Critical patent/SG11201504237XA/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/02—Details
    • G01J1/04—Optical or mechanical part supplementary adjustable parts
    • G01J1/0407—Optical elements not provided otherwise, e.g. manifolds, windows, holograms, gratings
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J1/00—Photometry, e.g. photographic exposure meter
    • G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
SG11201504237XA 2012-11-29 2013-11-22 Composition, infrared transmission filter and method for manufacturing the same and infrared sensor SG11201504237XA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012261422 2012-11-29
PCT/JP2013/081560 WO2014084147A1 (en) 2012-11-29 2013-11-22 Composition, infrared pass filter and method for fabricating same, and infrared sensor

Publications (1)

Publication Number Publication Date
SG11201504237XA true SG11201504237XA (en) 2015-07-30

Family

ID=50827785

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201504237XA SG11201504237XA (en) 2012-11-29 2013-11-22 Composition, infrared transmission filter and method for manufacturing the same and infrared sensor

Country Status (7)

Country Link
US (1) US10025011B2 (en)
JP (1) JP6091009B2 (en)
KR (1) KR101646944B1 (en)
CN (1) CN104823082B (en)
SG (1) SG11201504237XA (en)
TW (1) TWI595313B (en)
WO (1) WO2014084147A1 (en)

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JP6427659B2 (en) * 2015-03-10 2018-11-21 富士フイルム株式会社 Composition kit, laminate and method for producing the same, band pass filter
JP6645243B2 (en) * 2015-03-19 2020-02-14 Jsr株式会社 Curable composition, cured film, infrared light transmitting filter, and solid-state imaging device
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KR102325532B1 (en) * 2015-03-27 2021-11-11 동우 화인켐 주식회사 IR-Pass photo resist composition
WO2016178346A1 (en) * 2015-05-01 2016-11-10 富士フイルム株式会社 Film, method for producing film, solid-state imaging device, and infrared sensor
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DE102015114661A1 (en) * 2015-09-02 2017-03-02 Osram Opto Semiconductors Gmbh Optoelectronic component and method for producing an optoelectronic component
TWI553410B (en) * 2015-10-08 2016-10-11 新應材股份有限公司 Composition, infrared ray transmitting filter and fabricating method thereof, and infrared ray sensor
CN105511003A (en) * 2015-12-08 2016-04-20 江苏星浪光学仪器有限公司 High-performance optical filter production and processing technology
JP6899061B2 (en) * 2016-03-18 2021-07-07 日東電工株式会社 Selective wavelength absorbing resin composition for lidar and its manufacturing method
KR102129746B1 (en) 2016-07-21 2020-07-03 후지필름 가부시키가이샤 Composition, membrane, laminate, infrared transmission filter, solid-state imaging element and infrared sensor
WO2018055966A1 (en) * 2016-09-21 2018-03-29 富士フイルム株式会社 Composition, formed body, laminate, far-infrared transmission filter, solid-state imaging element, infrared camera, and infrared sensor
TWI756347B (en) 2017-01-30 2022-03-01 日商富士軟片股份有限公司 Composition, film, infrared transmission filter, solid-state imaging device, image display device, and infrared sensor
CN110809585B (en) 2017-07-13 2022-04-05 富士胶片株式会社 Composition, film, infrared transmission filter, solid-state imaging element, image display device, and infrared sensor
WO2019054281A1 (en) 2017-09-15 2019-03-21 富士フイルム株式会社 Composition, film, laminate, infrared transmission filter, solid-state imaging device and infrared sensor
JP6812936B2 (en) * 2017-09-22 2021-01-13 豊田合成株式会社 Cover device for near infrared sensor
JP6837568B2 (en) * 2017-09-28 2021-03-03 富士フイルム株式会社 Compositions, films, optical filters, solid-state image sensors and infrared sensors
JP7390189B2 (en) * 2017-09-29 2023-12-01 富士フイルム株式会社 Colored photosensitive composition and method for producing optical filter
CN107908886A (en) * 2017-11-22 2018-04-13 西南大学 The method that insulating polymeric material simulation model is established based on the stable state minimum degree of polymerization
JP2019120940A (en) * 2017-12-27 2019-07-22 住友化学株式会社 Optical film with adhesive layer and display device
TWI765958B (en) * 2018-01-19 2022-06-01 南韓商東友精細化工有限公司 Colored photosensitive resin composition, color filter including black matrix , column spacer or black column spacer manufactured using the colored photosensitive resin composition, and display device including the color filter
KR101977886B1 (en) * 2018-06-18 2019-05-13 영창케미칼 주식회사 Chemical amplified type positive photoresist composition for pattern profile improvement
KR20200015092A (en) * 2018-08-02 2020-02-12 동우 화인켐 주식회사 Infrared transmissive colored photosensitive composition and infrared pass filter
WO2020059509A1 (en) 2018-09-20 2020-03-26 富士フイルム株式会社 Curable composition, cured film, infrared transmission filter, laminate, solid-state imaging element, sensor, and pattern formation method
CN109917500A (en) * 2018-11-29 2019-06-21 北京科易达知识产权服务有限公司 The structure of organic thermal infrared thin film lens, design and preparation method thereof
CN109593202A (en) * 2018-11-30 2019-04-09 北京科易达知识产权服务有限公司 The design of polymer infrared lens material and preparation of high infrared transmittance
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JP2021060580A (en) * 2019-10-07 2021-04-15 住友化学株式会社 Coloring resin composition
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Also Published As

Publication number Publication date
TWI595313B (en) 2017-08-11
KR20150080538A (en) 2015-07-09
KR101646944B1 (en) 2016-08-09
JP2014130338A (en) 2014-07-10
US20150260885A1 (en) 2015-09-17
JP6091009B2 (en) 2017-03-08
US10025011B2 (en) 2018-07-17
CN104823082A (en) 2015-08-05
TW201428422A (en) 2014-07-16
WO2014084147A1 (en) 2014-06-05
CN104823082B (en) 2017-07-28

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