SG10201910709PA - Method of inspecting defects, and method of manufacturing mask blank, transfer mask and semiconductor device - Google Patents

Method of inspecting defects, and method of manufacturing mask blank, transfer mask and semiconductor device

Info

Publication number
SG10201910709PA
SG10201910709PA SG10201910709PA SG10201910709PA SG10201910709PA SG 10201910709P A SG10201910709P A SG 10201910709PA SG 10201910709P A SG10201910709P A SG 10201910709PA SG 10201910709P A SG10201910709P A SG 10201910709PA SG 10201910709P A SG10201910709P A SG 10201910709PA
Authority
SG
Singapore
Prior art keywords
semiconductor device
inspecting defects
mask
manufacturing
mask blank
Prior art date
Application number
SG10201910709PA
Other languages
English (en)
Inventor
Tanabe Masaru
Uchida Naoki
Original Assignee
Hoya Corp
Hoya Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Singapore Pte Ltd filed Critical Hoya Corp
Publication of SG10201910709PA publication Critical patent/SG10201910709PA/en

Links

SG10201910709PA 2018-11-30 2019-11-15 Method of inspecting defects, and method of manufacturing mask blank, transfer mask and semiconductor device SG10201910709PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2018224842A JP7202861B2 (ja) 2018-11-30 2018-11-30 欠陥検査方法、並びにマスクブランク、転写用マスクおよび半導体デバイスの製造方法

Publications (1)

Publication Number Publication Date
SG10201910709PA true SG10201910709PA (en) 2020-06-29

Family

ID=70907990

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201910709PA SG10201910709PA (en) 2018-11-30 2019-11-15 Method of inspecting defects, and method of manufacturing mask blank, transfer mask and semiconductor device

Country Status (2)

Country Link
JP (1) JP7202861B2 (ja)
SG (1) SG10201910709PA (ja)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3656918B2 (ja) * 1995-06-12 2005-06-08 オリンパス株式会社 電動レボルバ制御装置
JP5245212B2 (ja) * 2006-05-09 2013-07-24 株式会社ニコン 端部検査装置
JP2010261915A (ja) * 2009-05-11 2010-11-18 Olympus Corp 基板検査装置
JP5346243B2 (ja) * 2009-06-04 2013-11-20 Ｈｏｙａ株式会社 マスクブランク用ガラス基板の製造方法、マスクブランクの製造方法、露光用マスクの製造方法及びパターン転写方法
WO2012102313A1 (ja) * 2011-01-26 2012-08-02 旭硝子株式会社 フォトマスクの製造方法
JP6891795B2 (ja) * 2017-01-26 2021-06-18 信越化学工業株式会社 フォトマスクブランクの欠陥検査方法、選別方法及び製造方法
JP6903449B2 (ja) * 2017-02-22 2021-07-14 Hoya株式会社 欠陥検査装置、および欠陥検査方法

Also Published As

Publication number Publication date
JP2020086363A (ja) 2020-06-04
JP7202861B2 (ja) 2023-01-12

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