SG10201701374PA - Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device - Google Patents

Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Info

Publication number
SG10201701374PA
SG10201701374PA SG10201701374PA SG10201701374PA SG10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA SG 10201701374P A SG10201701374P A SG 10201701374PA
Authority
SG
Singapore
Prior art keywords
manufacturing
starting
semiconductor device
forming apparatus
mask
Prior art date
Application number
SG10201701374PA
Inventor
Isao Kawasumi
Toshiyuki Suzuki
Chor Boon Ang
Cheng Yong Boo
Original Assignee
Hoya Corp
Hoya Electronics Singapore Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp, Hoya Electronics Singapore Pte Ltd filed Critical Hoya Corp
Publication of SG10201701374PA publication Critical patent/SG10201701374PA/en

Links

SG10201701374PA 2016-03-24 2017-02-21 Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device SG10201701374PA (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2016059740A JP6316861B2 (en) 2016-03-24 2016-03-24 Method for starting film forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Publications (1)

Publication Number Publication Date
SG10201701374PA true SG10201701374PA (en) 2017-10-30

Family

ID=59971802

Family Applications (1)

Application Number Title Priority Date Filing Date
SG10201701374PA SG10201701374PA (en) 2016-03-24 2017-02-21 Method for starting up flim forming apparatus, method for manufacturing mask blank, method for manufacturing transfer mask, and method for manufacturing semiconductor device

Country Status (2)

Country Link
JP (1) JP6316861B2 (en)
SG (1) SG10201701374PA (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7159096B2 (en) * 2019-03-28 2022-10-24 Hoya株式会社 Photomask blank, photomask manufacturing method, and display device manufacturing method
JP7379027B2 (en) * 2019-09-04 2023-11-14 Hoya株式会社 Substrate with multilayer reflective film, reflective mask blank, reflective mask, and semiconductor device manufacturing method
TW202122909A (en) * 2019-10-25 2021-06-16 美商應用材料股份有限公司 Extreme ultraviolet mask blank defect reduction methods

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09268367A (en) * 1996-04-01 1997-10-14 Hitachi Ltd Thin film forming device and method by plasma treatment
JPH10130814A (en) * 1996-10-24 1998-05-19 Sony Corp Formation of sputtered film
JP4473410B2 (en) * 2000-05-24 2010-06-02 キヤノンアネルバ株式会社 Sputtering apparatus and film forming method
JP4376637B2 (en) * 2004-01-14 2009-12-02 Ｈｏｙａ株式会社 Sputtering target and mask blank manufacturing method using the same
CN101978093B (en) * 2008-11-28 2012-02-01 佳能安内华股份有限公司 Deposition apparatus and electronic device manufacturing method

Also Published As

Publication number Publication date
JP6316861B2 (en) 2018-04-25
JP2017172000A (en) 2017-09-28

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