SE8800837L - Anordning for anvendning i ett steg- och repetitionssystem for direkt exponering av halvledarskivor - Google Patents

Anordning for anvendning i ett steg- och repetitionssystem for direkt exponering av halvledarskivor

Info

Publication number
SE8800837L
SE8800837L SE8800837A SE8800837A SE8800837L SE 8800837 L SE8800837 L SE 8800837L SE 8800837 A SE8800837 A SE 8800837A SE 8800837 A SE8800837 A SE 8800837A SE 8800837 L SE8800837 L SE 8800837L
Authority
SE
Sweden
Prior art keywords
wafer
image
reticle
alignment
stepped
Prior art date
Application number
SE8800837A
Other languages
English (en)
Other versions
SE456873B (sv
SE8800837D0 (sv
Inventor
Peski C Van
W L Meisenheimer
Original Assignee
American Semiconductor Equip
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by American Semiconductor Equip filed Critical American Semiconductor Equip
Publication of SE8800837D0 publication Critical patent/SE8800837D0/sv
Publication of SE8800837L publication Critical patent/SE8800837L/sv
Publication of SE456873B publication Critical patent/SE456873B/sv

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
SE8800837A 1979-05-11 1988-03-09 Anordning foer anvaendning i ett steg- och repetitionssystem foer direkt exponering av halvledarskivor SE456873B (sv)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3834979A 1979-05-11 1979-05-11

Publications (3)

Publication Number Publication Date
SE8800837D0 SE8800837D0 (sv) 1988-03-09
SE8800837L true SE8800837L (sv) 1988-03-09
SE456873B SE456873B (sv) 1988-11-07

Family

ID=21899427

Family Applications (3)

Application Number Title Priority Date Filing Date
SE8003424A SE457034B (sv) 1979-05-11 1980-05-07 Anordning vid fotoexponeringssystem foer halvledarskivor med en kamera foer exponering av skivan foer att framstaella halvledaranordningar.
SE8800837A SE456873B (sv) 1979-05-11 1988-03-09 Anordning foer anvaendning i ett steg- och repetitionssystem foer direkt exponering av halvledarskivor
SE8800836A SE456872B (sv) 1979-05-11 1988-03-09 Anordning foer steg- och repetitionssystem foer direkt exponering foer framstaellning eller behandling av halvledarskivor med en kamera foer exponering av en bild paa skivan

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SE8003424A SE457034B (sv) 1979-05-11 1980-05-07 Anordning vid fotoexponeringssystem foer halvledarskivor med en kamera foer exponering av skivan foer att framstaella halvledaranordningar.

Family Applications After (1)

Application Number Title Priority Date Filing Date
SE8800836A SE456872B (sv) 1979-05-11 1988-03-09 Anordning foer steg- och repetitionssystem foer direkt exponering foer framstaellning eller behandling av halvledarskivor med en kamera foer exponering av en bild paa skivan

Country Status (8)

Country Link
JP (3) JPS5617019A (sv)
DE (1) DE3017582C2 (sv)
FR (1) FR2456338B1 (sv)
GB (2) GB2052767B (sv)
IL (1) IL59629A (sv)
IT (1) IT1212414B (sv)
NL (1) NL8002009A (sv)
SE (3) SE457034B (sv)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
GB2150105B (en) * 1983-11-23 1987-04-29 Alan Leslie Smith Device for expelling fluent contents from a container
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JP2682002B2 (ja) * 1988-02-22 1997-11-26 日本精工株式会社 露光装置の位置合わせ方法及び装置
KR0144082B1 (ko) * 1994-04-01 1998-08-17 김주용 레티클 및 그 레티클을 사용한 가림막 세팅 방법
JP2546537B2 (ja) * 1994-06-20 1996-10-23 株式会社ニコン 投影露光装置及び方法
JP2006213107A (ja) 2005-02-02 2006-08-17 Yamaha Motor Co Ltd 鞍乗り型車両

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2052603A (en) * 1932-09-09 1936-09-01 Johns Manville Article of manufacture
DE2222249C3 (de) * 1972-05-05 1979-04-12 Anatolij Petrovitsch Kornilov Doppelobjektiv-Einrichtung zum Indeckungbringen einer Photomaske mit einer Unterlage wie einem Halbleiter-Plättchen
JPS4921467A (sv) * 1972-06-20 1974-02-25
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS51124938A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Automatic focusing apparatus
JPS5932763B2 (ja) * 1975-07-25 1984-08-10 株式会社日立製作所 自動焦点合わせ装置
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren

Also Published As

Publication number Publication date
SE457034B (sv) 1988-11-21
SE456872B (sv) 1988-11-07
DE3017582A1 (de) 1980-11-13
IT1212414B (it) 1989-11-22
IL59629A (en) 1983-03-31
JPH0310221B2 (sv) 1991-02-13
FR2456338B1 (fr) 1986-05-09
JPH0125220B2 (sv) 1989-05-16
NL8002009A (nl) 1980-11-13
GB2052767A (en) 1981-01-28
SE8800836D0 (sv) 1988-03-09
SE8003424L (sv) 1980-11-12
GB2052767B (en) 1983-06-08
GB2111695B (en) 1984-01-11
JPS5816531A (ja) 1983-01-31
FR2456338A1 (fr) 1980-12-05
JPS638609B2 (sv) 1988-02-23
DE3017582C2 (de) 1986-07-31
SE456873B (sv) 1988-11-07
SE8800836L (sv) 1988-03-09
IL59629A0 (en) 1980-06-30
GB2111695A (en) 1983-07-06
SE8800837D0 (sv) 1988-03-09
JPS5617019A (en) 1981-02-18
JPS5816532A (ja) 1983-01-31
IT8021931A0 (it) 1980-05-09

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