FR2456338B1 - Appareil et procede de reproduction optique pour la fabrication de dispositifs semi-conducteurs - Google Patents

Appareil et procede de reproduction optique pour la fabrication de dispositifs semi-conducteurs

Info

Publication number
FR2456338B1
FR2456338B1 FR8010517A FR8010517A FR2456338B1 FR 2456338 B1 FR2456338 B1 FR 2456338B1 FR 8010517 A FR8010517 A FR 8010517A FR 8010517 A FR8010517 A FR 8010517A FR 2456338 B1 FR2456338 B1 FR 2456338B1
Authority
FR
France
Prior art keywords
semiconductor devices
reproducing apparatus
manufacturing semiconductor
optical reproducing
optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR8010517A
Other languages
English (en)
Other versions
FR2456338A1 (fr
Inventor
Christian Van Peski
William L Meisenheimer
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ELECTROMASK Inc
Original Assignee
ELECTROMASK Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ELECTROMASK Inc filed Critical ELECTROMASK Inc
Publication of FR2456338A1 publication Critical patent/FR2456338A1/fr
Application granted granted Critical
Publication of FR2456338B1 publication Critical patent/FR2456338B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
FR8010517A 1979-05-11 1980-05-09 Appareil et procede de reproduction optique pour la fabrication de dispositifs semi-conducteurs Expired FR2456338B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3834979A 1979-05-11 1979-05-11

Publications (2)

Publication Number Publication Date
FR2456338A1 FR2456338A1 (fr) 1980-12-05
FR2456338B1 true FR2456338B1 (fr) 1986-05-09

Family

ID=21899427

Family Applications (1)

Application Number Title Priority Date Filing Date
FR8010517A Expired FR2456338B1 (fr) 1979-05-11 1980-05-09 Appareil et procede de reproduction optique pour la fabrication de dispositifs semi-conducteurs

Country Status (8)

Country Link
JP (3) JPS5617019A (fr)
DE (1) DE3017582C2 (fr)
FR (1) FR2456338B1 (fr)
GB (2) GB2052767B (fr)
IL (1) IL59629A (fr)
IT (1) IT1212414B (fr)
NL (1) NL8002009A (fr)
SE (3) SE457034B (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
GB2150105B (en) * 1983-11-23 1987-04-29 Alan Leslie Smith Device for expelling fluent contents from a container
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JP2682002B2 (ja) * 1988-02-22 1997-11-26 日本精工株式会社 露光装置の位置合わせ方法及び装置
KR0144082B1 (ko) * 1994-04-01 1998-08-17 김주용 레티클 및 그 레티클을 사용한 가림막 세팅 방법
JP2546537B2 (ja) * 1994-06-20 1996-10-23 株式会社ニコン 投影露光装置及び方法
JP2006213107A (ja) 2005-02-02 2006-08-17 Yamaha Motor Co Ltd 鞍乗り型車両

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2052603A (en) * 1932-09-09 1936-09-01 Johns Manville Article of manufacture
DE2222249C3 (de) * 1972-05-05 1979-04-12 Anatolij Petrovitsch Kornilov Doppelobjektiv-Einrichtung zum Indeckungbringen einer Photomaske mit einer Unterlage wie einem Halbleiter-Plättchen
JPS4921467A (fr) * 1972-06-20 1974-02-25
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS51124938A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Automatic focusing apparatus
JPS5932763B2 (ja) * 1975-07-25 1984-08-10 株式会社日立製作所 自動焦点合わせ装置
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren

Also Published As

Publication number Publication date
SE8003424L (sv) 1980-11-12
SE8800836L (sv) 1988-03-09
IT8021931A0 (it) 1980-05-09
IL59629A (en) 1983-03-31
SE8800837D0 (sv) 1988-03-09
JPS638609B2 (fr) 1988-02-23
DE3017582A1 (de) 1980-11-13
GB2111695A (en) 1983-07-06
JPH0310221B2 (fr) 1991-02-13
DE3017582C2 (de) 1986-07-31
SE8800836D0 (sv) 1988-03-09
GB2052767A (en) 1981-01-28
SE456873B (sv) 1988-11-07
JPS5816532A (ja) 1983-01-31
SE8800837L (sv) 1988-03-09
IT1212414B (it) 1989-11-22
JPS5617019A (en) 1981-02-18
SE456872B (sv) 1988-11-07
GB2111695B (en) 1984-01-11
IL59629A0 (en) 1980-06-30
FR2456338A1 (fr) 1980-12-05
JPS5816531A (ja) 1983-01-31
GB2052767B (en) 1983-06-08
JPH0125220B2 (fr) 1989-05-16
NL8002009A (nl) 1980-11-13
SE457034B (sv) 1988-11-21

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Legal Events

Date Code Title Description
CD Change of name or company name
TP Transmission of property
ST Notification of lapse