IL59629A0 - Apparatus and process for photo-exposing semiconductor wafers - Google Patents

Apparatus and process for photo-exposing semiconductor wafers

Info

Publication number
IL59629A0
IL59629A0 IL55629A IL5962980A IL59629A0 IL 59629 A0 IL59629 A0 IL 59629A0 IL 55629 A IL55629 A IL 55629A IL 5962980 A IL5962980 A IL 5962980A IL 59629 A0 IL59629 A0 IL 59629A0
Authority
IL
Israel
Prior art keywords
photo
semiconductor wafers
exposing semiconductor
exposing
wafers
Prior art date
Application number
IL55629A
Other versions
IL59629A (en
Original Assignee
Electromask Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electromask Inc filed Critical Electromask Inc
Priority to IL66762A priority Critical patent/IL66762A/en
Publication of IL59629A0 publication Critical patent/IL59629A0/en
Priority to IL66762A priority patent/IL66762A0/en
Publication of IL59629A publication Critical patent/IL59629A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Light Sources And Details Of Projection-Printing Devices (AREA)
IL59629A 1979-05-11 1980-03-14 Apparatus and process for photoexposing semiconductor wafers IL59629A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IL66762A IL66762A (en) 1979-05-11 1980-03-14 Apparatus for use in photo-exposing semiconductor wafers
IL66762A IL66762A0 (en) 1979-05-11 1982-09-10 Apparatus for use in photo-exposing semiconductor wafers

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3834979A 1979-05-11 1979-05-11

Publications (2)

Publication Number Publication Date
IL59629A0 true IL59629A0 (en) 1980-06-30
IL59629A IL59629A (en) 1983-03-31

Family

ID=21899427

Family Applications (1)

Application Number Title Priority Date Filing Date
IL59629A IL59629A (en) 1979-05-11 1980-03-14 Apparatus and process for photoexposing semiconductor wafers

Country Status (8)

Country Link
JP (3) JPS5617019A (en)
DE (1) DE3017582C2 (en)
FR (1) FR2456338B1 (en)
GB (2) GB2052767B (en)
IL (1) IL59629A (en)
IT (1) IT1212414B (en)
NL (1) NL8002009A (en)
SE (3) SE457034B (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
JPS5946026A (en) * 1982-09-09 1984-03-15 Toshiba Corp Measuring method for position of sample
GB2150105B (en) * 1983-11-23 1987-04-29 Alan Leslie Smith Device for expelling fluent contents from a container
JP2593440B2 (en) * 1985-12-19 1997-03-26 株式会社ニコン Projection type exposure equipment
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JP2682002B2 (en) * 1988-02-22 1997-11-26 日本精工株式会社 Exposure apparatus alignment method and apparatus
KR0144082B1 (en) * 1994-04-01 1998-08-17 김주용 Reticle and the setting method of blind using the same
JP2546537B2 (en) * 1994-06-20 1996-10-23 株式会社ニコン Projection exposure apparatus and method
JP2006213107A (en) 2005-02-02 2006-08-17 Yamaha Motor Co Ltd Saddle riding

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2052603A (en) * 1932-09-09 1936-09-01 Johns Manville Article of manufacture
DE2222249C3 (en) * 1972-05-05 1979-04-12 Anatolij Petrovitsch Kornilov Double lens device for bringing a photomask into register with a substrate such as a semiconductor wafer
JPS4921467A (en) * 1972-06-20 1974-02-25
JPS593791B2 (en) * 1975-04-07 1984-01-26 キヤノン株式会社 Object image recognition method
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS51124938A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Automatic focusing apparatus
JPS5932763B2 (en) * 1975-07-25 1984-08-10 株式会社日立製作所 automatic focusing device
JPS602772B2 (en) * 1976-11-01 1985-01-23 株式会社日立製作所 exposure equipment
DE2845603C2 (en) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Method and device for projection copying

Also Published As

Publication number Publication date
JPH0125220B2 (en) 1989-05-16
JPS5816532A (en) 1983-01-31
IL59629A (en) 1983-03-31
FR2456338A1 (en) 1980-12-05
GB2111695B (en) 1984-01-11
GB2052767B (en) 1983-06-08
JPH0310221B2 (en) 1991-02-13
NL8002009A (en) 1980-11-13
IT8021931A0 (en) 1980-05-09
GB2052767A (en) 1981-01-28
SE8800836D0 (en) 1988-03-09
JPS638609B2 (en) 1988-02-23
SE8003424L (en) 1980-11-12
SE8800837L (en) 1988-03-09
JPS5617019A (en) 1981-02-18
DE3017582C2 (en) 1986-07-31
FR2456338B1 (en) 1986-05-09
JPS5816531A (en) 1983-01-31
SE456873B (en) 1988-11-07
SE456872B (en) 1988-11-07
GB2111695A (en) 1983-07-06
IT1212414B (en) 1989-11-22
SE457034B (en) 1988-11-21
SE8800836L (en) 1988-03-09
DE3017582A1 (en) 1980-11-13
SE8800837D0 (en) 1988-03-09

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