GB2111695B - Parallel alignment of surfaces - Google Patents
Parallel alignment of surfacesInfo
- Publication number
- GB2111695B GB2111695B GB08227345A GB8227345A GB2111695B GB 2111695 B GB2111695 B GB 2111695B GB 08227345 A GB08227345 A GB 08227345A GB 8227345 A GB8227345 A GB 8227345A GB 2111695 B GB2111695 B GB 2111695B
- Authority
- GB
- United Kingdom
- Prior art keywords
- parallel alignment
- alignment
- parallel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
- G03F9/7049—Technique, e.g. interferometric
- G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
- G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Light Sources And Details Of Projection-Printing Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3834979A | 1979-05-11 | 1979-05-11 |
Publications (2)
Publication Number | Publication Date |
---|---|
GB2111695A GB2111695A (en) | 1983-07-06 |
GB2111695B true GB2111695B (en) | 1984-01-11 |
Family
ID=21899427
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8014982A Expired GB2052767B (en) | 1979-05-11 | 1980-05-06 | Single lens repeater |
GB08227345A Expired GB2111695B (en) | 1979-05-11 | 1982-09-24 | Parallel alignment of surfaces |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB8014982A Expired GB2052767B (en) | 1979-05-11 | 1980-05-06 | Single lens repeater |
Country Status (8)
Country | Link |
---|---|
JP (3) | JPS5617019A (en) |
DE (1) | DE3017582C2 (en) |
FR (1) | FR2456338B1 (en) |
GB (2) | GB2052767B (en) |
IL (1) | IL59629A (en) |
IT (1) | IT1212414B (en) |
NL (1) | NL8002009A (en) |
SE (3) | SE457034B (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4475122A (en) * | 1981-11-09 | 1984-10-02 | Tre Semiconductor Equipment Corporation | Automatic wafer alignment technique |
JPS5946026A (en) * | 1982-09-09 | 1984-03-15 | Toshiba Corp | Measuring method for position of sample |
GB2150105B (en) * | 1983-11-23 | 1987-04-29 | Alan Leslie Smith | Device for expelling fluent contents from a container |
JP2593440B2 (en) * | 1985-12-19 | 1997-03-26 | 株式会社ニコン | Projection type exposure equipment |
GB8803171D0 (en) * | 1988-02-11 | 1988-03-09 | English Electric Valve Co Ltd | Imaging apparatus |
JP2682002B2 (en) * | 1988-02-22 | 1997-11-26 | 日本精工株式会社 | Exposure apparatus alignment method and apparatus |
KR0144082B1 (en) * | 1994-04-01 | 1998-08-17 | 김주용 | Reticle and the setting method of blind using the same |
JP2546537B2 (en) * | 1994-06-20 | 1996-10-23 | 株式会社ニコン | Projection exposure apparatus and method |
JP2006213107A (en) | 2005-02-02 | 2006-08-17 | Yamaha Motor Co Ltd | Saddle riding type vehicle |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2052603A (en) * | 1932-09-09 | 1936-09-01 | Johns Manville | Article of manufacture |
DE2222249C3 (en) * | 1972-05-05 | 1979-04-12 | Anatolij Petrovitsch Kornilov | Double lens device for bringing a photomask into register with a substrate such as a semiconductor wafer |
JPS4921467A (en) * | 1972-06-20 | 1974-02-25 | ||
JPS593791B2 (en) * | 1975-04-07 | 1984-01-26 | キヤノン株式会社 | Object image recognition method |
JPS51123565A (en) * | 1975-04-21 | 1976-10-28 | Nippon Telegr & Teleph Corp <Ntt> | Three-dimention-position differential adjustment of processing article |
JPS51124938A (en) * | 1975-04-25 | 1976-10-30 | Hitachi Ltd | Automatic focusing apparatus |
JPS5932763B2 (en) * | 1975-07-25 | 1984-08-10 | 株式会社日立製作所 | automatic focusing device |
JPS602772B2 (en) * | 1976-11-01 | 1985-01-23 | 株式会社日立製作所 | exposure equipment |
DE2845603C2 (en) * | 1978-10-19 | 1982-12-09 | Censor Patent- und Versuchs-Anstalt, 9490 Vaduz | Method and device for projection copying |
-
1980
- 1980-03-14 IL IL59629A patent/IL59629A/en unknown
- 1980-04-03 NL NL8002009A patent/NL8002009A/en not_active Application Discontinuation
- 1980-04-23 JP JP5406980A patent/JPS5617019A/en active Granted
- 1980-05-06 GB GB8014982A patent/GB2052767B/en not_active Expired
- 1980-05-07 SE SE8003424A patent/SE457034B/en not_active IP Right Cessation
- 1980-05-08 DE DE3017582A patent/DE3017582C2/en not_active Expired
- 1980-05-09 FR FR8010517A patent/FR2456338B1/en not_active Expired
- 1980-05-09 IT IT8021931A patent/IT1212414B/en active
-
1982
- 1982-06-16 JP JP57103658A patent/JPS5816532A/en active Granted
- 1982-06-16 JP JP57103657A patent/JPS5816531A/en active Granted
- 1982-09-24 GB GB08227345A patent/GB2111695B/en not_active Expired
-
1988
- 1988-03-09 SE SE8800836A patent/SE456872B/en not_active IP Right Cessation
- 1988-03-09 SE SE8800837A patent/SE456873B/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
JPH0125220B2 (en) | 1989-05-16 |
IL59629A0 (en) | 1980-06-30 |
SE8800837L (en) | 1988-03-09 |
JPS5816531A (en) | 1983-01-31 |
SE457034B (en) | 1988-11-21 |
IT8021931A0 (en) | 1980-05-09 |
FR2456338B1 (en) | 1986-05-09 |
DE3017582A1 (en) | 1980-11-13 |
GB2052767B (en) | 1983-06-08 |
JPS5816532A (en) | 1983-01-31 |
SE8800836L (en) | 1988-03-09 |
SE8003424L (en) | 1980-11-12 |
JPH0310221B2 (en) | 1991-02-13 |
SE456872B (en) | 1988-11-07 |
FR2456338A1 (en) | 1980-12-05 |
IL59629A (en) | 1983-03-31 |
GB2052767A (en) | 1981-01-28 |
SE8800836D0 (en) | 1988-03-09 |
SE8800837D0 (en) | 1988-03-09 |
NL8002009A (en) | 1980-11-13 |
GB2111695A (en) | 1983-07-06 |
SE456873B (en) | 1988-11-07 |
DE3017582C2 (en) | 1986-07-31 |
JPS5617019A (en) | 1981-02-18 |
JPS638609B2 (en) | 1988-02-23 |
IT1212414B (en) | 1989-11-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
732 | Registration of transactions, instruments or events in the register (sect. 32/1977) | ||
PCNP | Patent ceased through non-payment of renewal fee |