IT1212414B - Ripetitore a lente singola per l'uso in operazioni di mascheratura nella lavorazione di elementi semiconduttori compositi - Google Patents

Ripetitore a lente singola per l'uso in operazioni di mascheratura nella lavorazione di elementi semiconduttori compositi

Info

Publication number
IT1212414B
IT1212414B IT8021931A IT2193180A IT1212414B IT 1212414 B IT1212414 B IT 1212414B IT 8021931 A IT8021931 A IT 8021931A IT 2193180 A IT2193180 A IT 2193180A IT 1212414 B IT1212414 B IT 1212414B
Authority
IT
Italy
Prior art keywords
processing
single lens
masking operations
semiconductive elements
composite semiconductive
Prior art date
Application number
IT8021931A
Other languages
English (en)
Other versions
IT8021931A0 (it
Inventor
Peski Van Christian
William L Meisenheimer
Original Assignee
Electromask Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Electromask Inc filed Critical Electromask Inc
Publication of IT8021931A0 publication Critical patent/IT8021931A0/it
Application granted granted Critical
Publication of IT1212414B publication Critical patent/IT1212414B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G03F9/7053—Non-optical, e.g. mechanical, capacitive, using an electron beam, acoustic or thermal waves
    • G03F9/7057—Gas flow, e.g. for focusing, leveling or gap setting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
IT8021931A 1979-05-11 1980-05-09 Ripetitore a lente singola per l'uso in operazioni di mascheratura nella lavorazione di elementi semiconduttori compositi IT1212414B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US3834979A 1979-05-11 1979-05-11

Publications (2)

Publication Number Publication Date
IT8021931A0 IT8021931A0 (it) 1980-05-09
IT1212414B true IT1212414B (it) 1989-11-22

Family

ID=21899427

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8021931A IT1212414B (it) 1979-05-11 1980-05-09 Ripetitore a lente singola per l'uso in operazioni di mascheratura nella lavorazione di elementi semiconduttori compositi

Country Status (8)

Country Link
JP (3) JPS5617019A (it)
DE (1) DE3017582C2 (it)
FR (1) FR2456338B1 (it)
GB (2) GB2052767B (it)
IL (1) IL59629A (it)
IT (1) IT1212414B (it)
NL (1) NL8002009A (it)
SE (3) SE457034B (it)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4475122A (en) * 1981-11-09 1984-10-02 Tre Semiconductor Equipment Corporation Automatic wafer alignment technique
JPS5946026A (ja) * 1982-09-09 1984-03-15 Toshiba Corp 試料位置測定方法
GB2150105B (en) * 1983-11-23 1987-04-29 Alan Leslie Smith Device for expelling fluent contents from a container
JP2593440B2 (ja) * 1985-12-19 1997-03-26 株式会社ニコン 投影型露光装置
GB8803171D0 (en) * 1988-02-11 1988-03-09 English Electric Valve Co Ltd Imaging apparatus
JP2682002B2 (ja) * 1988-02-22 1997-11-26 日本精工株式会社 露光装置の位置合わせ方法及び装置
KR0144082B1 (ko) * 1994-04-01 1998-08-17 김주용 레티클 및 그 레티클을 사용한 가림막 세팅 방법
JP2546537B2 (ja) * 1994-06-20 1996-10-23 株式会社ニコン 投影露光装置及び方法
JP2006213107A (ja) 2005-02-02 2006-08-17 Yamaha Motor Co Ltd 鞍乗り型車両

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2052603A (en) * 1932-09-09 1936-09-01 Johns Manville Article of manufacture
DE2222249C3 (de) * 1972-05-05 1979-04-12 Anatolij Petrovitsch Kornilov Doppelobjektiv-Einrichtung zum Indeckungbringen einer Photomaske mit einer Unterlage wie einem Halbleiter-Plättchen
JPS4921467A (it) * 1972-06-20 1974-02-25
JPS593791B2 (ja) * 1975-04-07 1984-01-26 キヤノン株式会社 物体の像認識方法
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
JPS51124938A (en) * 1975-04-25 1976-10-30 Hitachi Ltd Automatic focusing apparatus
JPS5932763B2 (ja) * 1975-07-25 1984-08-10 株式会社日立製作所 自動焦点合わせ装置
JPS602772B2 (ja) * 1976-11-01 1985-01-23 株式会社日立製作所 露光装置
DE2845603C2 (de) * 1978-10-19 1982-12-09 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren und Einrichtung zum Projektionskopieren

Also Published As

Publication number Publication date
SE8800836D0 (sv) 1988-03-09
JPS638609B2 (it) 1988-02-23
IL59629A0 (en) 1980-06-30
IL59629A (en) 1983-03-31
JPH0125220B2 (it) 1989-05-16
GB2111695A (en) 1983-07-06
NL8002009A (nl) 1980-11-13
SE8003424L (sv) 1980-11-12
JPS5816532A (ja) 1983-01-31
GB2052767B (en) 1983-06-08
SE8800837L (sv) 1988-03-09
SE456873B (sv) 1988-11-07
SE457034B (sv) 1988-11-21
IT8021931A0 (it) 1980-05-09
JPS5617019A (en) 1981-02-18
SE8800837D0 (sv) 1988-03-09
GB2052767A (en) 1981-01-28
JPH0310221B2 (it) 1991-02-13
DE3017582C2 (de) 1986-07-31
GB2111695B (en) 1984-01-11
FR2456338B1 (fr) 1986-05-09
SE8800836L (sv) 1988-03-09
JPS5816531A (ja) 1983-01-31
DE3017582A1 (de) 1980-11-13
SE456872B (sv) 1988-11-07
FR2456338A1 (fr) 1980-12-05

Similar Documents

Publication Publication Date Title
DK403783D0 (da) Slibemaskine
IT1160170B (it) Rettificatrice
IT1128730B (it) Perfezionamento negli utensili pneumatici per l&#39;applicazione di elementi di fissaggio
FI832001A0 (fi) Kemisk behandling i tvao steg av mekanisk traemassa
AT375859B (de) Diamantschleifkoerper
DK98283A (da) Pinolloest sliberedskab
DE3378025D1 (de) Collet adapter
IT1212414B (it) Ripetitore a lente singola per l&#39;uso in operazioni di mascheratura nella lavorazione di elementi semiconduttori compositi
IT1155615B (it) Composizione gelificata per bastoncini ad uso cosmetico
AT372894B (de) Schleifkoerper
FI821440A0 (fi) Foerfarande och anordning foer baogsvetsning under vatten
IT1169402B (it) Rettificatrice
IT1152889B (it) Rettificatrice
FR2537034B1 (fr) Meule
IT1174116B (it) Dispositivo per l&#39;accumulo temporaneo di stampati
DK565483A (da) Slibemaskine
AT378345B (de) Schleifwerkzeug
IT1153136B (it) Cilindro di smerigliatura
NO823024L (no) Fasade pussemiddel
IT8047917A0 (it) Apparecchio per la lavorazione con temporanea di una pluralita&#39; di pezzi
NO830685L (no) Fremgangsmaate for fremstilling av antidiabetiske preparater
ATA120282A (de) Schleifwerkzeug
FI823582A0 (fi) Kalender foer vaentan och gestaltning
FI834462A0 (fi) Kol-vatten-dispersion och metod foer framstaellning daerav
FI821508A0 (fi) Anordning foer utspridning av aska och grus