RU2589519C2 - Твердотельное устройство формирования изображения, способ изготовления этого устройства и система формирования изображения - Google Patents
Твердотельное устройство формирования изображения, способ изготовления этого устройства и система формирования изображения Download PDFInfo
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- RU2589519C2 RU2589519C2 RU2014139258/28A RU2014139258A RU2589519C2 RU 2589519 C2 RU2589519 C2 RU 2589519C2 RU 2014139258/28 A RU2014139258/28 A RU 2014139258/28A RU 2014139258 A RU2014139258 A RU 2014139258A RU 2589519 C2 RU2589519 C2 RU 2589519C2
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- 239000012535 impurity Substances 0.000 claims abstract description 96
- 238000009826 distribution Methods 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 30
- 238000005468 ion implantation Methods 0.000 claims abstract description 29
- 238000006243 chemical reaction Methods 0.000 claims abstract description 24
- 230000007423 decrease Effects 0.000 claims abstract description 11
- 238000000034 method Methods 0.000 claims description 31
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- 229910044991 metal oxide Inorganic materials 0.000 claims description 3
- 150000004706 metal oxides Chemical class 0.000 claims description 3
- 238000002513 implantation Methods 0.000 claims description 2
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- 229910052698 phosphorus Inorganic materials 0.000 description 2
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Images
Classifications
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/10—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths
- H04N23/11—Cameras or camera modules comprising electronic image sensors; Control thereof for generating image signals from different wavelengths for generating image signals from visible and infrared light wavelengths
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
- H04N23/60—Control of cameras or camera modules
- H04N23/63—Control of cameras or camera modules by using electronic viewfinders
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N25/00—Circuitry of solid-state image sensors [SSIS]; Control thereof
- H04N25/70—SSIS architectures; Circuits associated therewith
- H04N25/76—Addressed sensors, e.g. MOS or CMOS sensors
-
- H—ELECTRICITY
- H04—ELECTRIC COMMUNICATION TECHNIQUE
- H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
- H04N5/00—Details of television systems
- H04N5/222—Studio circuitry; Studio devices; Studio equipment
- H04N5/262—Studio circuits, e.g. for mixing, switching-over, change of character of image, other special effects ; Cameras specially adapted for the electronic generation of special effects
- H04N5/265—Mixing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
- H10F39/014—Manufacture or treatment of image sensors covered by group H10F39/12 of CMOS image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/182—Colour image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/10—Integrated devices
- H10F39/12—Image sensors
- H10F39/18—Complementary metal-oxide-semiconductor [CMOS] image sensors; Photodiode array image sensors
- H10F39/184—Infrared image sensors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/802—Geometry or disposition of elements in pixels, e.g. address-lines or gate electrodes
- H10F39/8027—Geometry of the photosensitive area
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
- H10F39/80—Constructional details of image sensors
- H10F39/803—Pixels having integrated switching, control, storage or amplification elements
- H10F39/8033—Photosensitive area
Landscapes
- Engineering & Computer Science (AREA)
- Multimedia (AREA)
- Signal Processing (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Light Receiving Elements (AREA)
- Transforming Light Signals Into Electric Signals (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013210588A JP6355311B2 (ja) | 2013-10-07 | 2013-10-07 | 固体撮像装置、その製造方法及び撮像システム |
| JP2013-210588 | 2013-10-07 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| RU2014139258A RU2014139258A (ru) | 2016-04-20 |
| RU2589519C2 true RU2589519C2 (ru) | 2016-07-10 |
Family
ID=51518700
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| RU2014139258/28A RU2589519C2 (ru) | 2013-10-07 | 2014-09-29 | Твердотельное устройство формирования изображения, способ изготовления этого устройства и система формирования изображения |
Country Status (5)
| Country | Link |
|---|---|
| US (3) | US9761618B2 (enExample) |
| EP (1) | EP2866260B1 (enExample) |
| JP (1) | JP6355311B2 (enExample) |
| CN (1) | CN104517983B (enExample) |
| RU (1) | RU2589519C2 (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6355311B2 (ja) * | 2013-10-07 | 2018-07-11 | キヤノン株式会社 | 固体撮像装置、その製造方法及び撮像システム |
| JP6595750B2 (ja) | 2014-03-14 | 2019-10-23 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
| JP6274567B2 (ja) | 2014-03-14 | 2018-02-07 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
| JP6579774B2 (ja) * | 2015-03-30 | 2019-09-25 | キヤノン株式会社 | 固体撮像装置およびカメラ |
| US9900539B2 (en) | 2015-09-10 | 2018-02-20 | Canon Kabushiki Kaisha | Solid-state image pickup element, and image pickup system |
| US10205894B2 (en) | 2015-09-11 | 2019-02-12 | Canon Kabushiki Kaisha | Imaging device and imaging system |
| JP6541523B2 (ja) | 2015-09-11 | 2019-07-10 | キヤノン株式会社 | 撮像装置、撮像システム、および、撮像装置の制御方法 |
| JP6570384B2 (ja) | 2015-09-11 | 2019-09-04 | キヤノン株式会社 | 撮像装置及び撮像システム |
| JP6674219B2 (ja) | 2015-10-01 | 2020-04-01 | キヤノン株式会社 | 固体撮像装置及び撮像システム |
| JP6862129B2 (ja) * | 2016-08-29 | 2021-04-21 | キヤノン株式会社 | 光電変換装置および撮像システム |
| JP7121468B2 (ja) * | 2017-02-24 | 2022-08-18 | ブリルニクス シンガポール プライベート リミテッド | 固体撮像装置、固体撮像装置の製造方法、および電子機器 |
| WO2021059882A1 (ja) * | 2019-09-26 | 2021-04-01 | パナソニックIpマネジメント株式会社 | 撮像装置 |
| US12376407B2 (en) * | 2021-07-19 | 2025-07-29 | Samsung Electronics Co., Ltd. | Image sensor |
Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6441411B2 (en) * | 1997-07-04 | 2002-08-27 | Kabushiki Kaisha Toshiba | Solid-state image sensor having a substrate with an impurity concentration gradient |
| EP1612863A2 (en) * | 2004-06-30 | 2006-01-04 | Sony Corporation | Solid-state imaging device, camera and method of producing the solid-state imaging device |
| US8049293B2 (en) * | 2005-03-07 | 2011-11-01 | Sony Corporation | Solid-state image pickup device, electronic apparatus using such solid-state image pickup device and method of manufacturing solid-state image pickup device |
| EP2416361A2 (en) * | 2010-08-02 | 2012-02-08 | Imec | Arrays for CMOS imagers and their method of manufacturing |
| RU2444150C1 (ru) * | 2008-04-01 | 2012-02-27 | Кэнон Кабусики Кайся | Твердотельный датчик изображения с уменьшенными расплывчатостью изображения и смешиванием цветов |
| US8363141B2 (en) * | 2009-06-18 | 2013-01-29 | Canon Kabushiki Kaisha | Solid-state image pickup device, image pickup system including the same, and method for manufacturing the same |
| EP2565925A2 (en) * | 2011-08-29 | 2013-03-06 | Hitachi, Ltd. | Solid-state imaging apparatus |
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| JPH0191453A (ja) * | 1987-10-02 | 1989-04-11 | Fuji Photo Film Co Ltd | 固体撮像装置 |
| JP2508218B2 (ja) * | 1988-09-27 | 1996-06-19 | 日本電気株式会社 | 相補型mis集積回路 |
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| JPH07273364A (ja) | 1994-04-01 | 1995-10-20 | Matsushita Electron Corp | 固体撮像装置およびその製造方法 |
| JP2798006B2 (ja) | 1995-05-19 | 1998-09-17 | 日本電気株式会社 | 赤外線固体撮像素子とその製造方法 |
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| US6310366B1 (en) * | 1999-06-16 | 2001-10-30 | Micron Technology, Inc. | Retrograde well structure for a CMOS imager |
| JP2002043557A (ja) * | 2000-07-21 | 2002-02-08 | Mitsubishi Electric Corp | 固体撮像素子を有する半導体装置およびその製造方法 |
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| JP5224633B2 (ja) | 2004-03-30 | 2013-07-03 | キヤノン株式会社 | 半導体装置の製造方法 |
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| JP5968146B2 (ja) | 2012-07-31 | 2016-08-10 | キヤノン株式会社 | 固体撮像装置およびカメラ |
| JP6355311B2 (ja) * | 2013-10-07 | 2018-07-11 | キヤノン株式会社 | 固体撮像装置、その製造方法及び撮像システム |
-
2013
- 2013-10-07 JP JP2013210588A patent/JP6355311B2/ja active Active
-
2014
- 2014-09-12 EP EP14184612.1A patent/EP2866260B1/en active Active
- 2014-09-18 US US14/489,812 patent/US9761618B2/en not_active Expired - Fee Related
- 2014-09-26 CN CN201410499673.6A patent/CN104517983B/zh active Active
- 2014-09-29 RU RU2014139258/28A patent/RU2589519C2/ru active
-
2017
- 2017-06-29 US US15/637,155 patent/US9947702B2/en active Active
-
2018
- 2018-03-01 US US15/908,997 patent/US10217780B2/en active Active
Patent Citations (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6441411B2 (en) * | 1997-07-04 | 2002-08-27 | Kabushiki Kaisha Toshiba | Solid-state image sensor having a substrate with an impurity concentration gradient |
| EP1612863A2 (en) * | 2004-06-30 | 2006-01-04 | Sony Corporation | Solid-state imaging device, camera and method of producing the solid-state imaging device |
| US8049293B2 (en) * | 2005-03-07 | 2011-11-01 | Sony Corporation | Solid-state image pickup device, electronic apparatus using such solid-state image pickup device and method of manufacturing solid-state image pickup device |
| RU2444150C1 (ru) * | 2008-04-01 | 2012-02-27 | Кэнон Кабусики Кайся | Твердотельный датчик изображения с уменьшенными расплывчатостью изображения и смешиванием цветов |
| US8363141B2 (en) * | 2009-06-18 | 2013-01-29 | Canon Kabushiki Kaisha | Solid-state image pickup device, image pickup system including the same, and method for manufacturing the same |
| EP2416361A2 (en) * | 2010-08-02 | 2012-02-08 | Imec | Arrays for CMOS imagers and their method of manufacturing |
| EP2565925A2 (en) * | 2011-08-29 | 2013-03-06 | Hitachi, Ltd. | Solid-state imaging apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2866260B1 (en) | 2019-02-06 |
| JP6355311B2 (ja) | 2018-07-11 |
| EP2866260A2 (en) | 2015-04-29 |
| CN104517983B (zh) | 2018-01-05 |
| US20170317121A1 (en) | 2017-11-02 |
| US20160027825A1 (en) | 2016-01-28 |
| CN104517983A (zh) | 2015-04-15 |
| US20180261637A1 (en) | 2018-09-13 |
| US9761618B2 (en) | 2017-09-12 |
| EP2866260A3 (en) | 2015-08-26 |
| US9947702B2 (en) | 2018-04-17 |
| RU2014139258A (ru) | 2016-04-20 |
| JP2015076453A (ja) | 2015-04-20 |
| US10217780B2 (en) | 2019-02-26 |
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