KR970706242A - 우레아 유도체 및 ACAT-억제제로서 그의 용도(Urea derivatives and their use as ACAT-inhibitors) - Google Patents

우레아 유도체 및 ACAT-억제제로서 그의 용도(Urea derivatives and their use as ACAT-inhibitors)

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Publication number
KR970706242A
KR970706242A KR1019970702138A KR19970702138A KR970706242A KR 970706242 A KR970706242 A KR 970706242A KR 1019970702138 A KR1019970702138 A KR 1019970702138A KR 19970702138 A KR19970702138 A KR 19970702138A KR 970706242 A KR970706242 A KR 970706242A
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South Korea
Prior art keywords
alkyl
pyridyl
phenyl
group
lower alkyl
Prior art date
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KR1019970702138A
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English (en)
Inventor
다케시 테라사와
아키라 다나카
도시유키 치바
히사시 다카수기
Original Assignee
후지야마 아키라
후지사와 야꾸힝 고교 가부시키가이샤
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Priority claimed from GB9419970A external-priority patent/GB9419970D0/en
Priority claimed from GBGB9506720.3A external-priority patent/GB9506720D0/en
Priority claimed from GBGB9514021.6A external-priority patent/GB9514021D0/en
Application filed by 후지야마 아키라, 후지사와 야꾸힝 고교 가부시키가이샤 filed Critical 후지야마 아키라
Publication of KR970706242A publication Critical patent/KR970706242A/ko

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Abstract

본 발명은 약제로서 유용한 다음 일반식(Ⅰ)의 우레아 유도체 및 그의 약제학적으로 허용되는 염에 관한 것이다.
상기 식에서, R1은 일반식의 그룹(여기에서, R4는 적합한 치환체(들)을 가질 수 있는 아릴등이고, Y는 결합, 저급 알킬렌, -0-등이다)이고, R2는 저급 알킬, 저급 알콕시(저급)알킬 등이며, R3는 적합한 치환체(들)을 가질 수 있는 아릴 등이고, n은 0 또는 1이다.

Description

우레아 유도체 및 ACAT-억제제로서 그의 용도 (Urea derivatives and their use as ACAT-inhibitors)
본 내용은 요부공개 건이므로 전문내용을 수록하지 않았음

Claims (13)

  1. 일반식(Ⅰ)의 화합물 및 약제학적으로 허용되는 그의 염
    상기 식에서, R1은 일반식의 그룹 [여기에서, R4는 적합한 치환체(들)을 가질 수 있는 아릴 또는 적합한 치환체(들)을 가질 수 있는 헤테로사이클릭 그룹이고, Y는 결합, 저급 알킬렌, -S-, -O-,=CH-, -CONH-,(여기에서, R7은 저급 알킬이다), -NHSO2-, -SO2NH-, -SO2NHCO- 또는 -CONHSO2-이다, 또는 각각 적합한 치환체(들)을 가질 수 있는 티아졸릴, 이미다졸릴, 피라졸릴, 피리딜, 티에닐, 푸릴, 이속사졸릴 또는 크로마닐이며; R2는 저급 알킬, 저급 알콕시(저급)알킬, 사이클로알킬, 적합한 치환체(들)을 가질 수 있는 아르(저급)알킬, 헤테로사이클릭 그룹, 또는 헤테로사이클릭(저급)알킬이고; R3는 적합한 치환체(들)을 가질 수 있는 아릴 또는 적합한 치환체(들)을 가질 수 있는 헤테로사이클릭 그룹이며; n은 0 또는 1 이다.
  2. 제1항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 할로겐, 저급 알킬, 디(저급)알킬아미노, 보호된 아미노, 시아노, 모노(또는 디 또는 트리)-아르(저급)알킬을 가질 수 있는 헤테로사이클릭 그룹, 하이드록시, 보호된 하이드록시 및 모노(또는 디 또는 트리) 할로(저급)알킬로 구성된 그룹중에서 선택된 1 내지 3개의 치환체(들)을 가질 수 있는 페닐;또는 각각 저급 알킬, 모노(또는 디 또는 트리) 아르(저급)알킬 및 옥소로 구성된 그룹중에서 선택된 1 내지 3개의 치환체(들)를 가질 수 있는 티에닐, 피라졸릴, 이미다졸릴, 트리아졸릴, 피리딜, 피롤릴, 테트라졸릴, 옥사졸릴, 티아졸릴, 옥사디아졸릴, 피페라지닐, 티아졸리디닐 또는 메틸렌디옥시페닐이고; Y는 결합, 저급 알킬렌, -S-, -O-,=CH-, -CONH-,(여기에서, R7은 저급 알킬이다), -NHSO2-, -SO2NH-, -SO2NHCO- 또는 -CONHSO2-이다], 또는 각각 저급 알킬, 하이드록시, 보호된 하이드록시, 페닐, 할로페닐, 페닐티오 및 피롤릴로 구성된 그룹중에서 선택된 1 내지 5개의 치환체(들)을 가질 수 있는 티아졸릴, 이미다졸릴, 피라졸릴, 피리딜, 티에닐, 푸릴, 이속사졸릴 또는 크로마닐이고; R2는 저급 알킬; 저급 알콕시(저급)알킬; 사이클로(C3-C7)알킬; 할로겐, 저급 알콕시 및 디(저급알킬) 아미노로 구성된 그룹중에서 선택된 1 내지 3개의 치환체(들)를 가질 수 있는 페닐(저급)알킬; 테트라하이드로피라닐; 또는 푸릴(저급)알킬이며; R3는 저급 알킬 및 할로겐으로 구성된 그룹중에서 선택된 1 내지 3개의 치환체(들)을 가질 수 있는 페닐; 각각 저급 알킬, 저급 알칼티오, 할로겐, 저급 알콕시, 저급 알킬설피닐 및 저급 알킬설포닐로 구성된 그룹중에서 선택된 1 내지 3개의 치환체(들)를 가질 수 있는 피리딜 또는 피리미디닐인 화합물.
  3. 제2항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 할로겐, 저급 알킬, 디(저급)알킬아미노, 아실아미노, 시아노, 모노(또는 디 또는 트리)아르(저급)알킬을 가질 수 있는 테트라졸릴, 하이드록시, 저급 알콕시(저급)알콕시 및 모노(또는 디 또는 트리)할로(저급)알킬로 구성된 그룹중에서 선택된 1 내지 3개의 치환체(들)를 가질 수 있는 페닐; 또는 각각 저급 알킬, 페닐(저급)알킬), 트리페닐(저급)알킬 및 옥소로 구성된 그룹중에서 선택된 1 또는 2개의 치환체(들)를 가질 수 있는 티에닐, 피라졸릴, 이미다졸릴, 트리아졸릴, 피리딜, 피롤릴, 테트라졸릴, 옥사졸릴, 티아졸릴, 옥사디아졸릴, 피페라지닐, 티아졸리디닐 또는 메틸렌 디옥시페닐이고; Y는 결합, 저급 알킬렌, -S-, -O-,=CH-, -CONH-,(여기에서, R7은 저급 알킬이다), -NHSO2-, -SO2NH-, -SO2NHCO- 또는 -CONHSO2- 이다], 또는 각각 저급 알킬, 하이드록시, 아실옥시, 페닐, 할로페닐, 페닐티오 및 피롤릴로 구성된 그룹중에서 선택된 1 내지 5개의 치환체(들)를 가질 수 있는 티아졸릴, 이미다졸릴, 피라졸릴, 피리딜, 티에닐, 푸릴, 이속사졸릴 또는 크로마닐이고; R2는 저급 알킬; 저급 알콕시(저급)알킬; 사이클로(C3-C7) 알킬; 할로겐, 저급 알콕시 및 디(저급알킬) 아미노로 구성된 그룹중에서 선택된 1 내지 2개의 치환체(들)을 가질 수 있는 페닐(저급)알킬 ; 테트라하이드로피라닐 또는 푸릴(저급)알킬이며; R3는 저급 알킬 및 할로겐으로 구성된 그룹중에서 선택된 2 또는 3개의 치환체(들)를 가질 수 있는 페닐; 각각 저급 알킬, 저급 알킬티오, 할로겐, 저급 알콕시, 저급 알킬설피닐 및 저급 알킬설포닐로 구성된 그룹중에서 선택된 2 또는 3개의 치환체(들)을 가질 수 있는 피리딜 또는 피리미디닐인 화합물.
  4. 제3항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 할로겐, 저급 알킬페닐; 디(저급)알킬아미노페닐; 저급알킬포닐아미노페닐; 시아노페닐; 테트라졸릴페닐; (트리페닐(저급)알킬테트라졸릴)페닐; 트리할로(저급)알킬페닐; 두개의 저급 알킬 및 하이드록시를 갖는 페닐; 두개의 저급 알킬 및 저급 알콕시(저급)알콕시를 갖는 페닐; 티에닐; 저급 알킬 또는 트리페닐(저급)알킬을 가질 수 있는 피라졸릴; 이미다졸릴; 저급 알킬 및 페닐(저급)알킬로 구성된 그룹중에서 선택된 1 또는 2개의 치환체(들)를 가질 수 있는 트리아졸릴; 피리딜; 피롤릴; 저급 알킬 또는 트리페닐(저급)알킬을 가질 수 있는 테트라졸릴; 옥사졸릴; 저급 알킬티아졸릴; 저급 알킬옥사디아졸릴; 저급 알킬피페라지닐; 디옥소티아졸리디닐 또는 메틸렌디옥시페닐이고; Y는 결합, 저급 알킬렌, -S-, -O-,=CH-, -CONH-,(여기에서, R7은 저급 알킬이다), -NHSO2-, -SO2NH-, -SO2NHCO- 또는 -CONHSO2-이다]; 할로페닐티아졸릴; 페닐이미다졸릴; 페닐피라졸릴; 페닐피리딜; 페닐티오피리딜; 피롤릴피리딜; 페닐티에닐; 페닐푸릴; 페닐이속사졸릴; 또는 4개의 저급 알킬 및 하이드록시를 갖는 크로마닐이고; R2는 저급 알킬; 저급 알콕시(저급)알킬); 사이클로(C3-C7) 알킬, 페닐(저급)알킬; 할로페닐(저급)알킬; 저급 알콕시페닐(저급)알킬, 디(저급 알킬) 아미노페닐(저급)알킬, 테트라하이드로피라닐 또는 푸릴(저급)알킬이며; R3는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리딜; 할로겐, 저급 알킬 및 저급 알킬티오를 갖는 피리딜; 트리(저급 알킬) 피리딜; 두개의 저급 알콕시 및 저급알킬을 갖는 피리딜; 저급 알콕시, 저급 알칼티오 및 저급 알킬을 갖는 피리딜; 두개의 저급 알킬설피닐 및 저급 알킬을 갖는 피리딜; 두개의 저급 알킬설포닐 및 저급 알킬을 갖는 피리딜; 저급 알킬티오, 저급 알콕시 및 저급 알킬을 갖는 피리딜; 저급 알칼설피닐, 저급 알칼설포닐 및 저급 알킬을 갖는 피리딜; 저급 알킬티오, 저급 알킬설포닐 및 저급 알킬을 갖는 피리딜; 두개의 할로겐 및 저급 알킬을 갖는 피리딜; 디(저급)알콕시 피리미디닐; 또는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리미디닐인 화합물.
  5. 제4항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 페닐 또는 할로페닐이고, Y는 -0-이다)이고, R2는 사이클로(C3-C7) 알킬 또는 페닐(저급)알킬이며; R3는 두개의 저급 알킬티오 및 저급 알킬을 갖는 페닐; 트리(저급 알킬) 피리딜; 두개의 할로겐 및 저급 알킬을 갖는 피리딜; 할로겐, 저급 알킬 및 저급 알칼티오를 갖는 피리딜; 저급 알킬티오, 저급 알콕시 및 저급 알킬을 갖는 피리딜; 저급 알킬티오, 저급 알킬 설포닐 및 저급 알킬을 갖는 피리딜; 두개의 저급 알킬설포닐 및 저급 알킬을 갖는 피리딜; 또는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리미디닐이고; n은 1인 화합물.
  6. 제5항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 할로페닐이고, Y는 -0-이다)이고, R2는 사이클로(C3-C7) 알킬이며, R3는 트리(저급 알킬)피리딜; 또는 두개의 저급 알킬설포닐 및 저급 알킬을 갖는 피리딜인 화합물.
  7. 제4항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 피라졸릴이고, Y는 결합이다)이고, R2는 페닐(저급)알킬, 저급 알콕시페닐(저급)알킬, 할로페닐(저급)알킬, 디(저급)알킬아미노페닐(저급)알킬 또는 사이클로(C3-C7)알킬이며; R3는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리딜; 할로겐, 저급 알킬 및 저급 알킬티오를 갖는 피리딜; 또는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리미디닐이고; n은 1인 화합물.
  8. 제7항에 있어서, R1은 일반식의 그룹 [여기에서, R4는 피라졸릴이고, Y는 결합이다)이고, R2는 페닐(저급)알킬이며; R3는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리딜인 화합물.
  9. (1)일반식(Ⅱ)의 화합물 또는 그의 염을 일반식(Ⅲ)의 화합물 또는 그의 염과 반응시켜 일반식(Ⅰ)의 화합물 또는 그의 염을 수득하거나, (2) 일반식(Ⅱ)의 화합물 또는 그의 염 및 일반식(Ⅳ)의 화합물 또는 그의 염에 대해 우레이도 그룹을 형성시켜 일반식(Ⅰ)의 화합물 또는 그의 염을 수득하거나, (3) 일반식(1a)의 화합물 또는 그의 염을 산화 반응시켜 일반식(Ⅰ)의 화합물 또는 그의 염을 수득함을 특징으로 하여, 일반식(Ⅰ)의 화합물 또는 그의 염을 제조하는 방법.
    상기 식에서, R1은 일반식의 그룹 [여기에서, R4는 적합한 치환체(들)을 가질 수 있는 아릴 또는 적합한 치환체(들)을 가질 수 있는 헤테로사이클릭 그룹이고, Y는 결합, 저급 알킬렌, -S-, -O-,=CH-, -CONH-,(여기에서, R7은 저급 알킬이다), -NHSO2-, -SO2NH-, -SO2NHCO- 또는 -CONHSO2-이다), 또는 각각 적합한 치환체(들)을 가질 수 있는 티아졸릴, 이미디졸릴, 파라졸릴, 피리딜, 티에닐, 푸릴, 이속사졸릴 또는 크로마닐이며; R2는 저급 알킬, 저급 알콕시(저급)알킬, 사이클로알킬, 적합한 치환체(들)을 가질 수 있는 아르(저급)알킬, 헤테로사이클릭 그룹, 또는 헤테로사이클릭(저급)알킬이고; R3는 적합한 치환체(들)을 가질 수 있는 아릴 또는 적합한 치환체(들)을 가질 수 있는 헤테로사이클릭 그룹이며; n은 0 또는 1이고; Ra 3는 두개의 저급 알킬티오 및 저급 알킬을 갖는 피리딜이며; Rb 3는 두개의 저급 알킬설포닐 및 저급 알킬을 갖는 피리딜; 두개의 저급 알칼설피닐 및 저급 알킬을 갖는 피리딜; 또는 저급 알킬설포닐, 저급 알킬설피닐 및 저급 알킬을 갖는 피리딜이다.
  10. 약제학적으로 허용되는 실질적으로 무독성인 담체 또는 부형제와의 혼합물로, 활성 성분으로서 제1항의 화합물을 함유하는 약제학적 조성물.
  11. 의약으로서 사용하기 위한 제1항의 화합물.
  12. 유효량의 제1항의 화합물을 인간 또는 동물에게 투여함을 특징으로하여, 고콜레스테롤혈증, 고지혈증, 동맥경화증 또는 이들에 의해 유발된 질환을 치료 및/또는 예방하는 방법.
  13. 인간 또는 동물에게서 고콜레스테롤혈증, 고지혈증, 동맥경화증 또는 이들에 의해 유발된 질환을 치료 및/또는 예방하기 위한 약제를 제조하기 위한 제1항의 화합물의 용도.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019970702138A 1994-10-04 1995-09-29 우레아 유도체 및 ACAT-억제제로서 그의 용도(Urea derivatives and their use as ACAT-inhibitors) KR970706242A (ko)

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GB9419970A GB9419970D0 (en) 1994-10-04 1994-10-04 Urea derivatives
GB9419970.0 1994-10-04
GBGB9506720.3A GB9506720D0 (en) 1995-03-31 1995-03-31 Urea derivatives
GB9506720.3 1995-03-31
GB9514021.6 1995-07-10
GBGB9514021.6A GB9514021D0 (en) 1995-07-10 1995-07-10 Urea derivatives
PCT/JP1995/001982 WO1996010559A1 (en) 1994-10-04 1995-09-29 Urea derivatives and their use as acat-inhibitors

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JP3116256B2 (ja) * 1993-01-14 2000-12-11 小野薬品工業株式会社 (チオ)ウレア誘導体

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TR199501209A2 (tr) 1996-06-21
EP0784612A1 (en) 1997-07-23
WO1996010559A1 (en) 1996-04-11
JPH10510512A (ja) 1998-10-13
IL115483A0 (en) 1996-01-19
CA2200981A1 (en) 1996-04-11
AU3577995A (en) 1996-04-26

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