KR920004354A - 3-아미도피라졸 유도체 및 그 제조방법과 그것을 함유한 약학 조성물 - Google Patents

3-아미도피라졸 유도체 및 그 제조방법과 그것을 함유한 약학 조성물 Download PDF

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KR920004354A
KR920004354A KR1019910014358A KR910014358A KR920004354A KR 920004354 A KR920004354 A KR 920004354A KR 1019910014358 A KR1019910014358 A KR 1019910014358A KR 910014358 A KR910014358 A KR 910014358A KR 920004354 A KR920004354 A KR 920004354A
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보아쥬그랭 로베르뜨
귈리 다니엘
쟝쟝 프랑시스
몰리마 쟝-샤를르
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앨린 씨. 스워드
사노피
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Abstract

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Description

3-아미도피라졸 유도체 및 그 제조방법과 그것을 함유한 약학 조성물
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Claims (8)

  1. 하기식(Ⅰ)또는 (Ⅰ')의 3-아미도피라졸 또는 그의 유기 또는 무기산과의 가능한 염 또는 그의 유기 또는 무기산과의 가능한 염 :
    식중, -R1은 하기의 기들을 나타내고,
    [식중, R1,R1'및 R1"는 각각 독립적으로 수소원자, 할로겐원자, 히드록실, 직쇄 또는 측쇄의 C1~C4알킬기, C1~C4알콕시기, 트리플루오르 메틸기, 트리플루오로메톡시기, 니트로기, 카르복실기 또는 아미노기를 나타낸다. ㆍ알킬이 C1~C4기인 카르복시알킬 또는 알콕시카르보닐알킬기, ㆍ알킬이 C3~C6기인 시클로알킬기, ㆍ테트라히드로나프틸리, ㆍ피리딜기, ㆍ상기 정의된 R1,R1'및R1"로 치환된 나프틸기, ㆍ상기 정의된 R1,R1'및 R1"로 치환된 벤질기, ㆍ방향족 고리위에 할로겐, 히드록실 또는 C1~C4알콕시로 임의 치환된 신나밀기,ㆍ상기 정의된 R1,R1'및 R1"로 임의 치환된 퀴놀릴 또는 이소퀴놀릴기, ㆍ2-벤조티아졸릴기, ㆍ퀴녹살리닐디온기, 1-프탈라지닐기, ㆍ벤조티아디아졸릴기, ㆍ특히,피리딜 및 티에닐 같은 5-또는 6-원 헤테로고리기로 치환된 메틸렌기, -RIa는 상기 정의된 R1,R1'및 R1"로 치환된 벤질기를 나타내며, -R은 수소원자 또는 직쇄 또는 측쇄의 C1~C4알킬기를 나타내고, -n은 0,1,2또는 3이고, -X가 수소를 나타내고 X'가 수소, 직쇄 또는 측쇄의 C1~C6알킬, 아릴, C1~C4알아미노알킬, C1~C4히드록시알킬, 알킬기가 C1~C4기인 카르복실알킬,알킬기가 C1~C4기인 아세트아미도아라킬시스테인, 알킬기가 C1~C4기인 구아니디노알킬, 알킬기가 C1~C4기인 니트로구아니디노알킬, C3~C7시클로알킬, 알킬이C1~C4기이고 이릴이 할로겐 또는 히드록실로 또는 C1~C3알킬로 임의 치환된 알릴알킬, 헤테로아릴이 C1~C4알킬, 히드록실 또는 C1~C4알콕시로 치환되거나 치환되지 않은 인돌릴 또는 이미다졸릴을 나타내고 알킬이 C1~C4기인 헤테로알릴알킬을 나타내거나, -또는, n이 0일때, X가 수소를 나타내고 X'및이 하기식의 히드록실로 치환되거나 치환되지 않은 고리를 함께 형성하거나:
    (식중, m=2,3 또는 4) 또는 하기식의 고리계이거나 :
    (식중, t=1또는 2) 또는 하기식의 고리계이거나 :
    또는 인돌리닐, 퍼히드로인돌 또는 4,5,6,7-테트라히드로티에노[2,3-c]피리드-6-일 고리계이거나, -또는 X및 X'가 각각 독립적으로 C1~C4알킬 또는 C3~C6시클로알킬, 페닐을 나타내거나, -또는 X및 X'가 연결되어 2내지 12개의 탄소원자를 갖는, C1-C3알킬로 임의 치환된 시클로알킬기를 함께 형성하거나, -또는 X, X'및 그들이 연결된 탄소원자가 아다만탈기, 하나 또는 둘의 메틸기로 또는 히드록실, C1~C3알콕시 또는 할로겐 원자로 치환된 아다만틸기, 1-아자아다만틸기, 퀴뉴클리디닐기, 벤질기로 임의로 N-치환된 4-피페리딜기, 2,2,6,6-테트라메틸피페리딜기, 테트라히드로나프틸기, 테트라히드로피란-4-일 또는 테트라히드로티오피란-4-일기, 2,3-디히드로-4H-벤조피란-4-일기, 2,3-디히드로-4H-벤조티오피란-4-일기, 하나의 고리 또는 다른 고리의 탄소원자를 통해 상기에서 정의된 -N(R)-및-C(O)-Z에 결합된 하기 a의 기
    (식중, n1=0 또는 1, n1'=또는 2, n2=1, n3=2 또는 3이고 W는 탄소원자 또는 산소원자를 나타낸다), 또는 하나의 고리 또는 다른 고리 또는 다른 고리의 탄소원자를 통해 상기에서 정의된 -N(R)-및-C(O)-Z에 하기식 b의 기.
    (식중, n4=2,3 또는 4, n5=2 또는 3이고 W는 탄소 또는 산소원자를 나타낸다)
    상기b및b의 고리는 하나의 고리 및/또는 다른 고리위에 하나 또는 둘의 C1~C4알킬기로 임의 치환이 가능하며 W가 산소를 나타낼때 W에 대해 α-위치에서 아미노기의 치환이 가능하지는 않다. 비시클로[2,2,1]헵트-5-엔-2-일기,8-옥사비시클로[3,2,1]옥트-6-3-일기, 8-티아비시클로-[3.2.1]옥트-3-일기를 형성하거나, -또는, X가 수소를 나타내고 X'가 아다만틸기, 하나 또는 둘의 메틸, 히드록실, C1~C3알콕시기 또는 할로겐 원자로 치환된 아다만틸기, 1-아자 아다만틸기, b의 W가 산소를 나타낼때 W에 대해 α-위치에 이러한 고리계들 사이의 결합과 -COZ및 N-R을 운반하는 탄소가 존재하는 것이 가능하지 못한, 상기 정의된 식b또는b의 기이고 -Z가 히드록실기 또는 C1~C6알킬,트리플루오로메틸, 트리플루오로메톡시 또는 카르보닐길 치환된 벤질, 벤질,t-부틸과 같은 카르복실산-보호기로 치환된 탄소원자, Z가 알킬이 직쇄 또는측쇄의 C1~C6기인 카르복시알킬로 치환된 질소원자를 나타내고 n=0이면, X=H일때 X'는 하기의 기 :
    (식중, X=1또는 2이고 Q는 히드록실, 자유아미노 또는 C1~C6디알킬 또는 C1~C6알콕시로 치환된 아미노이다)일수 없다는 제한하에 상기 정의된 바와같이 치환된 질소원자를 나타내고, -RIv수소원자, 할로겐원자 또는 C1~C6알킬을 나타내며, -Rv는 하기의 기들을 나타내며,
    (식중, R5,R5'및 R5"는 각각 독립적으로, 수소원자, 할로겐원자, 직쇄 또는 측쇄의 C1~C4알킬, 히드록실, C1~C4알콕시, 니트로, 트리플루오로메틸, 트리플루오로메톡시, 시아노, 아미노, 카르복실, C1~C4카르복시알킬 또는 페닐을나타낸다. ㆍC1~C4알킬로 치환되거나 치환되지 않은 나프틸기, ㆍ피리딜기,ㆍC1~C4알킬로 치환되거나 치환되지 않은 스티릴기, -또는 대신, RIv및 Rv가 함꼐 하기를 기를 나타내는 것으로 고려된다.
    (식중, 페닐기 5위치에서 피라졸을 치환하고 -(CH2)i-기(i=1내지 3가 4위치에서 피라졸을 치환하며, W1,W2및 W3이 벤젠고리를 치환하고 독립적으로 수소,할로겐 또는 히드록실기를 나타낸다)
  2. R1이 제1항에서 정의된 R1,R1'및 R1"로 치환된 나프틸 또는 페닐기를 나타냄을 특징으로 하는 식(Ⅰ)의 3-아미도피라졸(식중, R,X,X',n,Z,RIv및 Rv는 제1항에서 정의된 바와 같다)또는 그와 유기 또는 무기산과의 가능한 염 또는그와 유기 또는 무기염기와 가능한 염.
  3. Rv가 제1항에서 정의된, 바람직하게는 수소 또는 C1~C4알콕시인 R5,R5'및 R5"로 치환된 나프틸 또는 페닐기를 나타냄을 특징으로 하는 식(Ⅰ)또는(Ⅰ')의3-아미도피라졸(식중, R,X,X',n,Z,R1또는 RIa및 RIv는 제1항에서 정의된 바와같다)또는 그와 유기 또는 무기산과의 가능한 염 또는 그와 유기 또는 무기명기와의 가능한 염.
  4. X,X'및 그들이 연결된 탄소원자가 하기식의 기:
    (식중, n1,n1',n2,n3및 W는 제1항에서 정의된 바와 같다)또는 하기식의아다만
    틸기 ;
    (식중, n4,n5및 W는 제1항에서 정의된 바와 같다)를 형성하고 언급된a및b의 기가 하나의 고리 또는 다른고리의 한 탄소원자를 통해 상기 정의된 -N(R)-및-C(O)-Z에 결합되고 상기a및b의 고리가 하나의 고리 및/도는 다른 고리위에서 한 또는 둘의 C1~C4알킬기로 임의 치환가능하며 아미노산이 W가 산소를 나타낼때 W에 대해 α-위치에 존재하는 것이 가능하지 않음을 특징으로하는 식(Ⅰ)의 3-아미도피라졸(식중, R,Z,n,RIv및 Rv는 제1항에서 정의된 바와 같다)또는 그와 유기 또는 무기산과의 가능한 염 또는 그와 유기 또는 무기 염기와의 가능한 염.
  5. 하기식(Ⅱ)또는 (Ⅱ')의 피라졸카르복실산 :
    (식중, R1,RIv,Rv및 RIa는 상기 정의된 바와 같다)작용유도체를 펩티드 합성에서 관습적인 보호기에 의해 임의 보호된 하기식의 아미노산 :
    (식중, R,n,X,X'및 Z는 상기 정의된 바와같다)으로 처리하고 그렇게 수득한화합물을 그의 염중 하나로 변환시킴을 특징으로 하는 식(Ⅰ)및(Ⅰ')의 화합물의 제조방법.
  6. 제1항 내지 4항중 어느 하나에 따르는 화합물을 활성 성분으로 함유하는 약학 조성물 또는 그의 약학적으로 수용 가능한 염.
  7. 제6항에 있어서, 단위 투여 형태를 갖는 약학 조성물.
  8. 제7항에 있어서, 적어도 하나의 부형제와 혼합된 1내지 250mg의 활성 성분을 함유함을 특징으로 하는 약학 조성물.
    ※ 참고사항 : 최초출원 내용에 의하여 공개하는 것임.
KR1019910014358A 1990-08-20 1991-08-20 3-아미도피라졸 유도체 및 그 제조방법과 그것을 함유한 약학 조성물 KR100223074B1 (ko)

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US5420141A (en) 1995-05-30
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JP2694932B2 (ja) 1997-12-24
RU2066317C1 (ru) 1996-09-10
CA2166902A1 (en) 1992-02-21
LT3520B (en) 1995-11-27
PL169085B1 (pl) 1996-05-31
CS257491A3 (en) 1992-06-17
EP0477049B1 (fr) 1999-12-01
HU211970A9 (en) 1996-01-29
LTIP656A (en) 1995-01-31
CA2166902C (en) 1999-01-19
KR100223074B1 (ko) 1999-10-15
FR2665898B1 (fr) 1994-03-11
NO300212B1 (no) 1997-04-28
ATE187167T1 (de) 1999-12-15
FI913917A (fi) 1992-02-21
FI104170B (fi) 1999-11-30
ES2142798T3 (es) 2000-05-01
IE912932A1 (en) 1992-02-26
IL99225A0 (en) 1992-07-15
SG52322A1 (en) 1998-09-28
MX9203576A (es) 1992-07-01
US5635526A (en) 1997-06-03
CA2049514A1 (en) 1992-02-21
HU912750D0 (en) 1992-01-28
CA2166901A1 (en) 1992-02-21
HK1005136A1 (en) 1998-12-24
US5607958A (en) 1997-03-04
CA2166903C (en) 1998-09-01
DK0477049T3 (da) 2000-04-25
HUT59106A (en) 1992-04-28
NO913234L (no) 1992-02-21
PL291463A1 (en) 1992-07-13
ZA916583B (en) 1992-05-27
AU8259691A (en) 1992-02-27
LV10434B (en) 1995-10-20
PT98717B (pt) 1999-01-29
LV10434A (lv) 1995-02-20
CA2166901C (en) 1999-01-26
FI913917A0 (fi) 1991-08-19
NO913234D0 (no) 1991-08-19
CA2166903A1 (en) 1992-02-21
US5744491A (en) 1998-04-28
GR3032732T3 (en) 2000-06-30
FI104170B1 (fi) 1999-11-30
MY121908A (en) 2006-03-31
US5616592A (en) 1997-04-01
CZ281864B6 (cs) 1997-03-12
DE69131813T2 (de) 2000-05-31
BR9103550A (pt) 1992-04-07
PT98717A (pt) 1992-07-31
AR248133A1 (es) 1995-06-30
IL99225A (en) 1995-10-31
EP0477049A1 (fr) 1992-03-25
JPH04244065A (ja) 1992-09-01
HU217435B (hu) 2000-01-28
US5744493A (en) 1998-04-28

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