KR910001908A - 레이저 스캐닝(scanning)을 사용하여 전자 구성 부품등을 제조하는 석판 인쇄 방법 - Google Patents

레이저 스캐닝(scanning)을 사용하여 전자 구성 부품등을 제조하는 석판 인쇄 방법

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Publication number
KR910001908A
KR910001908A KR1019900009209A KR900009209A KR910001908A KR 910001908 A KR910001908 A KR 910001908A KR 1019900009209 A KR1019900009209 A KR 1019900009209A KR 900009209 A KR900009209 A KR 900009209A KR 910001908 A KR910001908 A KR 910001908A
Authority
KR
South Korea
Prior art keywords
laser
workpiece
electronic components
radiation
printing method
Prior art date
Application number
KR1019900009209A
Other languages
English (en)
Other versions
KR940007801B1 (ko
Inventor
칸드라 다스 샤이암
칸 자마루딘
Original Assignee
디지탈 이큅먼트 코포레이션
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 디지탈 이큅먼트 코포레이션 filed Critical 디지탈 이큅먼트 코포레이션
Publication of KR910001908A publication Critical patent/KR910001908A/ko
Application granted granted Critical
Publication of KR940007801B1 publication Critical patent/KR940007801B1/ko

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G03F7/2006—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light using coherent light; using polarised light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
KR1019900009209A 1989-06-22 1990-06-21 레이저 스캐닝(scanning)을 사용하여 전자 구성 부품등을 제조하는 석판 인쇄 방법 KR940007801B1 (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US369,714 1989-06-22
US07/369,714 US5221422A (en) 1988-06-06 1989-06-22 Lithographic technique using laser scanning for fabrication of electronic components and the like

Publications (2)

Publication Number Publication Date
KR910001908A true KR910001908A (ko) 1991-01-31
KR940007801B1 KR940007801B1 (ko) 1994-08-25

Family

ID=23456607

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1019900009209A KR940007801B1 (ko) 1989-06-22 1990-06-21 레이저 스캐닝(scanning)을 사용하여 전자 구성 부품등을 제조하는 석판 인쇄 방법

Country Status (7)

Country Link
US (1) US5221422A (ko)
EP (1) EP0404340B1 (ko)
JP (1) JP2714475B2 (ko)
KR (1) KR940007801B1 (ko)
AT (1) ATE150555T1 (ko)
CA (1) CA2018262C (ko)
DE (1) DE69030215T2 (ko)

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FR2781916B1 (fr) * 1998-07-28 2000-09-08 Commissariat Energie Atomique Procede de realisation collective de tetes magnetiques integrees a surface portante obtenue par photolithographie
US6080959A (en) * 1999-03-12 2000-06-27 Lexmark International, Inc. System and method for feature compensation of an ablated inkjet nozzle plate
JP4514317B2 (ja) * 2000-11-27 2010-07-28 株式会社ミツトヨ 露光装置
US6514866B2 (en) * 2001-01-12 2003-02-04 North Carolina State University Chemically enhanced focused ion beam micro-machining of copper
AU2005238942B2 (en) * 2004-04-23 2008-09-04 Shell Internationale Research Maatschappij B.V. Reducing viscosity of oil for production from a hydrocarbon containing formation
US7655152B2 (en) * 2004-04-26 2010-02-02 Hewlett-Packard Development Company, L.P. Etching
US7534365B2 (en) * 2004-07-29 2009-05-19 Purdue Research Foundation Ultra-violet assisted anisotropic etching of PET
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US20080003819A1 (en) * 2006-06-09 2008-01-03 Octavian Scientific, Inc. Laser isolation of metal over alumina underlayer and structures formed thereby
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US8536062B2 (en) * 2007-09-21 2013-09-17 Advanced Inquiry Systems, Inc. Chemical removal of oxide layer from chip pads
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KR20200055871A (ko) * 2018-11-13 2020-05-22 삼성디스플레이 주식회사 기판 식각 방법

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Also Published As

Publication number Publication date
DE69030215D1 (de) 1997-04-24
CA2018262A1 (en) 1990-12-22
DE69030215T2 (de) 1997-08-14
JPH03135568A (ja) 1991-06-10
US5221422A (en) 1993-06-22
ATE150555T1 (de) 1997-04-15
CA2018262C (en) 1994-05-17
EP0404340B1 (en) 1997-03-19
KR940007801B1 (ko) 1994-08-25
JP2714475B2 (ja) 1998-02-16
EP0404340A3 (en) 1992-02-12
EP0404340A2 (en) 1990-12-27

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